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| Number | Title | Issue Date |
| 5523580 | Reticle having a number of subfields A reticle for an electron beam system for direct writing applications has a base layer that contains a reticle pattern; a set of reinforcing struts connected to the base layer separating the base layer into a set of non-contiguous subfields; in which the ... | 06/04/1996 |
| 5500930 | System to decode instructions indicating the addresses of control codes and providing patterns to direct an electron beam exposure apparatus A decoder to decode input data which includes an instruction code. The decoder includes a high-order address generator which uses the instruction code in the generation of the high-order address, and a storage circuit which stores control codes that corre... | 03/19/1996 |
| 5481472 | Method and apparatus for automatically recognizing repeated shapes for data compaction A methodology and apparatus for extracting repeated data from a large body of data for compaction and reproduction by step-and-repeat operations includes extraction of data based on common parameters and a variable parameter. Lists are formed from the ext... | 01/02/1996 |
| 5475618 | Apparatus and method for monitoring and controlling an ion implant device An improved ion implant device is provided having programmable and graphical user interface. The ion implant device can be accessed by a remote computer such as an IBM.RTM.-compatible PC/XT/AT personal computer to allow an operator to access, control and ... | 12/12/1995 |
| 5468969 | Method and apparatus for electron beam lithography Electron beam lithography for exposure of a group of elemental openings in a collective-exposure shaping diaphragm is intended to correct the positional deviation of the group of elemental openings quickly and economically. A rectangular beam is formed by... | 11/21/1995 |
| 5455427 | Lithographic electron-beam exposure apparatus and methods An apparatus for exposing a radiation sensitive workpiece to define patterns therein includes an electron gun, a mask with spaced apertures for passing electron radiation, and a radiation deflector-blanker to direct the radiation to selected ones of the a... | 10/03/1995 |
| 5448075 | Electron-beam exposure system having an improved rate of exposure throughput An electron beam exposure system includes a pattern memory for storing bitmap data of a pattern to be exposed, wherein the pattern memory includes a number of latch elements arranged in rows and columns such that the writing of the bitmap data is achieved... | 09/05/1995 |
| 5448494 | Mask data processing apparatus for integrated circuit production An apparatus for mask data processing in which a design data format of computer aided design for an integrated circuit is transformed into mask data of an actual integrated circuit. The apparatus includes a data transformation unit for transforming a desi... | 09/05/1995 |
| 5438204 | Twin-mask, and method and system for using same to pattern microelectronic substrates A microelectronic substrate patterning system and method uses two or more copies of a mask pattern in the radiation path between the radiation source and the microelectronic substrate. The two or more copies are axially displaced from one another along th... | 08/01/1995 |
| 5430304 | Blanking aperture array type charged particle beam exposure A charged particle beam-exposure method in which a subject is exposed to a pattern via a charged particle beam having an on/off exposure characteristic. A blanking aperture array has n open/close devices which individually/correspond to respective scan po... | 07/04/1995 |
| 5430303 | Exposure apparatus An exposure apparatus comprises a light source emitting light of the ultraviolet region; an illuminating system for introducing the light from the light source into a mask bearing a predetermined pattern; an exposure unit for forming the image of the mask... | 07/04/1995 |
| 5424549 | Scanning systems for high resolution e-beam and X-ray lithography An electron-beam lithography apparatus and method, including an electron source with a mask or photocathode for generating a patterned electron beam; an electron-sensitive resist layer; a conductive plate with a slit, located between the electron source a... | 06/13/1995 |
| 5424550 | Charged particle beam exposure apparatus A charged particle beam exposure apparatus includes an irradiator for irradiating a sample with a charged particle beam, an analog controller for analog controlling the charged particle beam, a digital controller for digital controlling the analog control... | 06/13/1995 |
