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| Number | Title | Issue Date |
| 7521679 | Inspection method and inspection system using charged particle beam An electron beam system using a scanning electron microscope equipped with a function for controlling a charged state of a sample to be observed includes electron optics for obtaining image data of the scanning electron microscope, and a monitor that displays a rela... | 04/21/2009 |
| 7521677 | Method and device for distance measurement A method and a device for determining the distance from the sample to be examined to at least one reference point which function independently of the type of sample. A signal is modulated to a first potential of a sample and a primary particle beam is directed at th... | 04/21/2009 |
| 7521675 | Charged particle beam apparatus A charged particle beam apparatus having an aberration correction capability at high acceleration voltages. The charged particle beam apparatus comprises a charged particle beam source; an extraction electrode to extract charged particles from the charged particle b... | 04/21/2009 |
| 7521676 | Method and apparatus for inspecting pattern defects and mirror electron projection type or multi-beam scanning type electron beam apparatus The present invention provides a mirror electron projection (MPJ) type (SEPJ type included) scanning electron beam apparatus that is capable of performing condition setup, and a method and apparatus for inspecting pattern defects with the scanning electron beam appa... | 04/21/2009 |
| 7518109 | Method and apparatus of measuring thin film sample and method and apparatus of fabricating thin film sample In a method of measuring a thin film sample of irradiating an electron beam to a thin film sample, detecting a generated secondary electron and measuring a film thickness of the thin film sample by utilizing the secondary electron, it is provided that the film thick... | 04/14/2009 |
| 7514683 | Scanning electron microscope Disclosed is a scanning electron microscope capable of performing speedy focusing by automatically measuring an electrostatic voltage of a surface of a wafer inside a specimen chamber in an accurate, and easy speedy manner, the wafer assuming different electrostatic... | 04/07/2009 |
| 7514681 | Electrical process monitoring using mirror-mode electron microscopy One embodiment relates to a method of inspecting a substrate using electrons. Mirror-mode electron-beam imaging is performed on a region of the substrate at multiple voltage differences between an electron source and a substrate, and image data is stored correspondi... | 04/07/2009 |
| 7514682 | Electron anti-fogging baffle used as a detector Methods and apparatus to facilitate the measurement of the amount of scattered electrons collected by an anti-fogging baffle arrangement are provided. For some embodiments, by affixing a lead to an electrically isolated (floating) portion of the baffle arrangement, ... | 04/07/2009 |
| 7511272 | Method for controlling charged particle beam, and charged particle beam apparatus According to the invention, to achieve the above objective, there is provided a charged particle beam apparatus that creates a first image by irradiating a charged particle beam on a sample to scan a first pattern of the sample, controls on the basis of the first im... | 03/31/2009 |
| 7511271 | Scanning electron microscope A scanning electron microscope includes an irradiation optical system for irradiating an electron beam to a sample; a sample holder for supporting the sample, arranged inside a sample chamber; at least one electric field supply electrode arranged around the sample h... | 03/31/2009 |
| 7507961 | Method and apparatus of pattern inspection and semiconductor inspection system using the same A pattern inspection apparatus can be provided, for example, in a scanning electron microscope system. When patterns of a plurality of layers are included in a SEM image, the apparatus separates the patterns according to each layer by using design data of the plural... | 03/24/2009 |
| 7507962 | Electron-beam device and detector system An electron-beam device having a beam generator for generating an electron beam, an objective lens for focusing the electron beam on an object, and at least one detector for detecting electrons scattered on the object or emitted by the object. Furthermore, a detecto... | 03/24/2009 |
| 7504627 | Electron beam inspection apparatus An electron beam inspection apparatus in which the order of inspection is determined to shorten the inspection time is disclosed. The order of inspection is determined by minimizing the total of the moving time and the inspection time as well as by simply optimizing... | 03/17/2009 |
