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Class 34/406 - Gas or vapor pressure is subatmospheric


Subclass of Class 34 - Drying and gas or vapor contact with solids
Definition: Process wherein the treated material is subjected to a constant
No. of patents: 99
Last issue date: 10/28/2008


1      
NumberTitleIssue Date
7441345Laundering aid removing adherent matter from fabric articles
A laundering aid having a core member, such as an elastomeric ball member, that includes a covering comprising an abrasive or brush-like material adapted for engaging and lifting matter, such animal hair, adherent to the surface of fabric articles when the launderin...
10/28/2008
7383643Method for drying veneers
An apparatus and method is provided to dry veneer or other items by vaporization of moisture in the item. Apparatus has an insulated chamber with a frame and a drawer with a door. A mesh surface of the drawer supports item for drying with a heater at sub-atmospheric...
06/10/2008
7367139Vacuum processing apparatus and method operation thereof
This vacuum processing apparatus has a fixed processing chamber 24 and two movable load lock chambers 28a and 28b. A gate valve 26 is provided on the processing chamber 24, and gate valves 30 are respectively p...
05/06/2008
7357115Wafer clamping apparatus and method for operating the same
A wafer clamping apparatus is provided to secure a wafer within a chamber during wafer processing. The wafer clamping apparatus creates a pressure differential between a top surface and a bottom surface of the wafer. The pressure differential serves to pull the wafe...
04/15/2008
7351307Method of dewatering a fibrous web with a press belt
A method of dewatering a fibrous web in a paper machine including the steps of carrying the fibrous web on a side of a first fabric; contacting the fibrous web with a side of a second fabric, the fibrous web being between the first fabric and the second fabric; and ...
04/01/2008
7347007Low pressure high capacity dryer for resins and other granular and powdery materials
A vacuum dryer and method for drying granular or powdery material including at least one canister for holding said material being movable among a series of locations including material heating and vacuum drying locations, means for moving said canister among said lo...
03/25/2008
7347656Vacuum processing apparatus and semiconductor manufacturing line using the same
A vacuum processing apparatus is composed of a cassette block and a vacuum processing block. The cassette block has a cassette table for mounting a plurality of cassettes containing a sample and an atmospheric transfer means. The vacuum processing block has a plural...
03/25/2008
7347006Processing apparatus and method for removing particles therefrom
A processing apparatus includes a first detection unit for detecting a temperature of an inner wall of the vacuum vessel, a second detection unit for detecting a temperature of the processing unit, and a first control unit for controlling a temperature of the gas. T...
03/25/2008
7343698Reduced pressure drying apparatus and reduced pressure drying method
A reduced pressure drying apparatus comprises a substrate stage section for disposing thereon a substrate having the surface coated with a coating liquid containing a film-forming component and a solvent, a hermetic vessel having the substrate stage section arranged...
03/18/2008
7306680Method of cleaning by removing particles from surfaces, a cleaning apparatus and a lithographic projection apparatus
A lithographic mask is placed in a chamber which is then sealed. The gas pressure in the chamber is reduced to dislodge contaminant particles on the mask surface. ...
12/11/2007
RE39824Vacuum processing apparatus and operating method with wafers, substrates and/or semiconductors
This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chamber are dry-cleaned, dummy substrates are transferred i...
09/11/2007
RE39823Vacuum processing operating method with wafers, substrates and/or semiconductors
This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dirty-cleaned, dummy substrates are transferre...
09/11/2007
RE39775Vacuum processing operating method with wafers, substrates and/or semiconductors
This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred ...
08/21/2007
RE39756Vacuum processing operating method with wafers, substrates and/or semiconductors
This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred ...
08/07/2007
7244401Apparatus for separation of constituents from matrices
The present invention provides an apparatus useful for the separation of hazardous and non-hazardous organic and inorganic constituents from various matrices. A method of separating such constituents is also provided. ...
07/17/2007
7196507Apparatus for testing substrates
An apparatus for testing substrates reduces the area required and the costs which arise with the testing of substrates, in particular semiconductor wafers, during the production process. The apparatus includes testing arrangements comprising a chuck, a chuck drive, ...
03/27/2007
7179334System and method for performing semiconductor processing on substrate being processed
A semiconductor process system (10) includes a measuring section (40), an information processing section (51), and a control section (52). The measuring section (40) measures a characteristic of a test target film formed on a targe...
02/20/2007
7080652Automated semiconductor processing systems
A semiconductor processing system for wafers or other semiconductor articles. The system uses an interface section at an end of the machine accessible from the clean room. A plurality of processing stations are arranged away from the clean room interface. A transfer...
07/25/2006
7065900Docking-type system and method for transferring and treating substrate
A substrate transferring/treating system includes a substrate stacking base, a substrate transferring member for receiving/transferring the substrate from/to the base, a substrate cleaning/drying device for cleaning and drying the substrate transferred from the subs...
06/27/2006
7003219Substrate processing method
A substrate processing apparatus includes a reaction chamber for simultaneously processing a plurality of process substrates, a boat for loading the process substrates into the reaction chamber, and a stocker for storing a multiple number of dummy substrates, at lea...
02/21/2006
6996919Process for obtaining dry extracts under mild conditions
The invention concerns a method for obtaining dry plant extracts under mild conditions, in which a liquid plant extract is introduced into a vacuum drying equipment having a multi-shaft stirrer extending through a cylindrical mixing and drying chamber and with its o...