| 5422491 | Mask and charged particle beam exposure method using the mask A charged particle beam exposure method exposes a desired exposure pattern on a substrate by a charged particle beam of a beam source and a deflection system for deflecting the charged particle beam transmitted through a mask. The method includes providin... | 06/06/1995 |
| 5404018 | Method of and an apparatus for charged particle beam exposure A charged particle beam exposure apparatus employs a main deflector made of electromagnetic coils and a subdeflector made of electrostatic deflection electrodes. An exposure method used for this apparatus is capable of shortening a wait time of the main d... | 04/04/1995 |
| 5404019 | Charged particle exposure system having a capability of checking the shape of a charged particle beam used for exposure A charged particle beam exposure system checks for the shape of the charged particle beam shaped by a mask by causing a scanning of a marker pattern provided on a substrate along a scanning path. The reflected electrons emitted from the substrate are dete... | 04/04/1995 |
| 5403753 | Method of forming implant indicators for implant verification A semiconductor device and method of making same which includes a semiconductor substrate having a moat region with an ion implant in the moat region and a window in the substrate spaced from the moat region, electrically decoupled therefrom and having an... | 04/04/1995 |
| 5399872 | Charged-particle beam exposure method A charged-particle beam exposure method is used for a charged-particle beam exposure apparatus equipped with a blanking aperture array plate in which columns are arranged side by side in a first direction, and each of the columns includes a plurality of b... | 03/21/1995 |
| 5396077 | Electron beam lithography apparatus having electron optics correction system An electron beam apparatus used in a cell projection method has a system for correcting the electron optics. A figured electron beam that has been passed through a cell having a complex figure shape is directed onto a stage on which a substrate is positio... | 03/07/1995 |
| 5393987 | Dose modulation and pixel deflection for raster scan lithography A raster scan lithography system is modified so that the duration of illumination (dose modulation) for particular pixels is varied to lie between the full on and full off normally used. For instance, three levels of pixel intensity are provided, 100%, 70... | 02/28/1995 |
| 5393634 | Continuous phase and amplitude holographic elements A method for producing a phase hologram using e-beam lithography provides n-ary levels of phase and amplitude by first producing an amplitude hologram on a transparent substrate by e-beam exposure of a resist over a film of metal by exposing nࣘm×m spot... | 02/28/1995 |
| 5393988 | Mask and charged particle beam exposure method using the mask A mask is used for exposing a desired pattern on a substrate by a charged particle beam exposure. The mask comprises a plurality of pattern groups each including a plurality of exposure patterns within an approximately rectangular region, and a plurality ... | 02/28/1995 |
| 5391886 | Charged particle beam exposure system and method of exposing a pattern on an object by such a charged particle beam exposure system A method of exposing a pattern on a substrate by a charged particle beam includes the steps of energizing first and second mask deflectors provided at an upstream side of a stencil mask simultaneously to obtain a first relativistic relationship of energiz... | 02/21/1995 |
| 5384466 | Electron beam lithography apparatus and a method thereof The object of the invention is to provide an electron beam lithography apparatus and a method thereof which, while maintaining a predetermined pattern drawing accuracy, enables the pattern drawing speed to be improved still further. An electron beam litho... | 01/24/1995 |
| 5371373 | Electron beam lithography method and apparatus separating repetitive and non-repetitive pattern data Not only for a memory device having a high repeatabitlity but also for a device having a low repeatability, there can be realized an electron beam lithography method which can carry out high speed processing of the device with a less number of lithography... | 12/06/1994 |
| 5369282 | Electron beam exposure method and system for exposing a pattern on a substrate with an improved accuracy and throughput An electron beam exposure process includes a step of producing a plurality of electron beam elements from a single electron beam by shaping and radiating the plurality of electron beam elements on a substrate. The exposure is achieved in a plurality of ti... | 11/29/1994 |
| 5364718 | Method of exposing patttern of semiconductor devices and stencil mask for carrying out same A method is provided for exposing a semiconductor device pattern onto a semiconductor substrate by repeatedly exposing an adjoining arrangement of a plurality of unit patterns. The device pattern is first divided into a plurality of unit patterns. Then, a... | 11/15/1994 |
