Celebrity Inventors
Mark Twain (Samuel L. Clemens) received Patent No. 121,992 for "An Improvement in Adjustable and Detachable Straps for Garments." He later received two more patents: one for a self-pasting scrapbook and one for a game to help players remember important historical dates.
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| Number | Title | Issue Date |
| 8188428 | Scanning electron microscope A technique executes autofocus adjustment stably even when a plurality of patterns or foreign matter capable of being imaged only by a specific detector are included independently. Such an image as a concavo-convex image having a weak contrast can be picked up. The ... | 05/29/2012 |
| 8188427 | Scanning electron microscope alignment method and scanning electron microscope A method and apparatus for alignment and astigmatism correction for a scanning electron microscope can prevent an alignment or correction error attributable to the conditions of a particular specimen. First, a difference is determined between optimal values acquired... | 05/29/2012 |
| 8178840 | Specimen inspection equipment and how to make the electron beam absorbed current images An object of the present invention is to obtain a clear absorbed current image without involving the difference in gain of amplifier between inputs, from absorbed currents detected by using a plurality of probes and to improve measurement efficiency. In the p... | 05/15/2012 |
| 8168950 | Charged particle beam apparatus, and image generation method with charged particle beam apparatus The present invention has a subject to provide an apparatus that optimizes scanning in accordance with circumstances or purposes, reduces distortion of images, and improves throughput, image quality, and defect detection rate by controlling deflection of a charged p... | 05/01/2012 |
| 8168951 | Charged particle beam apparatus A charged particle beam apparatus having an aberration correction capability at high acceleration voltages. The charged particle beam apparatus comprises a charged particle beam source; an extraction electrode to extract charged particles from the charged particle b... | 05/01/2012 |
| 8164060 | System and method for a charged particle beam System and method for charged particle beam. According an embodiment, the present invention provides a charged particle beam apparatus. The apparatus includes a charged particle source for generating a primary charged particle beam. The apparatus also includes at le... | 04/24/2012 |
| 8164059 | In-chamber electron detector A secondary particle detector 302 for a charged particle beam system 300 includes a scintillator 304 and a transducer 312, such as a photomultiplier tube, positioned within a vacuum chamber 107. Unlike prior art Everhart-Thornley d... | 04/24/2012 |
| 8148684 | Electron beam apparatus An electron beam apparatus has the electron optical column for releasing an electron beam from the front-end portion after the beam is emitted from an electron beam source located on a rear-end portion of the column, a specimen chamber connected to a front-end porti... | 04/03/2012 |
| 8134125 | Method and apparatus of an inspection system using an electron beam Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method whic... | 03/13/2012 |
| 8124933 | Mapping-projection-type electron beam apparatus for inspecting sample by using electrons emitted from the sample An apparatus capable of detecting defects of a pattern on a sample with high accuracy and reliability and at a high throughput, and a semiconductor manufacturing method using the same are provided. The electron beam apparatus is a mapping-projection-type electron be... | 02/28/2012 |
| 8119985 | Methods and apparatus for statistical characterization of nano-particles A method and apparatus for determining statistical characteristics of nano-particles includes distributing the nano-particles over a surface and then determining properties of the nano-particles by automatic measurement of multiple particles or by a measurement that... | 02/21/2012 |
| 8101911 | Method and device for improved alignment of a high brightness charged particle gun A charged particle gun alignment assembly for emitting a charged particle beam along an optical axis of a charged particle beam device is described. The charged particle gun alignment assembly is configured to compensate for misalignment of the charged particle beam... | 01/24/2012 |
| 8097848 | Scanning electron microscope In a VP-SEM that uses gas multiplication induced within a low-vacuum sample chamber and uses a method of detecting a positive displacement current, a secondary electron detector for the VP-SEM that responds at high speed, which can acquire a TV-Scan rate image at a ... | 01/17/2012 |
| 8097849 | Electron microscope device The present invention provides an electron microscope device 1, comprising a scanning electron microscope 2 and an optical microscope 3, wherein the scanning electron microscope has scanning means 10 for scanning an electron beam and an e... | 01/17/2012 |
| 8093557 | Method and apparatus for reviewing defects A method of inspecting defects of a sample includes a first step for, on a basis of position information of defects on a sample placed on a movable table which is previously detected and obtained by an other inspection system, driving the table so that the defects c... | 01/10/2012 |
| 8080789 | Sample dimension measuring method and scanning electron microscope The present invention suppresses decreases in the volumes of the patterns which have been formed on the surfaces of semiconductor samples or of the like, or performs accurate length measurements, irrespective of such decreases. In an electrically charged particle ra... | 12/20/2011 |
| 8076641 | Method and device for producing an image The invention relates to a method and to a device (1) for producing an image of an object (5) by means of a particle beam. According to the method and in the device (1), the particle beam is scanned by the object (5). The aim of the inven... | 12/13/2011 |
| 8076642 | Electron beam apparatus and method of operating the same An electron beam apparatus is offered which can well detect backscattered electrons or both backscattered electrons and secondary electrons if an electron detector is disposed above an objective lens in the apparatus. The electron beam apparatus has an electron beam... | 12/13/2011 |
| 8063365 | Non-shot-noise-limited source for electron beam lithography or inspection One embodiment relates to an electron source apparatus for an electron beam lithography tool or an electron beam inspection tool. A cathode is configured to emit electrons, and an anode is configured to accelerate the electrons so as to create an electron beam. Ther... | 11/22/2011 |
| 8058613 | Micromechanical devices for materials characterization The present disclosure describes micromechanical devices and methods for using such devices for characterizing a material's strength. The micromechanical devices include an anchor pad, a top shuttle platform, a nanoindenter in movable contact with the top shuttle pl... | 11/15/2011 |
