Bizarre Patents
Decorative Jeweled Wheel Cover
An improved wheel is provided wherein decorative items such as gem stones are embedded in either the wheel surface, a special mounting section attached to the wheel surface, or to a spoke strap that wraps around each spoke and positions embedded gem stones on the outside surface of the spoke.
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| Number | Title | Issue Date |
| 7377053 | Method and device for drying substrate A device for drying substrate comprising a processing vessel housing a specified number of substrates such as semiconductor wafers installed erectedly in parallel to one another, a first substrate supporting member supporting substrates within the processing vessel,... | 05/27/2008 |
| 7368016 | Substrate processing unit and substrate processing apparatus A substrate processing unit includes: a vertically-movable substrate holder for holding a substrate; a pan surrounding a periphery of the substrate holder; a cell, located below the substrate holder and within the pan, having in its interior a chemical processing se... | 05/06/2008 |
| 7361231 | System and method for mid-pressure dense phase gas and ultrasonic cleaning Workpieces are loaded into a cleaning chamber. The cleaning chamber is pressurized with a first dense-phase cleaning fluid, the temperature and pressure of the first dense-phase fluid being maintained at less than about 1500 psi using a temperature control device. T... | 04/22/2008 |
| 7335333 | Method of altering a fluid-borne contaminant An improved method of altering a fluid-borne contaminant includes the steps of: providing a positive-displacement pump (21) having an inlet (22) and an outlet (23); connecting the pump inlet to a source (24) of contaminated fluid; operati... | 02/26/2008 |
| 7291565 | Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry comprises fl... | 11/06/2007 |
| 7270941 | Method of passivating of low dielectric materials in wafer processing A method of passivating silicon-oxide based low-k materials using a supercritical carbon dioxide passivating solution comprising a silylating agent is disclosed. The silylating agent is preferably an organosilicon compound comprising organo-groups with five carbon a... | 09/18/2007 |
| 7255772 | High pressure processing chamber for semiconductor substrate A high pressure chamber comprises a chamber housing, a platen, and a mechanical drive mechanism. The chamber housing comprises a first sealing surface. The platen comprises a region for holding the semiconductor substrate and a second sealing surface. The mechanical... | 08/14/2007 |
| 7250374 | System and method for processing a substrate using supercritical carbon dioxide processing A method and system for processing a substrate in a film removal system. The method includes providing the substrate in a substrate chamber of a film removal system, where the substrate has a micro-feature containing a dielectric film on a sidewall of the micro-feat... | 07/31/2007 |
| 7179000 | Method of developing a resist film and a resist development processor The present invention provides a resist development processor consisting of a development processing chamber for storing a resist substrate having an exposed resist on the substrate and for developing the exposed resist by means of a development solvent consisting o... | 02/20/2007 |
| 7177081 | High contrast grating light valve type device A grating light valve has with a plurality of spaced reflective ribbons are spatially arranged over a substrate with reflective surfaces. The grating light valve is configured to optimized the conditions for constructive and destructive interference with an incident... | 02/13/2007 |
| 7140393 | Non-contact shuttle valve for flow diversion in high pressure systems A valve for redirecting flow in a supercritical fluid or other high pressure processing system is disclosed. In high pressure supercritical carbon dioxide (SCCO2) equipment for semiconductor wafer processing, a major hurtle in providing clean equipment and clean waf... | 11/28/2006 |
| 7111556 | Printing system, print request terminal, compression algorithm selecting program and printing method A printing system is provided suitable for reducing a printing time. A client apparatus acquires document data being edited during an editing operation by an application, creates print data for evaluation based on the acquired document data, selects a compression al... | 09/26/2006 |
| 7068372 | MEMS interferometer-based reconfigurable optical add-and-drop multiplexor The interferometer comprises a beam splitter, a mirror and a phase modulator. The beam splitter splits a signal into a first portion and a second portion. The mirror reflects the first portion. The first portion includes an optical path length, which is fixed. The p... | 06/27/2006 |
