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"I hate what they've done to my child...I would never let my own children watch it. "
Vladimir Zworykin, television pioneer ; Talking about an invention in which he played a critical role.
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| Number | Title | Issue Date |
| 8188447 | Field-by-field laser annealing and feed forward process control A method includes dividing a semiconductor wafer into a plurality of dies areas, generating a map of the semiconductor wafer, scanning each of the plurality of die areas of the semiconductor wafer with a laser, and adjusting a parameter of the laser during the scann... | 05/29/2012 |
| 8183543 | Multi-beam source A multi-beam source for generating a plurality of beamlets of energetic electrically charged particles. The multi-beam source includes an illumination system generating an illuminating beam of charged particles and a beam-forming system being arranged after the illu... | 05/22/2012 |
| 8173977 | Laser irradiation apparatus and laser irradiation method It is an object of the present invention to provide a laser irradiation apparatus and a laser irradiation method that increase energy intensity distribution in a region having low energy intensity distribution in an end region in a major-axis direction of laser ligh... | 05/08/2012 |
| 8168959 | Reticle protection member, reticle carrying device, exposure device and method for carrying reticle A position measurement device 29 measures the position of a position measurement mark 26 formed on the lower surface of a reticle 1, thereby measuring the position of the reticle 1. A position measurement device 30 measures the pos... | 05/01/2012 |
| 8143603 | Electrostatic latent image measuring device An electrostatic latent image measuring device includes a charged particle optical system which irradiates an electron beam and charges a photoconductor sample, an exposure optical system which forms an electrostatic latent image on a surface of the photoconductor s... | 03/27/2012 |
| 8138486 | Lithographic apparatus and device manufacturing method In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap. ... | 03/20/2012 |
| 8134134 | Particle attachment preventing method and substrate processing apparatus In a particle attachment preventing method in a substrate processing apparatus, an electron density control power supplied from the second power supply is adjusted such that an electron density above the substrate gets lower than during a plasma processing, for a pr... | 03/13/2012 |
| 8115183 | Method for maskless particle-beam exposure For maskless irradiating a target with a beam of energetic electrically charged particles using a pattern definition means with a plurality of apertures and imaging the apertures in the pattern definition means onto a target which moves (v) relative to the pattern d... | 02/14/2012 |
| 8089055 | Ion beam processing apparatus An ion-cut machine and method for slicing silicon ingots into thin wafers for solar cell manufacturing is set forth, amongst other embodiments and applications. One embodiment comprises two carousels: first carousel (100) adapted for circulating workpieces ( | 01/03/2012 |
| 8089056 | Projection lens arrangement A charged particle multi-beamlet system for exposing a target using a plurality of beamlets. The system comprises a first plate having a plurality of holes formed in it, with a plurality of electrostatic projection lens systems formed at the location of each hole so... | 01/03/2012 |
| 8076655 | Method of cleaning optical surfaces of an irradiation unit in a two-step process The present invention provides a method of cleaning optical surfaces in an irradiation unit in order to remove contaminations deposited on said optical surfaces. The method includes a cleaning step in which a first gas or gas mixture is brought into contact with sai... | 12/13/2011 |
| 8071963 | Debris mitigation system and lithographic apparatus A debris mitigation system for trapping contaminant material coming from a debris-generating radiation source. The system includes a contamination barrier constructed and arranged to rotate about an axis, and a magnet structure constructed and arranged to provide a ... | 12/06/2011 |
| 8063388 | Ion implantation apparatus, substrate clamping mechanism, and ion implantation method Provided is an ion implantation apparatus including a disk which rotates about a first axis, a pad which is rotatable about a second axis on the disk, and on which a substrate is placed with a holder attached to a circumference of the substrate, the holder including... | 11/22/2011 |
| 8053746 | Irradiation device The present invention relates to an irradiation device for irradiating an irradiation object with heavy charged particles at an irradiation station, comprising a particle accelerator for providing a particle beam and a swivelling device for swivelling the particle b... | 11/08/2011 |
| 8049188 | Method of cleaning a surface region covered with contaminant or undesirable material The present invention relates to a method of cleaning a surface at least partly covered with contaminant or undesired material by applying atomic hydrogen. The invention also proposes an irradiation unit adapted to perform the cleaning method. In the present method ... | 11/01/2011 |
| 8044373 | Lithographic apparatus and device manufacturing method A lithographic apparatus is disclosed having a projection system housing supporting internally one or more lens elements, and a movement damper connected to the projection system housing, the movement damper configured to damp movement of the projection system housi... | 10/25/2011 |
| 8040146 | Inspection apparatus having a heating mechanism for performing sample temperature regulation There are provided an inspection apparatus and method that can locally perform sample temperature regulation, so that the sample drift can be suppressed. There are included a sample stage 109 that holds a semiconductor sample 118, multiple probes 10... | 10/18/2011 |
| 8030624 | Photoluminescent coating for vehicles The present invention provides a method and composition for illuminating a contoured surface, such as a vehicle having a receiving surface extending from a structural member. A method includes providing a heterogeneous mixture including a semiconductor nanocrystal c... | 10/04/2011 |
| 7994487 | Control of particles on semiconductor wafers when implanting boron hydrides A method for reducing particle contamination during implantation of ions comprises providing an implantation system for implanting ions into a workpiece via an ion beam, wherein one or more components are under selective vacuum and have one or more contaminants in a... | 08/09/2011 |
| 7989782 | Apparatus and method for specimen fabrication A specimen fabricating apparatus comprises: a specimen stage, on which a specimen is placed; a charged particle beam optical system to irradiate a charged particle beam on the specimen; an etchant material supplying source to supply an etchant material, which contai... | 08/02/2011 |
