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| Number | Title | Issue Date |
| 7288764 | Pattern measuring method A pattern measuring method calculates an average pattern shape from a plurality of the same patterns appearing within an image captured using an electron microscope, and compares pattern information at each measuring position with average pattern information to dete... | 10/30/2007 |
| 7289598 | X-ray fluorescent analysis apparatus The change in the sample size and a change in background intensity due to the coexisting element are measured in real time to thereby automatically change a measurement time, the detection lower limit is kept constant, so that a fluorescent X-ray apparatus is provid... | 10/30/2007 |
| 7288763 | Method of measurement accuracy improvement by control of pattern shrinkage A scanning method for a scanning electron microscope is provided which minimizes a degradation in dimension measuring accuracy caused by a shrink of a specimen. A time between the first and the second scan over the same location on the specimen is shortened by chang... | 10/30/2007 |
| 7285779 | Methods of scanning an object that includes multiple regions of interest using an array of scanning beams A multi beam inspection method and system. The inspection system includes: (i) a beam array generator adapted to generate an array of beams characterized by a beam array axis; and (ii) at least one mechanism adapted to position the object under the array of beams su... | 10/23/2007 |
| 7285780 | Detector system for a scanning electron microscope and a scanning electron microscope incorporating said detector system With a detector system for the specimen chamber of a scanning electron microscope, signals are simultaneously detected in transmission which signals correspond to a light field contrast and a dark field contrast. The detector system (14) includes four detecto... | 10/23/2007 |
| 7285778 | Probe current imaging A method including directing a first electrical signal to at least one of a plurality of probes each positioned within a chamber of a charged particle beam device. At least one of the plurality of probes is exposed to a charged particle beam of the charged particle ... | 10/23/2007 |
| 7285781 | Characterizing resist line shrinkage due to CD-SEM inspection A CD-SEM (critical dimension-scanning electron microscope) system may utilize a technique for characterizing and reducing shrinkage carryover due to CD-SEM measurements. The system may identify the affects of CD-SEM measurements on the resist and adjust the operatin... | 10/23/2007 |
| 7285785 | Apparatus with permanent magnetic lenses The invention describes a particle-optical apparatus arranged to focus a beam (1) of electrically charged particles with the aid of two particle-optical lens systems (10, 20). The lens action is achieved by magnetic fields, which fields are generated b... | 10/23/2007 |
| 7285777 | Sample dimension measuring method and scanning electron microscope An object of the present invention is to suppress measurement errors caused by the fact that the shrink amount due to scan of an electron beam differs pattern by pattern. To accomplish this object, according to the invention, functions indicative of a process... | 10/23/2007 |
| 7285776 | Scanning transmission electron microscope and electron energy loss spectroscopy The present invention provides a scanning transmission electron microscope which is capable of setting an acceptance angular range of an energy loss spectrometer independent of an acceptance angular range of a scattered electron detector, and makes it unnecessary to... | 10/23/2007 |
| 7282711 | Multiple electron beam device The invention provides electron multiple beam devices (1) for probing or structuring a non-transparent specimen (20) with primary electron beams (14) with an array of electron beam sources (3) to generate multiple primary electron beams (... | 10/16/2007 |
| 7282722 | Charged particle beam apparatus and charged particle beam irradiation method A charged particle beam apparatus produces little reduction in resolution when the beam is inclined with respect to a sample. The trajectory of a primary beam 4 is deflected by a deflector or changed by a movable aperture such that the beam is incident on a p... | 10/16/2007 |
| 7283224 | Face lighting for edge location in catalytic converter inspection A method and system for inspecting an object having a planar face with surface variations such as catalytic converters. Light sources are placed above the planar face of the object for lighting the face of the object. At least one obscuration is positioned proximate... | 10/16/2007 |
| 7283299 | Magnifying observation apparatus, method for observing magnified image, and computer-readable medium In a magnifying observation apparatus, simple observation conditions are set for simply acquiring a plurality of observation images. A plurality of simple observation images are acquired per the plurality of simple observation conditions set, and displayed on a simp... | 10/16/2007 |
| 7280945 | Apparatus and methods for detection of systematic defects Disclosed are mechanisms are provided for determining whether a particular integrated circuit (IC) pattern is susceptible to systematic failure, e.g., due to process fluctuations. In one embodiment, final resist patterns for such IC pattern are simulated using a spa... | 10/09/2007 |
| 7279689 | Contact opening metrology A method for process monitoring includes receiving a sample having a first layer that is at least partially conductive and a second layer formed over the first layer, following production of contact openings in the second layer by an etch process, the contact openin... | 10/09/2007 |
| 7279686 | Integrated sub-nanometer-scale electron beam systems A solid state sub-nanometer-scale electron beam emitter comprising a multi-layered structure having a nano-tip electron emitter and tunnel emission junction formed on substrate, an initial electron beam extraction electrode, a “nano-sandwich Einzel” electrode, a... | 10/09/2007 |
| 7276692 | Beam adjusting sample, beam adjusting method and beam adjusting device A beam adjusting sample having a flat surface being like a plate and having two edges orthogonal to each other is employed. A beam is applied to the beam adjusting sample to detect an amount of the beam passing through the beam adjusting sample. The beam vertically ... | 10/02/2007 |
| 7276694 | Defect detection using energy spectrometer One embodiment disclosed relates to an apparatus for detecting defects in substrates. An irradiation source is configured to generate an incident beam, and a lens system configured to focus the incident beam onto a target substrate so as to cause emission of electro... | 10/02/2007 |
