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| Number | Title | Issue Date |
| 6472673 | Lithographic method for producing an exposure pattern on a substrate For producing an exposure pattern on a resist material layer on a substrate, a mask having a pattern of transparent structures is illuminated with a beam of energetic radiation and the structure pattern is imaged onto the substrate by means of the structu... | 10/29/2002 |
| 6455863 | Apparatus and method for forming a charged particle beam of arbitrary shape A charged particle beam column for generating a variable shaped (in cross section) charged particle beam. The charged particle beam column includes: a source of a charged particle beam; a first aperture defining a first opening positioned coaxial to the b... | 09/24/2002 |
| 6444990 | Multiple target, multiple energy radioisotope production A multiple target array for receiving particles from a particle beam generator includes a particle beam transport path having a transport inlet and a transport outlet, the inlet receiving a particle beam from the particle beam generator. A kicker magnet i... | 09/03/2002 |
| 6437353 | Particle-optical apparatus and process for the particle-optical production of microstructures The invention relates to a particle-optical apparatus for particle-optical mask projection. According to the invention, an energy filter is used, by which particles which are inelastically scattered in a mask plane are separated from particles which are e... | 08/20/2002 |
| 6437347 | Target locking system for electron beam lithography An e-beam lithographic system capable of in situ registration. The system has an optics section such as a VAIL lens. A controllable stage moves a substrate with respect to the beam axis to place substrate writing fields beneath the beam. A field locking t... | 08/20/2002 |
| 6437351 | Method and apparatus for controlling a workpiece in a vacuum chamber An apparatus used to control a workpiece inside a vacuum chamber. The workpiece is supported on a workpiece holder in the vacuum chamber. The workpiece is isolated from the atmosphere outside of the vacuum chamber by differentially pumped vacuum seals and... | 08/20/2002 |
| 6437352 | Charged particle beam projection lithography with variable beam shaping Flexibility of a charged particle (e.g. electron) beam projection lithography tool is enhanced by filling a shaping aperture with the beam, projecting the image of the shaping aperture to a reticle subfield where the image preferably corresponds in size t... | 08/20/2002 |
| 6433495 | Device for fitting of a target in isotope production A device is disclosed for simple and quick disconnection of a target assembly at a cyclotron accelerator producing an ion beam irradiating the target assembly for PET radioisotope production. The device consists of a target body presenting a target space ... | 08/13/2002 |
| 6433347 | Charged-particle-beam projection-exposure methods and apparatus that selectively expose desired exposure units of a reticle pattern Methods and apparatus are disclosed for performing charged-particle-beam projection exposure of selected exposure units of a pattern, defined by a reticle, without compromising throughput or transfer accuracy. An illumination beam sequentially illuminates... | 08/13/2002 |
| 6429442 | Ion implanter An ion implanter comprises an ion source and a wafer support device having a rotary disk that supports a plurality of wafers thereon and is rotated about its center axis, and capable of being swung alternately in opposite directions. An ion beam emitted b... | 08/06/2002 |
| 6429441 | Charged-particle-beam microlithography apparatus and methods exhibiting variable beam velocity, and device-manufacturing methods using same Charged-particle-beam (CPB) microlithography apparatus and methods are disclosed that produce a beam-decelerating electric field and that achieve controlled reduction of aberrations parasitic to the beam-decelerating electric field. To such end, a represe... | 08/06/2002 |
| 6423968 | Method for structured energy transmission using electron beams Multiple methods are known to process materials or alter their properties using an electron beam. Until now, it was not possible to impinge upon minuscule surface sections (pixel) with a given arrangement on the surface in order to achieve certain effects... | 07/23/2002 |
| 6410924 | Energy filtered focused ion beam column The resolution of a charged particle beam, such as a focused ion beam (FIB), is optimized by providing an energy filter in the ion beam stream. The energy filter permits ions having a desired energy range to pass while dispersing and filtering out any ion... | 06/25/2002 |
