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| Number | Title | Issue Date |
| 7444761 | Intrinsically safe flammable solvent processing method and system Parts to be chemically treated are processed in a controlled-environment processing chamber. The process includes applying a negative gauge pressure to the chamber to remove air or other non-condensable gases. The process includes introducing an oxygen free solvent ... | 11/04/2008 |
| 7244315 | Microelectronic device drying devices and techniques Improved methods of rinsing and drying microelectronic devices by way of an immersion processing apparatus are provided for effectively cleaning microelectronic devices. Methods and arrangements control the separation of one or more microelectronic devices from a li... | 07/17/2007 |
| 7191545 | Apparatus to dry substrates The present invention disclosed herein is an apparatus for drying a substrate. In accordance with the present invention, the apparatus includes a measuring unit to detect a density of IPA vapor at predetermined regions in a process chamber or a pipe. The measuring u... | 03/20/2007 |
| 7181863 | Wafer dryer and method for drying a wafer A wafer dryer and method featuring a nebulizer which emits a pressurized drying liquid stream that converges with an opposed pressurized non-reactive carrier gas stream to produce a drying liquid fog. The pressurized non-reactive gas spray device is disposed partial... | 02/27/2007 |
| 7128767 | Method to upgrade low rank coal stocks The ash content of raw coals, lignite, and other carbonaceous materials is reduced by leaching the high-ash material with an aqueous acidic waste product produced by a Fischer-Tropsch reaction. The acidic aqueous waste is mixed with coal and process conditions are d... | 10/31/2006 |
| 7114880 | Process for the excavation of buried waste Disclosed is a method of excavating large quantities of non-homogenous radioactive contaminated waste, desirably without releasing radioactive contaminated dust or exposing personnel to its hazards. The excavation of buried waste is performed in the presence of a su... | 10/03/2006 |
| 7025804 | Method for separating hydrocarbon-containing gas mixtures using hydrocarbon-resistant membranes A method of separating or concentrating hydrocarbon-containing gas mixtures such as hydrogen from hydrocarbons, carbon dioxide from hydrocarbons, nitrogen from hydrocarbons, and hydrocarbons from one another using a selectively permeable membrane. The method is well... | 04/11/2006 |
| 7018445 | Polyimide blends for gas separation membranes The present invention provides a selectively gas permeable membrane that has a superior combination of permeability and selectivity. The membrane composition includes a Type 1 copolyimide uniformly blended with a Type 2 copolyimide, which polymers are defined by che... | 03/28/2006 |
| 7018447 | Method of cleaning a rotary concentrator A method of cleaning the adsorbent media of a rotary concentrator in-situ while maintaining operation of the concentrator, including directing washing liquid into the sectors in the desorb plenum, then rotating the sectors one full revolution plus at least one secto... | 03/28/2006 |
| 6802137 | Solvent drying method The present invention is directed to a controlled environment processing chamber of chambers in which parts are to be dried. The parts either contain water on or imbibed into the part. The process includes a means of applying a negative gauge pressure to the chamber... | 10/12/2004 |
| 6729040 | Apparatus and method for drying a substrate using hydrophobic and polar organic compounds A dryer for drying a substrate includes: a bath containing a fluid; a chamber; and a delivery system supplying a polar organic compound, such as isopropyl alcohol, and a hydrophobic organic compound, such as hydrofluoroether, to the interface between the substrate a... | 05/04/2004 |
| 6678968 | Supercritical point drying apparatus for semiconductor device manufacturing and bio-medical sample processing A critical point drying apparatus for sample preparation in electron microscopy and semiconductor wafer production includes a computer system to automate the operational modes in drying the specimen. These operational modes controlled by the computer syst... | 01/20/2004 |
| 6655042 | System and method for drying semiconductor substrate A drying system for drying a semiconductor substrate is provided. The drying system includes: a chamber for housing a vapor distributor and a fluid bath, said fluid bath being disposed in a lower portion of the chamber and said distributor being disposed ... | 12/02/2003 |
