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| Number | Title | Issue Date |
| 8110818 | Method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system A method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system prevents particle absorption by grounding the wafer sample and kept electrically neutral during the transfer-in and transfer-out process. ... | 02/07/2012 |
| 7994486 | Substrate scanner apparatus This invention relates to an apparatus for scanning substrates through an ion beam in the process chamber of an ion implanter. The apparatus comprises a substrate carriage and reaction mass carriage movably mounted to a fixed base. The substrate carriage is adapted ... | 08/09/2011 |
| 7956335 | Wafer holding tool for ion implanting apparatus A wafer holding assembly is provided that is capable of preventing the temperature difference generated between a wafer and a holding pin through beam irradiation. In one embodiment, the wafer holding assembly has a plurality of holding pins for holding a waf... | 06/07/2011 |
| 7952081 | Device for determining aim position of charged particle beam, method of using the device, and treatment device employing device for determining aim position A subject is imaged for treatment of the subject such as an eye to be inspected, while irradiating a charged particle beam on the eye, so that an aim position of a charged particle beam for treatment can be determined. The device for determining an aim positi... | 05/31/2011 |
| 7935939 | Radiotherapy apparatus controller and radiation irradiation method A radiotherapy apparatus controller includes: a movement collection section; a sensor control section configured to change a first time interval in which a second sensor measures a position of an irradiation area in the subject, based on the movement information; an... | 05/03/2011 |
| 7928410 | Optical beam pointing system for setting irradiation position for radiation An optical beam pointing system for setting an irradiation position and which is capable of automatically performing positional adjustments of visible light beams with respect to an aiming center. The system uses opposed pointers disposed on opposite sides of an irr... | 04/19/2011 |
| 7928409 | Real-time, active picometer-scale alignment, stabilization, and registration in one or more dimensions A method and apparatus for aligning, stabilizing and registering two or more structures in one or more dimensional space with picometer-scale precision. Low noise laser light is scattered by at least one or more structure or fiducial marks. One mark may be coupled t... | 04/19/2011 |
| 7875861 | Positioning device for positioning a patient and method for operating a positioning device The invention relates to a positioning device for positioning a patient in a medical device comprising a patient receiving device for placing a patient and a robot arm having a plurality of movement axes for positioning the patient receiving device in a room. The po... | 01/25/2011 |
| 7868303 | Method and handling apparatus for placing patterning device on support member for charged particle beam imaging A patterning device handling apparatus for use in charged particle beam imaging is disclosed. The disclosed patterning device handling apparatus comprises a first gripping member and a second gripping member. The first gripping member is equipped with a plurality of... | 01/11/2011 |
| 7820985 | High tilt implant angle performance using in-axis tilt The present invention comprises a method for high tilt angle implantation, with angular precision not previously achievable. An ion beam, having a width and height dimension, is made up of a number of individual beamlets. These beamlets typically display a higher de... | 10/26/2010 |
| 7777201 | Method for maskless particle-beam exposure For maskless irradiating a target with a beam of energetic electrically charged particles using a pattern definition means with a plurality of apertures and imaging the apertures in the pattern definition means onto a target which moves (v) relative to the pattern d... | 08/17/2010 |
| 7767982 | Optical auto focusing system and method for electron beam inspection tool A method and system for inspecting a semiconductor wafer. The method includes providing an illumination flux through a pattern plate and a lens to a surface of a specimen to project a pattern onto the surface of the specimen. The pattern is associated with the patte... | 08/03/2010 |
| 7763865 | Radiotherapeutic apparatus The present invention therefore provides a method of treating the surface of an item for a radiotherapy apparatus, comprising the steps of machining into a planar reflective surface of the item a stepped profile, each step having a first surface angled to the planar... | 07/27/2010 |