| 5359202 | Electron beam exposure apparatus employing blanking aperture array An electron beam exposure apparatus is provided with an electron gun emitting an electron beam, a blanking aperture array including a plurality of two-dimensionally arranged blanking apertures for selectively deflecting the electron beam passing through t... | 10/25/1994 |
| 5349197 | Method for exposing a pattern on an object by a charged particle beam A method for exposing a pattern of a semiconductor device on an object comprises the steps of extracting block exposure data from design data the semiconductor device, extracting variable exposure data from the design data, extracting fine exposure data f... | 09/20/1994 |
| 5347134 | Apparatus for repairing defects in emulsion masks by passing laser light through a variable shaped aperture Defective portions, such as black dot defects, in an emulsion layer of an emulsion mask such as a photomask are repaired or removed by irradiating an ultraviolet laser beam from a laser oscillator, preferably an excimer laser. The laser beam is passed thr... | 09/13/1994 |
| 5345085 | Method and structure for electronically measuring beam parameters A method of electronically measuring parameters of an beam in a raster scan system includes the steps of: choosing a predetermined pixel to be calibrated, moving a grid adjacent this pixel, strobing the beam, incrementally moving the beam toward an axis o... | 09/06/1994 |
| 5329130 | Charged particle beam exposure method and apparatus A charged particle beam exposure method is used to draw a pattern on a substrate which is carried on a continuously moving stage by deflecting a charged particle beam. The method includes moving the stage in a direction parallel to an axis of a coordinate... | 07/12/1994 |
| 5315119 | Electron beam irradiating apparatus and electric signal detecting apparatus To prevent electric charge up from being accumulated on the plane scanned by an electron beam and further to improve the S/N ratio, an electron beam irradiating apparatus comprising: position information signal outputting section for outputting position i... | 05/24/1994 |
| 5313068 | Partitioning method for E-beam lithography A method of partitioning design shapes, in an E-beam lithography system, into subshapes such that a constant dose may be applied to an E-beam sensitive resist within each subshape. Within each subshape the constant dose corresponds to an approximation to ... | 05/17/1994 |
| 5309354 | Electron beam exposure method A more efficient method of macro placement and graying for electron beam (e-beam) lithography. The e-beam field is divided into smaller subfields. Repetitious shapes or collections of shapes which are repetitious are represented by macros. Some shapes spa... | 05/03/1994 |
| 5308991 | Method and apparatus for making a predistorted reticle to compensate for lens distortions A method and apparatus for making predistorted masks or reticles which compensate for lens field errors for use in the fabrication of integrated circuit devices. The lens error is first expressed as distortion data. The data is used to produce correction ... | 05/03/1994 |
| 5304811 | Lithography system using charged-particle beam and method of using the same A lithography system and a method of using the same, wherein a charged-particle beam is deflected to pass through a selected block of stencil pattern on a stencil mask and thereafter the beam forms an image of the stencil pattern on an objective, the lith... | 04/19/1994 |
| 5294801 | Extended source e-beam mask imaging system including a light source and a photoemissive source An electron beam imaging system (10) includes a photoemitter plate (12). An optical image beam (15) is directed through a pattern mask (18), which is imaged onto the photoemitter (12). The photoemitter (12) emits electrons from those unmasked regions illu... | 03/15/1994 |
| 5294800 | E-beam control data compaction system and method A system and method for exposing a radiation sensitive layer to one or more repetitious design cells. Each design cell includes at least one design shape on at least one buildlevel. Each shape represents a circuit shape, or part of a circuit shape on an i... | 03/15/1994 |
| 5283440 | Electron beam writing system used in a cell projection method An electron beam writing system is used in variable shaping and cell projection methods to produce LSI and reticles. In the cell projection method, the beam is deflected to define a writing position. In the time it takes to define the writing position, an... | 02/01/1994 |
