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| Number | Title | Issue Date |
| 6924492 | Lithographic apparatus, device manufacturing method, and device manufactured thereby Pre-cleaning or in situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating the optical component with microwave and/or infra-red radiation, preferably infra-red radiation having a wavelength or a range of ... | 08/02/2005 |
| 6919574 | Electron beam exposure apparatus, deflection apparatus, and electron beam exposure method An electron beam exposure apparatus for exposing a wafer by an electron beam incorporates a circuit structure for conducting a scan test to self-diagnose the electrical connections. The electron beam exposure apparatus includes: an electron beam generating section f... | 07/19/2005 |
| 6920368 | Method and device for correcting proximity effects The present invention relates to a method for determining the precompensated pattern of exposure doses of an electron beam required per pattern position to obtain a desired pattern in a coating on a substrate, comprising the steps of: determining a smearing function... | 07/19/2005 |
| 6917048 | Methods and devices for controlling blur resulting from the space-charge effect and geometrical aberration in a charged-particle-beam microlithography apparatus Methods and devices are disclosed for controlling blur resulting from the space-charge effect and geometrical aberration in a charged-particle-beam microlithography apparatus. Based on the pattern-element densities of the exposure units to be transferred to the subs... | 07/12/2005 |
| 6914252 | Charged beam exposure apparatus having blanking aperture and basic figure aperture Two or more-staged masks are prepared for a charged beam generating source. One mask has first aperture sections having rectangular apertures arranged into a lattice form, and electrodes which deflects a beam at respective first aperture sections. The other mask has... | 07/05/2005 |
| 6914441 | Detection of defects in patterned substrates One embodiment of the present invention is a method of detecting defects in a patterned substrate, including: (a) positioning a charged-particle-beam optical column relative to a patterned substrate, the charged-particle-beam optical column having a field of view (F... | 07/05/2005 |
| 6911656 | Rotational stage for high speed, large area scanning in focused beam systems A mechanical scanning stage for high speed image acquisition in a focused beam system. The mechanical scanning stage preferably is a combination of four stages. A first stage provides linear motion. A second stage, above the first stage, provides rotational position... | 06/28/2005 |
| 6911661 | Electron beam exposure apparatus An electron beam exposure apparatus, which exposes patterns on a wafer by an electron beam, includes an electron beam producing unit which produces the electron beam and an electron beam shaping member having a plurality of openings which shape the electron beam. Th... | 06/28/2005 |
| 6912267 | Erosion reduction for EUV laser produced plasma target sources A laser-plasma EUV radiation source (10) that employs one or more approaches for preventing vaporization of material from a nozzle assembly (40) of the source (10) by electrical discharge from the plasma (30). The first approach includes ... | 06/28/2005 |
| 6909490 | Reticle chambers and reticle cassettes providing temperature control and ready exchange of reticles for exposure For use in association with microlithography systems, reticle chambers and reticle cassettes are disclosed that provide ready access to and exchange of reticles for exposure as well as temperature control of the reticles. In an embodiment a vacuum reticle library is... | 06/21/2005 |
| 6909103 | Ion irradiation of a target at very high and very low kinetic ion energies A particle-beam exposure apparatus (1) for irradiating a target (41) by means of a beam (2) of energetic electrically charged particles comprises: an illumination system (101) for generating and forming said particles into a directed beam... | 06/21/2005 |
| 6906305 | System and method for aerial image sensing A system to sense an aerial image produced by optical equipment used in, for example, semiconductor fabrication. In one embodiment, the system includes a photo-electron emission device which, in response to an aerial image projected thereon, emits electrons in a pat... | 06/14/2005 |
| 6906336 | Methods for reducing blur and variation in blur in projected images produced by charged-particle-beam microlithography Exposure methods are disclosed for use in charged-particle-beam microlithography and that yield decreased blur and variation in blur within individual exposure fields (subfields) of a pattern. Blur at a location on the optical axis increases monotonically with incre... | 06/14/2005 |
