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| Number | Title | Issue Date |
| 7037639 | Methods of manufacturing a lithography template A method for forming imprint lithography templates is described herein. The method includes forming a masking layer and a conductive layer on a substrate surface. The use of a conductive layer allows patterning of the masking layer using electron beam pattern genera... | 05/02/2006 |
| 7038224 | Contact opening metrology A method for process monitoring includes receiving a sample having a first layer that is at least partially conductive and a second layer formed over the first layer, following production of contact openings in the second layer by an etch process, the contact openin... | 05/02/2006 |
| 7038225 | Method and apparatus for electron beam processing of substrates Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes two... | 05/02/2006 |
| 7036980 | Apparatus and method for forming pattern A pattern forming apparatus includes a drawing chamber having a drawing substrate on which an original pattern is drawn, a first temperature control unit having a first temperature regulator to make the temperature of the drawing chamber constant, and a constant-tem... | 05/02/2006 |
| 7038226 | Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method A semiconductor manufacturing factory includes a plurality of semiconductor manufacturing apparatuses including an exposure apparatus for exposing a substrate by using a plurality of charged particle beams, a local area network for connecting the plurality of semico... | 05/02/2006 |
| 7035056 | Piezoelectric actuator and a lithographic apparatus and a device manufacturing method A lithographic projection apparatus comprising at least one of a radiation system and a projection system having at least one of a reflective and a refractive optical member, wherein the optical member is supported by at least one piezoelectric actuator for position... | 04/25/2006 |
| 7033734 | Dipole illumination A system for fabricating patterns on a semiconductor, the system includes a first aperture having two openings aligned in a first axis, a first mask, a second aperture having two openings aligned in a second axis, and a second mask. The system may be implemented wit... | 04/25/2006 |
| 7034297 | Method and system for use in the monitoring of samples with a charged particle beam A method and apparatus for use in monitoring a sample with a charged particle beam are presented. A mechanical displacement between a plane defined by the sample's surface and an optical axis defined by a beam directing arrangement is provided so as to orient the sa... | 04/25/2006 |
| 7034321 | Electron beam exposure apparatus and electron beam measurement module An electron beam exposure apparatus for exposing wafer by using an electron beam includes: an electron beam generator for generating the electron beam; a wafer stage for holding the wafer to be exposed; a current detector, provided on the wafer stage, for detecting ... | 04/25/2006 |
| 7030394 | Charged particle beam apparatus and automatic astigmatism adjustment method According to the invention, techniques for automatically adjusting for astigmatism in a charged particle beam apparatus. Embodiments according to the present invention can provide a charged particle beam apparatus and an automatic astigmatism adjustment methods capa... | 04/18/2006 |
| 7030958 | Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing method An optical attenuator device operates to remove a part of a beam of radiation having a higher than average intensity using at least one optical attenuator element. The device has application in a radiation system, and/or a lithographic apparatus, in particular a sca... | 04/18/2006 |
| 7030964 | Stage system, exposure apparatus, and device manufacturing method A stage system including a first fixed guide having a first guide surface being parallel to a first direction and a second direction being orthogonal to the first direction, a first movable guide to be guided by the first fixed guide and having three freedoms of str... | 04/18/2006 |
| 7026629 | Lithographic apparatus and device manufacturing method A lithographic apparatus includes a first space containing a plasma source and also containing a source gas which may have a high absorption of radiation at the wavelength of the projection beam of the apparatus, this gas being restricted from entering the remainder... | 04/11/2006 |
| 7019312 | Adjustment in a MAPPER system The present invention relates to a lithography system comprising: means for generating a plurality of light beamlets, and an electron source, arranged to be illuminated by said light beamlets, said electron source ... | 03/28/2006 |
| 7020582 | Methods and apparatus for laser marking of integrated circuit faults Systems and methods are provided for marking integrated circuit defects on wafers to facilitate failure analysis. A wafer containing integrated circuits can be tested using a tester. Test data from the tester can be analyzed using integrated circuit design files to ... | 03/28/2006 |
| 7019314 | Systems and methods for ion beam focusing Systems and methods are provided for focusing a scanned ion beam in an ion implanter. A beam focusing system is provided, comprising first and second magnets providing corresponding magnetic fields that cooperatively provide a magnetic focusing field having a time-v... | 03/28/2006 |
| 7015482 | Electron beam writing equipment using plural beams and method An electron beam writing system, using discrete electron beams in which the interval of the beams is larger than the size of the beams, generates plural electron beams, on/off controls each of the electron beams according to pattern data to be written, and deflects ... | 03/21/2006 |
| 7015487 | Apparatus and method for exposing a radiation sensitive layer by means of charged particles as well as a mask for this purpose A projection apparatus for imaging a pattern of a mask onto a substrate by means of a beam of projected charged particles is disclosed. The apparatus includes a radiation sensitive layer. The apparatus also includes a mask. The mask includes a membrane layer made of... | 03/21/2006 |
| 7012266 | MEMS-based two-dimensional e-beam nano lithography device and method for making the same In accordance with the present invention, apparatus for performing electron beam lithography on selected portions of a substrate having a resist covered surface comprises a plurality of nanoscale electron emitters for emitting directional beams of electrons and, for... | 03/14/2006 |
| 7011915 | Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same An exposure parameter obtaining method comprising forming a charged reference pattern and a plurality of charged exposure patterns at a surface region of a to-be-exposed insulation substrate by projecting a charged beam with a first incident energy using a reference... | 03/14/2006 |
