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Class 34/516 - Special gas or vapor


Subclass of Class 34 - Drying and gas or vapor contact with solids
Definition: Process in which a gas or vapor is used that is other than
No. of patents: 58
Last issue date: 04/17/2012


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NumberTitleIssue Date
8156662Systems for prevention of HAP emissions and for efficient drying/dehydration processes
This invention discloses systems, apparatuses and methods for drying or dehydrating high moisture content feedstock to dry or low moisture products. The equipment systems comprise a gas turbine generator unit (preferred heat source), a dryer vessel and a processing ...
04/17/2012
7291565Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid
A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry comprises fl...
11/06/2007
7255772High pressure processing chamber for semiconductor substrate
A high pressure chamber comprises a chamber housing, a platen, and a mechanical drive mechanism. The chamber housing comprises a first sealing surface. The platen comprises a region for holding the semiconductor substrate and a second sealing surface. The mechanical...
08/14/2007
7250374System and method for processing a substrate using supercritical carbon dioxide processing
A method and system for processing a substrate in a film removal system. The method includes providing the substrate in a substrate chamber of a film removal system, where the substrate has a micro-feature containing a dielectric film on a sidewall of the micro-feat...
07/31/2007
7140393Non-contact shuttle valve for flow diversion in high pressure systems
A valve for redirecting flow in a supercritical fluid or other high pressure processing system is disclosed. In high pressure supercritical carbon dioxide (SCCO2) equipment for semiconductor wafer processing, a major hurtle in providing clean equipment and clean waf...
11/28/2006
6918192Substrate drying system
A substrate drying system for drying substrates after the substrates are washed typically using deionized water, is disclosed. The substrate drying system comprises a substrate cleaning tank in which the substrates are washed. A dry pump is provided in fluid communi...
07/19/2005
6880265Method of drying metallic waste of pyrophoric tendencies that is to be compacted; apparatus and compacting canister associated with said method
The present invention provides: a method of drying metallic waste having pyrophoric tendencies (liable to catch fire and/or explode), said waste being for compacting; an apparatus for drying said waste, the apparat...
04/19/2005
6576066Supercritical drying method and supercritical drying apparatus
According to a supercritical drying method of this invention, a substrate having a pattern is dipped in water and rinsed with water. Then, the substrate is placed in the reaction chamber of a predetermined sealable vessel, and surfactant-added liquid carb...
06/10/2003
6463672Mitigation of spacecraft charging by means of ionized water vapor
The process of mitigation of spacecraft surface charging using ionized water vapor is used, since it helps taking excess surface electrons away from a spacecraft surface, leaving practically no residue after complete evaporation....
10/15/2002
6449873Apparatus and method for dry cleaning of substrates using clusters
Disclosed is a dry cleaning apparatus and method using cluster for cleaning a surface of a specimen such as semiconductor wafer. The cleaning method first forms a neutral cluster no having polarity by passing a cleaning gas such as argon, nitrogen, or car...
09/17/2002
6408538Method of sterilization of musical wind instruments
A method of sterilizing musical instruments is provided. More particularly, a method of sterilizing musical wind instruments and accessories related thereto is provided for sterilizing, or at least sanitizing, musical wind instruments and accessories with...
06/25/2002
6398875Process of drying semiconductor wafers using liquid or supercritical carbon dioxide
A process of drying a semiconductor wafer which includes at least one microelectric structure disposed thereon which includes contacting a water-containing thin film-covered semiconductor wafer with a composition which includes liquid or supercritical car...
06/04/2002
6387158Method of removing moisture in gas supply system
A method of removing moisture efficiently in the gas supply system by evacuation at normal temperature without using the baking method. The method involves flowing a gas to remove moisture in the gas supply system with the flow pressure of the gas to remo...
05/14/2002
6357141Evaporator with hot air bath and method of use
An evaporating system for evaporating solvents from chemical samples held in supply plates, which accelerate evaporation by warming the samples in a hot air bath. The system includes adapters to allow the use of supply plates of varying heights, such as e...
03/19/2002
6345449Method of sterilization of musical wind instruments
A method of sterilizing musical instruments is provided. More particularly, a method of sterilizing musical wind instruments is provided for sterilizing, or at least sanitizing, musical wind instruments without damaging or degrading components of such ins...
02/12/2002
6226889Continuous rotary vacuum retort apparatus and method of use
The present invention relates to a method and apparatus for use in removing at least one volatile contaminant from contaminated material by using a rotary vacuum retort during high temperature and vacuum processing. The loading and unloading are performed...
05/08/2001
6192600Thermocapillary dryer
A process and apparatus for drying semiconductor wafers includes the controlled-rate extraction of a wafer immersed in rinsing liquid, irradiation of the wafer using high intensity lights or filaments along the wafer-liquid interface, and delivery of gas ...
02/27/2001
6148542Method for curing an adhesive between two layers of an information carrier
A method of manufacturing an information carrier which cures an adhesive by means of UV radiation in an inert-gas atmosphere. The adhesive is interposed as an adhesive layer between two superposed layers of a disc-shaped information carrier. The device in...
11/21/2000
6134806Bag with air distributor and ozone generator
A portable sport equipment bag having an air distributor is connected with a hose to blower and ozone generator operable to move air and ozone under pressure into the air distributor. The air distributor has one or more manifolds located within the bag. T...
10/24/2000
6105275Continuous rotary vacuum retort apparatus and method of use
The present invention relates to a method and apparatus for use in continuously loading material to be treated into a rotary vacuum retort and continuously unloading one or more vapors or similar volatile substances and treated material out of the rotary ...