| 7504624 | Charged particle beam device A scanning charged particle microscope which facilitates adjustment, has a deep focal depth, and is provided with an aberration correction means. The state of aberration correction is judged from a SEM image by using a stop having plural openings and the judgment re... | 03/17/2009 |
| 7504626 | Scanning electron microscope and apparatus for detecting defect A scanning electron microscope, by which an image of unevennesses on the surface of a sample may be obtained in a high-resolution manner and a high contrast one, is provided according to the present invention. A sample image is obtained by use of the scanning electr... | 03/17/2009 |
| 7504625 | Substrate inspection method, manufacturing method of semiconductor device and substrate inspection apparatus A substrate inspection method includes: generating primary charged particle beams; applying the generated primary charged particle beams to an inspection target of a substrate; condensing first secondary charged particle beams including at least one of secondary cha... | 03/17/2009 |
| 7498573 | Method for obtaining and processing surface analysis data A method of managing data obtained by measurements. The method permits EDS (energy dispersive spectroscopy) spectra to be collected in one operation. Energies detected by an EDS detector are converted by a pulse height analyzer into pulses of heights corresponding t... | 03/03/2009 |
| 7495216 | Electron beam apparatus for work function measurements The inventive apparatus measures workfunction values using deflection of an electron beam without direct contact of the electron beam with the sample surface. The apparatus, mounted within a vacuum chamber, includes an electron gun, a position sensitive electron det... | 02/24/2009 |
| 7495217 | Film thickness and composition measurement via auger electron spectroscopy and electron probe microanalysis In some embodiments, techniques are described for combining an X-ray detector (e.g., for providing EPMA) and an electron detector (e.g., for providing AES) to provide a tool for determining film compositions and thicknesses on a specimen, such as a semiconductor str... | 02/24/2009 |
| 7491934 | SEM technique for imaging and measuring electronic transport in nanocomposites based on electric field induced contrast Methods and apparatus are described for SEM imaging and measuring electronic transport in nanocomposites based on electric field induced contrast. A method includes mounting a sample onto a sample holder, the sample including a sample material; wire bonding leads fr... | 02/17/2009 |
| 7491933 | Electron beam apparatus An electron beam (4) to be irradiated onto a sample (10) is two-dimensionally scanned by a scanning coil (9), and secondary electrons generated from the sample (10) by the scanning are detected by a secondary electron detector (13)... | 02/17/2009 |
| 7488936 | TFT array inspecting apparatus A TFT array inspecting apparatus inspects a TFT array disposed at either an inclined position and a level position. The TFT array inspecting apparatus includes a vacuum chamber, a stage disposed in the vacuum chamber so that a TFT array to be inspected is disposed o... | 02/10/2009 |
| 7488938 | Charge-control method and apparatus for electron beam imaging One embodiment relates to a method of electron beam imaging of a target area of a substrate. During an imaging phase, an electron beam is controllably scanned over the target area of the substrate, and extracted secondary electrons are detected. An electric field at... | 02/10/2009 |
| 7488937 | Method and apparatus for the improvement of material/voltage contrast A method and system for registering a CAD layout to a Focused Ion Beam image for through-the substrate probing, without using an optical image and without requiring biasing, includes an improved method of trench endpointing during the FIB milling operation with a lo... | 02/10/2009 |
| 7479633 | Methodology for critical dimension metrology using stepper focus monitor information A method of producing an accurate critical dimension measurement comprises navigating to a critical dimension structure, performing a scanning electron microscope focusing, performing a final location alignment, acquiring waveform data, analyzing the data to determi... | 01/20/2009 |
| 7479634 | Electron beam apparatus and device manufacturing method using the same An electron beam apparatus is provided for reliably measuring a potential contrast and the like at a high throughput in a simple structure. The electron beam apparatus for irradiating a sample, such as a wafer, formed with a pattern with an electron beam to evaluate... | 01/20/2009 |
| 7476856 | Sample dimension-measuring method and charged particle beam apparatus A method and apparatus for efficiently executing two types of measurements with an optical measuring device and a scanning electron microscope are provided. For example, the method and apparatus may execute the following steps: calculating an average of the dimensio... | 01/13/2009 |
