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| Number | Title | Issue Date |
| 8164072 | Device and method for preparing specimens A method and a device for preparing specimens for a cryo-electron microscope are described. A carrier is fixed to a holder, sample liquid is applied to the carrier, and a blotting device for removing excess sample liquid from the carrier by means of the absorbing me... | 04/24/2012 |
| 8071961 | Charged particle beam apparatus A sample measuring method and a charged particle beam apparatus are provided which remove contaminants, that have adhered to a sample in a sample chamber of an electron microscope, to eliminate adverse effects on the subsequent manufacturing processes. To achieve th... | 12/06/2011 |
| 7777197 | Vacuum reaction chamber with x-lamp heater Methods and apparatus for electron beam treatment of a substrate are provided. An electron beam apparatus that includes a vacuum chamber, at least one thermocouple assembly in communication with the vacuum chamber, a heating device in communication with the vacuum c... | 08/17/2010 |
| 7772568 | Micro sample heating probe and method of producing the same, and analyzer using the micro sample heating probe An object of the present invention is to extract a micro foreign body of a few μm, which may cause a product defect of a device or the like, and to subject the foreign body to a mass analysis at a favorable S/N ratio without any contamination. A micro sample heatin... | 08/10/2010 |
| 7700927 | Heating stage for a micro-sample The present invention achieves a heating stage for a micro-sample, capable of efficient heating and accurate observation of the micro-sample. A micro-sample mount is a heating portion in coil form and is fixed at both ends to a base for the heating stage for the mic... | 04/20/2010 |
| 7518125 | Processing apparatus using focused charged particle beam A processing apparatus uses a focused charged particle beam to process a micro sample that is supported on a micro mount part. The micro mount part is supported on a micro sample stage and locally cooled by a cooling unit. The micro mount part is thermally independe... | 04/14/2009 |
| 7485874 | Apparatus for manufacturing semiconductor substrates This apparatus for manufacturing semiconductor substrates has support disks and holding units holding semiconductor substrates on the support disks. The holding unit has a stopper which is formed of a conductive material and holds the brim of the semiconductor subst... | 02/03/2009 |
| 7427755 | Integrated electron beam tip and sample heating device for a scanning tunneling microscope An electron beam heating device with the temperature up to 2200 K is provided for heating a sample and a tip for a scanning tunneling microscope (STM). The electron beam heating device includes a base stage for mating respectively with an electron beam sample heatin... | 09/23/2008 |
| 7420184 | Particle-optical apparatus with temperature switch The invention relates to a thermal switch for particle-optical apparatus. In, for example, a cryo-TEM (transmission electron microscope), a sample 34 that is placed at an extremity 20 of a sample holder 7 can be maintained at, for example, the t... | 09/02/2008 |
| 7414250 | Cryogenic variable temperature vacuum scanning tunneling microscope A cryogenic variable temperature scanning tunneling microscope of novel design and component configuration, for use in conjunction with a variety of low temperature methodologies. ... | 08/19/2008 |
| 7361915 | Beam current stabilization utilizing gas feed control loop One or more aspects of the present invention pertain to stabilizing the current or density of an ion beam within an ion implantation system by selectively adjusting a lone parameter of feed gas flow. Adjusting the gas flow does not necessitate adjustments to other o... | 04/22/2008 |
| 7328628 | Apparatus and methods for sample preparation The invention, in various embodiments, provides systems, methods and devices relating to processing a sample. A vessel is described for containing a sample. The vessel includes a reversibly sealable chamber for containing the sample which has a flexible portion to a... | 02/12/2008 |
| 7330583 | Integrated visual imaging and electronic sensing inspection systems Integrated inspection and test systems for liquid crystal display (LCD) active plates. The integrated inspection and test systems may combine visual imaging inspection and an electronic sensing such as voltage imaging, electron beam sensing or charge sensing, in whi... | 02/12/2008 |
| 7325404 | Exposure apparatus An exposure apparatus includes an optical system for guiding light to an object, a holding member for holding the object, a first refrigerator located near a holding side of the holding member without contacting the holding side, and a second refrigerator located ne... | 02/05/2008 |
