Bizarre Patents
A gun that fires a missile, powered by gas "discharged by the operator of the toy."
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 7355174 | Charged particle beam emitting device and method for adjusting the optical axis A charged-particle beam emitting device which includes the following configuration devices so that a lowering in the image resolution will be suppressed even if a primary beam is tilted relative to a sample: A device for causing orbit of the primary beam to pass thr... | 04/08/2008 |
| 7355175 | Method and apparatus for automatically correcting charged-particle beam and method of controlling aberration corrector for charged-particle beam There is disclosed a method and apparatus for automatically correcting a charged-particle beam with an aberration corrector without the operator performing manual operations. The apparatus has an extraction portion for extracting the profile of the beam from images ... | 04/08/2008 |
| 7355689 | Automatic optical inspection using multiple objectives Apparatus and techniques for automated optical inspection (AOI) utilizing image scanning modules with multiple objectives for each camera are provided. A scanning mechanism includes optical components to sequentially steer optical signals from each of the multiple o... | 04/08/2008 |
| 7355693 | Pattern inspection apparatus The defect confirmation screen of a pattern inspection apparatus that allows the user to create a recipe and check defects easily and quickly includes a “map display part” where a wafer map is displayed, an “image display part” where a list of defect images ... | 04/08/2008 |
| 7351971 | Charged-particle beam instrument and method of detection A charged-particle beam instrument and method are offered which can inspect side and rear surfaces of the outer periphery of a specimen. The instrument has a source of the charged-particle beam and an objective lens for focusing the beam onto the specimen positioned... | 04/01/2008 |
| 7351970 | Scanning electron microscope There is disclosed a scanning electron microscope capable of removing the effects of vibrations on image information easily and reliably by detecting variations in the relative position between a specimen chamber holding a specimen therein and the specimen stage. Th... | 04/01/2008 |
| 7351969 | Electron beam inspection system and inspection method and method of manufacturing devices using the system An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be insp... | 04/01/2008 |
| 7351968 | Multi-pixel electron emission die-to-die inspection One embodiment disclosed is a method of detecting defects in objects. A selected surface area of an object is inspected with a multi-pixel electron microscope, and first set of data is generated having signal values representing image content of each pixel thereof. ... | 04/01/2008 |
| 7352845 | Energy dispersion type X-ray diffraction/spectral device A white X-ray generating means and an X-ray detecting means are respectively moved to a first position and a second position that are separated, X-ray intensities, for each energy, detected at respective positions by the X-ray detecting means are obtained as first d... | 04/01/2008 |
| 7352440 | Substrate placement in immersion lithography A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position o... | 04/01/2008 |
| 7351967 | System and method for inspecting a semiconductor sample The present invention relates to a system and method of inspecting a semiconductor sample. A plurality of scans of the semiconductor sample are recorded. Each of the scans comprises a spatially resolved measurement of a property of interest. At least one cross-corre... | 04/01/2008 |
| 7352195 | Electron beam apparatus with detailed observation function and sample inspecting and observing method using electron beam apparatus Provided is a sample observing method allowing for a detailed observation of a sample by using one and the same electron beam apparatus. The method uses an electron beam apparatus 1 comprising a primary optical system 10 serving for irradiating the ele... | 04/01/2008 |
| 7351966 | High-resolution optical channel for non-destructive navigation and processing of integrated circuits An optical-fiber based light channel system is included in an ion/electron beam tool for imaging and/or processing integrated circuits. The optical channel system includes an image collection portion, an optical fiber image transmission portion and a detector portio... | 04/01/2008 |
| 7350404 | Scanning type probe microscope and probe moving control method therefor The probe tip movement control method of the scanning probe microscope is used for a scanning probe microscope provided with a cantilever 21 having a probe tip 20 facing a sample 12. The atomic force occurring between the probe tip and sample is... | 04/01/2008 |
| 7352352 | Liquid crystal display device and controlling method thereof The liquid crystal display device includes a histogram analyzer analyzing a histogram of an input image and determining the input image as being in one of a low brightness mode, a normal mode, and a high brightness mode based on the histogram analysis, a back light ... | 04/01/2008 |
| 7348557 | Scanning particle beam instrument A scanning particle beam instrument is provided, the instrument including a scanner, a radiation detector and a DC amplifier, the DC amplifier being operable to amplify a signal generated by the radiation detector to produce a video signal, the instrument further in... | 03/25/2008 |
| 7348566 | Aberration-correcting cathode lens microscopy instrument An aberration-correcting microscopy instrument is provided. The instrument has a first magnetic deflector disposed for reception of a first non-dispersed electron diffraction pattern. The first magnetic deflector is also configured for projection of a first energy d... | 03/25/2008 |
| 7348585 | Surface inspection apparatus A surface inspection apparatus of the present invention includes an irradiation optical unit having a multibeam irradiation optical unit for converging and irradiating multiple beams upon a surface of an object to be inspected; a detector which has a light-condensin... | 03/25/2008 |
| 7349152 | Three-dimensional confocal microscope system This invention is characterized by the following feature. A three-dimensional confocal microscope system for performing image processing based on image pickup data of sliced images of a sample outputted from a confocal scanner and thus acquiring a three-dimensional ... | 03/25/2008 |
| 7348558 | Charged particle beam apparatus and automatic astigmatism adjustment method According to the invention, techniques for automatically adjusting for astigmatism in a charged particle beam apparatus. Embodiments according to the present invention can provide a charged particle beam apparatus and an automatic astigmatism adjustment methods capa... | 03/25/2008 |
