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| Number | Title | Issue Date |
| 8054081 | Residual gas analyzer Provided is an excellent residual gas analyzer, which can perform measurements while being suitably arranged even in small areas, such as those in semiconductor equipments, and can perform measurements for display of measurement results without an external personal ... | 11/08/2011 |
| 8040138 | Planar type frequency shift probe for measuring plasma electron densities and method and apparatus for measuring plasma electron densities A planar type frequency shift probe that utilizes resonance of electromagnetic waves and includes a main body with a conductor plate and a coaxial cable. The main body includes a long narrow space, which has predetermined width and length and has an opening on the p... | 10/18/2011 |
| 7994794 | Methods for measuring a set of electrical characteristics in a plasma Methods using a probe apparatus configured to measure a set of electrical characteristics in a plasma include providing a chamber wall including at least a set of plasma chamber surfaces configured to be exposed to a plasma, the plasma having a set of electrical cha... | 08/09/2011 |
| 7812614 | Electron capture detector and nonradiative electron capture detector It is intended to realize measuring of trace organic components and to render qualitative procedure efficient through imparting of selectivity. Penning gas and dopant gas are ionized in a space isolated from discharge part with the use of metastable helium obtained ... | 10/12/2010 |
| 7723994 | Plasma processing chamber with an apparatus for measuring a set of electrical characteristics in a plasma A plasma processing chamber with a probe apparatus configured to measure a set of electrical characteristics in a plasma is disclosed. The plasma processing chamber includes a set of plasma chamber surfaces configured to be exposed to the plasma. The probe apparatus... | 05/25/2010 |
| 7498817 | Method of nondestructive tightness testing based on gas discharge visualization A method of nondestructive noncontact tightness testing of inner structure of articles based on gas discharge visualization includes the steps of providing a film for imaging on a dielectric plate and an electrode, the dielectric plate disposed on the electrode, and... | 03/03/2009 |
| 7427864 | Ion balance monitor An ion balance monitor for simultaneous monitoring of the positive and negative ion production rates, and therefore ion concentration, by measurement of currents resulting from the presence of airborne ions as created for example by an air (gas) ionizer. Additionall... | 09/23/2008 |
| 7425699 | Mass spectrometry method and apparatus A mass spectrometer 10 comprises an ion source 12 which generates nebulized ions which enter an ion cooler 20 via an ion source block 16. Ions within a window of m/z of interest are extracted via a quadrupole mass filter 24 and pas... | 09/16/2008 |
| 7411402 | Technique for reducing a parasitic DC bias voltage on a sensor A technique for reducing a parasitic DC bias voltage on a sensor monitors the parasitic DC bias voltage on a first element of the sensor. A controlled bias voltage that is applied between the first element of the sensor and a second element of the sensor is then mod... | 08/12/2008 |
| 7408360 | Gas detection and identification apparatus and method Gas detection and identification apparatus that receives a flow of a mixture of a carrier gas and an analyte gas and detects and identifies the components of the flowing gas mixture by Penning Ionization Electron Spectroscopy (PIES). ... | 08/05/2008 |
| 7388195 | Apparatus and systems for processing samples for analysis via ion mobility spectrometry The invention provides an interface assembly for delivering an ionized analyte from an ionization apparatus into an ion mobility spectrometer. This allows analysis of biological and non-biological samples, even non-volatile solids, via differential mobility spectrom... | 06/17/2008 |
| 7375348 | Micro UV detector A biological aerosol detector is provided. The biological aerosol detector uses a semiconductor optical source with an ultraviolet emission band to excite biological molecules in an aerosol sample. Filtering optics are configured to attenuate radiation from a second... | 05/20/2008 |
| 7368917 | Electronic circuit for ion sensor with body effect reduction An electronic circuit for ion sensor with the body effect reduction includes a bridge-type floating source circuit provided with an input terminal, an output terminal reflecting the change in the potential dependent on ion concentration, and an ion-sensitive field e... | 05/06/2008 |
| 7363876 | Multi-core transformer plasma source A transformer-coupled plasma source using toroidal cores forms a plasma with a high-density of ions along the center axis of the torus. In one embodiment, cores of a plasma generator are stacked in a vertical alignment to enhance the directionality of the plasma and... | 04/29/2008 |
