...that Thomas Edison's patent application on his phonograph was approved by the Patent Office in just seven weeks? In contrast, it took Gordon Gould, the inventor of the laser, 30 years to obtain his patent -- finally awarded in 1988!
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| Number | Title | Issue Date |
| 7791281 | Method and apparatus for stabilizing a glow discharge plasma under atmospheric conditions Method and apparatus for generating and sustaining a glow discharge plasma in a plasma discharge space comprising at least two spaced electrodes. The method and apparatus are arranged for performing the steps of introducing in the discharge space a gas or gas mixtur... | 09/07/2010 |
| 7759874 | Apparatus for effecting plasma chemical vapor deposition (PCVD) The present invention relates to an apparatus for carrying out a plasma chemical vapor deposition process by which one or more layers of doped or undoped silica can be deposited on the interior of an elongated glass substrate tube. The present invention further rela... | 07/20/2010 |
| 7750574 | Method of generating discharge plasma A pulse voltage is applied on a process gas to generate discharge plasma. The pulse voltage has a duty ratio controlled in a range of 0.001 percent or more and 8.0 percent or less. Preferably, the discharge plasma has an electron density of 1×1010 cm | 07/06/2010 |
| 7750575 | High density plasma source The present invention relates to a plasma source. The plasma source includes a cathode assembly having an inner cathode section and an outer cathode section. An anode is positioned adjacent to the outer cathode section so as to form a gap there between. A first powe... | 07/06/2010 |
| 7719199 | Controlled fusion in a field reversed configuration and direct energy conversion A system and apparatus for controlled fusion in a field reversed configuration (FRC) magnetic topology and conversion of fusion product energies directly to electric power. Preferably, plasma ions are magnetically confined in the FRC while plasma electrons are elect... | 05/18/2010 |
| 7692389 | Method and device for load matching The impedance of a variable load is matched to the output resistance of an HF generator by performing a first impedance matching for a first load impedance and by performing a second impedance matching for a second load impedance. The first impedance matching is car... | 04/06/2010 |
| 7663319 | Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities A strongly-ionized plasma generator includes a chamber for confining a feed gas. An anode is positioned inside the chamber. A cathode assembly is positioned adjacent to the anode inside the chamber. An output of a pulsed power supply is electrically connected betwee... | 02/16/2010 |
| 7615931 | Pulsed dielectric barrier discharge A dielectric barrier plasma discharge device consistent with certain embodiments of the present invention has a pair of electrodes spaced apart by an electrode gap. A dielectric is disposed between the electrodes. The electrode gap is provided with a gas at a specif... | 11/10/2009 |
| 7609002 | Plasma accelerating apparatus and plasma processing system having the same A plasma accelerating apparatus and a plasma processing system, which efficiently elevate a drift velocity of a plasma beam and are simple to manufacture and simple in construction. A channel includes an outlet port opening at an end of the channel. A gas supply por... | 10/27/2009 |
| 7602127 | Phase and frequency control of a radio frequency generator from an external source Controlling a phase and/or a frequency of a RF generator. The RF generator includes a power source, a sensor, and a sensor signal processing unit. The sensor signal processing unit is coupled to the power source and to the sensor. The sensor signal processing unit c... | 10/13/2009 |
| 7595594 | Arrangement for switching high electric currents by a gas discharge The present invention is directed to an arrangement for switching high electric currents by way of a gas discharge at high voltages or for generating gas discharge plasma emitting EUV radiation. It is the object of the invention to find a novel possibility for gener... | 09/29/2009 |
| 7589473 | Pulsed plasma device and method for generating pulsed plasma A device and a method for generating a truly pulsed plasma flow are disclosed. The device includes a cathode assembly comprising a cathode and a cathode holder, an anode, and two or more intermediate electrodes, the anode and the intermediate electrodes forming a pl... | 09/15/2009 |