| 7723702 | E-beam lithography system for synchronously irradiating a plurality of photomasks and method of fabricating photomasks using the same Disclosed is an E-beam lithography system for synchronously irradiating surfaces of a plurality of substrates. The E-beam lithography system may include a loading unit loading and unloading substrates, an alignment chamber aligning the substrates, a transfer chamber... | 05/25/2010 |
| 7714304 | Computed tomography measuring arrangement and method A computer tomography measuring device includes a radiation source for generating invasive radiation, in particular X-rays, and a rotating device which is embodied and arranged in such a way that it enables a measurement object to be rotatable about an axis of rotat... | 05/11/2010 |
| 7692162 | Imaging of two-dimensional arrays Images of two-dimensional chromatograms or other sample arrays are formed on a scanning instrument that utilizes a line of illumination light that sweeps the length of the array either by moving across the array or by the array moving relative to the light, in eithe... | 04/06/2010 |
| 7679069 | Method and system for optimizing alignment performance in a fleet of exposure tools A method for optimizing alignment performance in a fleet of exposure systems involves characterizing each exposure system in a fleet of exposure systems to generate a set of distinctive distortion profiles associated with each exposure system. The set of distinctive... | 03/16/2010 |
| 7652269 | Laser atom probe methods A laser atom probe (100) situates a counter electrode between a specimen mount and a detector (106), and provides a laser (116) having its beam (122) aligned to illuminate the specimen (104) through the aperture (110) of the... | 01/26/2010 |
| 7642526 | Direction correcting apparatus, method thereof and movable radiation inspecting system The present invention discloses direction correcting apparatus and method thereof for a movable radiation inspecting system having a moving device. The direction correcting apparatus comprises: a direction detecting device for detecting a moving direction of the mov... | 01/05/2010 |
| 7638779 | Medical radiotherapy assembly The invention relates to a radiotherapy assembly comprising a particle emitter (2) with an exit window (4) for a fixed particle stream (6) and a patient support device (16) comprising a patient couch (18A, 18B), which can be... | 12/29/2009 |
| 7605381 | Charged particle beam alignment method and charged particle beam apparatus An object of the present invention is to provide a charged particle beam apparatus and an alignment method of the charged particle beam apparatus, which make it possible to align an optical axis of a charged particle beam easily even when a state of the charged part... | 10/20/2009 |
| 7573049 | Wafer alignment method for dual beam system A gradient charged particle beam apparatus capable of moving highly accurately to a specific position by eliminating influences of warp inside a wafer surface is provided. A portion 46 having a mark 47 for aligning visual field alignment positioned in ... | 08/11/2009 |
| 7569840 | Alignment method of a laser beam processing machine An alignment method of a laser beam processing machine comprising a chuck table, a laser beam application means having a condenser for applying a laser beam to the workpiece held on the chuck table, an image pick-up means for picking up an image of the workpiece hel... | 08/04/2009 |
| 7541600 | Lithographic and measurement techniques using the optical properties of biaxial crystals A method and apparatus for accurately retrieving the position of an optical feature. The method uses the optical properties of biaxial crystals to conically refract the optical feature and transform the image of the optical feature to a circular ring structure. The ... | 06/02/2009 |
| 7511286 | Image-based flat panel alignment Some embodiments include determination of a first misalignment between an imaging device and an axis of a radiation beam emitted from a treatment head, determination of a rotational misalignment between the imaging device and the treatment head within a plane normal... | 03/31/2009 |
| 7488956 | Support and positioning system for miniature radioactive sources by aerodynamic levitation and application to a device for continuous characterisation of prostate implants The invention relates to a support and positioning system for at least one miniaturized element in the form of a cylinder. The system comprises a tube comprising an upper part, a median part and a lower part, the upper part being provided with an orifice into which ... | 02/10/2009 |
| 7479644 | Ion beam diagnostics This invention relates to a method of measuring a property of an ion beam, for example an ion beam current profile or the emittance of an ion beam. A Faraday array comprising an array of ion beam current sensors is employed. The array can provide an ion beam current... | 01/20/2009 |
