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| Number | Title | Issue Date |
| 4149084 | Apparatus for maintaining ion bombardment beam under improved vacuum condition In an apparatus for bombarding a target with a beam of ions, an expedient is provided for maintaining the beam line and target under vacuum of 2×10-4 Torr. or lower pressures. The apparatus includes a mass separator, e.g., analyzing magnet ada... | 04/10/1979 |
| 4149085 | Automatic overlay measurements using an electronic beam system as a measurement tool A method and apparatus is described for performing automatic overlay measurements on wafers utilized in semiconductor manufacturing. The overlay measurements are made at selected sites on a given wafer where a single bar pattern has been overlaid over a d... | 04/10/1979 |
| 4143468 | Inert atmosphere chamber An inert gas chamber for use in continuously curing oxygen sensitive coating compositions by the application of radiation, employs a jet of inert gas to displace the air boundary layer on the coated substrate as the coated substrate moves into the chamber... | 03/13/1979 |
| 4140913 | Charged-particle beam optical apparatus for the reduction imaging of a mask on a specimen A charged-particle beam optical apparatus for the reduction imaging of a mask on a specimen to be examined. The apparatus comprises a beam source for illuminating the mask, a condenser lens system comprising a plurality of lenses generating a ray bundle w... | 02/20/1979 |
| 4136285 | Method for irradiating a specimen by corpuscular-beam radiation A method for irradiating a specimen by corpuscular-beam radiation in which an irradiated surface pattern including isolated areas unexposed to the corpuscular beam surrounded at least almost completely by areas exposed to the beam is generated on a specim... | 01/23/1979 |
| 4135097 | Ion implantation apparatus for controlling the surface potential of a target surface In an ion beam apparatus a structure for controlling the surface potential of the target comprising an electron source adjacent to the beam for providing electrons to the beam and means between the target and source for inhibiting rectilinear radiations, ... | 01/16/1979 |
| 4134017 | Radiation device using a beam of charged particles A beam of charged particles is guided along a path including a looped section between two rectilinear stretches, each of these stretches being provided with focusing and centering means. A holder insertable into the outgoing stretch, ahead of a collimator... | 01/09/1979 |
| 4130761 | Electron beam exposure apparatus An electron beam exposure apparatus is provided with a blanking section to which electron beams emitted from an electron gun whose directions are paralleled through condenser lens are projected. The blanking section includes a slit plate with a plurality ... | 12/19/1978 |
| 4128764 | Collective field accelerator A collective field accelerator which operates with a vacuum diode and utilizes a grooved cathode and a dielectric anode that operates with a relativistic electron beam with a .nu./γ of ~ 1, and a plurality of dielectric lenses having an axial magnetic fi... | 12/05/1978 |
| 4128765 | Ion beam machining techniques and apparatus Method for producing specimens suitable for examination by electron microscopy techniques in accordance with which at least one ion beam from an ion source is directed onto a specimen while effecting relative rotation between the ion source(s) and the spe... | 12/05/1978 |
| 4122346 | Optical devices for computed transaxial tomography Various optical devices for use with circular-scanning techniques in computed transaxial tomography are disclosed. In essence such devices produce a rotating dipole field so as simultaneously to provide a circular scan and to focus the charged particle be... | 10/24/1978 |
| 4119854 | Electron beam exposure system A reference mark, common to both an electron beam and a workpiece, is arranged above and away from, but in the vicinity of, the workpiece exposure area. The position of the workpiece with respect to the reference mark is ascertained by an optical measurin... | 10/10/1978 |
| 4119857 | System for programmed drawing by particle bombardment A system capable of automatically producing drawings on a very small scale, comprises an electron optical system which forms a highly reduced elemental image from a diaphragm. A scanning system enables this image to be displaced line-by-line in a first di... | 10/10/1978 |
| 4118630 | Ion implantation apparatus with a cooled structure controlling the surface potential of a target surface In an ion beam apparatus a structure for controlling the surface potential of the target comprising an electron source adjacent to the beam for providing electrons to the beam and means between the target and source for inhibiting rectilinear radiations, ... | 10/03/1978 |
| 4117339 | Double deflection electron beam generator for employment in the fabrication of semiconductor and other devices This disclosure relates to an electron beam generator having a high brightness electron beam source and a focusing lens placed between the source and the target area to provide a large image focal distance relative to the object focal distance. In additio... | 09/26/1978 |
| 4112305 | Method of projecting a beam of charged particles Disclosed is a method of projecting on selected areas of a target a variety of charged particles each having a different shape of cross-section. The charged particle projecting method according to this invention is suitable for production of micro-circuit... | 09/05/1978 |
| 4110623 | Device for scanning a target with a beam of charged particles A device for furnishing a scanning beam intended for irradiating a target, the irradiating dose level having a predetermined distribution on the target. The device comprises a main magnetic system having a plurality of polepieces for scanning the charged ... | 08/29/1978 |
| 4101771 | Ion electron converter The ion-electron converter is primarily intended for the measurement of small positive ion currents. The essential feature of the converter is its curved conversion electrode which generates an electrostatic field with favorable ion-optical properties; in... | 07/18/1978 |
| 4097745 | High resolution matrix lens electron optical system A high resolution matrix lens electron optical system utilizes a relatively short focal length matrix lens, means for providing an axial magnetic field and electrostatic deflection means for both coarse and fine deflection operation in conjunction with th... | 06/27/1978 |
