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| Number | Title | Issue Date |
| 7037846 | Method and apparatus for micro-jet enabled, low energy ion generation and transport in plasma processing A method for creating and transporting low-energy ions for use in plasma processing of a semiconductor wafer is disclosed. In an exemplary embodiment of the invention, the method includes generating plasma from a gas species to produce a plasma exhaust. The plasma e... | 05/02/2006 |
| 7038389 | Magnetron plasma source A point projection type flood plasma source implements a magnetron sputter cold cathode electron source in a discharge cavity separated from a process chamber by a narrow conduit and a solenoid magnetic field. The solenoid magnetic field impedes radial electron flow... | 05/02/2006 |
| 7037813 | Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage A method for implanting ions in a surface layer of a workpiece includes placing the workpiece on a workpiece support in a chamber with the surface layer being in facing relationship with a ceiling of the chamber, thereby defining a processing zone between the workpi... | 05/02/2006 |
| 7034322 | Fluid jet electric discharge source A fluid jet or filament source and a pair of coaxial high voltage electrodes, in combination, comprise an electrical discharge system to produce radiation and, in particular, EUV radiation. The fluid jet source is composed of at least two serially connected reservoi... | 04/25/2006 |
| 7034285 | Beam source and beam processing apparatus A beam source has a plasma generating chamber and a gas inlet port for introducing a gas into the plasma generating chamber. The beam source includes a plasma generator for generating positive-negative ion plasma containing positive ions at a density of at least 10 | 04/25/2006 |
| 7030390 | Ion source with electrode kept at potential(s) other than ground by zener diode(s), thyristor(s) and/or the like An ion source is provided, which generates or emits an ion beam which may be used to deposit a layer on a substrate, or the perform other functions. The ion source includes at least one anode and at least one cathode. In certain example embodiments, the cathode(s) i... | 04/18/2006 |
| 7029636 | Electrode discharge, non-thermal plasma device (reactor) for the pre-treatment of combustion air A device for the pre-treatment of combustion air by exposure to non-thermal plasma at substantially atmospheric pressure and a method for operating the same. The device includes an inner electrode having a longitudinal channel defined therein to receive a fuel. An o... | 04/18/2006 |
| 7030335 | Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression A plasma reactor for processing a semiconductor workpiece, includes a reactor chamber having a chamber wall and containing a workpiece support for holding the semiconductor workpiece, an overhead electrode overlying said workpiece support, the electrode comprising a... | 04/18/2006 |
| 7030336 | Method of fixing anodic arc attachments of a multiple arc plasma gun and nozzle device for same An improved anode element for a plasma generator is comprised of an anode body having a central bore therein. A plurality of arc attachment regions are formed along a surface of the central bore. Each attachment is configured to provide a substantially radially pred... | 04/18/2006 |
| 7026174 | Method for reducing wafer arcing A method for reducing wafer damage during an etching process is provided. In one of the many embodiments, the method includes assigning a bias voltage to each of at least one etching process, and generating the assigned bias voltage before initiation of one of the a... | 04/11/2006 |
| 7026763 | Apparatus for magnetic and electrostatic confinement of plasma An apparatus and method for containing plasma and forming a Field Reversed Configuration (FRC) magnetic topology are described in which plasma ions are contained magnetically in stable, non-adiabatic orbits in the FRC. Further, the electrons are contained electrosta... | 04/11/2006 |
| 7026611 | Analytical instruments, ionization sources, and ionization methods Methods and apparatus for simultaneous vaporization and ionization of a sample in a spectrometer prior to introducing the sample into the drift tube of the analyzer are disclosed. The apparatus includes a vaporization/ionization source having an electrically conduct... | 04/11/2006 |
| 7022937 | Plasma processing method and apparatus for performing uniform plasma processing on a linear portion of an object A plasma processing method is used to process a linear portion of an object to be processed by generating a linear plasma by supplying an electric power to an electrode provided at a plasma source or the object to be processed while supplying gas to the plasma sourc... | 04/04/2006 |
