...that on Dec. 15, 1836, the Patent Office was completely destroyed by fire? Lost were some 7,000 models, 9,000 drawings, and 230 books plus all records of patent applications and grants.
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| Number | Title | Issue Date |
| 6232601 | Dynamically compensated objective lens-detection device and method The invention relates to a charged particle beam device and a method for inspecting a specimen, comprising a source for generating a charged particle beam, an objective lens with an optical axis for focussing said charged particle beam on a specimen, whic... | 05/15/2001 |
| 6222197 | Charged-particle-beam pattern-transfer methods and apparatus Exposure methods are disclosed for high precision pattern transfer with reduced distortion using an evaluation mask containing distortion-measurement patterns. The distortion-measurement patterns are provided in multiple subfields on a mask, and images of... | 04/24/2001 |
| 6218675 | Charged particle beam irradiation apparatus A charged particle beam irradiation apparatus for irradiating a target with a charged particle beam emitted from an accelerator includes a plurality of scanning electromagnets, and a quadrupole electromagnet is used between two of the plurality of the sca... | 04/17/2001 |
| 6194729 | Particle beam apparatus The invention relates to a particle beam apparatus, in which very low target energies of the particles focused on the object can be set, with good imaging conditions. For this purpose, the beam guiding tube (5), from the anode (4) to behind the objective ... | 02/27/2001 |
| 6191423 | Correction device for correcting the spherical aberration in particle-optical apparatus Electron-optical rotationally symmetrical lenses inevitably suffer from spherical aberration which often imposes a limit on the resolution. This lens defect cannot be eliminated by compensation by means of rotationally symmetrical fields. In order to enha... | 02/20/2001 |
| 6188071 | Feedback method for increasing stability of electron beams Temperature dependency on magnetic field strength of an electron optical element in an electron beam system due to variation of permeability with temperature of a ferromagnetic pole piece subject to radiant heating from another electron optical element is... | 02/13/2001 |
| 6185054 | Apparatus and method for mounting pole piece in electromagnetic lens A ferrite pole piece is mounted in an electromagnetic lens by placing a mounting ring around the pole piece and securing it with an adhesive. The internal diameter of the mounting ring is sufficiently greater than the outer diameter of the pole piece that... | 02/06/2001 |
| 6180947 | Multi-element deflection aberration correction for electron beam lithography A method of optimizing locations of correction elements of a charged particle beam system determines respective corrector element currents to achieve optimum correction as a function of individual corrector location. Substantially complete dynamic correct... | 01/30/2001 |
| 6153885 | Toroidal charged particle deflector with high mechanical stability and accuracy A semiconductor manufacturing tool for charged particle lithography systems such as an EBPS comprises a magnetic deflector with a hub comprising a cylinder mounted on flange. The hub has an opening for a particle beam. Grooves on the surface of the flange... | 11/28/2000 |
| 6150657 | Energy filter and electron microscope equipped with the energy filter An energy filter has a plurality of deflection means and is constructed by using the plural deflection means so that an average track of an electron beam is symmetric and the normal line to a symmetric plane is inclined against an incident direction of th... | 11/21/2000 |
| 6140645 | Transmission electron microscope having energy filter There is disclosed a small-sized and inexpensive electron spectroscopic imaging (ESI) system using an Ω-filter. The amounts of currents supplied to the lenses located before and after the Ω-filter need not be varied, whether the Ω-filter is used or not... | 10/31/2000 |
| 6140642 | Imaging energy filter equipped with distortion corrector There is disclosed an imaging energy filter equipped with a distortion corrector. The energy filter is incorporated in an electron microscope and includes a spectrometer having magnets for producing magnetic fields. In this spectrometer, coils for excitin... | 10/31/2000 |
| 6130432 | Particle beam system with dynamic focusing A magnetic lens having a lens bore for the passage of a particle beam includes a dynamic focus coil that is positioned outside the lens bore and within the pole piece that shapes the lens field, so that the magnetic flux lines from the dynamic focus coil ... | 10/10/2000 |