| 7054515 | Diffractive light modulator-based dynamic equalizer with integrated spectral monitor An integrated device of the present invention comprises free-space optics, a bi-directional multiplexor/de-multiplexor, a diffractive light modulator, a beam splitter, an optical performance monitor, and a controller. The free-space optics collimate, transform and i... | 05/30/2006 |
| 7049164 | Microelectronic mechanical system and methods The current invention provides for encapsulated release structures, intermediates thereof and methods for their fabrication. The multi-layer structure has a capping layer, that preferably comprises silicon oxide and/or silicon nitride, and which is formed over an et... | 05/23/2006 |
| 7044147 | System, apparatus and method for contaminant reduction in semiconductor device fabrication equipment components A system, apparatus, and method for reducing contaminants of semiconductor device fabrication equipment components, featuring a manifold having a passageway in fluid communication with to a plurality of inlets and for providing a purge fluid to removably connected c... | 05/16/2006 |
| 7044662 | Developing photoresist with supercritical fluid and developer An apparatus for developing a polymeric film without the need for a water rinse step is disclosed. An object having a surface supporting a polymeric film is placed onto a support region within a pressure chamber of the apparatus. A fluid and developer is introduced ... | 05/16/2006 |
| 7042611 | Pre-deflected bias ribbons A modulator for and a method of modulating an incident beam of light including means for supporting a plurality of active elements and a plurality of bias elements, each active and bias element including a light reflective planar surface with the light reflective pl... | 05/09/2006 |
| 7033089 | Method of developing a resist film and a resist development processor The present invention provides a resist development processor consisting of a development processing chamber for storing a resist substrate having an exposed resist on the substrate and for developing the exposed resist by means of a development solvent consisting o... | 04/25/2006 |
| 6953654 | Process and apparatus for removing a contaminant from a substrate Contaminant removal from a substrate can be performed using a supercritical fluid. An apparatus can be configured to operate at conditions that take advantage of higher solubility of a contaminant in its supercritical state compared to its liquid state. The substrat... | 10/11/2005 |
| 6947613 | Wavelength selective switch and equalizer A device comprising a light modulator including a plurality of elements wherein each element is selectively operable such that the plurality of elements are dynamically configurable to combine selected ones of a plurality of grating periods such that selected portio... | 09/20/2005 |
| 6928748 | Method to improve post wafer etch cleaning process A method and apparatus for performing a semiconductor process wafer drying process, the method provides a semiconductor wafer having a process surface disposed in an enclosed drying space following exposure of the process surface to water; supplying a solvent vapor ... | 08/16/2005 |
| 6928207 | Apparatus for selectively blocking WDM channels An apparatus for selective blocking WDM channels comprises a light modulator, a diffraction grating, and a transform lens. The light modulator comprises an array of pixels. Each pixel of the light modulator is selectively operable to direct light into a first mode a... | 08/09/2005 |
| 6923869 | Device for deposition with chamber cleaner and method for cleaning the chamber A chamber cleaner includes a cleaner, which is sealed, a connector passing through a side of the cleaner, lamp assembly connected to the connector and uniformly arranged in an inside surface of the cleaner, a heat-source assembled in the lamp assembly and an exhaust... | 08/02/2005 |
| 6922272 | Method and apparatus for leveling thermal stress variations in multi-layer MEMS devices A MEMS device such as a grating light valve™ light modulator is athermalized such that the force required to deflect the movable portion of the MEMS device remains constant over a range of temperatures. In MEMS embodiments directed to a grating light valve™ ligh... | 07/26/2005 |
| 6908201 | Micro-support structures A MEM device in accordance with the invention comprises one or more movable micro-structures which are preferably ribbon structures or cantilever structures. The ribbon structures or cantilever structures are preferably coupled to a substrate structure through one o... | 06/21/2005 |