| 4085330 | Focused ion beam mask maker A method of making a pattern for a photolithographic mask. A field ion source is advantageously utilized to produce heavy ions with a high beam current density. The ions are accelerated and directly bombard a metallic coating on the mask substrate to form... | 04/18/1978 |
| 4084095 | Electron beam column generator for the fabrication of semiconductor devices This disclosure relates to an electron beam generator and focusing mechanism including a high current thermionic field emission source to establish a high current electron beam and an electro-magnetic focusing means placed along the axis of the electron b... | 04/11/1978 |
| 4080546 | Beam splitter for electron beam machines A beam splitter for electron beam machines with a beam splitter grid which is to be set crossways to the beam and which has a row of cross-pieces running next to one another with uniform spaces for shading the portions of beam striking it, where the cross... | 03/21/1978 |
| 4075488 | Pattern forming apparatus using quadrupole lenses Disclosed is a pattern forming apparatus using a quadrupole lens system to control the cross section of a beam of electrons or ions to be projected onto a plate-like object. A variety of rectangular beams can be formed by electrically controlling the quad... | 02/21/1978 |
| 4063098 | Beam scanning system A system for deflecting a beam of particles having different momenta, preferably through a 90° angle, so as to cause the beam to impinge upon a moving target and to scan across the target. The system includes a means responsive to a beam from a suitable ... | 12/13/1977 |
| 4063103 | Electron beam exposure apparatus A radiant beam exposure apparatus forms a desired pattern on a workpiece disposed on a carriage movable in both directions X and Y which intersect at a right angle. The distance over which the carriage moves is measured by a laser interferometer. In respo... | 12/13/1977 |
| 4057722 | Method and apparatus for the generation of distortion-free images with electron microscope A specimen to be analyzed under an electron microscope is oriented at an inclined angle relative to a plane normal to the beam. The beam is deflected to form a scanning raster to scan the specimen, and the raster and specimen are each rotated independentl... | 11/08/1977 |
| 4052614 | Photoelectron spectrometer with means for stabilizing sample surface potential An improved X-ray photoelectron spectrometer is disclosed, which includes circuit means to determine the surface potential of a sample, e.g., an insulator. The circuit means comprise an electron gun, whose potential is modulated at a preselected frequency... | 10/04/1977 |
| 4051405 | Method for controlling low-energy high current density electron beams A method and an apparatus for controlling the angle of incidence of low-egy, high current density electron beams are disclosed. The apparatus includes a current generating diode arrangement with a mesh anode for producing a drifting electron beam. An aux... | 09/27/1977 |
| 4051381 | Device for the programmed tracing of designs by particle bombardment The present invention relates to a device designed to automatically trace designs at a very small scale. The device comprises an electron-optical system forming an elementary image of extremely small dimensions, of a diaphragm. A scanning system makes it ... | 09/27/1977 |
| 4037100 | Ultra-sensitive spectrometer for making mass and elemental analyses The present invention comprehends an extremely sensitive apparatus which can be used for the detection of electronegative particles and provide data as to their elemental composition. A mass spectrometer selects negative ions of the required mass coming f... | 07/19/1977 |
| 4021674 | Charged-particle beam optical apparatus for irradiating a specimen in a two-dimensional pattern An improved charged-particle beam optical apparatus for the irradiation of a specimen in a two-dimensional pattern having first areas which are unexposed to the particle beam and are surrounded at least almost entirely by second areas which are exposed to... | 05/03/1977 |
| 4013891 | Method for varying the diameter of a beam of charged particles In the bombardment of targets with beams of charged particles, a method for varying and controlling the diameter of such beams by passing the beam through an envelope of conductive material; the envelope is spaced from and coaxial with the beam. A selecte... | 03/22/1977 |
| 4005408 | Multiple electron beam analog to digital converter A typical embodiment of the invention is a multiple electron beam device converting analog input signals into coded digital output signals. A beam of electrons, generated through a Watkins-Johnson laminar flow sheet beam electron gun is focused before b... | 01/25/1977 |
| 3983401 | Method and apparatus for target support in electron projection systems Apparatus and a corresponding method for supporting a wafer of target material for exposure to a beam or pattern of electrons with little or no distortion of the electric field used to accelerate the electrons from a cathode to the target. In one embodime... | 09/28/1976 |
| 3969670 | Electron beam testing of integrated circuits Disclosed is a technique for testing functional circuit units of an integrated circuit. For each separate functional circuit unit desired to be tested, a capacitor is connected to each input while a diode is connected to each output. An electron beam then... | 07/13/1976 |
| 3956634 | Linear particle accelerator using magnetic mirrors A particle accelerator for obtaining high energy particle beams, comprises an accelerating structure SA, one mirror or two mirrors constituted with magnetic achromatic and stigmatic deviators and a source K of particles located at the entry of ... | 05/11/1976 |
| 3949228 | Method for controlling an electron beam A square-shaped electron beam is stepped from one predetermined position to another in a line-by-line scan to form a desired pattern on each chip of a semiconductor wafer to which the beam is applied. At each of the predetermined positions, the beam is on... | 04/06/1976 |
| 3937957 | Apparatus for determining the energy of charged particles In a device for measuring the energy of charged particles separated from a sample by bombardment with ionizing radiation, which device includes an energy analyzer and an electron lens system disposed between the sample location and the analyzer and includ... | 02/10/1976 |