| 8053726 | Inspection system by charged particle beam and method of manufacturing devices using the system An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron im... | 11/08/2011 |
| 8044351 | Micro-column with simple structure The present invention relates to an electron column including an electron emission source and lenses, and, more particularly, to an electron column having a structure that can facilitate the alignment and assembly of an electron emission source and lenses. The elect... | 10/25/2011 |
| 8044352 | Electron microscopy Using, as a detector, a CCD detector having a CCD element to which a scintillator is closely fixed, a backscattered or scanning transmission image is obtained by the following method. The detector is disposed directly under an objective lens to obtain the backscatte... | 10/25/2011 |
| 8035082 | Projection electron beam apparatus and defect inspection system using the apparatus A sample is evaluated at a high throughput by reducing axial chromatic aberration and increasing the transmittance of secondary electrons. Electron beams emitted from an electron gun 1 are irradiated onto a sample 7 through a primary electro-optical sy... | 10/11/2011 |
| 8013301 | Measurement system and a method The invention provides a method and a measurement system. The method includes: providing a measurement model that includes measurement image information; locating a measurement area image area by utilizing the measurement image information; and performing at least o... | 09/06/2011 |
| 8008622 | Electron beam apparatus and method of generating an electron beam irradiation pattern High-contrast exposure is performed by use of a small dose of electron beams, a pattern is formed on a wafer with high accuracy, and high-precision inspection is performed. In pattern formation, proximity effect correction processing is performed. Moreover, exposure... | 08/30/2011 |
| 8003940 | Tool-to-tool matching control method and its system for scanning electron microscope A system for controlling a tool-to-tool disparity between a plurality of scanning electron microscopes includes a measuring unit for measuring a tool-to-tool disparity between plural scanning electron microscopes based on information extracted from secondary electro... | 08/23/2011 |
| 7985952 | Charged particle spin polarimeter, microscope, and photoelectron spectroscope A charged particle spin polarimeter that is capable of resolving with high efficiency the magnetic moment of a charged particle. The charged particle spin polarimeter has a pair of convex and concave magnetic poles to apply a magnetic field with gradient to an incid... | 07/26/2011 |
| 7982188 | Apparatus and method for wafer pattern inspection An electric field for decelerating an electron beam is formed on a surface of a sample semiconductor to be inspected, an electron beam having a specific area (a sheet electron beam) and containing a component having such an energy as not to reach the surface of the ... | 07/19/2011 |
| 7977632 | Scanning electron microscope To make it possible to observe the bottom of a contact hole and internal wires, in observation of the contact hole 102, by scanning it at a predetermined acceleration voltage, the positive charge 106 is formed on the surface of the insulator 101... | 07/12/2011 |
| 7973281 | Semiconductor substrate, substrate inspection method, semiconductor device manufacturing method, and inspection apparatus A semiconductor substrate inspection method includes: generating a charged particle beam, and irradiating the charged particle beam to a semiconductor substrate in which contact wiring lines are formed on a surface thereof, the contact wiring lines of the semiconduc... | 07/05/2011 |
| 7968844 | Hole inspection apparatus and hole inspection method using the same Disclosed herein is an apparatus and method for inspecting the via holes of a semiconductor device using electron beams. The apparatus includes electron beam irradiation means, a current measuring means, and a current measuring means and data processing means. The e... | 06/28/2011 |
| 7964844 | Sample inspection apparatus The invention avoids charge up when creating a focus map for an electron beam apparatus for inspecting a sample. An auto-focus (AF) control apparatus controls to drive an actuator for moving a focus lens of an optical microscope while acquiring a contrast signal fro... | 06/21/2011 |
| 7960697 | Electron beam apparatus The present invention relates to a charged particle beam apparatus which employs a scanning electron microscope for sample inspection and defect review. The present invent provides solution of improving imaging resolution by utilizing a field emission cathode... | 06/14/2011 |
| 7960696 | Method for inspecting and measuring sample and scanning electron microscope As an aspect for realizing accurate observation, inspection, or measurement of the contact hole with large aspect ratio, a method and a device to scan a second electron beam after scanning a first electron beam to a sample to charge the sample are proposed wherein t... | 06/14/2011 |
| 7952071 | Apparatus and method for inspecting sample surface Provided is a defect inspection apparatus and an inspection (or evaluation) method with highly improved accuracy, which would not be provided by the prior art, in the defect inspection apparatus used in a manufacturing process of a semiconductor device. Provi... | 05/31/2011 |
| 7952073 | Apparatus and method including a direct bombardment detector and a secondary detector for use in electron microscopy An apparatus for use with an electron beam for imaging a sample. The apparatus has a down-conversion detector configured to detect an electron microscopy signal generated by the electron beam incident on the sample, a direct bombardment detector adjacent to the down... | 05/31/2011 |
| 7952072 | Test apparatus A scan control unit for generating two-dimensional coordinates for performing a scan with an electron beam of an electron scanning microscope is provided with first and second transforming units for transforming coordinates in the horizontal (X) direction and the ve... | 05/31/2011 |
| 7935925 | Charged particle beam scanning method and charged particle beam apparatus In a method of scanning a charged particle beam which can position the scan position to a proper location inside a deflectable range of the scan position of charged particle beam, the scan position of charged particle beam is deflected to a plurality of target objec... | 05/03/2011 |
| 7935926 | Inspection equipment for fine pattern and morphology using microcolumn Inspection equipment using a microcolumn is disclosed. The inspection equipment of the present invention can conduct inspection of a fine circuit, which could not be conducted using conventional optical inspection equipment. Furthermore, the present invention can ra... | 05/03/2011 |
