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| Number | Title | Issue Date |
| 8102123 | External resonator electrode-less plasma lamp and method of exciting with radio-frequency energy Described is an electrode-less plasma lamp comprising a gas-fill vessel, a gas-fill contained within the gas-fill vessel, an RF electromagnetic radiation source, an RF electromagnetic resonator, an output probe that couples RF energy from the RF electromagnetic reso... | 01/24/2012 |
| 7438018 | Confinement ring assembly of plasma processing apparatus A confinement ring assembly of a plasma treatment apparatus includes a cam ring disposed above the process chamber, a plurality of plungers disposed about a process chamber of the apparatus and operated by the cam ring, and a plurality of confinement rings coupled t... | 10/21/2008 |
| 7423367 | Design of high power pulsed flash lamps Broadband output high power pulsed flash lamps are useful in many applications, and when specifically optimized, can become an excellent source of ultraviolet (UV) light, which is particularly useful for photo-chemically-induced materials processing applications. Mu... | 09/09/2008 |
| 7420182 | Combined radio frequency and hall effect ion source and plasma accelerator system This invention features a combined radio frequency (RF) and Hall Effect ion source and plasma accelerator system including a plasma accelerator having an anode and a discharge zone, the plasma accelerator for providing plasma discharge. A gas distributor introduces ... | 09/02/2008 |
| 7411352 | Dual plasma beam sources and method A pair of plasma beam sources are connected across an AC power supply to alternatively produce an ion beam for depositing material on a substrate transported past the ion beams. Each plasma beam source includes a discharge cavity having a first width and a nozzle ex... | 08/12/2008 |
| 7405410 | Method and apparatus for confining, neutralizing, compressing and accelerating an ion field An apparatus and method of use for injection, confinement, neutralization, acceleration and compression of an ion field using a solenoid having an axis of symmetry and supported within a vacuum space. A pair of magnetizable elements are positioned initially in space... | 07/29/2008 |
| 7382098 | Plasma producing apparatus and doping apparatus An object of the present invention is to provide an apparatus for producing stable plasma. Another object of the present invention is to provide an apparatus having a long-lasting cathode electrode which is superior in field emission characteristic since the plasma ... | 06/03/2008 |
| 7364623 | Confinement ring drive A confinement assembly for a semiconductor processing chamber is provided. The confinement assembly includes a plurality of confinement rings disposed over each other. Each of the plurality of confinement rings are separated by a space and each of the plurality of c... | 04/29/2008 |
| 7327089 | Beam plasma source A plasma source which includes a discharge cavity having a first width, where that discharge cavity includes a top portion, a wall portion, and a nozzle disposed on the top portion and extending outwardly therefrom, where the nozzle is formed to include an aperture ... | 02/05/2008 |
| 7323821 | Device for generating and/or influencing electromagnetic radiation from a plasma A device generates and/or influences electromagnetic radiation from a plasma, for the lithographic production of semiconductor elements. For example, the device generates and/or reflects EUV-radiation for EUV-lithography. In a first example, a magnetic means (10 | 01/29/2008 |
| 7319295 | High-frequency power supply structure and plasma CVD device using the same A radio frequency power supply structure and a plasma CVD device comprising the same are provided in which reflection of radio frequency power at a connecting portion where an RF cable connects to an electrode is reduced so that incidence of the radio frequency powe... | 01/15/2008 |
| 7315128 | Magnetically enhanced capacitive plasma source for ionized physical vapor deposition A capacitive plasma source for iPVD is immersed in a strong local magnetic field, and maybe a drop-in replacement for an inductively coupled plasma (ICP) source for iPVD. The source includes an annular electrode having a magnet pack behind it that includes a surface... | 01/01/2008 |
| 7315129 | Plasma producing apparatus and doping apparatus An object of the present invention is to provide an apparatus for producing stable plasma. Another object of the present invention is to provide an apparatus having a long-lasting cathode electrode which is superior in field emission characteristic since the plasma ... | 01/01/2008 |