| 7019543 | Impedance monitoring system and method An apparatus (14) for and method of measuring impedance in a capacitively coupled plasma reactor system (10). The apparatus includes a high-frequency RF source (150) in electrical communication with an upper electrode (50). A first high-p... | 03/28/2006 |
| 7015646 | Magnetic and electrostatic confinement of plasma with tuning of electrostatic field A system and method for containing plasma and forming a Field Reversed Configuration (FRC) magnetic topology are described in which plasma ions are contained magnetically in stable, non-adiabatic orbits in the FRC. Further, the electrons are contained electrostatica... | 03/21/2006 |
| 7014738 | Enhanced macroparticle filter and cathode arc source A cathode arc source for depositing a coating on a substrate has an anode and a cathode station for a target, a first filter means comprising a filter duct having at least one bend, and first magnetic means for steering plasma through the filter duct for removal of ... | 03/21/2006 |
| 7015415 | Higher power density downstream plasma A method and system to obtain a high power density plasma to efficiently generate high concentrations of plasma downstream from one or more plasma sources. A first embodiment of the invention involves a method to provide an improved power density for dissociating on... | 03/21/2006 |
| 7014741 | Cylindrical magnetron with self cleaning target A cylindrical magnetron capable of running at high current and voltage levels with a target tube that is self cleaning not only in the center portion, but also at the ends. Sputtering the ends of the target tube virtually eliminates accumulation of condensate at the... | 03/21/2006 |
| 7004107 | Method and apparatus for monitoring and adjusting chamber impedance A substrate processing system that includes a deposition chamber having a reaction zone, a substrate holder that positions a substrate in the reaction zone, a gas distribution system that includes a gas inlet manifold for supplying one or more process gases to said ... | 02/28/2006 |
| 7005635 | Nebulizer with plasma source A combination electrospray/microwave induced plasma (MIP) ionization source is used as the ionization source for a mass spectrometer. The electrospray can be operated in positive mode, negative mode, or it can be switched off. The microwave-induced plasma can also b... | 02/28/2006 |
| 7001520 | Method for treating waste-activated sludge using elecroporation A method of treating of municipal sludge, paper-pulp sludge, animal and plant waste, and the like, whereby the treatment thereof via electroporation causes the breakdown of waste activated sludge, which is then recycled back to a bioreactor, or to one or more additi... | 02/21/2006 |
| 7000565 | Plasma surface treatment system and plasma surface treatment method A plasma surface treatment system for irradiating a surface of a substrate to be treated with a nitrogen plasma excited by a high-frequency electric field to introduce nitrogen into the surface of the substrate comprises a pulse modulator for pulse modulation of the... | 02/21/2006 |
| 6995515 | Formation of a field reversed configuration for magnetic and electrostatic confinement of plasma A system and method for containing plasma and forming a Field Reversed Configuration (FRC) magnetic topology are described in which plasma ions are contained magnetically in stable, non-adiabatic orbits in the FRC. Further, the electrons are contained electrostatica... | 02/07/2006 |
| 6995545 | Control system for a sputtering system A fault handling algorithm processes a plurality of fault status signals from a sputtering system in a period of time to generate at least one command signal for affecting the operation of a power generator. ... | 02/07/2006 |
| 6984941 | Extreme UV radiation source and semiconductor exposure device A usable 13.5 nm radiation source in which Sn is the radiation substance, in which rapid transport with good reproducibility is possible up to the plasma generation site and in which formation of detrimental “debris” and coagulation of the vapor are suppressed a... | 01/10/2006 |
| 6977383 | Method and apparatus for generating a membrane target for laser produced plasma A method and apparatus for generating membrane targets for a laser induced plasma is disclosed herein. Membranes are advantageous targets for laser induced plasma because they are very thin and can be readily illuminated by high-power coherent light, such as a laser... | 12/20/2005 |
| 6975073 | Ion plasma beam generating device An electron beam device wherein a low temperature gaseous plasma is generated in a chamber divided by two parallel wire grids. A semiconductor wafer serves as a cathode drawing ions from the plasma to impinge on the wafer, generating secondary electrons that are acc... | 12/13/2005 |