| 6903353 | Charged particle beam exposure apparatus, device manufacturing method, and charged particle beam applied apparatus A high-precision multi-charged-particle-beam exposure apparatus has a charged particle source (ES) that emits a charged particle beam. An aperture array (AA) having plural apertures divides the charged particle beam from the charged particle source (ES) into plural ... | 06/07/2005 |
| 6903355 | Electron beam exposure apparatus, electron beam method, semiconductor device manufacturing method, mask, and mask manufacturing method An electron beam exposure apparatus for exposing a pattern accurately even if the current of the electron beam is high. The electron beam exposure apparatus 100 includes a mask 30 with a first and second block patterns for shaping the electron beam. Ma... | 06/07/2005 |
| 6903352 | Charged-particle beam exposure apparatus, charged-particle beam exposure method, control data determination method, and device manufacturing method using this method A charged-particle beam exposure apparatus for exposing a member to be exposed to a charged particle beam with a pattern includes memories (902-905) for storing a plurality of control data for controlling reference dose data of the charged particle beam in ac... | 06/07/2005 |
| 6903350 | Ion beam scanning systems and methods for improved ion implantation uniformity Ion implantation systems and scanning systems therefor are provided, in which focus adjustment apparatus is provided to dynamically adjust a focal property of an ion beam to compensate for at least one time varying focal property of a scanner. Methods are provided f... | 06/07/2005 |
| 6903351 | Charged particle beam irradiation equipment having scanning electromagnet power supplies A power supply for applying a voltage to a scanning electromagnet for deflecting a charged particle beam has a first power supply unit having no filter and a second power supply unit having a filter. When an irradiation position of the charged particle beam in an ir... | 06/07/2005 |
| 6903348 | Wafer holding apparatus for ion implanting system An ion implanting system and a wafer holding apparatus therefor are provided. The ion implanting system includes x- and y-axis rotating parts; first and second angle measuring circuits; and a controller. The x-axis rotating part rotates a main surface of a wafer abo... | 06/07/2005 |
| 6903345 | Electron optical system, charged-particle beam exposure apparatus using the same, and device manufacturing method An electron optical system has a plurality of electron lenses. The system includes a first electron optical system array having electrodes with a plurality of rectangular apertures, and a second electron optical system array having electrodes with a plurality of rec... | 06/07/2005 |
| 6900446 | Charged particle beam irradiation equipment and control method thereof A power supply for applying a voltage to a scanning electromagnet for deflecting a charged particle beam has a first power supply unit having no filter and a second power supply unit having a filter. When an irradiation position of the charged particle beam in an ir... | 05/31/2005 |
| 6897454 | Energy beam exposure method and exposure apparatus An exposure method using an energy beam exposure apparatus capable of controlling magnitude relation between blurs of energy beam in first and second directions for exposing a pattern on a sample in the apparatus in a state in which the blur of energy beam in one di... | 05/24/2005 |
| 6897458 | Electron beam exposure system The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target, comprising: a beamlet generator for generating a plurality of electron beamlets; a modulation ar... | 05/24/2005 |
| 6894292 | System and method for maskless lithography using an array of sources and an array of focusing elements A maskless lithography system is disclosed that includes an array of focusing elements, each of which focuses an energy beam from an array of sources into an array of focal spots in order to create a permanent pattern on an adjacent substrate. ... | 05/17/2005 |
| 6894295 | Electron beam proximity exposure apparatus and mask unit therefor In an electron beam proximity exposure apparatus comprising an electron beam source, which emits a collimated electron beam, a mask substrate on which a plurality of masks with apertures are formed, a mask moving mechanism, which moves the mask substrate, and a stag... | 05/17/2005 |
| 6891175 | Exposure apparatus and device manufacturing method using the same A scanning exposure apparatus includes a master stage for scanning a master, a substrate stage for scanning a substrate, a transfer device for supplying/recovering the substrate to/from the substrate stage, a positioning device for relatively positioning the substra... | 05/10/2005 |
| 6888618 | Exposure apparatus and exposure method A scan type exposure apparatus wherein a pattern of an original is lithographically transferred to a substrate sequentially while the original and the substrate are scanningly moved relative to exposure light, the apparatus including a photodetector disposed at a po... | 05/03/2005 |