| 7304435 | Device for confinement of a plasma within a volume A device of a plasma (5) for confinement of a plasma within a housing (1), comprising creation means for creating a magnetic field, said means being a series of permanent magnets (3) for creation of a magnetic field presenting an alternating mul... | 12/04/2007 |
| 7294207 | Gas-admission element for CVD processes, and device The invention relates to a method for depositing especially, crystalline layers onto especially, crystalline substrates. At least two process gases are led into a process chamber of a reactor separately from each other, through a gas inlet mechanism above a heated s... | 11/13/2007 |
| 7288014 | Design, fabrication, testing, and conditioning of micro-components for use in a light-emitting panel A method of forming micro-components is disclosed. The method includes pretesting and conditioning of the micro-components. The micro-components that fail testing or conditioning are discarded, and those remaining are assembled into a panel. ... | 10/30/2007 |
| 7276140 | Plasma accelerating apparatus for semiconductor substrate processing and plasma processing system having the same A plasma accelerating apparatus and a plasma processing system having the same are provided. The apparatus includes a circular channel comprising an inner wall, an outer wall, and an end wall connected to an end of the inner wall and the outer wall to form an outlet... | 10/02/2007 |
| 7276135 | Vacuum plasma processor including control in response to DC bias voltage A plasma processor chamber includes a bottom electrode and a top electrode assembly having a center electrode surrounded by a grounded electrode. RF excited plasma between the electrodes induces a DC bias on them. A measure of the bottom electrode DC bias controls t... | 10/02/2007 |
| 7223448 | Methods for providing uniformity in plasma-assisted material processes A method for providing uniformity in plasma-assisted material processes. A shielding plate is implemented within a plasma chamber above a substrate. The dimensions, geometry, and location of the shielding plate are optimized to generate a desired ion flux in a plasm... | 05/29/2007 |
| 7217903 | Method for purifying gas using plasma discharge A method is provided for purifying gases, particularly gases contaminated by environmentally harmful substances, by way of plasma discharge. The gas to be purified is guided through a thermal plasma, which is generated by electrodeless ignition of a process gas, so ... | 05/15/2007 |
| 7211170 | Twist-N-Lock wafer area pressure ring and assembly Wafer area pressure rings used to confine plasma in plasma processing chambers which are manufactured with bores therein such that replacement of the pressure rings during routine or repair maintenance is significantly eased. The bores allows the pressure rings to b... | 05/01/2007 |
| 7183715 | Method for operating a semiconductor processing apparatus A method for operating a semiconductor processing apparatus that plasma-processes a semiconductor wafer mounted on a stage placed in a container using a plasma generated therein. The method includes setting a temperature of the semiconductor wafer, and controlling a... | 02/27/2007 |
| 7156047 | Apparatus for fabricating semiconductor device using plasma Provided is an apparatus for fabricating a semiconductor device using plasma, whereby a semiconductor device fabricating process using plasma provides significantly greater uniformity. The apparatus includes a process chamber, a first electrode through which a radio... | 01/02/2007 |
| 7153444 | Apparatus and method for radio frequency de-coupling and bias voltage control in a plasma reactor Provided is a method and apparatus for controlling a bias voltage over a wide range and for de-coupling dual radio frequency (RF) currents to allow for independent control of plasma density and ion energy of a plasma for processing a substrate. An exemplary apparatu... | 12/26/2006 |
| 7140941 | Liquid manufacturing processes for panel layer fabrication A method for manufacturing a light-emitting panel sandwiches a plurality of micro-components between two flexible substrates in a web configuration. Each micro-component contains a gas or gas-mixture capable of ionization when a sufficiently large voltage is supplie... | 11/28/2006 |
| 7137857 | Method for manufacturing a light-emitting panel An improved light-emitting panel having a plurality of micro-components sandwiched between two subtrates is disclosed. Each micro-component contains a gas or gas-mixture capable of ionization when a sufficiently large voltage is supplied across the micro-component v... | 11/21/2006 |
