Bizarre Patents
Decorative Jeweled Wheel Cover
An improved wheel is provided wherein decorative items such as gem stones are embedded in either the wheel surface, a special mounting section attached to the wheel surface, or to a spoke strap that wraps around each spoke and positions embedded gem stones on the outside surface of the spoke.
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| Number | Title | Issue Date |
| 7420181 | Liquid metal ion gun An emitter of a Ga liquid metal ion source is constituted to include W12 of a base material and Ga9 of an ion source element covering a surface as construction materials. By making back-sputtered particles become elements (W and Ga) of the Ga liquid metal ion sour s... | 09/02/2008 |
| 7405415 | Ion source with particular grid assembly An ion source (1) to be used in optical thin film deposition by IAD process includes a discharge chamber (10), a gas source, an actuator (11), a grid assembly (20) and an outer shell (30). The grid assembly includes a screen grid (... | 07/29/2008 |
| 7372059 | Plasma-based EUV light source Various mechanisms are provided relating to plasma-based light source that may be used for lithography as well as other applications. For example, a device is disclosed for producing extreme ultraviolet (EUV) light based on a sheared plasma flow. The device can prod... | 05/13/2008 |
| 7342361 | Plasma source A plasma source is described. The source includes a reactive impedance element formed from a plurality of electrodes. By providing such a plurality of electrodes and powering adjacent electrodes out of phase with one another, it is possible to improve the characteri... | 03/11/2008 |
| 7323701 | Gas discharge lamp A gas discharge lamp for the wavelength range of extreme ultraviolet radiation and/or soft X-ray radiation has at least two electrodes for providing a radiaton-emitting plasma in the intervening discharge space. One of the electrodes has a continuous opening to an a... | 01/29/2008 |
| 7321198 | Ion source with uniformity of radial distribution of ion beam intensity An ion source, comprising: a discharge chamber, in which is formed an opening; a coil, provided outside said discharge chamber, for generating plasma within said discharge chamber; an extraction electrode, which extracts ions in said plasma generated in said dischar... | 01/22/2008 |
| 7281492 | System and method for generating a discharge in gases A method of generating an electrical discharge in a gas contained in a sealed enclosure. The method includes driving a helical coil resonator at an RF frequency to generate an RF electric-magnetic field sufficient to generate an electrical discharge in the high pres... | 10/16/2007 |
| 7279845 | Plasma processing method and apparatus A method and apparatus for processing a target substance by using atmospheric-pressure plasma produced by a composite waveform generated by superimposing a high-frequency sine wave and a high-frequency square wave at the same or substantially the same frequency and ... | 10/09/2007 |
| 7276847 | Cathode assembly for indirectly heated cathode ion source A cathode in an indirectly heated cathode ion source is supported by at least one rod or pin. The cathode is preferably in the form of a disk, and the support rod is smaller in diameter than the disk to limit thermal conduction and radiation. In one embodiment, the ... | 10/02/2007 |
| 7264771 | Method and apparatus for manipulating pre-sterilized components in an active sterile field The connection, assembly, or fill of two or more pre-sterilized components having at least one terminal end each for attachment to another component, and an apparatus for performing such a connection, while maintaining the sterility of the components is disclosed. T... | 09/04/2007 |
| 7251263 | Capillary discharge x-ray laser A compact, high repetition rate, extreme ultraviolet/soft x-ray laser and method for generating such radiation are described. Excitation of the gaseous or vaporous lasing medium is achieved by discharging energy stored in a solid-dielectric capacitive device through... | 07/31/2007 |
| 7244475 | Plasma treatment apparatus and control method thereof A frequency control circuit (45) controls an oscillation frequency of a second high frequency power source 51 based on a phase difference between a voltage component and a current component measured by a phase difference sensor (41) and an input... | 07/17/2007 |
| 7243689 | Device with needle penetrable and laser resealable portion and related method A device and method are provided for needle penetrating and filling a chamber with a predetermined substance, and laser resealing a resulting needle hole in the device. A needle penetrable and laser resealable portion of the device is pierceable with a needle to for... | 07/17/2007 |