| 7567037 | High frequency power supply device and plasma generator A high frequency power supplying device and a plasma generation device using the same includes: two or more inductive antennas; high frequency power sources, respectively supplying power to the antennas; and a vacuum chamber on which the antennas are provided so as ... | 07/28/2009 |
| 7560869 | Method and apparatus for remotely monitoring properties of gases and plasmas A method and apparatus for remotely monitoring properties of gases and plasmas is disclosed. A laser beam is focused at a desired region within a gas or plasma to be analyzed, generating an ionized sample region in the gas or plasma. A beam of microwave radiation is... | 07/14/2009 |
| 7557511 | Apparatus and method utilizing high power density electron beam for generating pulsed stream of ablation plasma A pulsed electron ablation (PEA) utilizes a source of a high power density electron beam which includes a cathode plasma supplying electrons for generation of the electron beam and an anode plasma having a front layer extending in the processing chamber in a counter... | 07/07/2009 |
| 7514875 | RF plasma source with quasi-closed ferrite core An inductively coupling plasma source having a primary winding powered directly from a radio frequency source and a quasi-closed O-type ferrite core comprised of two equal U-shaped core halves separated from one another to form two operating gaps between aligned spa... | 04/07/2009 |
| 7508140 | Plasma reactor A plasma reactor including a plasma generating electrode which includes a plurality of unit electrodes hierarchically layered at specific intervals, a casing in which the plasma generating electrode is disposed, and a power supply which applies a voltage to the unit... | 03/24/2009 |
| 7482757 | Inductively coupled high-density plasma source A high-density plasma source (100) is disclosed. The source includes an annular insulating body (300) with an annular cavity (316) formed within. An inductor coil (340) serving as an antenna is arranged within the annular cavity and is op... | 01/27/2009 |
| 7459858 | Hall thruster with shared magnetic structure A Hall thruster with a shared magnetic structure including a plurality of plasma accelerators each including an anode and a discharge zone for providing plasma discharge. An electrical circuit having one or more cathodes connected to the plurality of plasma accelera... | 12/02/2008 |
| 7446479 | High-density plasma source The present invention relates to a plasma source. The plasma source includes a cathode assembly having an inner cathode section and an outer cathode section. An anode is positioned adjacent to the outer cathode section so as to form a gap there between. A first powe... | 11/04/2008 |
| 7439678 | Magnetic and electrostatic confinement of plasma with tuning of electrostatic field A system and method for containing plasma and forming a Field Reversed Configuration (FRC) magnetic topology are described in which plasma ions are contained magnetically in stable, non-adiabatic orbits in the FRC. Further, the electrons are contained electrostatica... | 10/21/2008 |
| 7436122 | Helicon hall thruster Atoms of a propellant gas are ionized in a helicon plasma source, preferably in an annular area between inner and outer cylinders. The annular ionization area is aligned with an annular acceleration stage similar to the electrical-magnetic acceleration stage of a Ha... | 10/14/2008 |
| 7426900 | Integrated electrostatic inductive coupling for plasma processing An integrated electrostatic inductively-coupled (i-ESIC) device is provided for plasma processing that may be used as a primary or secondary source for generating a plasma to prepare substrates for, and to process substrates by applying, dielectric and conductive co... | 09/23/2008 |
| 7427766 | Method and apparatus for producing extreme ultraviolet radiation or soft X-ray radiation A method of producing extreme ultraviolet radiation (EUV) or soft X-ray radiation by means of an electrically operated discharge, in particular for EUV lithography or for metrology, in which a plasma (22) is ignited in a gaseous medium between at least two el... | 09/23/2008 |
| 7420191 | Discharge radiation source, in particular UV radiation The invention concerns a radiation source, comprising an anode (2), a cathode (3), an electric discharge gap (4) between the anode (2) and the cathode (3) and a gas input conduit (30) in the discharge gap (4). The gas... | 09/02/2008 |
| 7415940 | Plasma processor This invention includes a first filter (27) connected between a susceptor (21) and ground and having a variable impedance, a sensor (28) for detecting an electrical signal based on the state of a plasma (P) generated in a process chamber (11 | 08/26/2008 |
