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| Number | Title | Issue Date |
| 7786453 | Charged-particle beam pattern writing method and apparatus with a pipeline process to transfer data A charged-particle beam writing apparatus includes first and second storage devices, a transfer processor for sequentially sending to the first storage several design data files per pattern layout-defined region, a first data processor which sequentially reads desig... | 08/31/2010 |
| 7781748 | Particle-beam exposure apparatus with overall-modulation of a patterned beam In a charged-particle exposure apparatus for exposure of a target with a beam of electrically charged particles, the illumination system includes a deflector device adapted to vary the direction of incidence of the illuminating beam upon the pattern definition devic... | 08/24/2010 |
| 7777204 | System and method of electron beam writing A system and method for improved electron beam writing that is capable of taking design intent, equipment capability and design requirements into consideration. The system and method determines an optimal writing pattern based, at least in part, on the received info... | 08/17/2010 |
| 7777205 | Electron beam lithography system An electron beam lithography method is provided for sequentially irradiating an electron beam deflected by a deflector on a shot-by-shot basis to draw a pattern on a surface of a sample mounted on a stage. This method includes the step of irradiating the electron be... | 08/17/2010 |
| 7772574 | Pattern lock system for particle-beam exposure apparatus In a pattern-lock system of particle-beam apparatus wherein the imaging of the pattern is done by means of at least two consecutive projector stages of the projecting system, reference marks are imaged upon registering means to determine the position of the particle... | 08/10/2010 |
| 7759659 | Charged particle beam writing method A writing method includes emitting a first charged particle beam formed to be a first shape by passing through a first shaping aperture and a second shaping aperture, onto a target workpiece; and emitting a second charged particle beam formed to be a second shape by... | 07/20/2010 |
| 7750324 | Charged particle beam lithography apparatus and charged particle beam lithography method A charged particle beam lithography apparatus includes a first block area divider configured to divide a pattern forming area into a plurality of first block areas in order to make a number of shots when forming a pattern substantially equal; an area density calcula... | 07/06/2010 |
| 7741622 | Exposure device The present invention presents an exposure device, which includes an optical source for emitting a UV ray, a lighting system for shaping the UV ray into a collimated light beam, an aperture member for producing rectangular first and second light beams based on the l... | 06/22/2010 |
| 7737420 | Pixelated modulation of illumination pupil image The present invention describes a method of conditioning radiation upstream from a reticle including: pixelating the radiation, the pixelating involving partitioning into pixels; modulating a first set of the pixels to configure for openings; modulating a second set... | 06/15/2010 |
| 7737421 | Electron beam exposure apparatus and method for cleaning the same Provided is an electron beam exposure apparatus for forming a desired pattern on a sample mounted on a wafer stage by exposure with an electron beam generated form an electron gun. The electron beam exposure apparatus includes: supplying device of injecting a reduci... | 06/15/2010 |
| 7732792 | Pattern measurement apparatus Mutual compatibility is established between the measurement with a high magnification and the measurement in a wide region. A pattern measurement apparatus is proposed which adds identification information to each of fragments that constitute a pattern within an ima... | 06/08/2010 |
| 7732791 | Semiconductor testing method and semiconductor tester A semiconductor testing method capable of quickly counting semiconductor cells in which a seemingly horizontal or vertical line is drawn with a mouse, and raster rotation is performed in alignment with the closer axis. After that, the stage is horizontally moved, pa... | 06/08/2010 |
| 7728313 | Maskless lithography system and method using optical signals In a lithographic system, data transmission is carried out by a powerful electro-optical free-beam connection system enabling optical pattern data to be guided from light exit places to light entrance places inside the vacuum chamber by free-space optical beams in o... | 06/01/2010 |
| 7696498 | Electron beam lithography method and apparatus using a dynamically controlled photocathode Embodiments of the invention include an electron beam lithography device using a dynamically controllable photocathode capable of producing a patterned electron beam. One such implementation includes a dynamic pattern generator configurable to produce an electron be... | 04/13/2010 |