| 6124596 | Charged-particle-beam projection apparatus and transfer methods The present invention provides CPB projection apparatus and transfer methods for transferring a pattern from a mask onto a wafer with precise linear-distortion correction of transferred images without creating significant astigmatic blur of the image. A p... | 09/26/2000 |
| 6107633 | Electron beam lens An electron beam lens has a magnetic lens provided with first and second pole pieces for influencing an electron beam and forming a magnetic field between the two pole pieces. A third pole piece is provided, but is not in magnetic contact with the two oth... | 08/22/2000 |
| 6104034 | Objective lens The invention relates to an objective lens for influencing a particle beam, particularly an electron beam with a magnetic single-pole lens and an electrostatic lens having a first and a second electrode which can be supplied with different potentials. The... | 08/15/2000 |
| 6097028 | Energy filter There is disclosed a highly isochromatic electron spectroscopic imaging filter providing good energy resolution even in a microscope image having a wide field of view. To reduce the difference in energy between the vicinity of the center of the image on t... | 08/01/2000 |
| 6087670 | Synchrotron type accelerator and medical treatment system employing the same A synchrotron type accelerator including a deflecting electromagnet arranged on a circulating orbit of a charged particle beam, four-pole divergence electromagnets and four-pole convergence electromagnets arranged on said circulating orbit. A high frequen... | 07/11/2000 |
| 6078382 | Charged-particle-beam projection-optical system Charged-particle-beam projection optical systems are disclosed including a symmetric magnetic doublet comprising first and second magnetic lenses arranged along a system axis between a reticle position and a sample position. The lenses have point symmetry... | 06/20/2000 |
| 6069363 | Magnetic-electrostatic symmetric doublet projection lens Resolution of a symmetric magnetic doublet charged particle beam projection lens is improved by applying a non-uniform electrostatic field having the same symmetry conditions as the lens through the magnetic doublet which provides a maximum particle veloc... | 05/30/2000 |
| 6066853 | Electron-optical system exhibiting reduced aberration Electron-optical systems are disclosed in having operating parameters that are quantitatively optimized in a short period of time. The systems comprise multiple deflectors that diminish off-axis aberrations. The deflectors are situated in a two-stage proj... | 05/23/2000 |
| 6066852 | Electron energy filter An electron energy filter includes a first pair of magnetic poles for generating a first deflecting magnetic field and a second pair of magnetic poles for generating a second deflecting magnetic field in the same direction as the first deflecting magnetic... | 05/23/2000 |
| 6064071 | Charged-particle-beam optical systems Charged-particle optical systems are disclosed for transferring high-resolution patterns from a mask to a wafer. One embodiment comprises a symmetric magnetic doublet lens and a plurality of deflectors. The deflectors satisfy variable axis lens (VAL) cond... | 05/16/2000 |
| 6060711 | Charged-particle optical systems and pattern transfer apparatus comprising same Charged-particle beam pattern transfer apparatus and charged-particle beam optical systems are disclosed. A representative charged-particle beam pattern transfer apparatus comprises a projection lens that images patterns from a mask onto a substrate. To r... | 05/09/2000 |
| 6055719 | Method for manufacturing an electrostatic deflector The present invention relates to a charged particle beam exposure apparatus, deflecting a charged particle beam formed into a predetermined shape by being passed through a predetermined transmission mask, and irradiating a predetermined location on the su... | 05/02/2000 |
| 6053241 | Cooling method and apparatus for charged particle lenses and deflectors A method of cooling a deflection system for a particle beam, containing vibration sensitive deflection devices comprises providing a vibrating cooled heat exchange structure spaced away from the vibration sensitive deflection devices. The technique used i... | 04/25/2000 |
