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| Number | Title | Issue Date |
| 8110780 | Photoirradiation type heat treatment apparatus To provide a photo-irradiation type heat treatment apparatus that eliminates the adverse influence of a light transmitting window on the temperature distribution of an article to be treated without losing the original function of a reflecting mirror a photo-irradiat... | 02/07/2012 |
| 7772527 | Heat reflector and substrate processing apparatus comprising the same A substrate processing apparatus includes a process chamber including upper and lower quartz walls, a substrate support disposed in the process chamber, radiant heaters respectively provided above and below the quartz walls of the chamber, and heat reflectors dispos... | 08/10/2010 |
| 7692120 | Transport robot and transport apparatus A transport robot including a release-side high radiation ratio portion and a receive-side high radiation ratio portion that face each other. Heat in a substrate conducted to a base portion due to thermal conduction is released as radiant heat from the release-side ... | 04/06/2010 |
| 7432475 | Vertical heat treatment device and method controlling the same A vertical heat processing apparatus includes a process chamber (5) defining a process field (A1) configured to accommodate a plurality of target substrates (W) supported at intervals in a vertical direction. The apparatus further includes a heating fu... | 10/07/2008 |
| 7429717 | Multizone heater for furnace The present invention relates to an apparatus and method for heating a semiconductor processing chamber. One embodiment of the present invention provides a furnace for heating a semiconductor processing chamber. The furnace comprises a heater surrounding side walls ... | 09/30/2008 |
| 7429718 | Heating and cooling of substrate support A substrate support assembly and method for controlling the temperature of a substrate within a process chamber are provided. A substrate support assembly includes an thermally conductive body comprising a stainless steel material, a substrate support surface on the... | 09/30/2008 |
| 7415312 | Process module tuning A process module tuning method characterizes a process module by gathering data using a process condition measuring device to measure process outputs while inputs are excited. The data is used to identify a dynamic process model. The dynamic process model is then be... | 08/19/2008 |
| 7383875 | Heating/cooling method, manufacturing method of image displaying apparatus, heating/cooling apparatus, and heating/cooling processing apparatus A heating/cooling method, a manufacturing method of an image displaying apparatus, a heating/cooling apparatus, and a heating/cooling processing apparatus, in which the heating and cooling of a substrate can be executed at a high speed are provided. ... | 06/10/2008 |
| 7381928 | Thermal processing apparatus and thermal processing method A light source including a plurality of flash lamps emits flashes thereby flash-heating a semiconductor wafer held by a thermal diffuser and a hot plate. The current distance of irradiation between the thermal diffuser and the hot plate holding the semiconductor waf... | 06/03/2008 |
| 7378618 | Rapid conductive cooling using a secondary process plane A method and apparatus for thermally processing a substrate is described. The apparatus includes a substrate support configured to move linearly and/or rotationally by a magnetic drive. The substrate support is also configured to receive a radiant heat source to pro... | 05/27/2008 |
| 7371997 | Thermal processing apparatus and thermal processing method In a thermal processing apparatus, using a lamp for heating a substrate, an opening is formed for a camera unit, which is used to image portions of an auxiliary ring supporting the substrate, to obtain the position of the center of the auxiliary ring. The camera fur... | 05/13/2008 |
| 7364624 | Wafer handling apparatus and method of manufacturing thereof A wafer processing device or apparatus, i.e., a heater or an electrostatic chuck, comprises a planar support platen, a support shaft having centrally located bore, and a pair of electrical conductors located in the shaft. In one embodiment, the electrical conductors... | 04/29/2008 |
| 7358462 | Apparatus and method for reducing stray light in substrate processing chambers A method and apparatus for heating semiconductor wafers in thermal processing chambers is disclosed. The apparatus includes a non-contact temperature measurement system that utilizes radiation sensing devices, such as pyrometers, to determine the temperature of the ... | 04/15/2008 |