| 6589360 | Drying system for drying semiconductor wafers and method of drying wafers using the same A method of and system for drying a wafer offer a short cycle of operation, and minimize the amount of time that the wafer is exposed to external air. The drying system includes a process bath, a loader for transferring the wafer from a wash bath to an el... | 07/08/2003 |
| 6526675 | Methods of using natural products as dewatering aids for fine particles A method of dewatering fine particulate materials is disclosed. In this method, an aqueous slurry of fine particles is treated with appropriate hydrophobizing reagents so that the particulate material becomes moderately hydrophobic. A lipid of vegetable o... | 03/04/2003 |
| 6516537 | Method for drying and producing microporous particles In a process for drying microporous, fluid-containing particles, the fluid-containing particles to be dried are fed as a moving bed countercurrently to a drying fluid, the interfacial tension of the fluid being reduced in comparison with the interfacial t... | 02/11/2003 |
| 6493964 | Supercritical point drying apparatus for semiconductor device manufacturing and bio-medical sample processing A critical point drying apparatus for sample preparation in electron microscopy and semiconductor wafer production includes a computer system to automate the operational modes in drying the specimen. These operational modes controlled by the computer syst... | 12/17/2002 |
| 6460269 | Wafer dryer comprising revolving spray nozzle and method for drying wafers using the same A wafer dryer for drying a wafer includes a chamber and a support adapted to support the wafer in the chamber. A spray nozzle is disposed in the chamber. A source gas supply tank is in fluid communication with the spray nozzle. At least one heater is oper... | 10/08/2002 |
| 6438867 | Method for drying and producing microporous particles and a drying device In a process for drying microporous, fluid-containing particles, the heat required for increasing the temperature is supplied by convection by reducing the interfacial tension of the fluid, preferably to 0 to 1/10, in particular to 0 to 1/20, of the inter... | 08/27/2002 |
| 6427359 | Systems and methods for processing workpieces Workpieces requiring low levels of contamination, such as semiconductor wafers, are loaded into a workpiece support or holder within a process chamber. The process chamber has a drain opening, slot or edge. The chamber is closed via a door. A process or r... | 08/06/2002 |
| 6357142 | Method and apparatus for high-pressure wafer processing and drying A system for high-pressure drying of semiconductor wafers includes the insertion of a wafer into an open vessel, the immersion of the wafer in a liquid, pressure-sealing of the vessel, pressurization of the vessel with an inert gas, and then the controlle... | 03/19/2002 |
| 6357138 | Drying apparatus and method A tank stores a drying liquid for drying a semiconductor wafer. A boat vertically holds a plurality of target semiconductor wafers to be dried. The semiconductor wafers which are held by the boat are entirely soaked in the drying liquid. After this, the s... | 03/19/2002 |
| 6286231 | Method and apparatus for high-pressure wafer processing and drying A method and apparatus for high-pressure drying of semiconductor wafers includes the insertion of a wafer into an open vessel, the immersion of the wafer in a liquid, pressure-sealing of the vessel, pressurization of the vessel with an inert gas, and then... | 09/11/2001 |
| 6270584 | Apparatus for drying and cleaning objects using controlled aerosols and gases Method and apparatus for cleaning and/or drying objects that may have been wetted or contaminated in a manufacturing process. The objects are submerged in a rinse liquid in an enclosed chamber, and aerosol particles from a selected liquid are introduced i... | 08/07/2001 |
| 6243969 | Bagless dry cleaning kits and processes for dry cleaning A process for dry cleaning fabrics comprising the steps of: (i) placing one or more fabrics to be cleaned in a device which provides heat and agitation; (ii) placing one or more carrier sheets in the device wherein the carrier sheets have 200 grams of a l... | 06/12/2001 |
| 6132811 | Procedure for the drying of silicon The invention relates to a procedure applicable for drying substrate surfaces of a large number of materials, such as semiconductors, metals, plastics and, in particular, silicon. The silicon (1) is dipped into a liquid bath (2) and the silicon (1) is sep... | 10/17/2000 |