| 7276707 | Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus A deflector which deflects a charged particle beam includes a substrate having an opening through which the charged particle beam should pass, and a deflection electrode which is arranged in the opening to deflect the charged particle beam and has a first conductive... | 10/02/2007 |
| 7276690 | Method and system for e-beam scanning The disclosure relates to a method and system of electron beam scanning for measurement, inspection or review. In accordance with one embodiment, the method includes a first scan on a region to collect first image data. The first image data is processed to determine... | 10/02/2007 |
| 7276693 | Inspection method and apparatus using charged particle beam A scanning electron microscope or inspection system includes a sample stage on which a sample such as a wafer is loaded, an electro optical unit to scan an electron beam to the sample, and a charge control electrode to which voltage for controlling a charged state o... | 10/02/2007 |
| 7274017 | Electron beam apparatus and high-voltage discharge prevention method Disclosed is an electron beam apparatus and method which can retain the state that minimizes the amount of water content contained at a gap between a high-voltage cable and a high-voltage introduction insulator to thereby prevent creation of high-voltage discharge a... | 09/25/2007 |
| 7274018 | Charged particle beam apparatus and method for operating the same A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between... | 09/25/2007 |
| 7275005 | Worked product appearance inspection method and system therefore An inspection system inspects appearances of a plurality of worked products held by a sheet-like inspection target sheet, and includes an image processing station provided at a first location and defect detection stations provided at one or a plurality of second loc... | 09/25/2007 |
| 7270790 | Sterilizer monitoring and controlling system and method A system and method are provided for monitoring and/or controlling a sterilization system. Briefly described, in architecture, the system can be implemented as follows. A current transformer is operatively associated with a source of power for a radiation source. A ... | 09/18/2007 |
| 7271385 | Inspection method and inspection apparatus using electron beam An inspection method and an inspection apparatus using an electron beam enabling more detailed and quantitative evaluation at a high throughput level. The method comprises the steps of irradiating, based on previously prepared information concerning a defect positio... | 09/18/2007 |
| 7269995 | Method and apparatus of vibration isolation, in particular for electron beam metrology tools There is provided a method and an apparatus for isolating mechanical vibrations reacting to beam metrology tools. The apparatus includes an outer structure for supporting a metrology instrument, and a chuck for holding a specimen with respect to the metrology instru... | 09/18/2007 |
| 7271396 | Method and device for aligning a charged particle beam column The invention provides a method for automatically aligning a beam of charged particles with an aperture. Thereby, the beam is defelcted to two edges of the aperture. From the signals required to obtain an extinction, a correction deflection field is calculated. Furt... | 09/18/2007 |
| 7268356 | Method and apparatus for specimen fabrication A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line seg... | 09/11/2007 |
| 7265382 | Method and apparatus employing integrated metrology for improved dielectric etch efficiency A method and apparatus for processing a semiconductor wafer is provided for reducing dimensional variation by feeding forward information relating to photoresist mask CD and profile and underlying layer thickness measured at several points on the wafer to adjust the... | 09/04/2007 |
| 7262418 | Method and apparatus for multiple charged particle beams A multi-charged particle beam tool for semiconductor wafer inspection or lithography includes an array of electron beam columns, each having its own electron or ion source. The objective lenses of the various electron beam columns, while each has its own pole piece,... | 08/28/2007 |
| 7263161 | Analysis device with variably illuminated strip detector An X-ray or neutron-optical analysis device comprising means for directing radiation from a source (1) onto a sample (2), and a detector (7) with n substantially identical detector elements (Di) which are disposed parallel, next to ea... | 08/28/2007 |
| 7262548 | Image forming apparatus capable of suppressing a fluctuation in an incident position of an electron beam The invention is to provide a flat panel image forming apparatus capable of suppressing a fluctuation in an incident position of an electron beam resulting from a front-rear temperature difference generated in a panel, thereby capable of high-quality display not aff... | 08/28/2007 |
| 7262410 | Sample observing apparatus and sample observing method There is provided a sample observing apparatus for observing the surface of a sample by irradiating an electron beam thereto, having an electron gun for irradiating the electron beam to the surface of the sample, a potential control section for adjusting electric po... | 08/28/2007 |
| 7262411 | Direct collection transmission electron microscopy A preferred method for transmission electron microscopy includes a step of generating a microscopy signal. The microscopy signal is then detected with an active pixel detector that includes a plurality of pixels. Each of the pixels includes at least one photodiode. ... | 08/28/2007 |
| 7262765 | Apparatuses and methods for utilizing non-ideal light sources A method includes obtaining a measurement of a property of a light source, scanning light from the light source onto a surface, such that the light interacts with the surface, detecting light from the surface to create a picture element, and correcting the picture e... | 08/28/2007 |
| 7260515 | Method and apparatus for simulating transparent latches A method and apparatus for cycle-based simulation of a transparent latch includes classifying a phase of the transparent latch, classifying a phase of an input to the transparent latch, and classifying a phase of a simulation cycle. The transparent latch is simulate... | 08/21/2007 |
| 7260442 | Method and system for mask fabrication process control A mask fabrication system. The mask fabrication system contains a processing tool, a metrology tool, and a controller. The processing tool processes a mask. The metrology tool inspects the mask to obtain an inspection result. The controller generates a manufacturing... | 08/21/2007 |
| 7260256 | Method and system for inspecting a pattern The present invention relates to detection of defects with simple specification of the coordinates, in the inspection of an object having a plurality of patterns in which a portion having the two-dimensional repetition and portions having the repetition only in the ... | 08/21/2007 |