| 6974560 | Electro-kinetic air transporter and conditioner device with enhanced anti-microorganism capability An electro-kinetic air conditioner for removing particulates from the air creates an airflow using no moving parts. The airflow is subjected to UV radiation from a germicidal lamp within the device. The conditioner includes an ion generator that has an electrode ass... | 12/13/2005 |
| 6975072 | Ion source with external RF antenna A radio frequency (RF) driven plasma ion source has an external RF antenna, i.e. the RF antenna is positioned outside the plasma generating chamber rather than inside. The RF antenna is typically formed of a small diameter metal tube coated with an insulator. An ext... | 12/13/2005 |
| 6972524 | Plasma processing system control A method of approximating an ion energy distribution function (IEDF) at a substrate surface of a substrate, the substrate being processed in a plasma processing chamber. There is included providing a first voltage value, the first voltage value representing a value ... | 12/06/2005 |
| 6972115 | Apparatus and methods for the production of powders Metallic powders are formed by the electrically exploded wire (EEW) process. An apparatus (20) for manufacturing such powders includes a closed loop recirculating gas path between a reaction chamber (100) and an extractor (32). A wire (31... | 12/06/2005 |
| 6969851 | Ion-mobility spectrometry sensor for NOx detection A sensor and detection methods are provided for detecting nitric oxides (NOx) in an exhaust gas based upon ion mobility spectrometry (IMS) technique. An ionization chamber having an interior electrically conductive shell receives exhaust gas. A spark electrode havin... | 11/29/2005 |
| 6969953 | System and method for inductive coupling of an expanding thermal plasma A method is provided for generating plasma using a plasma generator system. The method includes the steps of introducing energy and a reactant to a plasma generation apparatus of the plasma generator system for generating plasma, and expanding and inductively coupli... | 11/29/2005 |
| 6967341 | Method and device for the generation of far ultraviolet or soft x-ray radiation In a method for generating extreme ultraviolet radiation or soft x-ray radiation by means of gas discharge, in particular, for EUV lithography, a discharge vessel is provided with two electrodes that are connected to high voltage. Between the electrodes, in an area ... | 11/22/2005 |
| 6965267 | Bipolar differential input stage with input bias current cancellation circuit A bipolar differential input stage with an input bias current cancellation circuit comprises an input pair and a bipolar tracking transistor. The input stage is arranged such that the collector currents in the input pair and tracking transistor, and the collector-em... | 11/15/2005 |
| 6961251 | Waveform independent high frequency power system Method and apparatus are disclosed for providing a constant voltage, high frequency sinusoidal output across a varying load, using either a single or multiple switch topology operating at constant frequency while maintaining high efficiency over the entire load rang... | 11/01/2005 |
| 6960888 | Method of producing and accelerating an ion beam A method of producing and accelerating an ion beam comprising the steps of: providing a magnetic field with a cusp that opens in an outward direction along a centerline that passes through a vertex of the cusp: providing an ionizing gas that sprays outward through a... | 11/01/2005 |
| 6960887 | Method and apparatus for tuning a plasma reactor chamber A plasma reactor or vacuum processing apparatus is provided with an orifice plate assembly. The orifice plate assembly includes an upper plate and a lower plate. Each plate is configured with through holes. The upper and lower orifice plates are independently rotata... | 11/01/2005 |
| 6958630 | High-frequency detection method and high-frequency detection circuit A high frequency detection circuit detects information about a first high frequency power in a high frequency power source device supplying the first high frequency power having a first frequency and a second high frequency power having a second frequency lower than... | 10/25/2005 |
| 6955794 | Slot discharge non-thermal plasma apparatus and process for promoting chemical reaction A plasma reactor including a first dielectric having at least one slot defined therethrough, and a segmented electrode including a plurality of electrode segments, each electrode segment is disposed proximate an associated slot. Each electrode segment may be formed ... | 10/18/2005 |
