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Class 257/741 - Of specified material other than unalloyed aluminum


Subclass of Class 257 - Active solid-state devices (e.g., transistors, solid-state diodes)
Definition: Subject matter wherein the contact or lead is made of a
No. of patents: 349
Last issue date: 05/08/2012


1                  
NumberTitleIssue Date
8174121Semiconductor device and manufacturing method thereof
A semiconductor device is provided. The semiconductor device includes a substrate in which a first interlayer insulation layer having a first via hole and a first trench is formed. The semiconductor device also includes a first via plug and a first metal line respec...
05/08/2012
8125082Reduction of silicide formation temperature on SiGe containing substrates
A method that solves the increased nucleation temperature that is exhibited during the formation of cobalt disilicides in the presence of Ge atoms is provided. The reduction in silicide formation temperature is achieved by first providing a structure including a Co ...
02/28/2012
8102049Semiconductor device including through electrode and method of manufacturing the same
The present invention provides a semiconductor device including at least one of an insulating layer and a semiconductor layer each including a hole formed therein, and a through electrode provided in the hole. In the semiconductor device, the side wall of the hole i...
01/24/2012
8084860Liquid crystal display device and manufacturing method therefor
The present invention includes a liquid crystal display device having an oxide film having high adhesiveness to a substrate to thereby prevent oxidation of a wiring material or the like, and includes, an electrode or a terminal electrode having high conductivity, an...
12/27/2011
8076777Glass compositions used in conductors for photovoltaic cells
The invention relates to glass compositions useful in conductive pastes for silicon semiconductor devices and photovoltaic cells. The thick film conductor compositions include one or more electrically functional powders and one or more glass frits dispersed in an or...
12/13/2011
8063489Semiconductor integrated circuit device
In semiconductor integrated circuit devices for vehicle use or the like, in general, an aluminum pad on a semiconductor chip and an external device are coupled to each other by wire bonding or the like using a gold wire and the like for the convenience of mounting. ...
11/22/2011
8049333Transparent conductors comprising metal nanowires
A transparent conductor including a conductive layer coated on a substrate is described. More specifically, the conductive layer comprises a network of nanowires which may be embedded in a matrix. The conductive layer is optically transparent and flexible. It can be...
11/01/2011
8022541Au-Ag based alloy wire for semiconductor package
A gold-silver based wire for a semiconductor package has high humidity reliability as well as high dry reliability. The wire includes a first additive ingredient that contains 5˜15 wt % of at least one kind of elements from among first group elements composed of pa...
09/20/2011
8013444Solder joints with enhanced electromigration resistance
Electronic assemblies and solders used in electronic assemblies are described. One embodiment includes a die and a substrate, with a solder material positioned between the die and the substrate, the solder comprising at least 91 weight percent Sn, 0.4 to 1.0 weight ...
09/06/2011
8008772Semiconductor device, manufacturing method thereof, composite metal body and manufacturing method thereof
A semiconductor device having a structure in which a semiconductor element and a Cu or Ni electrode are connected by way of a bonding layer comprising Cu, and the Cu bonding layer and the Cu or Ni electrode are diffusion-bonded to each other. The bonding layer is fo...
08/30/2011
7948081Carbon nanotube structure, a semiconductor device, a semiconductor package and a manufacturing method of a semiconductor device
A semiconductor device uses a carbon nanotube structure, which reduces an electric resistance and a thermal resistance by increasing a density of the carbon nanotubes. An insulation film covers a first electrically conductive material. A second electrically conducti...
05/24/2011
7884473Method and structure for increased wire bond density in packages for semiconductor chips
A semiconductor package provides an IC chip on at least one package substrate and including signal bond pads, ground bond pads and power bond pads. The package substrate includes signal contact pads, ground contact pads and power contact pads which are respectively ...
02/08/2011
7859108Flip chip package and method for manufacturing the same
A flip chip package includes a substrate and a semiconductor chip. The substrate includes a substrate body, a metal wiring having a terminal part some of which is disposed in the substrate body, a solder resist pattern formed on the substrate body with an opening fo...