08/22/2000
6029371Drying treatment method and apparatus
A drying treatment apparatus for drying cleaned semiconductor wafers comprises drying gas producing means (41) connected to a drying treating unit (30) through a drying gas supplying pipe line (32). A flowrate controlling diaphragm pump (50) is provided i...
02/29/2000
5943880Cooling apparatus, cooling method, and processing apparatus
A refrigerant is directly contacted to a substrate to be processed that was heated so as to quickly cool the substrate. Thus, the temperature of the substrate is dropped to a predetermined temperature level. The substrate is cooled by a cooling device and...
08/31/1999
5644855Cryogenically purged mini environment
A portable contamination-sensitive component transport container provides a continuously purged environment for the components. The container includes an attached cryogenically liquefied inert gas insulated storage vessel from which vaporized liquefied in...
07/08/1997
5551165Enhanced cleansing process for wafer handling implements
Methods are providing for cleansing contaminants from substrates, such as semiconductor wafer handling implements, and thereby reduce the incidence of contamination of semiconductor devices being assembled upon the semiconductor wafers. In one aspect of t...
09/03/1996
5479727Moisture removal and passivation of surfaces
The present invention is a process of removal of moisture from surfaces, such as metal conduit for transmission of high purity gases in electronic component fabrication facilities, and the passivation of such metal surfaces to retard the readsorption of m...
01/02/1996
5454177Process for the treatment of objects with an inflammable volatile liquid
A process for the treatment of objects with an inflammable volatile liquid, in an installation comprising at least one upwardly open tank (16) adapted to be filled with the liquid, a drying device (20) adapted to remove contained treatment liquid from the...
10/03/1995
5440824Method of cleaning gas cylinders with supercritical fluids
The interior of a gas cylinder is cleaned using a supercritical fluid. A treating material, such as carbon dioxide, is injected into the cylinder, and the pressure in the cylinder is increased until the pressure of the treating material exceeds its critic...
08/15/1995
5333394Controlled atmosphere container system for perishable products
A controlled atmosphere container system for shipping and storing perishable products, wherein the container system includes a plurality of individual, transportable containers to be connected from time to time with a central source for providing a contro...
08/02/1994
5303482Wafer airtight keeping unit and keeping facility thereof
A wafer keeping apparatus includes a closed wafer keeping space, and an arrangement for circulating an inert gas through a filter and then through the wafer keeping space. In one embodiment, several wafer keeping shelves are each provided within the space...
04/19/1994
5210959Ambient-free processing system
An apparatus and method for processing a workpiece in an ambient-free, atmosphere of selected gas. A preparation vessel has an opening for entry of the workpiece and a diffuser oriented to emit across the vessel opening a laminar curtain flow of the selec...
05/18/1993
5162275Low temperature kiln carbon reactivation
Particulate carbon is reactivated by heating it for an effective reactivation time at a reactivation temperature in a stationary vertical annular heating zone of an unlined metal kiln....
11/10/1992
5092766Pulse combustion method and pulse combustor
It is an object of the present invention to provide a pulse combustion method and a valveless pulse combustor in which the strong sound wave energy and the combustion gas generated by explosions in the combustion chamber are effectively used for drying of...
03/03/1992
4974338Drying process
When it has been attempted to dry wet polymeric particles in hot air at up to 100° C. it has tended to produce discoloration in the product, introduce aggregates into the product, reduce the dispersibility of the product and reduce the integrity of the s...
12/04/1990
4894928Subterranean grain storage
A subterranean cavern having gas impermeable walls is used to store grain. The cavern has a controlled atmosphere without oxygen and preferably has an atmosphere of nitrogen. Access is provided to the cavern from the surface for the loading and outloading...
01/23/1990
4731938Anaerobic pasteurizing conditioning system
An anaerobic, pasteurizing conditioning system for treating matter such as whole and ground grain and minerals to increase the rate of conversion during digestion and thus the nutritional value thereof. The system comprises a direct fired steam generator ...
03/22/1988
4683664Apparatus for drying metal turnings or scrap
Apparatus for the drying of ferrous or non-ferrous turnings or scrap comprises a vertical axis drier (1) in which a drum (2) which encloses a transporter (3) for the turnings in question is mounted transversely. The turnings are heated indirectly via the ...
08/04/1987
4626301Method of making a fire-resistant translucent layer
A nonflammable layer is made by drying an aqueous alkali metal silicate composition on a substrate in the presence of a drying atmosphere containing at least 30% free oxygen by volume so that the resulting layer remains bubble-free on aging even under int...
12/02/1986
4597736Method and apparatus for heating semiconductor wafers
A method and apparatus for heating semiconductor wafers characterized by the release of preheated nitrogen into an oven to considerably reduce heating time for the wafers. The oven is evacuated prior to the release of the preheated nitrogen....
07/01/1986
4581164Gel drying via treatment with organic liquid below gas stream
The present invention relates to the treatment of gel materials to remove water therefrom. The invention provides a process for removing water from a gel material by contacting the gel material with an organic liquid and contacting the organic liquid with...
04/08/1986
4575950Method for removal of residual solvent from particulate crumb made by solution polymerization
A method for removing residual solvent dissolved in non-sticky crumb particles produced by solution polymerization that have been treated substantially to remove solvent from the polymer surface. Particles are transferred into a closed storage zone under ...
03/18/1986
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