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| Number | Title | Issue Date |
| 6900596 | Capacitively coupled plasma reactor with uniform radial distribution of plasma A plasma reactor for processing a semiconductor wafer includes a side wall and an overhead ceiling defining a chamber, a workpiece support cathode within the chamber having a working surface facing the ceiling for supporting a semiconductor workpiece, process gas in... | 05/31/2005 |
| 6897615 | Plasma process and apparatus An apparatus and process for enhancing the ignition of a gas to form a plasma in a plasma tool. The apparatus and process includes the use of a plasma tube to locally enhance the applied electric field so that plasma can be initiated at higher pressures, at lower el... | 05/24/2005 |
| 6897617 | Method and apparatus to reduce ozone production in ion wind device A method to limit ozone production in wind ion devices while simultaneously realizing incidents of high acceleration in such devices varies the high voltage potential across the array of emitter(s) (10) and collectors (20) over time in such a manner as... | 05/24/2005 |
| 6894245 | Merie plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression A plasma reactor for processing a semiconductor workpiece, includes a reactor chamber having a chamber wall and containing a workpiece support for holding the semiconductor support, the electrode comprising a portion of the chamber wall, an RF power generator for su... | 05/17/2005 |
| 6891911 | Formation of a field reversed configuration for magnetic and electrostatic confinement of plasma A system and method for containing plasma and forming a Field Reversed Configuration (FRC) magnetic topology are described in which plasma ions are contained magnetically in stable, non-adiabatic orbits in the FRC. Further, the electrons are contained electrostatica... | 05/10/2005 |
| 6888313 | Impedance matching network with termination of secondary RF frequencies There is provided a secondary reactive termination circuit connected between the output of the RF power generator and the input of the plasma chamber to allow the tight regulation or limiting of the voltage and current components of the secondary frequencies within ... | 05/03/2005 |
| 6888153 | Capacitive shield for containing radiofrequency magnetic fields RF magnetic shields which support tangential electric fields. The RF shields are particularly suited for use in magnetic resonance imaging (MRI) systems, but may also be used in other radio frequency applications. The RF magnetic shields may include a dielectric lay... | 05/03/2005 |
| 6888314 | Electrostatic fluid accelerator An electrostatic fluid accelerator having a multiplicity of closely spaced corona electrodes. The close spacing of such corona electrodes is obtainable because such corona electrodes are isolated from one another with exciting electrodes. Either the exciting electro... | 05/03/2005 |
| 6885153 | Plasma processing apparatus and method A method for determining the potential of a plasma in a processing chamber includes determining voltages of respective plasma engaging surfaces of at least two plasma generating electrodes disposed within the processing chamber and determining the plasma potential b... | 04/26/2005 |
| 6881971 | Arrangement for the suppression of particle emission in the generation of radiation based on hot plasma The invention is directed to an arrangement for the suppression of particle emission in the generation of radiation based on hot plasma in x-ray radiation sources, particularly EUV radiation sources. The object of the invention, to find a novel possibility for debri... | 04/19/2005 |
| 6879109 | Thin magnetron structures for plasma generation in ion implantation systems A plasma generator for space charge neutralization of an ion beam is disclosed and resides within an ion implantation system operable to generate an ion beam and direct the ion beam along a beamline path. The plasma generator comprises an electric field generation s... | 04/12/2005 |
| 6876154 | Plasma processing apparatus This invention relates to plasma processing apparatus and in particular, but not exclusively, to inductively coupled plasma helicon or electron cyclotron resonance apparatus. A plasma generation chamber is sat above a process chamber, in which is located a workpiece... | 04/05/2005 |
| 6876155 | Plasma processor apparatus and method, and antenna An antenna includes excitation terminals responsive to an RF source to supply an RF electromagnetic field to a plasma that processes a workpiece in a vacuum chamber. A matching network includes first and second portions respectively between the source and terminals ... | 04/05/2005 |