| 7235945 | Energy conversion systems A device comprising a massfree energy receiver and means to convert massfree energy into ordinary electricity or mechanical work, including a pulsed plasma reactor driving an inertially damped drag motor. ... | 06/26/2007 |
| 7215697 | Matched impedance controlled avalanche driver Controlled avalanche driver circuits and apparatuses for gas lasers. One embodiment typically delivers short, rapid, high voltage ionizing pulses in combination with an electric field whose magnitude is too low to sustain a normal glow discharge. The plasma is typic... | 05/08/2007 |
| 7216067 | Non-linear test load and method of calibrating a plasma system A non-linear test load is provided for calibrating a plasma system. The test load is a substrate for modeling the electrical characteristics of the plasma such that multi frequency testing can be performed in the absence of a plasma reaction. An exemplary substrate ... | 05/08/2007 |
| 7204921 | Vacuum apparatus and vacuum processing method A vacuum apparatus which can easily regenerate plasma is provided. A matching box used in the vacuum apparatus can vary the impedance thereof by varying the magnitudes of the inductance of variable inductance elements. Controlling the magnitude of direct current mak... | 04/17/2007 |
| 7196337 | Particle processing apparatus and methods This invention relates to an apparatus for processing particles. The apparatus comprises a particle source having an exist aperture; an extraction electrode located at the exist aperture; an acceleration electrode adjacent to the extraction electrode; a processing c... | 03/27/2007 |
| 7183716 | Charged particle source and operation thereof A charged particle source utilizes a novel plasma processing chamber, RF coil and ion optics, to achieve high uniformity. The plasma processing chamber has a re-entrant vessel which is movable, and which includes extensions of adjustable shape or position, to make m... | 02/27/2007 |
| 7164095 | Microwave plasma nozzle with enhanced plume stability and heating efficiency Systems and methods for generating relatively cool microwave plasma. The present invention provides a microwave plasma nozzle that includes a gas flow tube through which a gas flows, and a rod-shaped conductor that is disposed in the gas flow tube and has a tapered ... | 01/16/2007 |
| 7100646 | Sealed containers and methods of making and filling same Disclosed is a uniquely configured medicament vial assembly which includes a storage vial, a stopper member and a securing ring. The vial assembly is configured to improve healthcare worker safety by providing a shielded gripping location to aid in the reduction of ... | 09/05/2006 |
| 7078862 | Beam source and beam processing apparatus A beam source has a plasma generating chamber, an antenna for generating plasma in the plasma generating chamber, a first electrode disposed in the plasma generating chamber, and a second electrode disposed in the plasma generating chamber. Both of the antenna and t... | 07/18/2006 |
| 7071626 | Plasma generator Disclosed herein is a plasma generator, in which a plasma forming space, into which the air is introduced, is provided, band plate-like first and second electrodes are arranged in opposed relation to each other through a dielectric in the plasma forming space, and p... | 07/04/2006 |
| 7064491 | Ion implantation system and control method Ion implantation with high brightness, ion beam by ionizing gas or vapor, e.g. of dimers, or decaborane, by direct electron impact ionization adjacent the outlet aperture (46, 176) of the ionization chamber (80; 175)). Preferably: conditions are mainta... | 06/20/2006 |
| 7045793 | Multi-grid ion beam source for generating a highly collimated ion beam A multi-grid ion beam source has an extraction grid, an acceleration grid, a focus grid, and a shield grid to produce a highly collimated ion beam. A five grid ion beam source is also disclosed having two shield grids. The extraction grid has a high positive potenti... | 05/16/2006 |
| 7038403 | Method and apparatus for maintaining alignment of a cyclotron dee A technique is provided for the alignment of an H/D puller for use in a cyclotron. One aspect of the technique comprises magnetically attaching a pair of feeler gages to an alignment tool for use in aligning the H/D puller. The magnetic retention of the feeler gages... | 05/02/2006 |
