Celebrity Inventors
Actor Marlon Brando has four patents, all named "Drumhead tensioning device and method."
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 8039825 | Installation for exposing a cinematographic film from digital images This installation includes: a light source; means for storing film photoresist for exposure and exposed photoresist; a film carrier for positioning said film photoresist at an exposure plane; a projection lens capable of projecting the digital images at the exposure... | 10/18/2011 |
| 8003968 | Lithographic apparatus and substrate edge seal A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate, helping to keep immersion liquid that is present at the top and ... | 08/23/2011 |
| 7795603 | Lithographic apparatus and device manufacturing method A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor... | 09/14/2010 |
| 7667216 | Method of achieving CD linearity control for full-chip CPL manufacturing A method of generating masks for printing a pattern including a plurality of features having varying critical dimensions. The method includes the steps of: (1) obtaining data representing the pattern; (2) defining a plurality of distinct zones based on the critical ... | 02/23/2010 |
| 7566893 | Best focus detection method, exposure method, and exposure apparatus An aerial image of a measurement mark arranged on a measurement mask is conformed to a center in an X-axis direction of a slit arranged on a Z tilt stage. While illuminating the measurement mark with an illumination light, a slit plate on which the slit is formed is... | 07/28/2009 |
| 7482611 | Lithographic apparatus and device manufacturing method A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor... | 01/27/2009 |
| 7459710 | Lithographic apparatus, method for calibrating and device manufacturing method To calibrate a lithographic apparatus having a programmable patterning means, a sensor, such as a CCD, CMOS sensor or photo-diode array, having detector elements larger than the size of a spot corresponding to a single pixel of the programmable patterning means is u... | 12/02/2008 |
| 7459709 | Method of forming optical images, a control circuit for use with this method, apparatus for carrying out said method and process for manufacturing a device using said method An optical image is formed in a radiation-sensitive layer (5), by a number of sub-illuminations, in each of which an array of light valves (21-25) and a corresponding array (40) of converging elements (43) are used to form a patter... | 12/02/2008 |
| 7453078 | Sensor for use in a lithographic apparatus A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fres... | 11/18/2008 |
| 7439531 | Alignment systems and methods for lithographic systems An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determi... | 10/21/2008 |
| 7435984 | Imaging optical system and exposure apparatus An imaging optical system for imaging a pattern of an object plane onto an image plane includes a first imaging optical system for imaging at a first imaging position, the first imaging optical system having a magnification α in a vacuum atmosphere, and a second im... | 10/14/2008 |
| 7420194 | Lithographic apparatus and substrate edge seal A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate, helping to keep immersion liquid that is present at the top and ... | 09/02/2008 |
| 7398733 | Inline measurement and closed loop control method in printing machines Spectral, densitometric, or color measured values are detected on sheet printing materials during the printing process in a sheet-fed printing press. The measured values are determined on sheets as they are moving through the printing press and the measured values a... | 07/15/2008 |
| 7394523 | Exposure apparatus and method of controlling exposure apparatus An exposure apparatus generates an interlock signal to stop an exposure process when defocus is detected in real time. Leveling data for at least one wafer, and a predetermined threshold value are stored in a memory of the exposure apparatus. A value indicative of t... | 07/01/2008 |
| 7382446 | Aberration measuring method Disclosed is a method of measuring aberration of a projection optical system, that includes an illuminating step for illuminating a reticle by use of light from a light source and through an illumination optical system, a projecting step for projecting an image of a... | 06/03/2008 |
| 7379159 | Lithographic apparatus and device manufacturing method A lithographic apparatus and method, in an embodiment for immersion lithography, are disclosed with a single stage in which levelling and exposure are performed simultaneously. ... | 05/27/2008 |
| 7372541 | Lithographic apparatus and device manufacturing method In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.... | 05/13/2008 |
| 7373213 | Management system and apparatus, method therefor, and device manufacturing method A management apparatus which manages a parameter for an industrial device acquires AGA measurement results obtained by operating the industrial device with an operation job parameter value and non-operation job parameter value. An inspection apparatus acquires an â€... | 05/13/2008 |
| 7372478 | Pattern exposure method and pattern exposure apparatus A pattern exposure method and a pattern exposure apparatus in which the throughput is improved with an inexpensive apparatus and without a low running cost. Output faces of a plurality of laser beams emitted from a plurality of semiconductor lasers respectively are ... | 05/13/2008 |
| 7369216 | Lithographic system, method for adapting transmission characteristics of an optical pathway within a lithographic system, semiconductor device, method of manufacturing a reflective element for use in a lithographic system, and reflective element manufactured thereby A lithographic system includes a radiation system configured to provide a beam of radiation; an illumination system configured to condition the beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the pro... | 05/06/2008 |
