Quotables
"Fooling around with alternating current is just a waste of time. Nobody will use it, ever."
Thomas Edison ; 1889
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 7357115 | Wafer clamping apparatus and method for operating the same A wafer clamping apparatus is provided to secure a wafer within a chamber during wafer processing. The wafer clamping apparatus creates a pressure differential between a top surface and a bottom surface of the wafer. The pressure differential serves to pull the wafe... | 04/15/2008 |
| 7291565 | Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry comprises fl... | 11/06/2007 |
| 7255115 | Apparatus for cleaning semiconductor wafers An apparatus for cleaning semiconductor wafers includes a chamber, a bubbler having a vapor generating part for generating alcohol vapor and a spray pipe for spraying the alcohol vapor into the chamber, a gas supply nozzle for spraying gas into the chamber to dry th... | 08/14/2007 |
| 7255772 | High pressure processing chamber for semiconductor substrate A high pressure chamber comprises a chamber housing, a platen, and a mechanical drive mechanism. The chamber housing comprises a first sealing surface. The platen comprises a region for holding the semiconductor substrate and a second sealing surface. The mechanical... | 08/14/2007 |
| 7250374 | System and method for processing a substrate using supercritical carbon dioxide processing A method and system for processing a substrate in a film removal system. The method includes providing the substrate in a substrate chamber of a film removal system, where the substrate has a micro-feature containing a dielectric film on a sidewall of the micro-feat... | 07/31/2007 |
| 7191983 | Methods and systems for controlling flammability control systems in aircraft and other vehicles Methods and systems for controlling fuel tank flammability control systems are disclosed herein. In one embodiment, a system for use with an aircraft or other vehicle includes a flammability control system and a controller operably coupled to the flammability contro... | 03/20/2007 |
| 7186299 | Method of rinsing and drying semiconductor substrates A method for cleaning and drying semiconductor wafers improves device yield by providing more advanced control of the ratio of drying fluid to cleaning fluid, for example the ratio of N2 vapor to IPA vapor. In addition, a quick drain process is employed to improve p... | 03/06/2007 |
| 7180035 | Substrate processing device A steam generator 40′ provided in a substrate processing apparatus includes a tank 301 having a hollow cylindrical member 302 formed of a composite of PTFE and PFA and a pair of side wall plates 303 connected to the opposite ends of the... | 02/20/2007 |
| 7156895 | Air cleaning system A system for cleaning air wherein the air to be cleaned is bubbled up through an aqueous phase and an organic phase. The air is bubbled upwardly through the liquid to take advantage of the weight of the liquid to compress the gas, thereby increasing the solubility o... | 01/02/2007 |
| 7140393 | Non-contact shuttle valve for flow diversion in high pressure systems A valve for redirecting flow in a supercritical fluid or other high pressure processing system is disclosed. In high pressure supercritical carbon dioxide (SCCO2) equipment for semiconductor wafer processing, a major hurtle in providing clean equipment and clean waf... | 11/28/2006 |
| 7125912 | Doped sol-gel materials and method of manufacture utilizing reduced mixing temperatures A method of preparing a solution for forming a doped gel monolith includes providing a first substance including a metal alkoxide. The method further includes providing a second substance including a catalyst. The method further includes providing a chemical includi... | 10/24/2006 |
| 7060422 | Method of supercritical processing of a workpiece An apparatus for supercritical processing and non-supercritical processing of a workpiece comprises a transfer module, a supercritical processing module, a non-supercritical processing module, and a robot. The transfer module includes an entrance. The supercritical ... | 06/13/2006 |
| 7044662 | Developing photoresist with supercritical fluid and developer An apparatus for developing a polymeric film without the need for a water rinse step is disclosed. An object having a surface supporting a polymeric film is placed onto a support region within a pressure chamber of the apparatus. A fluid and developer is introduced ... | 05/16/2006 |
