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| Number | Title | Issue Date |
| 8173928 | Processing device In a processing apparatus for performing a specified process on a target object at a predetermined process pressure, the apparatus includes an evacuable processing chamber having a gas exhaust port formed in a bottom portion thereof; a mounting table provided within... | 05/08/2012 |
| 8093529 | Control method of a temperature of a sample A method of stably controlling the temperature of a sample placed on a sample stage to a desired temperature by estimating a sample temperature accurately, the sample stage including a refrigerant flow path to cool the sample stage, a heater to heat the sample stage... | 01/10/2012 |
| 7960670 | Methods of and apparatuses for measuring electrical parameters of a plasma process A sensor apparatus for measuring a plasma process parameter for processing a workpiece. The sensor apparatus includes a base, an information processor supported on or in the base, and at least one sensor supported on or in the base. The at least one sensor includes ... | 06/14/2011 |
| 7928339 | Device for gaseous plasma sterilization A device for producing a gas plasma by ionisation of a gas using a microwave source of determined nominal power (Pn), includes a magnetron 7 receiving its electric energy from a supply circuit. The device is characterized in that the power (Pd... | 04/19/2011 |
| 7915563 | Arc detector for plasma processing system An arc detector is provided for a plasma processing system including a HF power source, a plasma processor, and a voltage/current signal detector. The arc detector includes a calculator for the phase difference between the AC voltage signal and the AC current signal... | 03/29/2011 |
| 7910853 | Direct real-time monitoring and feedback control of RF plasma output for wafer processing A method and apparatus for controlling power output of a capacitatively-coupled plasma are provided. A detector is disposed on the power delivery conduit carrying power to one electrode to detect fluctuations in power output to the electrode. The detector is coupled... | 03/22/2011 |
| 7807937 | Method and system of conserving plasma torch consumable A system for conserving a consumable component of a plasma torch is disclosed. The system includes a controller of a plasma torch that is connected to a power source. The controller is configured to, during a single trigger actuation, delay generation of an arc afte... | 10/05/2010 |
| 7777152 | High AC current high RF power AC-RF decoupling filter for plasma reactor heated electrostatic chuck An RF blocking filter isolates a two-phase AC power supply from at least 2 kV p-p of power of an HF frequency that is reactively coupled to a resistive heating element, while conducting several kW of 60 Hz AC power from the two-phase AC power supply to the resistive... | 08/17/2010 |
| 7679027 | Soft x-ray laser based on z-pinch compression of rotating plasma A method and apparatus for producing soft x-ray laser radiation. A low pressure plasma column is created by electric discharge or by laser excitation inside a rotating containment tube. Rotation of the plasma is induced by viscous drag caused by rotation of the tube... | 03/16/2010 |
| 7612311 | Methods and systems for controlling electric heaters Systems and methods for controlling a heater to drive a load temperature to approximate a setpoint. At the beginning of each ½ AC cycle, a sigma delta modulation algorithm is computed to determine whether the AC cycle should be turned on or off. The running estimat... | 11/03/2009 |
| 7573000 | Power source for plasma device A plasma device including a power source for creating an AC output signal with a matrix transformer between said power source and a series circuit comprising a first lead and a second lead. The matrix transformer including at least two modules with a first primary p... | 08/11/2009 |
| 7470872 | Cooling device and system for a plasma arc torch and associated method A plasma arc generation system includes a power module operably engaged with a plasma arc torch head portion and adapted to provide an electrical current for causing an arc at the torch head portion or generating a plasma. A cooling device is operably engaged with t... | 12/30/2008 |
| 7435926 | Methods and array for creating a mathematical model of a plasma processing system A method of creating a simplified equivalent circuit model of a plasma processing system, including an electrical measuring device, a lower electrode, an upper electrode, and a signal generator device is described. The method includes creating a simplified equivalen... | 10/14/2008 |
| 7432467 | Plasma processing apparatus A plasma processing apparatus performs a desired plasma processing on a target substrate by using a plasma generated from a processing gas by forming a high frequency electric field in an evacuable processing chamber having an electrode. The plasma processing appara... | 10/07/2008 |