| 7012251 | Electron beam apparatus, a pattern evaluation method and a device manufacturing method using the electron beam apparatus or pattern evaluation method Provided is an electron beam apparatus in which an electron beam emitted from an electron gun is separated by a plurality of apertures, images of said apertures are reduced in more than two stages to form multi-beams on a sample surface and to scan said sample there... | 03/14/2006 |
| 7011927 | Electron beam duplication lithography method and apparatus An electron beam duplication lithography apparatus and method for focusing electrons emitted from a mask plate as a result of an application of an electric field between a mask plate and a duplication plate. Irradiation of electrons from the mask plate is assisted t... | 03/14/2006 |
| 7009192 | Charged particle beam application apparatus The present invention enables the same target to be precisely machined and observed in a short time when a focal distance of a charged particle beam is changed or if the focal distances of charged particle beams are not equal on a sample. The present invention provi... | 03/07/2006 |
| 7005658 | Charged particle beam exposure apparatus and method A multi-charged-particle beam drawing apparatus and method that can correct a change in positional relationship, caused by the Coulomb effect, among charged particle beams are provided. The focal lengths of two electron lenses (21, 22) that form a condenser l... | 02/28/2006 |
| 7005659 | Charged particle beam exposure apparatus, charged particle beam exposure method, and device manufacturing method using the same apparatus A charged particle beam exposure apparatus has a beam shaping optical system which forms an image of a charged particle source that emits charged particle beams, an aperture array and electrostatic lens which form a plurality of images of the charged particle source... | 02/28/2006 |
| 7002167 | Charged-particle beam writer A charged-particle beam writer which draws a pattern on a specimen with a charged-particle beam generated from a single particle generator by both of a VSB strategy and a scan-projection strategy, the charged-particle beam writer comprising a data creating unit conf... | 02/21/2006 |
| 7001709 | Method of drawing a pattern on a base material by scanning a beam A method of drawing a pattern on a base material by scanning a beam, comprising: drawing a pattern including ring-shaped zones on a first pattern-drawn field on a base material by scanning a beam on a first pattern-drawn field; shifting at least one of the beam sour... | 02/21/2006 |
| 7003758 | System and method for lithography simulation There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/o... | 02/21/2006 |
| 6998625 | Ion implanter having two-stage deceleration beamline An ion implanter includes an ion source for generating an ion beam, an analyzer for separating unwanted components from the ion beam, a first beam transport device for transporting the ion beam through the analyzer at a first transport energy, a first deceleration s... | 02/14/2006 |
| 6998217 | Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels Systems and methods for gray scale lithography for defining edges such as on microelectronic device patterns during integrated circuit fabrication are disclosed. Methods for critical dimension edge placement and slope enhancement utilize central pixel dose addition ... | 02/14/2006 |
| 6995382 | Arrangement for the generation of intensive short-wave radiation based on a plasma The invention is directed to an arrangement for generating intensive radiation based on a plasma, particularly short-wavelength radiation from soft x-ray radiation to extreme ultraviolet (EUV) radiation. The object of the invention is to find a novel possibility for... | 02/07/2006 |
| 6995830 | Lithographic projection apparatus and device manufacturing method A system and method is used to pattern a substrate. A projection beam received from a radiation system is patterned using an array of individually controllable elements. A portion of the projection beam is directed directly onto one of the individually controllable ... | 02/07/2006 |
| 6991896 | Exposure method An exposure method includes the steps of providing a mask that arranges a contact-hole pattern and a pattern smaller than the contact-hole pattern, and illuminating the mask using plural kinds of light so as to resolve the contact-hole pattern and restrain the small... | 01/31/2006 |
| 6992307 | Electron beam source and electron beam exposure apparatus employing the electron beam source An electron gun is composed of a hemispherical cathode (1) and a second bias electrode (8) having apertures (9, 7, 11) along an optical axis of an electron beam fired from the electron gun, a first bias electrode (6) and an anode (10 | 01/31/2006 |
| 6989546 | Particle multibeam lithography In a particle multibeam lithography apparatus an illumination system (242) having a particle source (203) produces an illuminating beam (205) of electrically charged particles, and a multibeam optical system (208) positioned after the ill... | 01/24/2006 |
| 6987278 | Gas flushing system with recovery system for use in lithographic apparatus In a lithographic apparatus using exposure radiation of a relatively short wavelength, e.g. 157 or 126 nm, a laminar flow of N2 is provided across parts of the beam path in or adjacent to moving components of the apparatus. The laminar flow is faster than... | 01/17/2006 |
| 6987275 | Lithographic apparatus and device manufacturing method A controlled aperture provides an opening through a barrier separating two parts of the apparatus to enable a pulse of radiation to be radiated from one part of the apparatus to the a second part. The controlled aperture closes the opening between the pulses of radi... | 01/17/2006 |
| 6977775 | Method and apparatus for crystallizing semiconductor with laser beams Laser beams emitted by a plurality of laser sources are divided into a plurality of sub-beams, which are irradiated onto selected portions of an amorphous semiconductor on a substrate to crystallize the amorphous semiconductor. A difference in diverging angles betwe... | 12/20/2005 |
| 6977387 | Combined on-axis and off-axis illumination The present invention describes an aperture comprising an opaque plate with a central opening and at least one peripheral opening and a method for combining an on-axis component and at least one off-axis component of illumination light. ... | 12/20/2005 |
| 6977386 | Angular aperture shaped beam system and method The present invention provides improved angular aperture schemes for generating shaped beam spots having a desired geometric shape from rectangular, elliptical, and semi-elliptical apertures having one sharp edge. A sharper beam edge can be generated by offsetting t... | 12/20/2005 |
