Did You Know...
...that when IBM conducted a market study of Chester Carlson's invention in 1959, the company concluded that it would take only 5000 units of his new product to saturate the market? IBM therefore declined to be part of the new product introduction. Too bad for IBM. Carlson's invention was the xerography process, and his new product was the beginning of the Xerox Corporation. It is estimated that every day, worldwide, 3,000,000,000 copies are made!!
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| Number | Title | Issue Date |
| 8134681 | Adjustment method, substrate processing method, substrate processing apparatus, exposure apparatus, inspection apparatus, measurement and/or inspection system, processing apparatus, computer system, program and information recording medium When a host issues an analysis order that specifically instructs the analytical contents to an analytical apparatus (step 401), the analytical apparatus collects two types of measurement and/or inspection results from a measurement and/or inspection instrumen... | 03/13/2012 |
| 8120748 | Lithographic processing optimization based on hypersampled correlations A method of optimizing lithographic processing to achieve substrate uniformity, is presented herein. In one embodiment, The method includes deriving hyper-sampled correlation information indicative of photoresist behavior for a plurality of wafer substrates processe... | 02/21/2012 |
| 8111372 | Coating film forming apparatus and coating film forming method for immersion light exposure A coating film forming apparatus for immersion light exposure includes one or more coating units configured to apply a resist film or a resist film and an additional film onto a substrate, one or more thermally processing units configured to perform a thermal proces... | 02/07/2012 |
| 8054443 | Developing method and developing apparatus A developing method is used for subjecting a light-exposed resist film disposed on a wafer W to a developing process by a developing solution and a rinsing process by a rinsing liquid. In a state where the resist film on the wafer W is wet with the developing soluti... | 11/08/2011 |
| 8040488 | Substrate processing apparatus A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a processing block for liquid immersion exposure processing, and an interface block. An exposure de... | 10/18/2011 |
| 8031324 | Substrate processing apparatus with integrated cleaning unit In a substrate processing apparatus, an indexer block, a resist film processing block, a cleaning/drying processing block, a development processing block, and an interface block are provided side by side in this order. An exposure device is arranged adjacent to the ... | 10/04/2011 |
| 8023099 | Substrate processing system and substrate processing method for double patterning with carrier block, process section, and interface block A substrate processing system is used for a light exposure apparatus which performs light exposure at least twice on each of substrates. The system includes a carrier block, and a process section configured to process each of substrates transferred from the carrier ... | 09/20/2011 |
| 7999910 | System and method for manufacturing a mask for semiconductor processing The present disclosure provides a system and method for manufacturing a mask for semiconductor processing. In one example, the system includes at least one exposure unit configured to select a recipe for a later baking process in a post treatment unit, a buffer unit... | 08/16/2011 |
| 7965372 | Apparatus for removing photoresist film A photoresist film removing apparatus includes a reacting chamber, an ozonizer producing a gas supplied to the reacting chamber, and an exhaust system that exhausts the gas from the reacting chamber. A source of a photoresist film-remover is located opposite a stage... | 06/21/2011 |
| 7924396 | Coating/developing apparatus and pattern forming method A coating/developing apparatus includes a process section including processing units to perform a series of processes for resist coating and development; an interface section disposed between the process section and immersion light exposure apparatus; and a drying s... | 04/12/2011 |
| 7880859 | Substrate processing system and substrate processing method A substrate processing system processes a plurality of substrates in a single-substrate processing mode by a plurality of processes and provided with a plurality of modules respectively for carrying out processes. When a defect is found in a substrate, a defective p... | 02/01/2011 |
| 7821614 | Monitoring apparatus and method particularly useful in photolithographically processing substrates Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which th... | 10/26/2010 |
| 7817241 | Lithographic apparatus and device manufacturing method A lithographic apparatus is disclosed that includes a utility substrate storage configured to hold a utility substrate, and a utility substrate scheduling unit configured to schedule the loading of a utility substrate in a flow of substrates in the lithographic appa... | 10/19/2010 |
| 7751025 | Scatterometric method of monitoring hot plate temperature and facilitating critical dimension control A method of determining temperatures at localized regions of a substrate during processing of the substrate in a photolithography process includes the following steps: independently illuminating a photoresist layer including a photoresist pattern at a plurality of l... | 07/06/2010 |
| 7742146 | Coating and developing method, coating and developing system and storage medium A resist film formed on a substrate is coated with a water-repellent protective film and the substrate is subjected to a developing process after the substrate has been processed by an immersion exposure process. The protective film is removed from the substrate aft... | 06/22/2010 |
| 7714979 | Substrate processing apparatus A substrate processing apparatus enables an efficient collection of a solvent vapor discharged via a nozzle onto a wafer on which a resist pattern is formed. A retaining base that retains the wafer is moved relative to the nozzle, which includes a nozzle head. A pai... | 05/11/2010 |
| 7679715 | Lithographic processing cell, lithographic apparatus, track and device manufacturing method A rework station and a metrology device(s) are incorporated into a lithographic processing cell so that a faulty substrate can be reworked directly and reprocessed without, for example, an overhead involved in changing masks, etc. ... | 03/16/2010 |
| 7630052 | Exposure processing system, exposure processing method and method for manufacturing a semiconductor device An exposure processing system comprises an exposure apparatus to expose a resist on a wafer, a heating apparatus comprising heating apparatus units, the heating apparatus heating the exposed resist by a heating apparatus unit in the heating apparatus units, a develo... | 12/08/2009 |
| 7626679 | Exposure apparatus, manufacturing system, and device manufacturing method An exposure apparatus of the present invention includes: an exposure unit configured to expose photoresist coated on a substrate to light to transfer a pattern of a mask to the photoresist with respect to each of shot regions; and a controller configured to obtain a... | 12/01/2009 |