| 7358666 | System and method for sealing high intensity discharge lamps In accordance with certain embodiments, the present technique includes a system for sealing a lamp including a thermal shield and a thermally susceptible enclosure disposed adjacent the thermal shield. The thermal shield has a first receptacle adapted to receive a f... | 04/15/2008 |
| 7351936 | Method and apparatus for preventing baking chamber exhaust line clog A method and apparatus involve providing a supply of nitrogen gas, heating the supply of nitrogen gas to a temperature, and ejecting the heated nitrogen gas through the exhaust line of the baking chamber on a periodic basis. The temperature is between a temperature ... | 04/01/2008 |
| 7348521 | Electric oven Provided is an electric oven. The electric oven includes a cavity having an electric component room, a light wave generating unit mounted on a top surface of the cavity, the light wave generating unit including a halogen heater emitting heat and light and a connecto... | 03/25/2008 |
| 7339137 | Electric grilling appliance A food heating appliance is disclosed that comprises a chamber portion and a lid portion that defines a heating chamber. The chamber portion has a perimeter wall extending about the heating chamber and an upper opening into the heating chamber. The perimeter wall is... | 03/04/2008 |
| 7335858 | Toaster using infrared heating for reduced toasting time A toaster uses radiant heat at infrared wavelengths optimized for producing rapid and uniform toasting of a food product. The infrared wavelengths of the radiated heat are selected for optimum speed and quality (browning and moisture content) of the food product. Th... | 02/26/2008 |
| 7332691 | Cooling plate, bake unit, and substrate treating apparatus A bake unit includes a cooling plate for cooling a substrate and a lift pin assembly for loading a substrate on the cooling plate. When a wafer is cooled on the cooling plate, a guide groove is formed at the cooling plate to allow a space between the wafer and the c... | 02/19/2008 |
| 7327948 | Cast pedestal with heating element and coaxial heat exchanger The present invention provides a heat transfer assembly that, when coupled to an object, is capable of keeping the object at a uniform elevated temperature while removing large amounts of heat from an external source. The assembly may be contained in a pedestal for ... | 02/05/2008 |
| 7323661 | Heat treatment apparatus using a lamp for rapidly and uniformly heating a wafer A heat treatment apparatus enables a rapid temperature rise of an object to be processed while giving an excellent economical efficiency. A heating unit heats an object to be heated by irradiating a light onto the object. A plurality of lamps are provided in a lamp ... | 01/29/2008 |
| 7323663 | Multi-purpose oven using infrared heating for reduced cooking time An oven using radiant heat at infrared wavelengths optimized for producing rapid and uniform cooking of a wide variety of foods. The infrared oven toasts, bakes, broils, and re-heats food at a much faster speed while maintaining high quality in taste and appearance ... | 01/29/2008 |
| 7320276 | Bread maker A bread maker having an oven and a main body accommodating the oven therein, which comprises a base frame in the main body, a main frame disposed above the base frame and forming an oven compartment with a front opening, and a reinforcing member mounted to the main ... | 01/22/2008 |
| 7317174 | Reconfigurable food heating apparatus A food heating or cooking appliance has at least one electrical heating element within its interior that is adjustable in position so as to be able to be moved close to thin or small food items under the control of a manually actuated control. A separator plate that... | 01/08/2008 |
| 7315447 | Electronic apparatus and hard disk drive housing apparatus A system for mounting a hard disk drive inside an electronic apparatus in such a way that the hard disk drive is isolated from vibration and noise and heat generated by the hard disk dive is radiated to a cover of the electronic apparatus to prevent overheating. A f... | 01/01/2008 |
| 7312423 | Cooking device A heating cooker (100) for heating to process an object placed on a mounting base of a heating chamber (51) including at least a single piece of a rod-like heater arranged along a face member forming the heating chamber (51) and a heat shielding... | 12/25/2007 |
| 7312422 | Semiconductor batch heating assembly A heat treatment apparatus for use in batch heating/wafer processing is provided, which comprises a process chamber for receiving a wafer boat, at least a heating element comprising a substrate body configured to form an electrical heating circuit for at least one h... | 12/25/2007 |