| 6870321 | High-frequency electron source A high-frequency electron source includes a discharge chamber having at least one gas inlet for a gas to be ionized and at least one extraction opening for electrons. The high-frequency electron source also includes a first electrode at least partially surrounding t... | 03/22/2005 |
| 6867387 | Device for plasma incision of matter with a specifically tuned radiofrequency electromagnetic field generator A device to place an incision into matter with a harmonious plasma cloud. A radiofrequency generator system produces pulsed or continuous electromagnetic waveform which is transmitted by an active transmitter incising electrode tip. This generated electromagnetic wa... | 03/15/2005 |
| 6864495 | Device for generating an ion beam An ion beam generation device including an ion source, an extraction mechanism for ions emitted by the source, an accelerating mechanism of the ions thus extracted, a selector for the ions thus accelerated, and an electrostatic optical system for focusing the select... | 03/08/2005 |
| 6864636 | Apparatus, method, and system for a laser-assisted field emission microwave signal generator A source electrode is biased to lower the potential barrier of surface electrons. A laser radiates the source electrode, producing a tunneling electron current. The tunneling electron current oscillates in response to frequency of the laser. The impedance match circ... | 03/08/2005 |
| 6864640 | Plasma processing method and apparatus thereof A plasma processing method includes introducing a gas into a vacuum chamber through a hole of a dielectric tube attached to a metal body fixed to the vacuum chamber while exhausting from the vacuum chamber to keep the vacuum chamber within a specified pressure. High... | 03/08/2005 |
| 6861643 | Neutral particle beam processing apparatus A neutral particle beam processing apparatus comprises a process gas inlet port (11) for introducing a process gas into a vacuum chamber (1), a plasma generating chamber (2) for generating positive ions and electrons from the introduced process ... | 03/01/2005 |
| 6858988 | Electrodeless excimer UV lamp An electrodeless excimer UV lamp, comprising an enclosed chamber with a gas sealed within the enclosed chamber, wherein the gas is capable of being used to generate a plasma discharge, a first electrode wrapped around the outer surface of the chamber at a first loca... | 02/22/2005 |
| 6858838 | Neutral particle beam processing apparatus A neutral particle beam processing apparatus comprises a plasma generator for generating positive ions and/or negative ions in a plasma, a pair of electrodes (5, 6) involving the plasma generated by the plasma generator therebetween, and a power supply (10... | 02/22/2005 |
| 6853141 | Capacitively coupled plasma reactor with magnetic plasma control A plasma reactor includes a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within the chamber and facing the ceiling for supporting a planar workpiece, the workpiece support and the ceiling together defining a... | 02/08/2005 |
| 6852969 | Atmospheric pressure, glow discharge, optical emission source for the direct sampling of liquid media A glow discharge spectroscopy (GDS) source operates at atmospheric pressure. One of the discharge electrodes of the device is formed by an electrolytic solution 27 containing the analyte specimen. The passage of electrical current (either electrons or positiv... | 02/08/2005 |
| 6849857 | Beam processing apparatus A beam processing apparatus comprises a workpiece holder (20) for holding a workpiece (X), a plasma generator for generating a plasma in a vacuum chamber (3), first electrode (4) disposed in the vacuum chamber (3), and a second electrode ... | 02/01/2005 |
| 6844082 | Gas distribution plate with anodized alumnium coating A new and improved, anodized aluminum gas distribution plate for process chambers, particularly an etch chamber. The gas distribution plate includes an aluminum body having multiple gas flow openings extending therethrough and an alumina anodized coating or layer on... | 01/18/2005 |
| 6841943 | Plasma processor with electrode simultaneously responsive to plural frequencies A plasma in a vacuum chamber where a workpiece is processed is bounded by a plasma confinement volume including a region between a first electrode simultaneously responsive to power at first and second RF frequencies and a DC grounded second electrode. A DC grounded... | 01/11/2005 |
| 6838833 | Plasma processing apparatus A plasma processing apparatus provided with a holding stage of a system in which a temperature of an electrode block is controlled so as to control the temperature of a semiconductor wafer. The electrode block is provided with at least first and second independent t... | 01/04/2005 |