| 6896743 | Wafer drying methods of Marangoni type and apparatus suitable therefor A wafer drying method includes submerging a wafer in a cleaning solution in a dry chamber. An organic liquid vapor from an organic liquid is supplied into the dry chamber at a first volumetric supply rate to form an organic liquid layer on a surface of the cleaning ... | 05/24/2005 |
| 6889447 | Method for drying a wafer and apparatus for performing the same An instantaneous pressure reducing heating and drying apparatus for an object, such as a wafer, includes a pressure reducing chamber; a vacuum pump for reducing a pressure in the pressure reducing chamber to below atmospheric pressure; a drying chamber installed wit... | 05/10/2005 |
| 6745494 | Method and apparatus for processing wafers under pressure A system for high-pressure drying of semiconductor wafers includes the insertion of a wafer into an open vessel, the immersion of the wafer in a liquid, pressure-sealing of the vessel, pressurization of the vessel with an inert gas, and then the controlled draining ... | 06/08/2004 |
| 6605254 | Method using ethylene oxide to fumigate corrosion promoting microbes The present invention relates to a method of fumigating closed systems susceptible to microbially influenced corrosion (MIC). The method is particularly useful in a method for mitigating MIC in fire protection sprinkler systems.... | 08/12/2003 |
| 6543156 | Method and apparatus for high-pressure wafer processing and drying A system for high-pressure drying of semiconductor wafers includes the insertion of a wafer into an open vessel, the immersion of the wafer in a liquid, pressure-sealing of the vessel, pressurization of the vessel with an inert gas, and then the controlle... | 04/08/2003 |
| 6532684 | System for cleaning pressurized containers The present invention relates to a system for cleaning a pressurized container having at least one chemical contained therein. More specifically, the container may store a quantity of a chemical that is reactive with water and forms dangerous reaction pro... | 03/18/2003 |
| 6442867 | Apparatus and method for cleaning a vertical furnace pedestal and cap A system (10) is disclosed for cleaning a vertical furnace (12) pedestal (34) and cap (36) including at least one inlet conduit (40) in fluid communication with a pressurized cleaning medium source (46). The system also includes at least one exhaust condu... | 09/03/2002 |
| 6430840 | Method of and apparatus for drying a wafer using isopropyl alcohol A method of and an apparatus for drying a wafer using the Marangoni effect quickly forms an isopropyl alcohol layer on a cleaning liquid in which the wafer is submerged. The isopropyl alcohol is first heated and then supplied in a fluid state onto the cle... | 08/13/2002 |
| 6357142 | Method and apparatus for high-pressure wafer processing and drying A system for high-pressure drying of semiconductor wafers includes the insertion of a wafer into an open vessel, the immersion of the wafer in a liquid, pressure-sealing of the vessel, pressurization of the vessel with an inert gas, and then the controlle... | 03/19/2002 |
| 6289605 | Method for drying a semiconductor wafer The present invention provides a drying method for removing a residual solution from a semiconductor wafer. The semiconductor wafer is placed into a chamber, and then the air pressure of the chamber is lowered from atmospheric pressure to a lower pressure... | 09/18/2001 |
| 6286231 | Method and apparatus for high-pressure wafer processing and drying A method and apparatus for high-pressure drying of semiconductor wafers includes the insertion of a wafer into an open vessel, the immersion of the wafer in a liquid, pressure-sealing of the vessel, pressurization of the vessel with an inert gas, and then... | 09/11/2001 |
| 6286230 | Method of controlling gas flow in a substrate processing system A method of transferring and processing a substrate in an evacuable chamber which is located adjacent a process chamber and back-to-back process chambers, and other combinations of evacuable chambers and process chambers. The method includes the use of va... | 09/11/2001 |
| 6263587 | Degassing method using simultaneous dry gas flux pressure and vacuum An apparatus and method for clamping and heating a wafer without using moving parts and without exposing the wafer to external stress is provided. A high backside wafer pressure which provides efficient heat transfer from a heated substrate support to the... | 07/24/2001 |
| 6249990 | Method and apparatus for transporting articles In one embodiment, a cart (5) having a first vessel (10) which fits within a second vessel (90) is used to transport and store an integrated circuit substrate. The integrated circuit substrate is placed within the first vessel (10) and the door (18) of th... | 06/26/2001 |
