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| Number | Title | Issue Date |
| 7993008 | Optical element and exposure apparatus An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a... | 08/09/2011 |
| 7384149 | Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system A lithographic projection apparatus includes a support configured to support a patterning device, the patterning device configure to pattern the projection beam according to a desired patter. The apparatus has a substrate table configure to hold a substrate, a proje... | 06/10/2008 |
| 7372541 | Lithographic apparatus and device manufacturing method In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.... | 05/13/2008 |
| 7365827 | Lithographic apparatus and device manufacturing method A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts. ... | 04/29/2008 |
| 7355800 | Apparatus for projecting a line of light from a diode-laser array A line-of-light projecting module is illuminated by a diode-laser bar and includes light-pipe for homogenizing light from the diode-laser bar in the slow-axis. A shaping optics assembly directs the light emitted by the diode-laser bar into the entrance end of the li... | 04/08/2008 |
| 7352440 | Substrate placement in immersion lithography A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position o... | 04/01/2008 |
| 7330238 | Lithographic apparatus, immersion projection apparatus and device manufacturing method A lithographic apparatus comprises a substrate table to hold a substrate and a projection system to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system to supply a fluid betwee... | 02/12/2008 |
| 7324185 | Lithographic apparatus and device manufacturing method In an embodiment, a lithographic projection apparatus has an off-axis image field and a concave refractive lens as the final element of the projection system. The concave lens can be cut-away in parts not used optically to prevent bubbles from being trapped under th... | 01/29/2008 |
| 7317507 | Lithographic apparatus and device manufacturing method A lithographic projection apparatus uses a volume of a second liquid to confine a first liquid to a space between the projection system and the substrate. In an embodiment, the first and second liquids are substantially immiscible and may be a cycloalkane, such as c... | 01/08/2008 |
| 7291850 | Lithographic apparatus and device manufacturing method A method and apparatus for monitoring a level of silicon dioxide in a liquid and removing the silicon dioxide using polishers is disclosed. In an embodiment, two polishers that absorb carbon dioxide and silicon dioxide, but which have a greater affinity for carbon d... | 11/06/2007 |
| 7224431 | Lithographic apparatus and device manufacturing method In, for example, an immersion lithography apparatus, a sensor that would normally be provided on the substrate table is replaced by a retro-reflector on the substrate table and a sensor at, for example, patterning device level. This may avoid the need to make the se... | 05/29/2007 |
| 7220005 | Projection type video display apparatus An object of the invention is to achieve a high intensity, a compact structure, a cost reduction and a heat radiation of a liquid crystal panel, in a projection type video display apparatus employing a combination of LED light sources and a light pipe. The light pip... | 05/22/2007 |
| 7209213 | Lithographic apparatus and device manufacturing method A final element of a projection system of an immersion lithographic apparatus is configured for a liquid having a refractive index greater than a refractive index of the final element. In an embodiment, the final element comprises a convex meniscus shaped lens. Such... | 04/24/2007 |
| 7196770 | Prewetting of substrate before immersion exposure A lithographic projection apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table ... | 03/27/2007 |
| 7193232 | Lithographic apparatus and device manufacturing method with substrate measurement not through liquid A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor... | 03/20/2007 |
| 7159986 | Wide field collimator A collimator is compact and uses power efficient light emitting diodes as the illumination source to generate a test image in collimated space. The collimator provides a test image across a wide field of view, which is useful for calibration of optical devices that ... | 01/09/2007 |
| 7156521 | Projector for compensating chromatic aberration of magnification A projector having a cross-dichroic prism (260) synthesizing three kinds of red, green, and blue light emitted from liquid crystal panels (250, 252, 254); and a projection lens (270) projecting the synthesized light and also having polarizing pl... | 01/02/2007 |
| 7150535 | Lighting device and projector equipped with the same A lighting includes: a light source device; a concave lens having a light-incident surface formed from a hyperboloid of revolution to make the luminous flux from the light source device almost parallel; a first lens array; and a second lens array, with a concave sur... | 12/19/2006 |
| 7092068 | Reticle, exposure monitoring method, exposure method and manufacturing method for semiconductor device A reticle includes a first mask portion including a first opaque portion, first and second exposure monitor patterns provided within first and second window portions in the first opaque portion, increasing transmittances in a first direction and a direction reverse ... | 08/15/2006 |
| 6961192 | Color lighting apparatus and method and image projection apparatus and method using the same A color lighting apparatus and method which has a small optical apparatus or method illuminating color beams with a high optical efficiency and an image projection apparatus and method using the same. The color lighting apparatus includes a light source, a color bea... | 11/01/2005 |
| 6916097 | Light source device and projection type display unit to which the device is applied A light emitted from a semiconductor light emitting device array having a plurality of semiconductor light emitting devices arranged two-dimensionally on a substrate is converged by a condensing lens. In a light guide, a mirror surface is formed from a light inciden... | 07/12/2005 |
| 5231471 | Alignment and exposure apparatus An alignment mark detecting device usable with an exposure apparatus for transferring a pattern of an original onto a workpiece having a radiation-sensitive layer, includes a holder for holding the workpiece, a radiation energy source for irradiating the ... | 07/27/1993 |
| 5161059 | High-efficiency, multilevel, diffractive optical elements A high-efficiency, diffractive optical element having at least one surface including multilevel steps, the steps determined by calculating equiphase boundaries utilizing a disclosed equation and algorithm. The optical element can be adapted to correct for... | 11/03/1992 |
| 5120134 | Exposure system including a device for analyzing an affect of a wafer resist upon a mark signal An exposure system for exposing a wafer coated with a resist to a mask is disclosed. The system includes a photoelectric converting device for photoelectrically converting, through a detection optical system, an alignment mark formed on the wafer; an anal... | 06/09/1992 |
| 4851924 | Color recorder overhead projector with color recorder An overhead projector having scanning device for scanning an original image thereby generating electric signals corresponding to the original image, selecting device for selecting one of a thermochromic film and a thermographic paper, a first heating devi... | 07/25/1989 |
| 4368963 | Multicolor image or picture projecting system using electronically controlled slides A large image or picture system includes a flat screen, on which is projected pictures from three small liquid crystal display panels behind or in front of which are disposed respectively three filters of the colors red, green and blue. Three light source... | 01/18/1983 |