| 7359177 | Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply output A plasma reactor has a dual frequency plasma RF bias power supply furnishing RF bias power comprising first and second frequency components, f(1), f(2), respectively, and an RF power path having an input end coupled to the plasma RF bias power supply a... | 04/15/2008 |
| 7352187 | Vacuum measuring gauge An electron-emitting cathode consists of an electrically conducting emitter layer attached to a side wall which consists of stainless steel and a gate which is fixed at a mall distance inside a concave emitter surface of the emitter layer. The cathode surrounds a re... | 04/01/2008 |
| 7351981 | Method and apparatus for measuring purity of noble gases A device for detecting impurities in a noble gas includes a detection chamber and a source of pulsed ultraviolet light. The pulse of the ultraviolet light is transferred into the detection chamber and onto a photocathode, thereby emitting a cloud of free electrons i... | 04/01/2008 |
| 7352461 | Particle detecting method and storage medium storing program for implementing the method A particle detecting method which is capable of detecting the number of low-speed particles accurately, and a storage medium storing a program for implementing the method. Intensity of scattered light generated when a light emitted into a gas stream is scattered by ... | 04/01/2008 |
| 7339656 | Method and apparatus for measuring electron density of plasma and plasma processing apparatus An apparatus for measuring plasma electron density precisely measures electron density in plasma even under a low electron density condition or high pressure condition. This plasma electron density measuring apparatus includes a vector network analyzer in a measurin... | 03/04/2008 |
| 7335611 | Copper conductor annealing process employing high speed optical annealing with a low temperature-deposited optical absorber layer A method of forming a conductor in a thin film structure on a semiconductor substrate includes forming high aspect ratio openings in a base layer having vertical side walls, depositing a dielectric barrier layer comprising a dielectric compound of a barrier metal on... | 02/26/2008 |
| 7332981 | Impedance matching apparatus for a plasma chamber comprising two separate storage units and three separate calculators An impedance matching apparatus 3 calculates a forward wave voltage Vfo and a reflected wave voltage Vro at an output terminal 3b, based on a forward wave voltage Vfi and a reflected wave voltage Vri at an input terminal 3a, on inf... | 02/19/2008 |
| 7323401 | Semiconductor substrate process using a low temperature deposited carbon-containing hard mask A method of processing a thin film structure on a semiconductor substrate using an optically writable mask includes placing the substrate in a reactor chamber, the substrate having on its surface a target layer to be etched in accordance with a predetermined pattern... | 01/29/2008 |
| 7320734 | Plasma immersion ion implantation system including a plasma source having low dissociation and low minimum plasma voltage A system for processing a workpiece includes a plasma immersion ion implantation reactor with an enclosure having a side wall and a ceiling and defining a chamber, and a workpiece support pedestal within the chamber having a workpiece support surface facing the ceil... | 01/22/2008 |
| 7318338 | Measuring device for measuring aerosol The invention relates to a measuring device for measuring aerosols, which measuring device comprises detection means (13), means (41) for conveying a signal from the detection means (13), a first insulation (43), a second insulation (4... | 01/15/2008 |
| 7314537 | Method and apparatus for detecting a plasma The present invention presents an improved apparatus and method for monitoring a material processing system, where the material processing system includes a processing tool, test signal source, and a filter/detector. The test signal source providing a first test sig... | 01/01/2008 |
| 7312162 | Low temperature plasma deposition process for carbon layer deposition A method of depositing a carbon layer on a workpiece includes placing the workpiece in a reactor chamber, introducing a carbon-containing process gas into the chamber, generating a reentrant toroidal RF plasma current in a reentrant path that includes a process zone... | 12/25/2007 |
| 7312148 | Copper barrier reflow process employing high speed optical annealing A method of forming a barrier layer for a thin film structure on a semiconductor substrate includes forming high aspect ratio openings in a base layer having vertical side walls, depositing a dielectric barrier layer comprising a dielectric compound of a barrier met... | 12/25/2007 |