| 6410923 | Magnetic lens apparatus for use in high-resolution scanning electron microscopes and lithographic processes Disclosed are lens apparatus in which a beam of charged particles is brought to a focus by means of a magnetic field, the lens being situated behind the target position. In illustrative embodiments, a lens apparatus is employed in a scanning electron micr... | 06/25/2002 |
| 6407399 | Uniformity correction for large area electron source The invention pertains to electron exposure equipment useful for exposing, treating and processing coatings and other materials by a cold cathode gas discharge electron source having a broad uniform emitting area. The apparatus has a vacuum chamber; a lar... | 06/18/2002 |
| 6403969 | Ion implantation system and ion implantation method It is an object of the present invention to heat wafers uniformly at a high temperature at all times regardless of the scanning motion of a rotary disk holding the wafers. A heater housing (11) for heating the wafers is mounted on a swing box (9) for mech... | 06/11/2002 |
| 6403972 | Methods and apparatus for alignment of ion beam systems using beam current sensors An ion beam is sensed with a beam current sensor which has a sensing aperture that is smaller than a cross-sectional dimension of the ion beam at the beam current sensor. The sensed ion beam current is indicative of ion beam position relative to a desired... | 06/11/2002 |
| 6394109 | Method and apparatus for removing carbon contamination in a sub-atmospheric charged particle beam lithography system A cleaning system for use with a charged particle beam lithography system is described. The cleaning system includes an oxidizer source and an oxidizer distribution mechanism that introduces an oxidizer into the imaging chamber of the lithography system. ... | 05/28/2002 |
| 6392243 | Electron beam exposure apparatus and device manufacturing method An electron optical system for controlling an electron beam to write a pattern detects the position of a stage reference mark on a stage using the electron beam, and a wafer stage position detection unit detects the position of the stage. Based on the det... | 05/21/2002 |
| 6388261 | Charged-particle-beam microlithography apparatus and methods exhibiting reduced astigmatisms and linear distortion Apparatus and methods are disclosed for making accurate yet simple corrections of astigmatism that would otherwise degrade edge resolution and astigmatism, and cause linear distortion of, a reticle image. Astigmatism that would otherwise degrade edge reso... | 05/14/2002 |
| 6380545 | Uniform raster pattern generating system A conventional particle generation and magnet configuration are used in combination with a relatively low-power power amplifier, a resonant loop magnet driver system, an amplitude modulator that induces a homogeneous amplitude function proportional to (t)... | 04/30/2002 |
| 6376848 | Apparatus and methods for charged-particle-beam microlithography exhibiting reduced aberrations caused by beam deflection to correct errors in stage-position control Apparatus and methods are disclosed for performing charged-particle-beam (CPB) microlithography in which aberrations arising from increased magnitudes of beam deflection are suppressed by making respective corrections for stage-position control errors. A ... | 04/23/2002 |
| 6376842 | Optical system for charged-particle-beam microlithography apparatus exhibiting reduced third- and fifth-order aberrations Charged-particle-beam (CPB) optical systems are disclosed, especially for use in CPB microlithography apparatus. A typical such system preferably includes first and second projection lenses (preferably in a Symmetric Magnetic Doublet configuration) and an... | 04/23/2002 |
| 6369396 | Calibration target for electron beams A scattering target for use in a particle beam system is formed from a grid of gold on a substrate of carbon, with an intermediate smoothing layer (e.g. copper) on the carbon to provide a surface sufficiently smooth to provide an adequate target. An optio... | 04/09/2002 |
| 6362486 | Magnetic lens for focusing a charged particle beam A magnetic lens focuses a charged particle beam generated by an instrument to a very small spot for deriving characteristics of a sample. A magnetic flux pattern is created which provides improved high resolution. The lens includes a polepiece with an inn... | 03/26/2002 |
| 6350992 | Charged particle beam exposure method and charged particle beam exposure device The basis of the present invention is a charged particle beam exposure method comprising the steps of: (a) generating a plurality of areas within the sub-fields; (b) determining the pattern density within each of the areas, and correcting the pattern dens... | 02/26/2002 |