| 7411353 | Alternating current multi-phase plasma gas generator with annular electrodes A plasma generator for three phase mains alternating current operation has three plasma generation tubes interconnected with a nozzle, each plasma generation tube having a plasma initiator for forming a plasma into an electrode ring, the electrode ring including sub... | 08/12/2008 |
| 7411352 | Dual plasma beam sources and method A pair of plasma beam sources are connected across an AC power supply to alternatively produce an ion beam for depositing material on a substrate transported past the ion beams. Each plasma beam source includes a discharge cavity having a first width and a nozzle ex... | 08/12/2008 |
| 7408303 | Pulsed plasma accelerator and method A pulsed plasma accelerator includes two electrodes (1) arranged between dielectric bars (2) made from an ablating material, a discharge channel with an open end part whose walls are defined by the surfaces of electrodes (1) and dielectric bars ... | 08/05/2008 |
| 7405410 | Method and apparatus for confining, neutralizing, compressing and accelerating an ion field An apparatus and method of use for injection, confinement, neutralization, acceleration and compression of an ion field using a solenoid having an axis of symmetry and supported within a vacuum space. A pair of magnetizable elements are positioned initially in space... | 07/29/2008 |
| 7404879 | Ionized physical vapor deposition apparatus using helical self-resonant coil Provided is an ionized physical vapor deposition (IPVD) apparatus having a helical self-resonant coil. The IPVD apparatus comprises a process chamber having a substrate holder that supports a substrate to be processed, a deposition material source that supplies a ma... | 07/29/2008 |
| 7405411 | Ion source with multi-piece outer cathode In certain example embodiments of this invention, there is provided an ion source including an anode and a cathode. In certain example embodiments, a multi-piece outer cathode is provided. The multi-piece outer cathode allows precision adjustments to be made, thereb... | 07/29/2008 |
| 7405521 | Multiple frequency plasma processor method and apparatus A workpiece is processed with a plasma in a vacuum plasma processing chamber by exciting the plasma at several frequencies such that the excitation of the plasma by the several frequencies simultaneously causes several different phenomena to occur in the plasma. The... | 07/29/2008 |
| 7403764 | RF power delivery diagnostic system An RF power delivery diagnostic system is provided herein. The system comprises an RF power source (303), an impedance matching network (305), a plasma reactor (307) in electrical contact with the RF power source by way of the impedance matching... | 07/22/2008 |
| 7397013 | Plasma lineation electrode A plasma spray device is provided. The plasma spray device includes a plasma chamber region for having a plasma formed and a throat region coupled to the plasma chamber region. The throat region has an end surface and an axial bore. The axial bore is formed substant... | 07/08/2008 |
| 7394041 | Apparatus for treating a waste gas using plasma torch Disclosed is a waste gas treatment apparatus having a waste gas inlet for flowing a waste gas into a main combustion chamber provided in empty space inside a body, and a plasma torch configured to propagate flames against the waste gas flowing through the waste gas ... | 07/01/2008 |
| 7391160 | Controlled fusion in a field reversed configuration and direct energy conversion A system and apparatus for controlled fusion in a field reversed configuration (FRC) magnetic topology and conversion of fusion product energies directly to electric power. Preferably, plasma ions are magnetically confined in the FRC while plasma electrons are elect... | 06/24/2008 |
| 7368876 | Plasma processing apparatus A low-cost plasma processing apparatus which permits reduction of the cost, as well as reduction of the loss of transmitted power. The plasma processing apparatus 1 has an apparatus main body 2 and auxiliary equipment 3. The auxiliary equipment ... | 05/06/2008 |
| 7367119 | Method for forming a reinforced tip for a probe storage device Systems and methods in accordance with the present invention can include a tip contactable with a media. In an embodiment, the tip comprises a substantially hollow structure formed of a metal. The tip can be formed by depositing a first metal layer over silicon ther... | 05/06/2008 |
| 7367196 | Spinning cold plasma apparatus and methods relating thereto Disclosed herein is an apparatus for generating a spinning cold plasma. A preferred embodiment of the spinning cold plasma apparatus is portable and includes a vortex tube having an inner wall to form a vortex reaction chamber. The vortex tube preferably has a cold ... | 05/06/2008 |