| 7696497 | Focusing system and method for a charged particle imaging system Apparatus for focusing a charged particle beam onto a surface, including a charged particle beam generator which is adapted to project the charged particle beam onto a location on the surface, thereby causing charges to be emitted from the location. The apparatus fu... | 04/13/2010 |
| 7692166 | Charged particle beam exposure apparatus An exposure apparatus which draws a pattern on a substrate with a charged particle beam is disclosed. The exposure apparatus includes a detector which detects a charged particle beam, a deflector which deflects the charged particle beam to scan the substrate or the ... | 04/06/2010 |
| 7683352 | Electron beam writing data creating method and electron beam writing data creating apparatus An electron beam writing data creating method for creating writing data used for electron beam lithography includes judging whether a resizing process needs to be performed to a figure cell in device pattern data by cell based design or not, the figure cell includin... | 03/23/2010 |
| 7683351 | Lithographic apparatus and device manufacturing method A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support for a patterning device, a substrate table for a substrate, a projection system, and a control system. The patterning device is capable of imparting the radi... | 03/23/2010 |
| 7652271 | Charged-particle beam lithography with grid matching for correction of beam shot position deviation A charged-particle beam pattern writing apparatus includes an electric field intensity calculator unit which operates to calculate an electric field intensity of another region different from a specified region of a workpiece due to electrical charge to be electrifi... | 01/26/2010 |
| 7646003 | Focusing apparatus and lithography system using the same A focusing apparatus and a lithography system using the same capable of adjusting a uniformity of an electromagnetic field by moving a portion of a magnetic field generator. The focusing apparatus may control a path of an electron beam generated from an electron-bea... | 01/12/2010 |
| 7642532 | Aperture design for improving critical dimension accuracy and electron beam lithography throughput Disclosed is an improved aperture design for improving critical dimension accuracy and electron beam lithography. A pattern may be created on a reticle by passing an electron beam through a first aperture having a first shape comprising an upper horizontal edge, a l... | 01/05/2010 |
| 7635851 | Electron beam apparatus and method of generating an electron beam irradiation pattern High-contrast exposure is performed by use of a small dose of electron beams, a pattern is formed on a wafer with high accuracy, and high-precision inspection is performed. In pattern formation, proximity effect correction processing is performed. Moreover, exposure... | 12/22/2009 |
| 7626185 | Patterning compositions, masks, and methods Electromagnetic radiation sensitive mask materials are provided. The mask materials are chosen such a first percentage of electromagnetic radiation at a first wavelength is transmitted through the mask material prior to the exposure of the mask material to electroma... | 12/01/2009 |
| 7619230 | Charged particle beam writing method and apparatus and readable storage medium A charged particle beam writing method includes inputting pattern data for writing a writing region, predicting a writing time for writing the pattern of the pattern data, acquiring, by using a correlation among a time required from a writing start time, the predict... | 11/17/2009 |
| 7608845 | Charged particle beam writing apparatus and method thereof, and method for resizing dimension variation due to loading effect A charged particle beam writing apparatus includes a first part configured, based on pattern data, to estimate a total writing time, a second part configured to acquire a base dose at an arbitrary time, after writing start time and within the total writing time by u... | 10/27/2009 |
| 7608844 | Charged particle beam drawing apparatus In the present invention, vector data developing unit, ends separating unit, overlap removing unit and bitmapped data generating unit are sequentially connected in order to make pipeline processing. In addition, data of each raster is orderly arranged as a unit so t... | 10/27/2009 |
| 7605383 | Pattern writing apparatus using charged particle beam, and program-recorded readable recording medium A charged particle beam pattern writing apparatus includes an input part for inputting a predetermined command, a check part for checking a state of a predetermined function used for pattern writing using a charged particle beam, based on the predetermined command, ... | 10/20/2009 |