12/28/2010
7830008Gold wire for connecting semiconductor chip
Gold wire for connecting a semiconductor chip basically containing praseodymium in 0.0004 mass % to 0.02 mass % in range and, considering the bonding characteristics, containing beryllium or aluminum or both in limited ranges and, considering the precipitates formed...
11/09/2010
7795730Wiring substrate and method of manufacturing thereof, and thin film transistor and method of manufacturing thereof
The invention includes a first step for forming a first conductive layer composed of a high melting point metal to be in contact with an insulating layer; and a second step for forming a second conductive layer by discharging a composition containing a conductive ma...
09/14/2010
7772699Semiconductor device and method of manufacturing the same
A semiconductor device includes an electrode pad formed on a pad forming surface of a semiconductor integrated circuit chip, and a step formed on the pad forming surface to surround the electrode pad. A method of manufacturing the semiconductor device includes formi...
08/10/2010
7719111Nanowire electromechanical device and method of fabricating the same
A nanowire electronmechanical device with an improved structure and a method of fabricating the same prevent burning of two nanowires which are switched due to contact with each other while providing stable on-off switching characteristics. The nanowire electromecha...
05/18/2010
7714438Bistable molecular mechanical devices with a band gap change activated by an electrical field for electronic switching, gating, and memory applications
Molecular systems are provided for electric field activated switches, such as a crossed-wire device or a pair of electrodes to which the molecular system is linked by linking moieties. The crossed-wire device comprises a pair of crossed wires that form a junction wh...
05/11/2010
7696624Nucleation method for atomic layer deposition of cobalt on bare silicon during the formation of a semiconductor device
A method used to form a cobalt metal layer on a silicon surface using an atomic layer deposition (ALD) process comprises a treatment of the silicon surface prior to cobalt formation. Treatment includes serial exposure to one or more cycles comprising a titanium nitr...
04/13/2010
7659624Semiconductor device having a nanoscale conductive structure
A semiconductor device includes a substrate, an insulating layer having an opening, the opening exposing a portion of the substrate, a hydrophobic layer covering substantially only a sidewall and a top surface of the insulating layer, and a nanoscale conductive stru...
02/09/2010
7420227Cu-metalized compound semiconductor device
The present invention is a compound semiconductor device characterized in that it is Cu-metalized to improved the reliability of the device and to greatly reduce the cost of production. ...
09/02/2008
7414313Polymeric conductor donor and transfer method
The present invention relates to a donor laminate for transfer of a conductive layer comprising at least one electronically conductive polymer on to a receiver, wherein the receiver is a component of a device. The present invention also relates to methods pertinent ...
08/19/2008
7411298Source/drain electrodes, thin-film transistor substrates, manufacture methods thereof, and display devices
A source/drain electrode is used in a thin-film transistor substrate containing a substrate, a thin-film transistor semiconductor layer, source/drain electrodes, and a transparent picture electrode. The source/drain electrode includes a nitrogen-containing layer and...
08/12/2008
7411223Compound electrodes for electronic devices
A compound electrode comprises a first layer that comprises at least one halide compound of at least one metal selected from the group consisting of alkali metals and alkaline-earth metals; and a second layer comprising an electrically conducting material. The secon...
08/12/2008
7411259Wiring material and a semiconductor device having a wiring using the material, and the manufacturing method thereof
An object of the present invention is to realize a semiconductor device having a high TFT characteristic. In manufacturing an active matrix display device, electric resistivity of the electrode material is kept low by preventing penetration of oxygen ion into the el...
08/12/2008
7385287Preventing damage to low-k materials during resist stripping
A method of forming a feature in a low-k dielectric layer is provided. A low-k dielectric layer is placed over a substrate. A patterned photoresist mask is placed over the low-k dielectric layer. At least one feature is etched into the low-k dielectric layer. A CO c...