| 7028698 | Pressure processing apparatus with improved heating and closure system Apparatus for pressure processing components is disclosed which includes an improved closure system that minimizes dust-generating parts and allows easy access to the chamber. Ports are provided for introducing and releasing pressurized gases and fluids to and from ... | 04/18/2006 |
| 6953654 | Process and apparatus for removing a contaminant from a substrate Contaminant removal from a substrate can be performed using a supercritical fluid. An apparatus can be configured to operate at conditions that take advantage of higher solubility of a contaminant in its supercritical state compared to its liquid state. The substrat... | 10/11/2005 |
| 6926012 | Method for supercritical processing of multiple workpieces An apparatus for supercritical processing of multiple workpieces comprises a transfer module, first and second supercritical processing modules, and a robot. The transfer module includes an entrance. The first and second supercritical processing modules are coupled ... | 08/09/2005 |
| 6921456 | High pressure processing chamber for semiconductor substrate A high pressure chamber comprises a chamber housing, a platen, and a mechanical drive mechanism. The chamber housing comprises a first sealing surface. The platen comprises a region for holding the semiconductor substrate and a second sealing surface. The mechanical... | 07/26/2005 |
| 6918192 | Substrate drying system A substrate drying system for drying substrates after the substrates are washed typically using deionized water, is disclosed. The substrate drying system comprises a substrate cleaning tank in which the substrates are washed. A dry pump is provided in fluid communi... | 07/19/2005 |
| 6904702 | Method and apparatus for drying substrate The substrate drying apparatus has a substrate processing vessel 1, a substrate supporting section for supporting plural substrates 2 in a standing condition and lined up condition in the interior of the substrate processing vessel 1, fluid rese... | 06/14/2005 |
| 6886273 | Apparatus and method for separating hydrocarbons from material A system for separating hydrocarbons from a material which includes a process chamber, a process pan operatively connected to the process chamber and removable therefrom, a blower operatively connected to the process chamber and to a heat source, the blower adapted ... | 05/03/2005 |
| 6655042 | System and method for drying semiconductor substrate A drying system for drying a semiconductor substrate is provided. The drying system includes: a chamber for housing a vapor distributor and a fluid bath, said fluid bath being disposed in a lower portion of the chamber and said distributor being disposed ... | 12/02/2003 |
| 6519869 | Method and apparatus for drying semiconductor wafers A method and an apparatus for drying semiconductor wafers by using an IPA drying apparatus. The present invention uses a vapor generator to generate an IPA vapor. The IPA vapor is generated and saved in a closed surrounding and then transferred in a porou... | 02/18/2003 |
| 6493964 | Supercritical point drying apparatus for semiconductor device manufacturing and bio-medical sample processing A critical point drying apparatus for sample preparation in electron microscopy and semiconductor wafer production includes a computer system to automate the operational modes in drying the specimen. These operational modes controlled by the computer syst... | 12/17/2002 |
| 6438867 | Method for drying and producing microporous particles and a drying device In a process for drying microporous, fluid-containing particles, the heat required for increasing the temperature is supplied by convection by reducing the interfacial tension of the fluid, preferably to 0 to 1/10, in particular to 0 to 1/20, of the inter... | 08/27/2002 |
| 6398875 | Process of drying semiconductor wafers using liquid or supercritical carbon dioxide A process of drying a semiconductor wafer which includes at least one microelectric structure disposed thereon which includes contacting a water-containing thin film-covered semiconductor wafer with a composition which includes liquid or supercritical car... | 06/04/2002 |
| 6289605 | Method for drying a semiconductor wafer The present invention provides a drying method for removing a residual solution from a semiconductor wafer. The semiconductor wafer is placed into a chamber, and then the air pressure of the chamber is lowered from atmospheric pressure to a lower pressure... | 09/18/2001 |