| 6838832 | Apparatus and methods for improving the stability of RF power delivery to a plasma load Methods for improving the stability of RF power delivery to a plasma load are disclosed. The method includes adding an RF resistor and/or a power attenuator at one of many specific locations in the RF power system to lower the impedance derivatives while keeping the... | 01/04/2005 |
| 6838831 | Apparatus and methods for generating persistent ionization plasmas A persistent ionization plasma generator is described that forms a plasma in a cavity that persists for a time after termination of the exciting RF electric field. The plasma generator includes a RF cavity that is in fluid communication with a source of ionizing gas... | 01/04/2005 |
| 6837589 | Heater module of rapid thermal processing apparatus Disclosed herein is a heater module of a rapid thermal processing apparatus. The heater module comprises a heater reactor provided with reflectors, lamps, a cooling gas inlet unit, a quartz window, a quartz window fixing unit, and a cooling gas outlet unit. Accordin... | 01/04/2005 |
| 6836073 | Simultaneous discharge apparatus A simultaneous discharge apparatus comprises a plurality of plasma treatment apparatuses and a single high-frequency power supply, in which the plurality of plasma treatment apparatuses are discharged simultaneously using the single high-frequency power supply, the ... | 12/28/2004 |
| 6831421 | Shunt-induced high frequency excitation of dielectric barrier discharges An ionizing discharge device operating arrangement wherein initiation of discharges in for example a dielectric barrier discharge device is accomplished by a short circuit shunting of the charged electrodes of the device. A cycle of slow charging of the device inter... | 12/14/2004 |
| 6825617 | Semiconductor processing apparatus A semiconductor processing apparatus that processes a semiconductor wafer disposed in a process chamber of a processing apparatus main unit includes a setting unit for enabling a user to set a temperature of the semiconductor wafer and control unit for controlling a... | 11/30/2004 |
| 6823815 | Wafer area pressure control for plasma confinement A plasma processing chamber is provided which provides improved wafer area pressure control. The plasma processing chamber is a vacuum chamber with a device connected for generating and sustaining a plasma. Part of this device would be an etchant gas source and an e... | 11/30/2004 |
| 6826222 | Electric oxygen iodine laser A pulse circuit, a plasma generator, and a excited atomic molecular state generator useful in an electric oxygen iodine laser of the present invention. The invention also comprises a laser wherein a beam passes through a gas expansion throat. ... | 11/30/2004 |
| 6822396 | Transformer ignition circuit for a transformer coupled plasma source According to one embodiment, an apparatus is described. An apparatus includes a vacuum chamber, an electrical transformer coupled to the vacuum chamber, and an ignition circuit. The electrical transformer induces an electromagnetic field within the vacuum chamber. T... | 11/23/2004 |
| 6822395 | Devices for controlling electron emission in plasma flood system A device for controlling emission of electrons from an arc chamber of a plasma flood system into an ion beam in an ion implanter for implanting ions into a substrate. In one embodiment, the invention comprises a mechanical shutter disposed in a discharge opening bet... | 11/23/2004 |
| 6819052 | Coaxial type impedance matching device and impedance detecting method for plasma generation For plasma generation, an impedance matching device and a process of controlling and detecting the impedance matching device are provided to satisfy a preset matching condition. The impedance matching device includes a tubular external conductor and an internal cond... | 11/16/2004 |
| 6818193 | Segmented electrode capillary discharge, non-thermal plasma apparatus and process for promoting chemical reactions A plasma reactor including a first dielectric having at least one capillary defined therethrough, and a segmented electrode including a plurality of electrode segments, each electrode segment is disposed proximate an associated capillary. Each electrode segment may ... | 11/16/2004 |
| 6815900 | Radiation source with high average EUV radiation output The invention is directed to a radiation source for generating extreme ultraviolet (EUV) radiation based on a hot, dense plasma generated by gas discharge. The object of the invention, to find a novel possibility for the realization of an EUV radiation source which ... | 11/09/2004 |