| 7599042 | Coating and developing apparatus, substrate processing method and computer-readable recording medium With regard to a group of substrates preceding a substrate of which residence time is under calculation, a time t1 and a time t2 are calculated, t1 being a time interval from a time point in which a substrate B1 under the consideration ha... | 10/06/2009 |
| 7586581 | Developing method of photoresist and developing device A developing device according to the present invention comprises a turntable, a motor for rotating the turntable and a spraying nozzle for spraying mixture of developer and nitrogen gas onto the turntable in mist form. The turntable is rotated at a rotational speed ... | 09/08/2009 |
| 7525634 | Monitoring apparatus and method particularly useful in photolithographically Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which th... | 04/28/2009 |
| 7508486 | Exposure apparatus, exposure and developing system, and method of manufacturing a device An exposure apparatus for exposing a substrate coated with a photosensitive material to radiant energy comprises a first controller and a second controller. The first controller is configured to control a process of exposing the substrate. The second controller is c... | 03/24/2009 |
| 7486377 | Developing method and developing apparatus A developing method is used for subjecting a light-exposed resist film disposed on a wafer W to a developing process by a developing solution and a rinsing process by a rinsing liquid. In a state where the resist film on the wafer W is wet with the developing soluti... | 02/03/2009 |
| 7474377 | Coating and developing system A coating and developing system for enabling maintenance of an exposure system combined therewith. The system carries a substrate, delivered to a carrier handling block, to a processing block to form a film thereon using a coating block included in the processing bl... | 01/06/2009 |
| 7435021 | Automatic development method of photosensitive lithographic printing plate and automatic development device thereof A developer replenishing method of an automatic development device of photosensitive lithographic printing plate including developing a plurality of exposed photosensitive lithographic printing plates with a developer containing an electrolyte and keeping the develo... | 10/14/2008 |
| 7429036 | Method and system for efficiently printing and sorting multiple orders of transaction cards A system and method for printing and sorting non-identical transaction cards concurrently includes a printer which is configured to print onto multiple sheets (i) each of a plurality of non-identical transaction cards onto a separate print receiving space on a sheet... | 09/30/2008 |
| 7422383 | Photosensitive material processor Developer is supplied to a first spray pipe disposed in a developing bath. The inside of the developing bath is provided with a heater. A liquid-flow generating unit comprises a liquid-flow generating head and a branch duct, which is connected to a branch pipe of th... | 09/09/2008 |
| 7403260 | Coating and developing system The coating and developing system carries a substrate delivered to a carrier handling block to a processing block to form a film on the substrate by a coating block included in the processing block, carries the substrate through an interface block to the exposure sy... | 07/22/2008 |
| 7403259 | Lithographic processing cell, lithographic apparatus, track and device manufacturing method A rework station and a metrology device(s) are incorporated into a lithographic processing cell so that a faulty substrate can be reworked directly and reprocessed without, for example, an overhead involved in changing masks, etc. ... | 07/22/2008 |
| 7372537 | Print processing apparatus capable of calibration printing A photographic printing apparatus includes a transporting section for cutting photosensitive material drawn from one of a plurality of magazines each accommodating therein an elongated photosensitive material into a print size piece by a cutter unit and then feeding... | 05/13/2008 |
| 7363876 | Multi-core transformer plasma source A transformer-coupled plasma source using toroidal cores forms a plasma with a high-density of ions along the center axis of the torus. In one embodiment, cores of a plasma generator are stacked in a vertical alignment to enhance the directionality of the plasma and... | 04/29/2008 |
| 7362448 | Characterizing residue on a sample A residue detection system collects at least one of the spectrum and image from a measurement region on a sample. Spectral analysis is performed on the collected spectrum to determine whether residue is present and if so the thickness of the residue. The spectral an... | 04/22/2008 |
| 7363195 | Methods of configuring a sensor network A sensor network collects time-series data from a process tool and supplies the data to an analysis system where pattern analysis techniques are used to identify structures and to monitor subsequent data based on analysis instructions or a composite model. Time-seri... | 04/22/2008 |
| 7362344 | Thermal developing apparatus A thermal developing apparatus for thermally developing a latent image formed on a thermal developing recording material by a thermal developing portion, the apparatus comprising: a heating unit that heats the thermal developing recording material carried to the the... | 04/22/2008 |
| 7349063 | Reflection mirror apparatus, exposure apparatus and device manufacturing method A reflection mirror apparatus, used in a reflection optical system of an exposure apparatus which performs exposure processing by guiding exposure light by reflection, has a mirror having a reflection surface to reflect the exposure light, and radiation plates for r... | 03/25/2008 |
| 7349067 | Lithographic apparatus and device manufacturing method A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provi... | 03/25/2008 |
| 7344322 | Drying device and drying method A drying device, which dries a photosensitive layer of a photosensitive planographic printing plate using infrared rays, includes an infrared emitting device and a filter that is arranged between the photosensitive planographic printing plate conveyed through the dr... | 03/18/2008 |
| 7338223 | Developing method and apparatus for performing development processing properly and a solution processing method enabling enhanced uniformity in the processing A substrate processing apparatus and method provide for exhausting air from a first peripheral region α around a substrate undergoing processing, and for exhausting air from a second peripheral region β between the first peripheral region and the substrate. The me... | 03/04/2008 |
| 7336340 | Method of exposure error adjustment in photolithography for multiple products A method of adjusting exposure error for multiple products is described. First, one Photo Feed Back System (PFBS) suited to host-product or miscellaneous product is chosen. Different standard points and compensation difference for host-product or miscellaneous produ... | 02/26/2008 |