| 7476857 | Tool-to-tool matching control method and its system for scanning electron microscope A system for controlling a tool-to-tool matching between a plurality of scanning electron microscopes for pattern dimension measurement includes a measuring unit for, at regular intervals, measuring a tool-to-tool disparity between canning electron microscopes based... | 01/13/2009 |
| 7476858 | Particle detection auditing system and method A system is presented for evaluating the performance of a particle detecting and measuring instrument wherein the instrument receives a specimen and detects the number of particles on the specimen and measures the descriptive parameters of the particles. The system ... | 01/13/2009 |
| 7465922 | Accelerating electrostatic lens gun for high-speed electron beam inspection One embodiment relates to an electron beam apparatus for inspecting or reviewing a manufactured substrate. The apparatus includes a cathode, an extraction electrode, a lens electrode, an anode, deflectors, electron lenses, and a detector. The extraction voltage is p... | 12/16/2008 |
| 7462828 | Inspection method and inspection system using charged particle beam In an electric immersion lens having high resolution capability, secondary electrons generated from a specimen are accelerated to suppress the dependency of rotational action of the secondary electrons applied thereto by an objective lens upon energy levels of the s... | 12/09/2008 |
| 7462829 | Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device A substrate inspection apparatus includes: an electron beam irradiation device which emits an electron beam and causes the electron beam to irradiate a substrate to be inspected as a primary beam; an electron beam detector which detects at least one of a secondary e... | 12/09/2008 |
| 7456402 | Detector optics for multiple electron beam test system A detector optics system for collecting secondary electrons (SEs) and/or backscattered electrons (BSEs) in a multiple charged particle beam test system is disclosed. Aspects of the detector optics system include: the ability to image and/or electrically test a numbe... | 11/25/2008 |
| 7456401 | Projection electron microscope, electron microscope, specimen surface observing method and micro device producing method The illuminating beam 4 emitted from the cathode 1 is incident on a deflector 3. In a state in which a voltage is applied to the deflector 3, the optical path of the illuminating beam 4 is altered by the deflector 3; the ill... | 11/25/2008 |
| 7449690 | Inspection method and inspection apparatus using charged particle beam To establish a technique that enables sorting of the elevation and azimuth angle in the direction of emitting secondary electrons and obtaining images with emphasized contrast, in order to perform the review and analysis of shallow asperities and microscopic foreign... | 11/11/2008 |
| 7449691 | Detecting apparatus and device manufacturing method A detecting apparatus for detecting a fine geometry on a surface of a sample, wherein an irradiation beam is irradiated against the sample placed in a different environment different from an atmosphere and a secondary radiation emanated from the sample is detected b... | 11/11/2008 |
| 7449689 | Dimension measuring SEM system, method of evaluating shape of circuit pattern and a system for carrying out the method The present invention relates to a dimension measuring SEM system and a circuit pattern evaluating system capable of achieving accurate, minute OPC evaluation, the importance of which increase with the progressive miniaturization of design pattern of a circuit patte... | 11/11/2008 |
| 7449692 | Charged particle beam apparatus The charged particle beams is provided, which can analyze contamination of the inner wall of the system without being disassembled and supply information on appropriate maintenance timing. The contamination level of the inner wall of the system is identified by meas... | 11/11/2008 |
| 7446313 | Scanning electron microscope It is facilitated in a scanning electron microscope to save the labor of executing the reproduction test, conduct basic analysis on a problem caused in execution of the automatic observation process, and confirm details resulting in the error. Upon detecting an erro... | 11/04/2008 |
| 7442929 | Scanning electron microscope A scanning electron microscope for digitally processing an image signal to secure the largest focal depth and the best resolution in accordance with the magnification for observation is disclosed. The angle of aperture of an optical system having a plurality of conv... | 10/28/2008 |