| 6351483 | Laser optical axis correcting method A method of correcting an optical axis of a laser projecting device is provided. According to this method, a cylindrical tubular member is provided, the tubular member made of a deformable material and having a base section, and a laser generation unit mo... | 02/26/2002 |
| 6337485 | Electron beam exposure apparatus and its control method An electron beam exposure apparatus, which has an electron beam source for generating a plurality of electron beams, a projection electron optical system for projecting images formed by the plurality of electron beams onto an object to be exposed, a defle... | 01/08/2002 |
| 6335532 | Convergent charged particle beam apparatus and inspection method using same A method and apparatus to enable observation of an electron beam image of a specimen surface with an electron beam being always in focus in a convergent charged particle beam apparatus. Using an optical height detection system which does not cause interfe... | 01/01/2002 |
| 6329659 | Correction device for correcting the lens defects in particle-optical apparatus Electron-optical rotationally symmetrical lenses inevitably suffer from spherical and chromatic aberration which often impose a limit on the resolution. These lens defects cannot be eliminated by compensation by means of rotationally symmetrical fields. I... | 12/11/2001 |
| 6326630 | Ion implanter In order to provide an ion implanter which can process the material in high accuracy by preventing charge up of the material, in an ion implanter comprising an ion source for generating an ion beam, a mass separator for separating and emitting only a nece... | 12/04/2001 |
| 6323499 | Electron beam exposure apparatus and method, and device manufacturing method An electron beam exposure apparatus which minimizes the influence of the space charge effect and aberrations of a reduction electron optical system, and simultaneously, increases the exposure area which can be exposed at once, thereby increasing the throu... | 11/27/2001 |
| 6323498 | Charged particle beam irradiation apparatus and irradiation method using the apparatus A charged particle beam irradiation apparatus includes a specimen stage for holding a specimen; a specimen stage drive unit for moving the specimen stage; a detector for detecting the amount of displacement of the moved specimen stage; a charged particle ... | 11/27/2001 |
| 6323500 | Electron-beam exposure system An electron-beam exposure system is constructed using electromagnetic lenses, apertures and an electron-beam mask, which are arranged and aligned in line between an electron source and a substrate. Within a trajectory of an electron beam that is radiated ... | 11/27/2001 |
| 6271531 | Charged beam drawing apparatus and method thereof A wafer with a surface on which a to-be-exposed resist is applied is first placed in a predetermined position. The position of the wafer and an irradiation position of en electron beam to be irradiated for exposing the resist are both aligned. Next, a chi... | 08/07/2001 |
| 6268610 | Charged-particle beam irradiation apparatus, charged-particle beam rotary irradiation system, and charged-particle beam irradiation method A charged-particle beam irradiation apparatus capable of realizing spot-scanning in which the spot of a beam parallel to the axis of incidence thereof is shifted in two axial directions within a radiation area, and having a compact and lightweight design.... | 07/31/2001 |
| 6262420 | Detection of alpha radiation in a beta radiation field An apparatus and method for detecting alpha particles in the presence of high activities of beta particles utilizing an alpha spectrometer. The apparatus of the present invention utilizes a magnetic field applied around the sample in an alpha spectrometer... | 07/17/2001 |
| 6259105 | System and method for cleaning silicon-coated surfaces in an ion implanter A method and system for controllably stripping a portion of silicon (98) from a silicon coated surface, for example, from an interior portion of an ion implanter (10). The system comprises (i) a source (80) of gas comprised at least partially of a reactiv... | 07/10/2001 |
| 6242750 | Ion implantation device The present invention provides ion implantation equipment in which the beam current in a lower energy region can be increased without making the equipment very large and the production of the equipment very expensive. A vacuum chamber 1 contains an ion so... | 06/05/2001 |
| 6232601 | Dynamically compensated objective lens-detection device and method The invention relates to a charged particle beam device and a method for inspecting a specimen, comprising a source for generating a charged particle beam, an objective lens with an optical axis for focussing said charged particle beam on a specimen, whic... | 05/15/2001 |