02/14/2006
6968631Method and apparatus for determining presence of moisture in freeze dryer vacuum line
A freeze dryer having a collector chamber is provided with a sensor for detecting the presence of moisture in the chamber so that the vacuum pump cannot be operated if moisture is present. The refrigeration system can also be deactivated. This precludes moisture fro...
11/29/2005
6968630Vacuum processing apparatus and operating method therefor
This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred ...
11/29/2005
6966949Apparatus and method for drying under reduced pressure, and coating film forming apparatus
In drying a coating liquid such as a resist applied to a substrate under reduced pressure, a coating film in a peripheral portion tends to lose good shape regardless of duration of a drying period, and it is difficult to set an appropriate exhaust flow rate. After t...
11/22/2005
6962003High-speed drying apparatus
Disclosed is a high-speed drying apparatus for drying objects which are rinsed with non-volatile or volatile liquid. The drying apparatus is capable of quickly drying such objects at a reduced cost, not permitting their oxidation. First, the rinsing liquid remaining...
11/08/2005
6959503Method and apparatus for removing liquid from substrate surfaces using suction
A cost effective and environmentally sound method for quickly removing liquid from surfaces of a substrate under manufacture without leaving behind substantial residue (e.g., silicon elements from the substrate, commonly known in the field as “water marks”). The...
11/01/2005
6941185Operating method of vacuum processing system and vacuum processing system
A vacuum processing apparatus and method wherein a plurality of processing units are for conducting processing, a transfer processing unit is connected with the plurality of processing units for carrying wafers to the processing units, a transfer device is disposed ...
09/06/2005
6930050Multi-chamber system having compact installation set-up for an etching facility for semiconductor device manufacturing
A multi-chamber system of an etching facility for manufacturing semiconductor devices occupies a minimum amount of floor space in a cleanroom by installing a plurality of processing chambers in multi-layers and in parallel along a transfer path situated between the ...
08/16/2005
6925731Thin film forming apparatus cleaning method
A cleaning process for cleaning a thermal processing apparatus includes: a heating step of heating an interior of a reaction tube at 300° C., and a cleaning step of removing deposits deposited in the thermal processing apparatus. In the cleaning step, a cleaning ga...
08/09/2005
6922912Drying apparatus
The invention provides drying apparatus including a first chamber for receiving articles to be dried and having an outlet, a second chamber having an outlet, and a fan having a fan inlet and a fan outlet, the fan inlet communicating with the outlet of the first cham...
08/02/2005
6920369Methods of operating vacuum processing equipment and methods of processing wafers
A method of operating vacuum processing equipment that includes multiple sets of apparatus for performing a succession of different processes on individual wafers, an apparatus for transporting said wafers, and an apparatus for controlling said processing apparatus ...
07/19/2005
6889447Method for drying a wafer and apparatus for performing the same
An instantaneous pressure reducing heating and drying apparatus for an object, such as a wafer, includes a pressure reducing chamber; a vacuum pump for reducing a pressure in the pressure reducing chamber to below atmospheric pressure; a drying chamber installed wit...
05/10/2005
6880264Vacuum processing apparatus and operating method therefor
This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred ...
04/19/2005
6877249Method of drying a lactulose solution
A method of drying a lactulose solution comprises introducing the solution into a vacuum chamber at elevated temperature and at reduced pressure so that the solution forms a foam, drying the foam under reduced pressure, and milling or grinding or breaking the dried ...
04/12/2005
6792693Wafer dryer system for PRS wet bench
A wafer dryer system which is suitable for drying rinse water from substrates in the event of a system malfunction or failure during or after rinsing of the substrates. The wafer dryer system typically includes a pair of drying chambers, each of which is fitted with...
09/21/2004
6746573Method of drying fibrous structures
A method for drying fibrous webs utilizing a limiting orifice medium with a plurality of pores. The web is disposed on a supporting fluid permeable carrier. The web is pressed between the supporting carrier and the limiting orifice medium. A vacuum greater than the ...
06/08/2004
6739073Method and apparatus for performing multiple cleaning and vacuum drying operations in enclosed vessels
A method for performing multiple cleaning and vacuum drying operations in enclosed vessels uses cleaning and vacuum drying apparatus, low-dissolved-air cleaning solution, and drain-to-vacuum process to produce vacuum in a cleaning vessel, so that influence of air pr...
05/25/2004
6725565Method for vacuum drying of substrate
A method for vacuum drying of a substrate which can eliminate not only the moisture adhered to the substrate surface but also the moisture impregnated inside of the films which form the devices in a shot time without deforming nor deteriorating the devices formed on...
04/27/2004
6722055Supporting fixture of substrate and drying method of substrate surface using the same
A supporting apparatus for supporting a substrate in drying a substrate surface of the substrate including a supporting rod having a hollow interior portion and a groove configured to support a substrate on the supporting rod, the groove communicating to the hollow ...
04/20/2004
6722057Method of drying thermoplastic norbornene resin and method of manufacturing magnetic recording medium
The gas components in thermoplastic norbornene resin pellets are suppressed below certain levels by drying the resin under vacuum or under the ordinary pressure and under vacuum. A substrate for magnetic recording media is manufactured by injection-molding the resin...
04/20/2004
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