| 6051839 | Magnetic lens apparatus for use in high-resolution scanning electron microscopes and lithographic processes Disclosed are lens apparatus in which a beam of charged particlesis brought to a focus by means of a magnetic field, the lens being situated behind the target position. In illustrative embodiments, a lens apparatus is employed in a scanning electron micro... | 04/18/2000 |
| 6049084 | Charged-particle-beam optical system Charged-particle-beam optical systems are disclosed exhibiting reduced aberrations. Such a system comprises a symmetric magnetic doublet type projection lens system and deflectors. An imaginary Z-axis is superimposed on the optical axis with an origin at ... | 04/11/2000 |
| 6043488 | Carrier gas separator for mass spectroscopy A system for separating certain ions from an ion beam in a mass spectrometer. A magnetic or electrostatic field is applied at an angle to the ion beam, causing the ions to disperse according to their mass to charge ratio. The ions are dispersed enough to ... | 03/28/2000 |
| 6031239 | Filtered cathodic arc source The plasma beam from a cathodic arc is filtered by baffles, a double bend toroidal plasma duct and a biased, corrugated liner within the duct, giving coatings virtually free of contaminating macroparticles. Reactive gas is ionised in the plasma ball and a... | 02/29/2000 |
| 6028317 | Charged particle beam optical element charged particle beam exposure apparatus and method of adjusting the same An optical element includes two electrodes 1 and 2 arranged at a distance to oppose each other and configured to converge an electron beam. The opposing surfaces of the electrodes 1 and 2 are so formed as to be cylindrically symmetrical along the beam pas... | 02/22/2000 |
| 6025600 | Method for astigmatism correction in charged particle beam systems A method for calculating and correcting an astigmatism error in a charged particle beam system. Images are collected during a single focus sweep of the charged particle beam system. Different orientations of image features, such as lines on a stigmation t... | 02/15/2000 |
| 6015973 | Energy Filter There is disclosed an energy filter having polepieces which form lenses and are mounted at accuracies that can be easily checked. The positions of the lenses can be easily readjusted. The lenses are mounted to a base plate and stacked on top of each other... | 01/18/2000 |
| 6011268 | Demagnifying projection-optical system for electron beam lithography with aberration control Electron-beam demagnifying projection-optical systems are disclosed that perform magnification adjustment, image-rotation adjustment, and focus correction while not contributing to aberrations. Also disclosed are electron-beam microlithography apparatus c... | 01/04/2000 |
| 6008498 | Charged particle beam apparatus and method of using the same The imaging characteristics of focal-point position, image rotation, and magnification of a projection system of a charged-particle-beam image-transfer apparatus are corrected by correction lenses positioned between a first projection lens and a second pr... | 12/28/1999 |
| 6005250 | Illumination deflection system for E-beam projection An electron beam projection system comprises a source of an electron beam, a first doublet of condenser lenses with a first symmetry plane, a first aperture comprising a trim aperture located at the first symmetry plane of the first doublet also serving a... | 12/21/1999 |
| 6002135 | Magnetic lens and deflector with inner and outer pole pieces with conical inner pole piece A composite magnetic lens and deflector for particle beam optical systems has a concentric gap and concentric conical lower pole pieces arranged to allow more accurate magnetic deflection. The flux generated by a solenoidal lens coil is shared by magnetic... | 12/14/1999 |
| 5994703 | Printed sheet for deflection coils A printed circuit for forming deflection coils used, for example, in a scanning electron microscope. The printed circuit permits some of scroll coil circuits to be connected with an external circuit with or without connecting them in series. There is also... | 11/30/1999 |
| 5994704 | Electromagnetic deflector Electromagnetic deflectors and methods for their manufacture are disclosed. The excitation coils inside such deflectors can be situated relative to each other and to an optical axis with a high degree of accuracy and precision. A pair of loop-shaped chann... | 11/30/1999 |
| 5974112 | Method and apparatus to control photon beam dose enhancements A photon beam dose enhancement is controlled by configuring a topical magnetic field, the magnetic field configuration having a magnetic field component across the beam path and having a magnetic field gradient component along the beam path which cause th... | 10/26/1999 |