| 7989783 | Nanolithography system A nanolithography system comprising a novel optical printing head suitable for high throughput nanolithography. This optical head enables a super-resolution lithographic exposure tool that is otherwise compatible with the optical lithographic process infrastructure.... | 08/02/2011 |
| 7947967 | Method for evaluating a semiconductor substrate A method for evaluating a semiconductor substrate is provided that can evaluate even a thin semiconductor substrate or a substrate with untreated surfaces, can evaluate a large quantity of semiconductor substrates for solar cells in a short time and can be used as i... | 05/24/2011 |
| 7947968 | Processing substrates using direct and recycled radiation Provided are apparatuses for processing a surface of a substrate using direct and recycled radiation reflected from the substrate. The apparatus includes a radiation source positioned to direct a radiation beam toward a beam image forming system that forms a beam im... | 05/24/2011 |
| 7935941 | Semiconductor structure processing using multiple laser beam spots spaced on-axis on non-adjacent structures Methods and systems selectively irradiate structures on or within a semiconductor substrate using a plurality of laser beams. The structures are arranged in a row extending in a generally lengthwise direction. The method generates a first laser beam that propagates ... | 05/03/2011 |
| 7902526 | 3D two-photon lithographic microfabrication system An imaging system is provided that includes a optical pulse generator for providing an optical pulse having a spectral bandwidth and includes monochromatic waves having different wavelengths. A dispersive element receives a second optical pulse associated with the o... | 03/08/2011 |
| 7897942 | Dynamic tracking of wafer motion and distortion during lithography A substrate processing apparatus and method for dynamic tracking of wafer motion and distortion during lithography are disclosed. An energetic beam may be applied to a portion of a substrate according to a predetermined pattern. The relative positions of one or more... | 03/01/2011 |
| 7897940 | Removable liners for charged particle beam systems An apparatus. The apparatus including: a chamber having an interior surface; a pump port for evacuating the chamber; a substrate holder within the chamber; a charged particle beam within the chamber, the charged beam generated by a source and the charged particle be... | 03/01/2011 |
| 7897941 | Lithographic apparatus, device manufacturing method, and use of a radiation collector A lithographic apparatus, comprising a collector being constructed to receive radiation from a radiation source and transmit radiation to an illumination system, wherein the collector is provided with at least one fluid duct, the apparatus including a temperature co... | 03/01/2011 |
| 7897939 | Removable liners for charged particle beam systems A method of improving the performance of charged beam apparatus. The method including: providing the apparatus, the apparatus comprising: a chamber having an interior surface; a pump port for evacuating the chamber; a substrate holder within the chamber; and a charg... | 03/01/2011 |
| 7880152 | Device and method for producing resist profiled elements The invention relates to a device and a method for producing resist profiled elements. According to the invention, an electron beam lithography system is used to produce an electron beam, the axis of the beam being essentially perpendicular to a resist layer in whic... | 02/01/2011 |
| 7875866 | Beam recording apparatus and beam adjustment method An electron beam recording apparatus includes: a displacement detection unit including at least three displacement sensors disposed at each different angle in a radial direction of the turntable; a shape calculation unit for calculating, based on the detected displa... | 01/25/2011 |
| 7875865 | EUV illumination system with a system for measuring fluctuations of the light source The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light sourc... | 01/25/2011 |
| 7875864 | Devices and methods for thermophoretic and electrophoretic reduction of particulate contamination of lithographic reticles and other objects Apparatus and methods are disclosed for reducing particle contamination of a surface of an object such as a reticle used in an EUV lithography system. An exemplary apparatus includes a thermophoresis device and an electrophoresis device. The thermophoresis device is... | 01/25/2011 |
| 7875863 | Illumination system, lithographic apparatus, mirror, method of removing contamination from a mirror and device manufacturing method An EUV illumination system, for example, for use in a photolithographic apparatus is configured to condition a radiation beam. A hydrogen radical source configured to supply gas containing hydrogen or hydrogen radicals into the illumination system. The hydrogen gas ... | 01/25/2011 |
| 7872245 | Systems and methods for target material delivery in a laser produced plasma EUV light source Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to es... | 01/18/2011 |
| 7872246 | Laser annealing method and semiconductor device fabricating method When the second harmonic of a YAG laser is irradiated onto semiconductor films, concentric-circle patterns are observed on some of the semiconductor films. This phenomenon is due to the non-uniformity of the properties of the semiconductor films. If such semiconduct... | 01/18/2011 |
| 7868304 | Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby A method for removal of deposition on a radiation collector of a lithographic apparatus includes providing a gas barrier to an end of a radiation collector, thereby providing a radiation collector enclosure volume; providing a gas to the enclosure volume, the gas se... | 01/11/2011 |
| 7858954 | Apparatus and method for irradiating energy beam An energy beam irradiating apparatus and/or method which, when peeling off an adhesive sheet having an energy radiation curable adhesive and stuck to a wafer, has an ultraviolet ray irradiated to the adhesive sheet, and on an occasion of reducing its adhesive streng... | 12/28/2010 |
| 7847270 | Semiconductor manufacturing apparatus and method thereof According to the present invention, there is provided a semiconductor manufacturing apparatus having: a process flow information creating section which registers an exposure device as a device for performing the pattern writing pro... | 12/07/2010 |
| 7838848 | Patterning device holding apparatus and application thereof A patterning device holding apparatus includes a support platform unit with a plurality of first positioning projections and a gripper unit. The gripper unit includes a head portion and a plurality of second positioning projections disposed on the head portion, and ... | 11/23/2010 |