| 7592611 | Creation method and conversion method of charged particle beam writing data, and writing method of charged particle beam A creation method of charged particle beam writing data for writing a pattern using a charged particle beam based on design data of circuits includes creating, based on the design data, a location data file including location data, as part of the writing data, the l... | 09/22/2009 |
| 7592612 | Method and apparatus for surface potential reflection electron mask lithography A method (and structure) for controlling a beam used to generate a pattern on a target surface includes generating a beam of charged particles and directing the beam to a mask surface and causing the beam to be either absorbed by or reflected from the mask surface, ... | 09/22/2009 |
| 7589335 | Charged-particle beam pattern writing method and apparatus and software program for use therein A charged particle beam pattern writing apparatus in accordance with one preferred form of this invention includes an atmospheric pressure measuring unit which measures the value of an atmosphere air pressure, a coordinate value corrector which corrects three-dimens... | 09/15/2009 |
| 7579606 | Method and system for logic design for cell projection particle beam lithography A method for particle beam lithography, such as electron beam (EB) lithography, includes predefining a stencil design having a plurality of cell patterns with information from a cell library, fabricating the stencil design, synthesizing a functional description into... | 08/25/2009 |
| 7573052 | Exposure apparatus, exposure method, and device manufacturing method A pattern image generation device generates a pattern image, and at least a part of the pattern image which has been generated or the pattern image which is generated and is formed on an object is photoelectrically detected by a detection system. Then, a correction ... | 08/11/2009 |
| 7569841 | Deflection signal compensation for charged particle beam Charged particles that are in transit through a deflection system when the beam is repositioned do not received the correct deflection force and are misdirected. By independently applying signals to the multiple stages of a deflection system, the number of misdirect... | 08/04/2009 |
| 7569842 | Method for correcting electron beam exposure data First, electron beam exposure data identifiable for each type of pattern of a semiconductor device is inputted (S601). Then, electron beam exposure data on a first type of pattern is not corrected, while electron beam exposure data on a second type of pattern... | 08/04/2009 |
| 7564049 | Pattern drawing system, electrically charged beam drawing method, photomask manufacturing method, and semiconductor device manufacturing method A pattern drawing system includes a beam irradiating mechanism which irradiates electrically charged beams on a film to be drawn, a coefficient calculating section which calculates a backward scattering coefficient relevant to a drawing pattern in the film to be dra... | 07/21/2009 |
| 7560713 | Correction lens system for a particle beam projection device A correction lens system for a particle beam projection device with at least a first magnetic lens and a second magnetic lens is disclosed. A plurality of correction lens pairs is arranged between the first magnetic lens and second magnetic lens and the particle bea... | 07/14/2009 |
| 7554107 | Writing method and writing apparatus of charged particle beam, positional deviation measuring method, and position measuring apparatus A charged particle beam writing method includes measuring a topography of a backside of a substrate without an influence of a gravity sag, calculating a first positional deviation amount of a pattern written on a frontside of the substrate in a case of the backside ... | 06/30/2009 |
| 7528393 | Charged particle beam processing apparatus A charged particle beam processing apparatus includes a sample chamber to process a substrate including side faces by a charged particle beam, a movable stage in the sample chamber, the stage including a place on which the substrate is to be mounted, a height and po... | 05/05/2009 |
| 7525109 | Method for writing a large-area closed curvilinear pattern with a cartesian electron beam writing system A method for operating a Cartesian-type electron beam (e-beam) lithography (EBL) tool enables the efficient and precise writing of a closed curvilinear pattern, such as a circle, over a wide area of a workpiece. The curvilinear pattern overlies a plurality of contig... | 04/28/2009 |
| 7525110 | Multiple irradiation effect-corrected dose determination technique for charged particle beam lithography A charged-particle beam microlithographic apparatus is generally made up of a pattern writing unit and a system controller. The writer has an electron beam source and a pattern generator for forming a pattern image on a workpiece. The system controller includes a un... | 04/28/2009 |