| 7304313 | Low-pressure chamber for scanning electron microscopy in a wet environment A specimen enclosure assembly (100) for use in an electron microscope and including a rigid specimen enclosure dish (102) having an aperture (122) and defining an enclosed specimen placement volume (125), an electron beam permeable, fluid... | 12/04/2007 |
| 7304302 | Systems configured to reduce distortion of a resist during a metrology process and systems and methods for reducing alteration of a specimen during analysis Various systems configured to reduce distortion of a resist during a metrology process are provided. The systems include an electron beam metrology tool configured to measure one or more characteristics of one or more resist features formed on a specimen. The electr... | 12/04/2007 |
| 7291847 | Specimen tip and tip holder assembly A specimen tip holder assembly for mounting a specimen tip in a transmission electron microscope (TEM) is described. The specimen tip holder assembly comprises a tip holder for supporting a specimen tip. The tip holder is coupled to an elongate support for movement ... | 11/06/2007 |
| 7276709 | System and method for electron-beam lithography To achieve high-resolution lithography, the temperature of a sample is controlled with heater wires during electron-beam lithography, the adverse effect of a magnetic field induced by the heater current is suppressed. Namely, heater wires are used to control the tem... | 10/02/2007 |
| 7247864 | Charged particle beam apparatus A sample measuring method and a charged particle beam apparatus are provided which remove contaminants, that have adhered to a sample in a sample chamber of an electron microscope, to eliminate adverse effects on the subsequent manufacturing processes. To achieve th... | 07/24/2007 |
| 7242020 | Real-time monitoring of particles in semiconductor vacuum environment An apparatus includes semiconductor processing equipment. A particle detecting integrated circuit is positioned in a vacuum environment, the particle detecting integrated circuit containing a device having a pair of conductive lines exposed to the vacuum environment... | 07/10/2007 |
| 7240497 | Cryostat having a heating plate A cryostat (1) having a sealable housing (2) is described, the housing (2) enclosing a coolable cryostat chamber (3). For cooling the cryostat chamber (3), a refrigeration device (4), a control system (5) and a power ... | 07/10/2007 |
| 7238953 | Specimen holder for an electron microscope and method for reducing thermal drift in a microscope A specimen holder for an electron microscope, comprising a rod-shaped part, which is provided near one end with a tip, which tip is arranged to receive a specimen, the rod-shaped part, in use, extending with at least the tip into the electron microscope, held by cla... | 07/03/2007 |
| 7233438 | Specimen temperature adjusting apparatus A specimen temperature adjusting apparatus includes a specimen stage that the observation specimen is to be placed on and a temperature adjustment element that is attached to the specimen stage. The specimen stage has a groove surrounding a portion where the observa... | 06/19/2007 |
| 7223990 | Ion beam irradiation device Disclosed is an ion beam irradiation device including a holder supporting a substrate; and an ion beam source that is a predetermined distance from the substrate and inclined to be substantially parallel with the substrate and that irradiates the substrate with an i... | 05/29/2007 |
| 7214549 | Correcting device, exposure apparatus, device production method, and device produced by the device production method A correcting device that properly maintains the flatness of a mask, an exposure apparatus in which overlay accuracy is increased by making use of the correcting device, and a device production method. The correcting device includes a gas flow path including a first ... | 05/08/2007 |
| 7211806 | Particle beam apparatus A particle beam apparatus has a cooled anti-contaminator (18) and/or a cooled specimen holder (17). A thermal conductor (19) is provided for providing a connection between the anti-contaminator (18) and/or the specimen holder (17),... | 05/01/2007 |
| 7205237 | Apparatus and method for selected site backside unlayering of si, GaAs, GaAlAsof SOI technologies for scanning probe microscopy and atomic force probing characterization Apparatus for exposure and probing of features in a semiconductor workpiece includes a hollow concentrator for covering a portion of the workpiece connected by a gas conduit to a supply of etchant gas. A stage supports and positions the semiconductor workpiece. Cont... | 04/17/2007 |