| 6119366 | Chemical drying and cleaning method Method and apparatus for drying and/or cleaning a workpiece, such as an electronic part, semiconductor wafer, printed circuit board or the like. As the workpiece is withdrawn from a processing liquid, a selected drying liquid, such as hydrofluoroether (HF... | 09/19/2000 |
| 6105274 | Cryogenic/phase change cooling for rapid thermal process systems A process for treating a workpiece. The workpiece is cooled by directing toward the workpiece a material that includes a gas and particles of a material that undergoes a phase change when applied to the workpiece. The gas and the particle material are non... | 08/22/2000 |
| 6101737 | Apparatus and method for drying a semiconductor member A drying apparatus and method of drying is provided for drying a semiconductor member mounted in a carrier that is placed in a processing tank through contact with isopropyl alcohol. An isopropyl alcohol liquid is vaporized in a bottom portion of the proc... | 08/15/2000 |
| 6096240 | Composition for the removal of water from a surface Method for the water removal from a surface, which comprises covering the surface with a composition having specific weight higher than that of the water, and subsequently removing water from the composition by skimming, such composition comprising a (per... | 08/01/2000 |
| 5974689 | Chemical drying and cleaning system Method and apparatus for drying and/or cleaning a workpiece, such as an electronic part, semiconductor wafer, printed circuit board or the like. As the workpiece is withdrawn from a processing liquid, a selected drying liquid, such as hydrofluoroether (HF... | 11/02/1999 |
| 5968285 | Methods for drying and cleaning of objects using aerosols and inert gases Methods for cleaning and/or drying objects that may have been wetted or contaminated in a manufacturing process. The objects are submerged in a rinse liquid in an enclosed chamber, and aerosol particles from a selected liquid are introduced into the chamb... | 10/19/1999 |
| 5964958 | Methods for drying and cleaning objects using aerosols Methods for drying and cleaning objects that may have been wetted or contaminated in a manufacturing process. The objects are submerged in a rinse liquid in an enclosed chamber, and aerosol particles from a selected liquid are introduced into the chamber ... | 10/12/1999 |
| 5815946 | Method for dehydrating wet coal A process is described whereby wet coal may be dehydrated and inhibited against rehydration by immersing in a bath of molten paraffin hydrocarbon for a sufficient period of time to evaporate and expel inherent water from the coal. The hydrocarbon then inh... | 10/06/1998 |
| 5758434 | Wood drying system A wood drying system to eliminate the discharge of liquid kiln water includes a kiln which is heated to dry a batch of wood, a basin to collect the water driven from the wood, and an evaporator in which the collected water is converted into steam. The ste... | 06/02/1998 |
| 5727578 | Apparatus for the treatment and drying of semiconductor wafers in a fluid Provided is a process for removing organic materials from semiconductor wafers and a process for chemical solvent drying of wafers. In the drying process, a wafer submerged in a bath having a lower aqueous layer and an upper organic layer is lifted from t... | 03/17/1998 |
| 5578138 | Compositions comprising 1,1-dichloro-1-fluoroethane and process for the removal of water from a solid surface Compositions based on 1,1-dichloro-1-fluoroethane and a surfactant comprising at least one imidazoline, which are usable for removing water from a solid surface.... | 11/26/1996 |
| 4900334 | Process for treating a liquid-wet polycarbonate membrane to improve its gas separation properties This invention relates to a method of treating liquid-wet polycarbonate membranes to improve gas separation properties.... | 02/13/1990 |
| 4876801 | Method and means for drying bulk goods A method and means for drying or dewatering bulk goods in which the goods are transported through a drying space by means of a helical vibrator conveyor in the presence of an insert gas. The moisture is displaced by a fluid bath contained in the drying sp... | 10/31/1989 |
| 4866856 | Solids dewatering process and apparatus A process and apparatus for dewatering water-containing mineral particles, e.g., pulverized coal and in particular, high moisture content, low rank coal, is described. In one embodiment, the process and apparatus make use of a hydrophobic dewatering aid t... | 09/19/1989 |
