Did You Know...
...that the x-ray was discovered purely by accident? When German physicist Wilhelm Konrad von Roentgen was experimenting with cathode rays in 1895, he put an activated Crookes tube in a book and went out to lunch. When he returned, he discovered that a key that had also been placed in the book showed up as an image on the developed film!
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| Number | Title | Issue Date |
| 7388245 | Semiconductor device, method for manufacturing the semiconductor device and portable electronic device provided with the semiconductor device A semiconductor device, which is characterized by that two or more island-shaped semiconductor layers including first and second island-shaped semiconductor layers are formed on the same substrate, at least the first island-shaped semiconductor layer has steps in it... | 06/17/2008 |
| 7378729 | Recycling a wafer comprising a buffer layer, after having separated a thin layer therefrom A donor wafer resulting from a method of recycling the wafer after detaching at least one useful layer. The donor wafer includes a substrate; a buffer structure on the substrate; a protective layer associated with the buffer structure; and a post detachment layer lo... | 05/27/2008 |
| 7358152 | Wafer bonding of thinned electronic materials and circuits to high performance substrate A method of bonding a wafer to a substrate comprising the steps of: providing a wafer having a front surface and a back surface; attaching the front surface of the wafer to a support; thinning the wafer from the back surface; bonding the back surface of the wafer to... | 04/15/2008 |
| 7232737 | Treatment of a removed layer of silicon-germanium A method of forming a structure that includes a removed layer taken from a donor wafer donor wafer that includes a first layer of Si1-xGex and a second layer of Si1-yGey. The method includes implanting atomic species into ... | 06/19/2007 |
| 7175712 | Light emitting apparatus and method for curing inks, coatings and adhesives A UV curing apparatus and method is provided for enhancing the distribution and application of UV light to UV photo initiators in a UV curable ink, coating or adhesive. The UV curing apparatus and method comprises UV LED assemblies in a first row with the UV LED ass... | 02/13/2007 |
| 6001715 | Non-thermal process for annealing crystalline materials Bulk crystalline materials are annealed by introducing into them mechanical energy of sufficient intensity to create a large amplitude sound wave. The mechanical energy may be introduced into the material, for example, by laser ablation. Where the bulk cr... | 12/14/1999 |
| 5855735 | Process for recovering substrates A process comprising removing surface layer materials from the wafer by inducing micro-fractures in the surface using a rotating pad and an abrasive slurry until all of the surface layer materials are removed; and chemically etching the surfaces of the wa... | 01/05/1999 |
| 5827771 | Readout backside processing for hybridization This invention pertains to a method for processing readout integrated circuits, and to a readout integrated circuit (10) that is processed in accordance with the method. The method includes a first step of providing a plurality of individual readout circu... | 10/27/1998 |
| 5701169 | Illumination system and exposure apparatus with demountable transparent protective member An illumination system includes an optical system for receiving light from a light source, a barrel for accommodating the light source and the optical system therein, the barrel having an inside gas containing a material which may cause blur of an optical... | 12/23/1997 |
| 5421934 | Dry-etching process simulator A new surface reaction model has been presented to simulate topological evolutions by taking into account the existence of absorbed radicals on the substrate surface. The model treats the etching rate as a function of the coverage ratio by absorbed radica... | 06/06/1995 |
| 5422306 | Method of forming semiconductor hetero interfaces A method is disclosed of forming semiconductor hetero interfaces that will contribute to the performance improvement of devices having semiconductor hetero interfaces such as MOS transistors, quantum devices, capacitors and the like. The method comprises ... | 06/06/1995 |
| 5365342 | Alignment and exposure apparatus and method for manufacture of integrated circuits An alignment apparatus includes a first off-axis alignment optical system having a magnification, and a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, wherein the apparatus ... | 11/15/1994 |
| 5125040 | Inspection method of photomask reticle for semiconductor device fabrication A method of inspecting a photomask reticle for the fabrication of a semiconductor device such as a die having a first pattern which has its own individual shape and a plurality of second patterns each having the same shape and size among themselves, combi... | 06/23/1992 |
| 5116782 | Method and apparatus for processing a fine pattern A method and apparatus for processing a fine pattern of a sample of one of an electronic device, molecular device and bioelement device, wherein a needle having a sharpened tip is disposed in opposed relation to the sample with a gap therebetween. A volta... | 05/26/1992 |
| 5048968 | Alignment mark detecting optical system In an alignment mark detecting optical system usable with an automatic alignment apparatus wherein alignment marks of a wafer and a mask are scanned by a laser beam to detect the state of misalignment therebetween, the laser beam scans the surface of the ... | 09/17/1991 |
| 4998134 | Exposure apparatus An apparatus for photolithographically transferring, onto a plate-like member a pattern corresponding to picture elements of a liquid crystal display device and a pattern corresponding to driving circuits and so on, by use of a photomask. The surface of t... | 03/05/1991 |
| 4944645 | Method and apparatus for loading objects into evacuated treating chamber In a method and apparatus for depicting a circuit pattern on an article such as a semiconductor wafer, glass mask or a reticle supported by a stage in an evacuated casing with an electron beam, the article is disposed in a magazine contained in a sealable... | 07/31/1990 |
| 4910679 | Step-and-repeat alignment and exposure method and apparatus An exposure apparatus usable in the manufacture of semiconductor devices, for transferring a pattern of a reticle onto each of discrete areas of a semiconductor wafer in a step-and-repeat manner. The apparatus has a laser interferometer for precisely meas... | 03/20/1990 |
| 4904570 | Method of using a projection aligner for photoetching When a circuit pattern for a semiconductor device is exposed on a substrate with a coating of photoresist by using a projection aligner with positioning pads to properly position the substrate, photoresist is removed from such areas on the substrate that ... | 02/27/1990 |