| 7411149 | inverter powered plasma cutting system with fixed gas flow control A lightweight and compact plasma cutting system includes a power source having an inverter and a non-adjustable regulator enclosed within the power source. The inverter is configured to generate a power signal suitable for a plasma arc process and the non-adjustable... | 08/12/2008 |
| 7399944 | Method and arrangement for controlling a glow discharge plasma under atmospheric conditions The present invention is directed to a method and arrangement for controlling a glow discharge plasma in a gas or gas mixture under atmospheric conditions, in a plasma discharge space comprising at least two spaced electrodes in which at least one plasma pulse havin... | 07/15/2008 |
| 7375302 | Plasma arc torch having an electrode with internal passages An electrode for a plasma arc cutting torch which minimizes the deposition of high emissivity material on the nozzle, reduces electrode wear, and improves cut quality. The electrode has a body having a first end, a second end in a spaced relationship relative to the... | 05/20/2008 |
| 7375303 | Plasma arc torch having an electrode with internal passages An electrode for a plasma arc cutting torch which minimizes the deposition of high emissivity material on the nozzle, reduces electrode wear, and improves cut quality. The electrode has a body having a first end, a second end in a spaced relationship relative to the... | 05/20/2008 |
| 7353771 | Method and apparatus of providing power to ignite and sustain a plasma in a reactive gas generator According to a first aspect, a power supply and a method of providing power for igniting a plasma in a reactive gas generator is provided that includes (i) coupling a series resonant circuit that comprises a resonant inductor and a resonant capacitor between a switc... | 04/08/2008 |
| 7335611 | Copper conductor annealing process employing high speed optical annealing with a low temperature-deposited optical absorber layer A method of forming a conductor in a thin film structure on a semiconductor substrate includes forming high aspect ratio openings in a base layer having vertical side walls, depositing a dielectric barrier layer comprising a dielectric compound of a barrier metal on... | 02/26/2008 |
| 7335851 | Gap measurement apparatus A detection unit (8) is disposed for detecting the magnitudes of f1 and f2 frequency components of a composite signal which is passed through a center electrode cable (4). A detecting signal generating unit (9) generates a ... | 02/26/2008 |
| 7326875 | Method for supplying a plasma torch with a gas, mixed gas, or gas mixture, comprising volumetric flow regulation in combination with pressure regulation; and arrangement for carrying out said method A method of supplying a plasma torch with a gas, mixed gas or gas mixture, in which the volume flow of the gas, mixed gas or gas mixture is controlled, characterised in that the volume flow control is effected in combination with a pressure control of the gas, mixed... | 02/05/2008 |
| 7323401 | Semiconductor substrate process using a low temperature deposited carbon-containing hard mask A method of processing a thin film structure on a semiconductor substrate using an optically writable mask includes placing the substrate in a reactor chamber, the substrate having on its surface a target layer to be etched in accordance with a predetermined pattern... | 01/29/2008 |
| 7320734 | Plasma immersion ion implantation system including a plasma source having low dissociation and low minimum plasma voltage A system for processing a workpiece includes a plasma immersion ion implantation reactor with an enclosure having a side wall and a ceiling and defining a chamber, and a workpiece support pedestal within the chamber having a workpiece support surface facing the ceil... | 01/22/2008 |
| 7317171 | Method and apparatus for generating an electric arc A method and apparatus for reducing the gap resistance between two electrodes, such as the electrodes used fusion splicing one optical fiber to another, by injecting negative ions into the gas or gasses that are located between the electrodes. As a result, the volta... | 01/08/2008 |
| 7312162 | Low temperature plasma deposition process for carbon layer deposition A method of depositing a carbon layer on a workpiece includes placing the workpiece in a reactor chamber, introducing a carbon-containing process gas into the chamber, generating a reentrant toroidal RF plasma current in a reentrant path that includes a process zone... | 12/25/2007 |
| 7312148 | Copper barrier reflow process employing high speed optical annealing A method of forming a barrier layer for a thin film structure on a semiconductor substrate includes forming high aspect ratio openings in a base layer having vertical side walls, depositing a dielectric barrier layer comprising a dielectric compound of a barrier met... | 12/25/2007 |