| 7459699 | Method of determining processing position in charged particle beam apparatus, and infrared microscope used in the method A laser mark which will be the positioning mark for a secondary charged particle image in the charged particle beam apparatus is applied by moving the sample processing/observation area in the charged particle beam apparatus so as to come into the view field while p... | 12/02/2008 |
| 7456414 | Beam re-registration system and method A beam re-registration system and method for error correction of a particle or other beam are disclosed. The beam re-registration system and method may include a particle or other beam, a stage movable in relation to the particle beam, at least two servos for contro... | 11/25/2008 |
| 7442946 | Nonuniform ion implantation apparatus and method using a wide beam A nonuniform ion implantation apparatus comprises a wide ion beam generator for generating a wide ion beam including a plurality of wide ion beams irradiated on at least two sections among a plurality of sections into which a wafer is divided, and a wafer drive unit... | 10/28/2008 |
| 7439527 | Ion beam irradiation apparatus Three axes that are orthogonal to each other at one point are taken as an X-axis, a Y-axis and a Z-axis. An irradiation angle setting motor holds a holder, and sets an irradiation angle θ of an ion beam by rotating this holder around a center axis that is parallel ... | 10/21/2008 |
| 7439505 | Scanning electron microscope An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high precision at high speed. To accomplish the above object, the present inventi... | 10/21/2008 |
| 7439525 | Demagnification measurement method for charged particle beam exposure apparatus, stage phase measurement method for charged particle beam exposure apparatus, control method for charged particle beam exposure apparatus, and charged particle beam exposure apparatus A method for measuring a demagnification of a charged particle beam exposure apparatus includes measuring a first stage position of a mask stage in accordance with a mask stage coordinate system, irradiating a first charged particle beam to a first irradiation posit... | 10/21/2008 |
| 7435959 | Microstructured pattern inspection method The edges of the reticle are detected with respect to the microstructured patterns exposed by the stepper, and the shapes of the microstructured patterns at the surface and at the bottom of the photoresist are detected. The microstructured patterns are evaluated by ... | 10/14/2008 |
| 7432515 | Charged particle beam lithography apparatus and method A charged particle beam lithography apparatus includes a charged particle beam generation source; a charged particle beam forming portion through which the charged particle beam is transmitted; a first deflector arranged between the charged particle beam forming por... | 10/07/2008 |
| 7429733 | Method and sample for radiation microscopy including a particle beam channel formed in the sample source A method and sample for radiation microscopy include a sample source that includes an area of interest, an outer side of a sample formed in the sample source adjacent to the area of interest, an inner side of the sample formed inside the sample source wherein at lea... | 09/30/2008 |
| 7425713 | Synchronous raster scanning lithographic system A multi-beam synchronous raster scanning lithography system includes a processor that generates electrical signals representing a desired exposure pattern at an output. A multi-beam source of exposing radiation generates a plurality of exposure beam. A beam modulato... | 09/16/2008 |
| 7423266 | Sample height regulating method, sample observing method, sample processing method and charged particle beam apparatus In a sample height regulating method, an area including the observation point on the sample is scan-irradiated with a first charged particle beam to obtain a first secondary electron image including the observation point. An area including the observation point on t... | 09/09/2008 |
| 7423274 | Electron beam writing system and electron beam writing method An electron beam writing technology which enables highly accurate deflection correction of a minute field used in an electron beam writing system is provided. In this system, a function to move an electron beam by a deflection means through high-speed deflection sca... | 09/09/2008 |
| 7417234 | Spatial-phase locking of energy beams for determining two-dimensional location and beam shape A method or system of spatial-phase locking a beam used in maskless lithography provides a fiducial grid with a single spatial-period, the fiducial grid being rotated at an angle with respect to a direction of scanning the beam; detects a signal generated in respons... | 08/26/2008 |