| 7309992 | Gas analysis method and ionisation detector for carrying out said method Chemical analysis of impurities in buffer gas is provided at various pressures up to atmospheric. Identification of the impurities is carried out by analyzing energy of electrons releases via ionization of the impurity atoms or molecules in their collisions either w... | 12/18/2007 |
| 7303982 | Plasma immersion ion implantation process using an inductively coupled plasma source having low dissociation and low minimum plasma voltage A method for implanting ions in a surface layer of a workpiece includes placing the workpiece on a workpiece support in a chamber with the surface layer being in facing relationship with a ceiling of the chamber, thereby defining a processing zone between the workpi... | 12/04/2007 |
| 7295015 | Ionization gauge An ionization gauge for isolating an electron source from gas molecules includes the electron source for generating electrons, a collector electrode for collecting ions formed by the impact between the electrons and gas molecules, and an electron window which isolat... | 11/13/2007 |
| 7294563 | Semiconductor on insulator vertical transistor fabrication and doping process A process for conformally doping through the vertical and horizontal surfaces of a 3-dimensional vertical transistor in a semiconductor-on-insulator structure employs an RF oscillating torroidal plasma current to perform either conformal ion implantation, or conform... | 11/13/2007 |
| 7291360 | Chemical vapor deposition plasma process using plural ion shower grids A chemical vapor deposition process is carried out in a reactor chamber having a set of plural parallel ion shower grids that divide the chamber into an upper ion generation region and a lower process region, each of the ion shower grids having plural orifices in mu... | 11/06/2007 |
| 7292045 | Detection and suppression of electrical arcing Method and apparatus for detecting or suppressing electrical arcing or other abnormal change in the electrical impedance of a load connected to a power source. Preferably the load is a plasma chamber used for manufacturing electronic components such as semiconductor... | 11/06/2007 |
| 7291545 | Plasma immersion ion implantation process using a capacitively couple plasma source having low dissociation and low minimum plasma voltage A method of ion implanting a species in a workpiece to a selected ion implantation profile depth includes placing a workpiece having a semiconductor material on an electrostatic chuck in or near a processing region of a plasma reactor chamber and applying a chucking... | 11/06/2007 |
| 7288491 | Plasma immersion ion implantation process One method of performing plasma immersion ion implantation on a workpiece in a plasma reactor chamber includes initially depositing a seasoning film on the interior surfaces of the plasma reactor chamber before the workpiece is introduced, by introducing a seasoning... | 10/30/2007 |
| 7287413 | Gas sensor unit and sensor cap A gas sensor unit including a gas sensor and a sensor cap. The gas sensor includes a gas detecting element, an electrode provided on the gas detecting element and a sensor terminal connecting to the electrode for transmitting an output signal from the gas detecting ... | 10/30/2007 |
| 7288942 | Plasma potential measuring method and apparatus, and plasma potential measuring probe A plasma potential measuring method is conducted by: providing a measurement space surrounded by a radio-frequency electric field in plasma atmosphere; varying a floating potential at an electrode located in the measurement space by the ponderomotive effect acted on... | 10/30/2007 |
| 7276912 | Method for the operation of an analytical circuit for an electromechanical cell The invention proposes a method for operating an evaluation circuit for an electrochemical cell wherein the evaluation circuit is switched on for a first time period and is switched off for a second time period. The ratio between the first and the second time period... | 10/02/2007 |
| 7268347 | Ion detecting apparatus and methods Ion injection in a drift tube apparatus for mobility spectrometry was accomplished without conventional ion shutters such as the Bradbury-Nielson or similar designs common to such drift tubes. Instead ions were passed between the ion source and drift region by using... | 09/11/2007 |
| 7251571 | Methods of diagnosing open-secondary winding of an ignition coil using the ionization current signal In a first embodiment, the present invention is a method of detecting an open secondary winding, including the steps of enabling an integrator, resetting the integrator, detecting an ionization current, integrating the ionization current over a spark window, compari... | 07/31/2007 |