| 7196768 | Lithographic apparatus and device manufacturing method A lithographic apparatus includes a substrate support that is constructed to support a substrate, and a projection system that is configured to project a patterned radiation beam onto a target portion of the substrate. The substrate support is arranged to move the s... | 03/27/2007 |
| 7196769 | Exposure apparatus and device manufacturing method An exposure apparatus for projecting a pattern of an original onto a substrate using exposure light includes a projection optical system to project the pattern onto the substrate; a shielding structure, having an opening through which the exposure light passes, to s... | 03/27/2007 |
| 7182794 | Correcting device, exposure apparatus, device production method, and device produced by the device production method A correcting device that properly maintains the flatness of a mask, an exposure apparatus in which overlay accuracy is increased by making use of the correcting device, and a device production method. The correcting device includes a gas flow path including a first ... | 02/27/2007 |
| 7183548 | Apparatus for modifying and measuring diamond and other workpiece surfaces with nanoscale precision Apparatus and techniques are provided for modifying and measuring surfaces of diamond workpieces and other workpieces with nanoscale precision. The apparatus and techniques exploit scanning probe microscopy (SPM) and atomic force microscopy (AFM) at a wide range of ... | 02/27/2007 |
| 7177007 | Temperature adjustment apparatus, exposure apparatus having the temperature adjustment apparatus, and semiconductor device manufacturing method An exposure apparatus including an illumination optical unit for irradiating exposure light, a stage for mounting a substrate and moving the substrate, a driving unit for driving the stage, a heater for applying heat to the stage, and a heat generation amount contro... | 02/13/2007 |
| 7153388 | Chamber for high-pressure wafer processing and method for making the same Broadly speaking, a wafer processing chamber for performing a high pressure wafer process is provided. More specifically, the wafer processing chamber incorporates a wafer processing volume and an outer chamber volume. The wafer processing volume is configured to co... | 12/26/2006 |
| 7151269 | Sample inspection apparatus A sample inspection apparatus comprises a sample support; a detection system for detecting radiation emitted by or transmitted through a sample on the sample support in response to radiation incident on the sample; and a cooling system for cooling at least one of th... | 12/19/2006 |
| 7138282 | Correcting device, exposure apparatus, device production method, and device produced by the device production method A correcting device that properly maintains the flatness of a mask, an exposure apparatus in which overlay accuracy is increased by making use of the correcting device, and a device production method. The correcting device includes a gas flow path including a first ... | 11/21/2006 |
| 7123343 | Exposure apparatus and device manufacturing method An exposure apparatus which projects and transfers a pattern formed on a mask to a substrate using exposure light includes a stage, an optical system, and a gas stream forming mechanism which forms a stream of inert gas in an optical path space including a space whi... | 10/17/2006 |
| 7106413 | Cooling mechanism A cooling mechanism for cooling an optical element disposed in a vacuum atmosphere includes a support part for supporting the optical element, which has a channel having an inlet, into which gas is supplied, and an outlet, from which the gas is exhausted, and a deco... | 09/12/2006 |
| 7106416 | Lithographic apparatus and device manufacturing method A lithographic apparatus including an illumination system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serving to impart the beam with a pattern in its cross-section. The apparatus also having a ... | 09/12/2006 |
| 7105836 | Method and apparatus for cooling a reticle during lithographic exposure Systems and methods eliminate vibrations produced by coolant fluid flowing through a short stroke stage and prevent change in thermally-induced distortion of the short stroke stage by maintaining the temperature and temperature distribution within the short stroke s... | 09/12/2006 |
| 7104666 | Cooling chamber and system of a cooling chamber with a microtome A cooling chamber 10 for a microtome 1 is disclosed. A knife 2 having a cutting edge 16 is arranged in the cooling chamber 10 opposite a sample holder 4 having a sample 4a retained therein. The microtome 1 | 09/12/2006 |