| 7032631 | Medicament vial having a heat-sealable cap, and apparatus and method for filling the vial A resealable cap (110, 210) for a medicament vial (114, 214) has a base portion (112, 212) formed of vulcanized rubber or like material known for providing a stable environment for the medicament contained within the vial, and a resealable porti... | 04/25/2006 |
| 7005782 | Charged particle beam extraction and formation apparatus A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits ... | 02/28/2006 |
| 6998620 | Stable energy detector for extreme ultraviolet radiation detection A detector for use with an EUV photon source emitting around 11-15 nm includes at least one multilayer mirror for reflecting the beam along an optical path include a detector element, a filter for reducing the bandwidth of the beam, and the detector element. The det... | 02/14/2006 |
| 6975073 | Ion plasma beam generating device An electron beam device wherein a low temperature gaseous plasma is generated in a chamber divided by two parallel wire grids. A semiconductor wafer serves as a cathode drawing ions from the plasma to impinge on the wafer, generating secondary electrons that are acc... | 12/13/2005 |
| 6972524 | Plasma processing system control A method of approximating an ion energy distribution function (IEDF) at a substrate surface of a substrate, the substrate being processed in a plasma processing chamber. There is included providing a first voltage value, the first voltage value representing a value ... | 12/06/2005 |
| 6971228 | Propulsion device, in particular for a rocket The invention relates to a propulsion device comprising a gas ejection nozzle and an injection chamber for injecting at least one propellant fluid. According to the invention, the device has an induction loop which surrounds a zone of the nozzle and also an electric... | 12/06/2005 |
| 6956329 | Apparatus and method for forming a high pressure plasma discharge column An apparatus for producing a stable, high pressure plasma column with long length, and high axial uniformity. Rotating a gas-filled tube about an horizontal axis creates a vortex with minimal, or no shear flow. Such a vortex provides a stable equilibrium for a centr... | 10/18/2005 |
| 6929712 | Plasma processing apparatus capable of evaluating process performance A high-frequency current detector of a plasma processing apparatus detects a high-frequency current produced when high-frequency power in the range that does not cause generation of plasma in a chamber is supplied from a high-frequency power supply source to the cha... | 08/16/2005 |
| 6929040 | Sterile filling machine having needle filling station within e-beam chamber A sterile filling machine and related method are provided for sterile filling a container with a substance. The container includes a heat resealable stopper and a chamber for receiving the substance therein. The sealed, empty containers are subjected to radiation ca... | 08/16/2005 |
| 6922019 | Microwave ion source A compact microwave ion source has a permanent magnet dipole field, a microwave launcher, and an extractor parallel to the source axis. The dipole field is in the form of a ring. The microwaves are launched from the middle of the dipole ring using a coaxial waveguid... | 07/26/2005 |
| 6919689 | Method for toolmatching and troubleshooting a plasma processing system A plasma processing system having a grounded chamber and an RF power feed connected to a bottom electrode is tested. A first capacitance between the bottom electrode and the grounded chamber is measured at atmosphere. Consumable hardware parts are installed in the c... | 07/19/2005 |
| 6909086 | Neutral particle beam processing apparatus A neutral particle beam processing apparatus comprises a workpiece holder (20) for holding a workpiece (X), a plasma generator for generating a plasma in a vacuum chamber (3) by applying a high-frequency electric field, an orifice electrode (4) ... | 06/21/2005 |
| 6909087 | Method of processing a surface of a workpiece A plasma generator generates positive ions and negative ions in a plasma. An ion extracting portion (4, 5) selectively extracts the generated positive ions and negative ions from the plasma, and accelerates the extracted ions in a predetermined direction. The... | 06/21/2005 |
| 6906469 | Radio frequency ion source with maneuverable electrode(s) An rf ion source suitable for low power operation over a range of pressures in air which comprises discharge electrode, a cathode and an anode, the cathode being connected to an rf signal supply through an associated coupling means and the anode adapted to provide a... | 06/14/2005 |