| 7125305 | Light-emitting panel and a method for making An improved light-emitting panel having a plurality of micro-components sandwiched between two substrates is disclosed. Each micro-component contains a gas or gas-mixture capable of ionization when a sufficiently large voltage is supplied across the micro-component ... | 10/24/2006 |
| 7109660 | Plasma processing device and baffle plate thereof A plasma processing device is able to positively enhance a process-gas exhaust efficiency in a processing region and restrict plasma leaking. A processing container of a magnetron type parallel plate plasma processing device has a separator for separating the inside... | 09/19/2006 |
| 7095179 | Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities Methods and apparatus for generating strongly-ionized plasmas are disclosed. A strongly-ionized plasma generator according to one embodiment includes a chamber for confining a feed gas. An anode and a cathode assembly are positioned inside the chamber. A pulsed powe... | 08/22/2006 |
| 7084573 | Magnetically enhanced capacitive plasma source for ionized physical vapor deposition A capacitive plasma source for iPVD is immersed in a strong local magnetic field, and may be a drop-in replacement for an inductively coupled plasma (ICP) source for iPVD. The source includes an annular electrode having a magnet pack behind it that includes a surfac... | 08/01/2006 |
| 7064491 | Ion implantation system and control method Ion implantation with high brightness, ion beam by ionizing gas or vapor, e.g. of dimers, or decaborane, by direct electron impact ionization adjacent the outlet aperture (46, 176) of the ionization chamber (80; 175)). Preferably: conditions are mainta... | 06/20/2006 |
| 7061184 | Plasma electron density measuring and monitoring device The present invention discloses a device for measuring and monitoring electron density of plasma. The device includes a chamber filled with plasma having varying electron density; a frequency probe having transmission/receiving antennas and a pair of waveguides, one... | 06/13/2006 |
| 7045795 | Apparatus for activating a product by applying plasma particles in a magnetic field An apparatus for activating an ionizable product is provided, which includes means for generating a magnetic field and means for applying plasma particles by corona discharge to the ionizable product placed on the means for generating the magnetic field. ... | 05/16/2006 |
| 7025648 | Liquid manufacturing processes for panel layer fabrication A method for manufacturing a light-emitting panel sandwiches a plurality of micro-components between two flexible substrates in a web configuration. Each micro-component contains a gas or gas-mixture capable of ionization when a sufficiently large voltage is supplie... | 04/11/2006 |
| 7026764 | Plasma producing apparatus and doping apparatus An object of the present invention is to provide an apparatus for producing stable plasma. Another object of the present invention is to provide an apparatus having a long-lasting cathode electrode which is superior in field emission characteristic since the plasma ... | 04/11/2006 |
| 7023128 | Dipole ion source A dipole ion source (FIG. 1) includes two cathode surfaces, a substrate (1) and a pole (3); wherein a gap is defined between the substrate and the pole; an unsymmetrical mirror magnetic field including a compressed end, wherein the substrate is ... | 04/04/2006 |
| 7009330 | Composition of plasma display panel A composition of a plasma display panel (PDP) is disclosed. In order to effectively reduce a jitter, the composition contains a ferroelectric transparent ceramics material. ... | 03/07/2006 |
| 7005793 | Socket for use with a micro-component in a light-emitting panel An improved light-emitting panel having a plurality of micro-components at least partially disposed in a socket and sandwiched between two substrates is disclosed. Each micro-component contains a gas or gas-mixture capable of ionization when a sufficiently large vol... | 02/28/2006 |
| 6998785 | Liquid-jet/liquid droplet initiated plasma discharge for generating useful plasma radiation Plasma discharge sources for generating emissions in the VUV, EUV and X-ray spectral regions. Embodiments can include running a current through liquid jet streams within space to initiate plasma discharges. Additional embodiments can include liquid droplets within t... | 02/14/2006 |
| 6979954 | Inter-stage plasma source A high efficiency plasma pump for use in a plasma processing system that includes a plasma processing device having a first plasma density proximate a processing region and a second plasma density proximate an exit region is disclosed. The plasma pump includes an in... | 12/27/2005 |
