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| Number | Title | Issue Date |
| 4233496 | Apparatus for removal of residues by means of pyrolysis A process and apparatus are provided for pyrolysis cleaning of residues from equipment used in the treatment and processing of synthetic materials, particularly synthetic plastics. The process comprises a first stage in which the equipment to be cleaned i... | 11/11/1980 |
| 4223048 | Plasma enhanced chemical vapor processing of semiconductive wafers Semiconductive wafers are processed, i.e., etched or layers deposited thereon, by means of a plasma enhanced chemical vapor processing system. The processing system includes an evacuable horizontal tubular envelope disposed within a surrounding heater or ... | 09/16/1980 |
| 4215265 | Method and apparatus for producing ceramic ware An electric kiln for firing ceramic ware in a reducing atmosphere has a substantially sealed chamber with electrical-resistance heating elements. A compartment is provided within the kiln for selectively introducing a reducing agent into the chamber. Acco... | 07/29/1980 |
| 4208573 | Kiln utilizing infrared radiation in the range of 0.7 to 1.5 μm to heat dental ceramic material A kiln for dental ceramic work comprises a retort housing and a heating means effective to generate the shortwave infrared radiation for heating dental ceramic material to the burning temperature of the ceramic mass within said retort housing. In a specif... | 06/17/1980 |
| 4195820 | Precise thermal processing apparatus Disclosed is apparatus for subjecting a workpiece to a controlled temperature comprising a light-weight muffle of high diffusivity material having an interior high emissivity surface, an air cooled envelope surrounding the muffle having an infrared reflec... | 04/01/1980 |
| 4189631 | Hamburger bun storage device A hamburger bun storage device has a supporting frame on which a bun-toasting and heating element is disposed. The heating element is preferably a planar member superposed above a parallel planar conveyor mounted on the frame to advance in a predetermined... | 02/19/1980 |
| 4171346 | Reactor heater An electrical resistance heater for high temperature chlorination of alumina bearing material by gaseous chlorine within a reaction chamber. The heater comprises two, closely spaced, side-by-side, elongated posts made of a carbonaceous material electrical... | 10/16/1979 |
| 4167915 | High-pressure, high-temperature gaseous chemical apparatus Apparatus and method for growing oxide on silicon wafers or silicon-coated wafers or other semiconductors for the semiconductor industry wherein the oxide growth is produced under high pressure and high temperature conditions within a reaction chamber by ... | 09/18/1979 |
| 4159415 | Electric slot furnace A slot furnace for heating steel to forging temperatures includes a housing lined with refractory material and a refractory hearth all defining a chamber in the housing for receiving and heating forging stock. A slot is located at the front of the housing... | 06/26/1979 |
| 4147888 | Electric heating element for electric resistance furnaces An electric heating element for electric resistance furnace comprises a plurality of heater frames which consist of conductive strip material having a sectional shape selected from leg angle-section, channel-section, lip-section, T-section, U-section, V-s... | 04/03/1979 |
| 4055219 | Electric tip-off heat sink During the construction of display gas panels front and back panels are connected together by means of a seal which forms a chamber for receiving a display gas. A hole is provided in the back plate which is outside the display viewing area and a glass tub... | 10/25/1977 |
| 4041278 | Heating apparatus for temperature gradient zone melting An apparatus for practicing temperature gradient zone melting includes a transparent tubular quartz glass work chamber for receiving a body of semiconductor material to be processed. An infrared radiation source is optically coupled to the interior of the... | 08/09/1977 |
| 4020791 | Apparatus for indiffusing dopants into semiconductor material Apparatus for indiffusing dopant into a semiconductor material. The apparatus comprises a heatable tube of the same semiconductor material, the wall of which is from 0.5 to 20 mm thick and is gas-tight under reaction conditions.... | 05/03/1977 |
| 4011394 | Kilns A set of components for use in the construction of a kiln comprising a number of holding devices adapted to be mounted on the outside of a kiln, a number of tie bars engageable in the holding devices so that the tie bars project into the kiln through the ... | 03/08/1977 |
| 4007369 | Tubular oven An improved tubular oven adapted for use in diffusion processing of semiconductors whose interior walls are comprised of polycrystalline silicon and whose exterior walls are comprised of phosphorous doped silicon. Block electrical contacts are located at ... | 02/08/1977 |
| 3974561 | Method of producing directly heatable hollow semiconductor bodies Hollow semiconductor bodies are formed from a gaseous phase by deposition on a heated mandrel and end zones of a so-produced body are doped so as to be conductive at room temperature.... | 08/17/1976 |
| 3972682 | Pyrolysis furnace A furnace assembly for use in a chemical analysis system utilizing high-temperature pyrolytic techniques includes a refractory tube which defines a heated chamber wherein samples are pyrolyzed, inlet and outlet cap members mounted on opposite ends of the ... | 08/03/1976 |
| 3971875 | Apparatus and method for vacuum hot press joining, compacting and treating of materials Apparatus and method for joining, compacting and thermo-mechanically processing materials under controlled application of heat and evenly distributed mechanical pressure in a vacuum or inert gas environment, having particular usefulness in diffusion bondi... | 07/27/1976 |
| 3962670 | Heatable hollow semiconductor Hollow semiconductor bodies having an outer surface composed of a doped semiconductor material and an inner surface composed of a pure semiconductor material are formed by sequential deposition from a gaseous thermally decomposable semiconductor compound ... | 06/08/1976 |
| 3933434 | High temperature chemical reactor A high temperature reactor comprises a tube which defines a reactor chamber; means for introducing the inert fluid into the reactor tube to provide a protective blanket for the inside surface of the tube; means for introducing reactants into the chamber, ... | 01/20/1976 |