| 7301127 | Cooking device The cooking device of the present invention operates in the 100 to 250 volt AC range acting as either, a grill, a smoker, an oven or a rotisserie. The cooking device is compact, being portable or fixed so as to allow the user to maximize limited space such as on a b... | 11/27/2007 |
| 7294811 | Heating cooking device A heating cooking device includes a housing having a wall portion; a first base material provided in at least a portion of the wall portion; and optionally a second base material formed on the first base material; a heat ray reflector formed on the conductive base m... | 11/13/2007 |
| 7285758 | Rapid thermal processing lamp and method for manufacturing the same A method and system for inductively coupling energy to a heating filament (7A′, 7B′, 7C′, 7A, 7B, 7C) in a thermal processing environment. By applying AC power to a coil antenna (11) and inductive coupling to a ... | 10/23/2007 |
| 7274006 | Heater A heater includes a heating member formed in a plate shape that includes a substrate-heating surface on which a substrate is mounted and a heating member rear surface which is on the opposite side of the substrate-heating surfaces. The heater also has a resistance h... | 09/25/2007 |
| 7255899 | Heat treatment apparatus and heat treatment method of substrate A heat diffusion plate and a heating plate are placed in a heat treatment chamber in this order. The heating plate is used for preliminarily heating a glass substrate to a temperature in a range from 200° C. to 400° C. The glass substrate thus preliminarily heated... | 08/14/2007 |
| 7256370 | Vacuum thermal annealer A vacuum thermal annealing device is provided having a temperature control for use with various materials, such as semiconductor substrates. A vacuum is used to remove air and outgas residual materials. Heated gas is injected planar to a substrate as pressure is qui... | 08/14/2007 |
| 7238920 | Modular bat warming system Disclosed is a baseball and/or softball bat warmer system. Each individual bat heater includes an elongated outer tubular member having a closed bottom surface. An inner tubular member is spaced inwardly from the outer tubular member forming a space therebetween. A ... | 07/03/2007 |
| 7239804 | Cooling device, and apparatus and method for manufacturing image display panel using cooling device A method for manufacturing an image display panel includes the steps of heating a substrate for the image display panel having a different-emissivity member on at least a part of one surface of the substrate, with the member having an emissivity different from that ... | 07/03/2007 |
| 7230709 | Measuring method and measuring apparatus of optical energy absorption ratio, and thermal processing apparatus Reflection intensities of a standard wafer with a known reflectance, a plain wafer on which no pattern is formed, and a semiconductor wafer to be processed practically are measured by using an optical measuring system. Their respective reflection intensities are sub... | 06/12/2007 |
| 7211769 | Heating chamber and method of heating a wafer A heating chamber which can be used during a reflow process to form a metal wiring having a multi-layered writing structure and a method of heating a wafer using the same, are provided. The heating chamber is movable upward and downward between the upper process pos... | 05/01/2007 |
| 7193184 | Impingement oven with radiant heating An oven for providing radiant and impingement heat to a food item. The oven includes a fan mechanism for drawing air around the radiant heat elements of the oven. The air is then delivered to an impingement tray located adjacent the food item. The air is forced thro... | 03/20/2007 |
| 7190889 | Non-contact heater and method for non-contact heating of a substrate for material deposition A heater for the non-contact heating of an object, such as a substrate for material deposition, includes a housing defining a deposition cavity and a source of radiation outside the deposition cavity. A reflector is optically coupled to the source of radiation to co... | 03/13/2007 |
| 7183229 | Semiconductor thin film forming method, production methods for semiconductor device and electrooptical device, devices used for these methods, and semiconductor device and electrooptical device An object of the present invention is to provide a method for easily forming a polycrystalline semiconductor thin-film, such as polycrystalline silicon having high crystallinity and high quality, or a single crystalline semiconductor thin-film at inexpensive cost, t... | 02/27/2007 |