| 7369214 | Lithographic apparatus and device manufacturing method utilizing a metrology system with sensors A system and method include an object supported on a moveable support, an optical system that transmits radiation onto the object, a support having an aperture therethrough, a sensor system coupled to the support, and a control system coupled to the sensor system an... | 05/06/2008 |
| 7367119 | Method for forming a reinforced tip for a probe storage device Systems and methods in accordance with the present invention can include a tip contactable with a media. In an embodiment, the tip comprises a substantially hollow structure formed of a metal. The tip can be formed by depositing a first metal layer over silicon ther... | 05/06/2008 |
| 7366344 | Edge normal process An edge inspection method for detecting defects on a wafer edge normal surface includes acquiring a set of digital images which captures a circumference of the wafer. An edge of the wafer about the circumference is determined. Each digital image is segmented into a ... | 04/29/2008 |
| 7365827 | Lithographic apparatus and device manufacturing method A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts. ... | 04/29/2008 |
| 7362508 | Projection optical system and method for photolithography and exposure apparatus and method using same Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ... | 04/22/2008 |
| 7359030 | Lithographic apparatus and device manufacturing method A flowcell including a plurality of separate chambers is provided on the substrate table so that a fluid can be brought into contact with exposed areas of the substrate to interact therewith. A series of exposures and chemical processes can thereby be carried out wi... | 04/15/2008 |
| 7359577 | Differential method for layer-to-layer registration A system for precisely measuring layer-to-layer mis-registration is provided. The system includes a new type of mark and a comparison system, which compare the right and left signals from the mark to eliminate non-alignment noise, to enlarge the alignment informatio... | 04/15/2008 |
| 7355674 | Lithographic apparatus, device manufacturing method and computer program product Additional vibrations are added during the exposure of a substrate so that vibrations occurring during exposure of a plurality of areas on the substrate are substantially uniform. This may improve CD uniformity. ... | 04/08/2008 |
| 7355179 | Scene imaging system integrity monitor and method thereof A scene imaging system (SIS) integrity monitor for monitoring the required operation of an imaging sensor of an SIS. The SIS is of a type including: i) an imaging sensor, ii) an imaging system processor, and iii) an imaging system display. The SIS integrity monitor ... | 04/08/2008 |
| 7355157 | Laser beam processing machine employing two beam spots having arcuate portions for forming a substantially rectangular combined spot Disclosed herein is a beam processing machine comprising laser beam application device for applying a laser beam to a workpiece, which device includes a laser beam oscillator and a condenser for converging a laser beam to apply the converged laser beam. The condense... | 04/08/2008 |
| 7351966 | High-resolution optical channel for non-destructive navigation and processing of integrated circuits An optical-fiber based light channel system is included in an ion/electron beam tool for imaging and/or processing integrated circuits. The optical channel system includes an image collection portion, an optical fiber image transmission portion and a detector portio... | 04/01/2008 |
| 7352433 | Lithographic apparatus and device manufacturing method Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of t... | 04/01/2008 |
| 7352435 | Lithographic apparatus and device manufacturing method In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithogr... | 04/01/2008 |
| 7352440 | Substrate placement in immersion lithography A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position o... | 04/01/2008 |
| 7352472 | Lithographic apparatus, device manufacturing method, and method for determining z-displacement The present invention provides an apparatus and method for determining displacement along the z-direction of an object, which is fixed in a holder of an apparatus and is illuminated by a beam of radiation, the beam being provided by the apparatus and having an optic... | 04/01/2008 |
| 7352434 | Lithographic apparatus and device manufacturing method In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedba... | 04/01/2008 |
| 7352475 | Measuring method and apparatus using shearing interferometry, exposure method and apparatus using the same, and device manufacturing method A measuring apparatus for irradiating measuring light and for measuring optical performance of a target optical system includes a barrel for housing the target optical system, the barrel being rotatable around an optical axis of the target optical system, and an ill... | 04/01/2008 |
| 7349105 | Method and apparatus for measuring alignment of layers in photolithographic processes According to a first embodiment of the invention, a first and second reticle are used to form layers using a photolithographic process. The first and second reticles each include a grating positioned so that when the reticles are printed, the two gratings will at le... | 03/25/2008 |
| 7349065 | Exposure apparatus and device fabrication method An exposure apparatus according to one aspect of the present invention includes an illumination optical system for illuminating, in a slit-shaped illumination area, a pattern of a reticle with a light from a light source, a projection optical system for projecting a... | 03/25/2008 |
| 7342570 | Optical mouse and image capture chip thereof An optical mouse and image capture chip thereof. The image capture chip comprises an image sensor, a calculating logic circuit, and a refreshing logic circuit. The image sensor has a plurality of sensor units, capturing an image according to an exposure parameter to... | 03/11/2008 |