| 7348556 | Method of measuring three-dimensional surface roughness of a structure An improved method of measuring the three-dimensional surface roughness of a structure. A focused ion beam is used to mill a succession of cross-sections or “slices” of the feature of interest at pre-selected intervals over a pre-selected measurement distance. A... | 03/25/2008 |
| 7348559 | Defect inspection and charged particle beam apparatus In a defect inspection apparatus which combines a plurality of probes for measuring electric properties of a specimen including a fine circuit line pattern with a charged particle beam apparatus, the charged particle beam apparatus reduces a degradation in resolutio... | 03/25/2008 |
| 7342225 | Crystallographic metrology and process control A system (70) for crystallography including a sample holder (74), an electron source (76) for generating an electron beam, and a scanning actuator (80) for controlling the relative movement between the electron beam and the crystalline sa... | 03/11/2008 |
| 7342226 | Stress measuring method and system A convergent electron beam is incident on an evaluation region of a crystalline material to obtain a HOLZ pattern formed by the convergent electron beam transmitted to the crystalline material (Steps S11 to S13), a split width of the HOLZ line of the o... | 03/11/2008 |
| 7339167 | Charged particle beam apparatus A charged particle beam apparatus in which an electrostatic lens is used as a main focusing element to obtain a subminiature high-sensitivity high-resolution SEM, a drift tube for an electron beam is located inside a column between an electron source and a sample, a... | 03/04/2008 |
| 7340085 | Rotating prism component inspection system An inspection system is provided. The system includes a rotating prism having a first end and a second end. The first end receives a first image area, such as a circular view, and rotates about a center point so as to cover a field of view area that is larger than t... | 03/04/2008 |
| 7335881 | Method of measuring dimensions of pattern With complexity of a process, the setting of conditions for pattern measurement by an SEM image falls into difficulties. However, the present invention aims to realize the setting of easy and reliable measuring conditions even with respect to a pattern complex in st... | 02/26/2008 |
| 7335880 | Technique for CD measurement on the basis of area fraction determination The present invention provides a technique for estimating critical dimensions of highly scaled circuit features on the basis of scanning electron microscopy, wherein area fractions of a scan area are determined. Preferably, the SEM is operated with high electron bea... | 02/26/2008 |
| 7335879 | System and method for sample charge control A system and method for characterizing and charging a sample. The system includes a vacuum chamber, a first apparatus in the vacuum chamber and configured to characterize a sample, and a second apparatus in the vacuum chamber and configured to charge the sample. The... | 02/26/2008 |
| 7335893 | Method and device for aligning a charged particle beam column The invention provides a method for automatically aligning a beam of charged particles with an aperture. Thereby, a defocusing is introduced and a signal calculated based on an image shift is applied to a deflection unit. Further, a method for correction of astigmat... | 02/26/2008 |
| 7335894 | High current density particle beam system The present invention relates to a charged particle unit for deflecting and energy-selecting charged particles of a charged particle beam. Thereby, a double-focusing sector unit for deflecting and focusing the charged particle beam and an energy-filter forming a pot... | 02/26/2008 |
| 7333677 | Image alignment method, comparative inspection method, and comparative inspection device for comparative inspections The present invention provides a high-precision alignment method, device and code for inspections that compare an inspection image with a reference image and detect defects from their differences. In one embodiment an inspection image and a reference image are divid... | 02/19/2008 |
| 7332736 | Article comprising gated field emission structures with centralized nanowires and method for making the same This invention provides novel methods of fabricating novel gated field emission structures that include aligned nanowire electron emitters (individually or in small groups) localized in central regions within gate apertures. It also provides novel devices using nano... | 02/19/2008 |
| 7329881 | Charged-particle beam system A charged-particle beam system used to fabricate or inspect semiconductor devices comprises the charged-particle beam accurately brought into position on a workpiece. The system has a workpiece stage, a laser metrology system for measuring movement of the stage, a f... | 02/12/2008 |
| 7330236 | Exposure apparatus, and device manufacturing method using the same Disclosed is an exposure apparatus having a specific structure that includes a cold trap plate for attracting contaminant substances which might cause a decrease of reflectance of a mirror when adhered thereto, and a radiation shield member for preventing excessive ... | 02/12/2008 |
| 7329868 | Charged particle beam apparatus It is an object of the present invention to obtain an image which is focused on all portions of a sample and to provide a charged particle beam apparatus capable of obtaining a two-dimensional image which has no blurred part over an entire sample. In order to achiev... | 02/12/2008 |
| 7329878 | Method for manufacturing a lens assembly of microcolumn and lens assembly of microcolumn manufactured by the same The present invention provides a method for manufacturing a lens assembly of a microcolumn having a plurality of microlenses and a plurality of insulating layers alternately interposed between the microlenses. The method includes forming at least one first microlens... | 02/12/2008 |
| 7329867 | Electron beam system and electron beam measuring and observing methods To provide an electron beam system capable of performing three-dimensional measurement of a sample with high precision irrespective of the tilt angle and height of the sample. The electron beam system has a correction factor storing section 32 for storing a c... | 02/12/2008 |
| 7326927 | Focusing lens and charged particle beam device for titled landing angle operation The present invention relates to a focusing lens, a charged particle beam device, and a method for focusing a charged particle beam onto a specimen, wherein the focusing lens comprises an auxiliary electrode having an essentially planar electrode surface for focusin... | 02/05/2008 |
| 7326928 | Electron microscope and a method of imaging objects An electron microscope and a method of imaging objects. The method including the steps of: generating at least one electron pulse, each electron pulse including a plurality of electrons with the electrons having a kinetic energy spread; demagnifying each electron pu... | 02/05/2008 |