| 4864360 | Exposure apparatus An apparatus for photolithographically transferring, onto a plate-like member a pattern corresponding to picture elements of a liquid crystal display device and a pattern corresponding to driving circuits and so on, by use of a photomask. The surface of t... | 09/05/1989 |
| 4843563 | Step-and-repeat alignment and exposure method and apparatus An exposure apparatus usable in the manufacture of semiconductor devices, for transferring a pattern of a reticle onto each of discrete areas of a semiconductor wafer in a step-and-repeat manner. The apparatus has a laser interferometer for precisely meas... | 06/27/1989 |
| 4830499 | Optical device capable of maintaining pupil imaging An optical device includes an objective lens, a relay lens group for relaying the beam from the objective lens, and a compensator for compensating the variation in the optical path length, which occurs when the relative position between said objective len... | 05/16/1989 |
| 4824254 | Alignment marks on semiconductor wafers and method of manufacturing the marks Alignment marks on a semiconductor wafer comprise a first alignment island projecting from a surface of the wafer and a second alignment island having substantially the same height as the first alignment island and surrounding the same with a slit therebe... | 04/25/1989 |
| 4801208 | Projection type exposing apparatus Alignment of a mask with a projection-type exposing apparatus and alignment of the mask with a substrate are provided. Plural exposure areas of the substrate are exposed by light of a predetermined wavelength, which is also used for alignment purposes to ... | 01/31/1989 |
| 4792270 | Automatic rental safe-depositing box system A system wherein a contractor of a rental safe-deposit box can privately obtain, handle and restore his own box in the fire-proof safe room. The system includes an automatic article retrieval and storage unit located within the safe room and having contra... | 12/20/1988 |
| 4786947 | Projection exposure apparatus A semiconductor device manufacturing projection exposure apparatus in which a pattern of a reticle is projected onto a semiconductor wafer through a projection optical system having a lens element and in which the reticle is irradiated with a light of a p... | 11/22/1988 |
| 4785187 | Alignment device An alignment device including an electron gun for emitting an electron beam, a deflecting electrode for scanningly deflecting the electron beam emitted from the electron gun, a holder for holding an object in a plane of scan, a reference mark with which t... | 11/15/1988 |
| 4779986 | Reduction projection system alignment method and apparatus A reduction projection system alignment method for detecting the positions of an alignment pattern on a reticle and an alignment pattern on a wafer projected onto a reticle by a reduction projection lens so as to relatively align the reticle and wafer. Th... | 10/25/1988 |
| 4780606 | Projection aligner method utilizing monitoring of light quantity A projection aligner wherein light from a light source is passed through a mask so as to focus an image of a pattern of the mask on a wafer, characterized in that at least one sensor for monitoring a luminosity and a distribution thereof is disposed in an... | 10/25/1988 |
| 4765744 | Method for testing a photomask A photomask comprises a tested pattern (P1, P2) and a synchronization pattern (SP1 ~SP8). The synchronization pattern is used for synchronizing a scanning signal (S9), obtained from the tested pattern... | 08/23/1988 |
| 4714668 | Method for patterning layer having high reflectance using photosensitive material A method for patterning a layer having a high reflectance includes directly forming on a layer having a high reflectance a light-absorbing film having a ratio of transmitted light intensity to exposing incident light intensity of not more than 30% and for... | 12/22/1987 |
| 4712910 | Exposure method and apparatus for semiconductor fabrication equipment An apparatus for controlling the exposure for successively exposing or printing the same pattern in the different areas on a photosensitive surface of a photosensitive substrate such as a wafer or a photographic mask. The intensity of the light projected ... | 12/15/1987 |
| 4710029 | Projection type exposing apparatus A projection type exposing apparatus includes a projection objective for projecting the image of a reticle having a predetermined pattern and a plurality of alignment marks onto a wafer, photoelectric alignment means having an imaging optical system for f... | 12/01/1987 |
| 4701859 | Inspecting method and apparatus for a photomask pattern A method and the apparatus for inspecting the unit pattern arrangements on a photomask to determine relative shear between the unit patterns where each unit pattern has the same shape and size and is printed repeatedly at equal intervals on the photomask.... | 10/20/1987 |
| 4701608 | Projection aligner with a sensor for monitoring light quantity A projection aligner wherein light from a light source is passed through a mask so as to focus an image of a pattern of the mask on a wafer, characterized in that at least one sensor for monitoring a luminosity and a distribution thereof is disposed in an... | 10/20/1987 |
| 4690529 | Optical exposer This invention relates to an optical exposer wherein a predetermined pattern is projected onto a work piece through a projector lens, and an alignment mark on the work piece is detected through the projector lens. It is desirable that a detection waveform... | 09/01/1987 |
| 4684315 | Frictionless supporting apparatus A frictionless supporting apparatus comprising a horizontally plane working table having magnet portions on its peripheries. Pairs of stationary magnets define therebetween a vertical space into which the working table is inserted. Magnetic repulsion betw... | 08/04/1987 |
| 4678919 | Electron beam exposure method and apparatus An electron beam exposure system for producing a desired pattern on a workpiece. The pattern is specified by predetermined pattern data. The pattern data is modified with correction data. The correction data is obtained from information indicating variati... | 07/07/1987 |
| 4669885 | Apparatus for inspecting negatives Disclosed is an apparatus for inspecting negatives which is provided with a laser beam generating source, a scanner for scanning the laser beam, a holding device for holding a negative having a pattern formed in a reflective area on a first surface of a t... | 06/02/1987 |
| 4669883 | Method and apparatus for alignment A method and apparatus for aligns two members each having an alignment mark which has mark elements extending in different directions. The marks are scanned with two linear illumination areas which are spaced apart by a predetermined distance and extend i... | 06/02/1987 |