06/10/2008
7382050Semiconductor device and method for producing the same
A semiconductor device includes a tape carrier substrate having a flexible insulating film base, a plurality of conductor wirings provided on the film base, and wiring bumps respectively formed so as to cover an upper surface and both side surfaces of the conductor ...
06/03/2008
7371674Nanostructure-based package interconnect
An embodiment of the present invention is an interconnect technique. A nanostructure bump is formed on a die. The nanostructure bump has a template defining nano-sized openings and metallic nano-wires extending from the nano-sized openings. The die is attached to a ...
05/13/2008
7372152Copper interconnect systems
An integrated circuit (IC) may include a substrate, a first dielectric layer adjacent the substrate, and at least one trench in the first dielectric layer. The IC may also include a metal liner within the at least one trench, and a first conductive region including ...
05/13/2008
7361589Copper interconnect systems which use conductive, metal-based cap layers
An integrated circuit (IC) may include a substrate, a first dielectric layer adjacent the substrate, and at least one trench in the first dielectric layer. The IC may also include a metal liner within the at least one trench, and a first conductive region including ...
04/22/2008
7351655Copper interconnect systems which use conductive, metal-based cap layers
An integrated circuit (IC) may include a substrate, a first dielectric layer adjacent the substrate, and at least one trench in the first dielectric layer. The IC may also include a metal liner within the at least one trench, and a first conductive region including ...
04/01/2008
7332810Integrated circuit device and method of producing the same
An integrated circuit device having vias having good resistance to migration causing the breaking of a wiring line, or an integrated circuit device having a wiring structure that is fined by breaking the limit of lithography technique is provided. The former device ...
02/19/2008
7327031Semiconductor device and method of manufacturing the same
There is provided a solution to the problem of the poor adhesion in the pad portion while inhibiting the dishing in the pad portion. An SiON film, which covers insulating areas and has an opening above Cu pad areas, is formed, and a barrier metal film is formed in t...
02/05/2008
7323218Synthesis of composite nanofibers for applications in lithium batteries
Methods of fabricating one-dimensional composite nanofiber on a template membrane with porous array by chemical or physical process are disclosed. The whole procedures are established under a base concept of “secondary template”. First of all, tubular first nano...
01/29/2008
7321097Electronic component comprising an electrically conductive connection consisting of carbon nanotubes and a method for producing the same
The invention provides in a preferred embodiment an electronic component comprising a first conductive layer, a non-conductive layer and a second conductive layer. A hole is etched through the non-conductive layer. A nanotube, which is provided in said hole, links t...
01/22/2008
7312474Group III nitride based superlattice structures
A light emitting diode is provided having a Group III nitride based superlattice and a Group III nitride based active region on the superlattice. The active region has at least one quantum well structure. The quantum well structure includes a first Group III nitride...
12/25/2007
7309724Thermosetting resin compositions containing maleimide and/or vinyl compounds
In accordance with the present invention, there are provided novel thermosetting resin compositions which do not require solvent to provide a system having suitable viscosity for convenient handling. Invention compositions have the benefit of undergoing rapid cure. ...
12/18/2007
7304383TFT substrate for liquid crystal display apparatus and method of manufacturing the same
There are provided a TFT substrate for an LCD apparatus and a method of manufacturing the same. A substrate (10), a diffusion barrier layer (11) and a copper alloy layer (12) are formed on the TFT substrate, consecutively. The copper alloy inclu...
12/04/2007
7301232Integrated circuit package with carbon nanotube array heat conductor
An integrated circuit package includes a die mounted on a substrate, an integrated heat spreader set above the die, and an array of carbon nanotubes mounted between the die and the integrated heat spreader. The integrated heat spreader is fixed on the substrate, and...
11/27/2007
7291558Copper interconnect wiring and method of forming thereof
Capping layer or layers on a surface of a copper interconnect wiring layer for use in interconnect structures for integrated circuits and methods of forming improved integration interconnection structures for integrated circuits by the application of gas-cluster ion...
11/06/2007
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