| 7303982 | Plasma immersion ion implantation process using an inductively coupled plasma source having low dissociation and low minimum plasma voltage A method for implanting ions in a surface layer of a workpiece includes placing the workpiece on a workpiece support in a chamber with the surface layer being in facing relationship with a ceiling of the chamber, thereby defining a processing zone between the workpi... | 12/04/2007 |
| 7305311 | Arc detection and handling in radio frequency power applications A radio frequency power delivery system comprises an RF power generator, arc detection circuitry, and control logic responsive to the arc detection circuitry. A dynamic boundary is computed about the measured value of a parameter representative of or related to the ... | 12/04/2007 |
| 7304264 | Micro thermal chamber having proximity control temperature management for devices under test A temperature unit to control a temperature of a device under test using a fluid includes a block disposed opposite the device under test and which defines a gap therebetween and through which the fluid passes across the device under test at a gap flow rate, and an ... | 12/04/2007 |
| 7294563 | Semiconductor on insulator vertical transistor fabrication and doping process A process for conformally doping through the vertical and horizontal surfaces of a 3-dimensional vertical transistor in a semiconductor-on-insulator structure employs an RF oscillating torroidal plasma current to perform either conformal ion implantation, or conform... | 11/13/2007 |
| 7291545 | Plasma immersion ion implantation process using a capacitively couple plasma source having low dissociation and low minimum plasma voltage A method of ion implanting a species in a workpiece to a selected ion implantation profile depth includes placing a workpiece having a semiconductor material on an electrostatic chuck in or near a processing region of a plasma reactor chamber and applying a chucking... | 11/06/2007 |
| 7291360 | Chemical vapor deposition plasma process using plural ion shower grids A chemical vapor deposition process is carried out in a reactor chamber having a set of plural parallel ion shower grids that divide the chamber into an upper ion generation region and a lower process region, each of the ion shower grids having plural orifices in mu... | 11/06/2007 |
| 7288491 | Plasma immersion ion implantation process One method of performing plasma immersion ion implantation on a workpiece in a plasma reactor chamber includes initially depositing a seasoning film on the interior surfaces of the plasma reactor chamber before the workpiece is introduced, by introducing a seasoning... | 10/30/2007 |
| 7270044 | Plasma firing mechanism and method for firing ammunition The invention comprises a device and method for firing firearm ammunition using a plasma torch generator. In a particular embodiment, the device relates to the control or management of the rate of fire and number of rounds fired in a burst firing mode for automatic ... | 09/18/2007 |
| 7244474 | Chemical vapor deposition plasma process using an ion shower grid A chemical vapor deposition process is carried out in a reactor chamber with an ion shower grid that divides the chamber into an upper ion generation region and a lower process region, the ion shower grid having plural orifices oriented in a non-parallel direction r... | 07/17/2007 |
| 7223676 | Very low temperature CVD process with independently variable conformality, stress and composition of the CVD layer A low temperature process for depositing a coating containing any of silicon, nitrogen, hydrogen or oxygen on a workpiece includes placing the workpiece in a reactor chamber facing a processing region of the chamber, introducing a process gas containing any of silic... | 05/29/2007 |
| 7220936 | Pulse thermal processing of functional materials using directed plasma arc A method of thermally processing a material includes exposing the material to at least one pulse of infrared light emitted from a directed plasma arc to thermally process the material, the pulse having a duration of no more than 10 s. ... | 05/22/2007 |
| 7214413 | Method and device for generating an activated gas curtain for surface treatment The invention relates to a surface treatment device comprising: electrodes (24a, 24b) that are used to initiate an electric arc of stabilised plasma (14); a stabilising channel (12) which is disposed in a body (10) in... | 05/08/2007 |
| 7212078 | Method and assembly for providing impedance matching network and network assembly An impedance matching network and network assembly employ one or more variable inductive elements, wherein one or more of the variable inductive elements includes a high temperature ferrite core, a helical coil, and a means for physically translating the magnetic co... | 05/01/2007 |