| 6101737 | Apparatus and method for drying a semiconductor member A drying apparatus and method of drying is provided for drying a semiconductor member mounted in a carrier that is placed in a processing tank through contact with isopropyl alcohol. An isopropyl alcohol liquid is vaporized in a bottom portion of the proc... | 08/15/2000 |
| 6067728 | Supercritical phase wafer drying/cleaning system An apparatus and method for drying a microelectronic structure on wafer substrate using supercritical phase gas techniques and a unique pressure vessel locking mechanism. There is lid and a base with an open cavity to contain at least one microelectronic ... | 05/30/2000 |
| 6067727 | Apparatus and method for drying substrates A cover is provided to an opening of a chamber in such a manner to open and close the opening and when the cover closes the opening, the chamber and the cover form a sealed drying process space. In this drying process space, nitrogen gas is supplied to pu... | 05/30/2000 |
| 6055743 | Method and apparatus for drying semiconductor wafers without forming water markers thereon A method and an apparatus for drying a semiconductor wafer. The semiconductor wafer is first dipped in a liquid with a volatility higher than water and which is miscible with water. The dipped semiconductor wafer is then delivered in an IPA dryer to carry... | 05/02/2000 |
| 5873181 | System for cleaning the interior of tanks and other objects A method and apparatus for cleaning the interior of a container or one or more objects suspended therein comprising generating a fluid vapor column by forming an air column having a direction of air flow. The air column is passed through a heating means, ... | 02/23/1999 |
| 5815942 | Vapor drying system and method A vapor drying system includes a tank for holding a drying liquid and a heater for boiling the drying liquid in the tank to produce a vapor. A manifold is arranged in the tank for bubbling gas into the drying liquid. A controller is configured to cause th... | 10/06/1998 |
| 5758434 | Wood drying system A wood drying system to eliminate the discharge of liquid kiln water includes a kiln which is heated to dry a batch of wood, a basin to collect the water driven from the wood, and an evaporator in which the collected water is converted into steam. The ste... | 06/02/1998 |
| 5752532 | Method for the precision cleaning and drying surfaces This invention pertains to a substrate cleaner and dryer or a dryer alone, and in particular, to an improved method of isopropyl alcohol (IPA) vapor drying having "closed loop" processing and capability to process extremely large substrates. The invention... | 05/19/1998 |
| 5715612 | Method for precision drying surfaces This invention pertains to a substrate cleaner and dryer or a dryer alone, and in particular, to an improved method of isopropyl alcohol (IPA) vapor drying having "closed loop" processing and capability to process extremely large substrates. The invention... | 02/10/1998 |
| 5711819 | Method for cleaning the interior of tanks and other objects A method and apparatus for cleaning the interior of a container or one or more objects suspended therein comprising generating a fluid vapor column by forming an air column having a direction of air flow. The air column is passed through a heating means, ... | 01/27/1998 |
| 5709037 | Stream drying process A material to be dried, such as a semiconductor substrate during manufacturing a semiconductor device, is loaded into a process chamber fitted at a loading opening with a lid which is closed from above. The inner side wall surface of the process chamber h... | 01/20/1998 |
| 5575079 | Substrate drying apparatus and substrate drying method A substrate drying apparatus includes a process bath having an object containing region for containing an object to be treated, a treatment liquid containing region for containing a volatile treatment liquid, and heating member for evaporating the treatme... | 11/19/1996 |
| 5548906 | Vaporizing and concentration drying apparatus and method Vaporizing and concentration drying apparatus and method are disclosed. The apparatus and method prepare good quality of condensed water and save evaporation energy and are wide used in making contaminated waste water become distilled water and in purific... | 08/27/1996 |
| 5539995 | Continuous flow vapor dryer system An apparatus and method for rapidly drying an object, such as a semiconductor wafer, by creating a vapor flow from a liquid, such as isopropyl alcohol, and exposing the object to that flow. The apparatus comprises a heater for vaporizing liquid in a reser... | 07/30/1996 |