| 6885012 | Convergent charged particle beam apparatus and inspection method using same A convergent charged particle beam apparatus includes an electron beam system which emits a converged electron beam, a vacuum chamber which is connected to the electron beam system, and a stage which mounts a specimen and moves at least in one direction inside of th... | 04/26/2005 |
| 6881963 | Vibration control of an object An apparatus for controlling motion of an object includes a first actuator for moving the object, an elastic-motion measuring unit for measuring elastic motion of the object, and a control unit for controlling the first actuator based on a result of measurement of t... | 04/19/2005 |
| 6881970 | Charged particle beam irradiation equipment and control method thereof A power supply for applying a voltage to a scanning electromagnet for deflecting a charged particle beam has a first power supply unit having no filter and a second power supply unit having a filter. When an irradiation position of the charged particle beam in an ir... | 04/19/2005 |
| 6881968 | Electron beam exposure apparatus, electron beam exposure method, semiconductor device manufacturing method, and electron beam shape measuring method An electron beam exposure apparatus for exposing a wafer by an electron beam, including: an electron beam generation section for generating the electron beam; an electron beam shaping member with a plurality of openings for shaping the electron beam; a deflecting se... | 04/19/2005 |
| 6872952 | Electron optical system array, method of manufacturing the same, charged-particle beam exposure apparatus, and device manufacturing method This invention relates to an electron optical system array having a plurality of electron lenses. The electron optical system array includes a plurality of electrode structures which are arranged along the paths of a plurality of charged-particle beams and have plur... | 03/29/2005 |
| 6872951 | Electron optical system array, charged-particle beam exposure apparatus using the same, and device manufacturing method An electron optical system array has a plurality of electron lenses, the system array having at least two electrodes structures which respectively have membranes and are arranged along an optical axis, each of the membranes having a plurality of apertures through wh... | 03/29/2005 |
| 6871337 | Illumination optimization for specific mask patterns A method and apparatus for microlithography. The method and apparatus include optimizing illumination modes based on characteristics of a specific mask pattern. The illumination is optimized by determining an appropriate illumination mode based on diffraction orders... | 03/22/2005 |
| 6870172 | Maskless reflection electron beam projection lithography One embodiment disclosed relates to an apparatus for reflection electron beam lithography. An electron source is configured to emit electrons. The electrons are reflected to a target substrate by portions of an electron-opaque patterned structure having a lower volt... | 03/22/2005 |
| 6870171 | Exposure apparatus An electron beam exposure apparatus which exposes a wafer (118) by using a plurality of electron beams corrects the positional error of the electron beams by using multi-deflector arrays (105, 106) capable of independently deflecting the positions of t... | 03/22/2005 |
| 6861657 | Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus An electron beam exposure mask comprises a main mask and one or more compensation masks. The main mask has a plurality of first defined masks. The compensation mask includes one or more non-defective second defined masks each having a pattern configuration to be for... | 03/01/2005 |
| 6861642 | Neutral particle beam processing apparatus A neutral particle beam processing apparatus comprises a workpiece holder (20) for holding a workpiece (X), a plasma generator for generating a plasma in a vacuum chamber (3), an orifice electrode (5) disposed between the workpiece holder (20... | 03/01/2005 |
| 6861187 | Methods and devices for evaluating imaging characteristics of a charged-particle-beam microlithography system Methods and devices are disclosed for evaluating the imaging performance of a charged-particle-beam (CPB) microlithography system. An embodiment of such a device includes a knife-edged pattern region defining multiple knife-edged apertures that are longitudinally ex... | 03/01/2005 |
| 6847433 | Holder, system, and process for improving overlay in lithography A deformable holder, system, and process where long range errors (any of lithography, metrology, or overlay errors) between the image of a mask and an existing pattern on a wafer from a number of potential sources are corrected. The long range errors are determined ... | 01/25/2005 |
