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A self defense weapon formed as a memo pad and which is easily held by a person's fingers, therefore making it possible to provide protection from a mugger and also to quickly and easily write a record or a message without failure of missing or forgetting significant information under a stressful situation.
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| Number | Title | Issue Date |
| 8153926 | Etching method and system An etching method and an etching system are adapted to produce a high etch selectivity for a mask, an excellent anisotropic profile and a large etching depth. An etching system according to the invention comprises a floating electrode arranged vis-à-vis a substrate... | 04/10/2012 |
| 8124907 | Load lock chamber with decoupled slit valve door seal compartment Embodiments of the invention include a load lock chamber having a decoupled slit valve door seal compartment. In one embodiment, a load lock chamber includes a main assembly, a first slit valve door seal compartment and a seal assembly. The main assembly has a subst... | 02/28/2012 |
| 8084705 | Quartz guard ring centering features An electrode assembly and method of centering an outer ring around an electrode assembly in a plasma reaction chamber used in semiconductor substrate processing. The method includes positioning the outer ring around an outer surface of a backing member of the electr... | 12/27/2011 |
| 8039772 | Microwave resonance plasma generating apparatus and plasma processing system having the same A microwave resonance plasma generating apparatus, a plasma processing system having the same and a method of generating a microwave resonance plasma are provided. The apparatus includes a microwave generating unit which generates a microwave, and a plasma producing... | 10/18/2011 |
| 8035056 | Plasma generation apparatus A plasma generation apparatus includes: a chamber having a chamber lid and defining an airtight reaction region; a susceptor in the chamber; a gas supply means supplying a process gas to the chamber; and a toroidal core vertically disposed with respect to the suscep... | 10/11/2011 |
| 7939778 | Plasma processing chamber with guard ring for upper electrode assembly A plasma processing chamber, which includes an upper electrode assembly, a lower electrode assembly, and a plasma confinement assembly. The upper electrode assembly includes an upper electrode, a backing member, the backing member attachable to an upper surface of t... | 05/10/2011 |
| 7919722 | Method for fabricating plasma reactor parts A method of fabricating yttria parts is provided herein. In one embodiment, the method includes sintering a yttria sample, machining the sintered sample to form a part, and annealing the part by heating the part at a predetermined heating rate, maintaining the part ... | 04/05/2011 |
| 7875824 | Quartz guard ring centering features An electrode assembly and method of centering an outer ring around an electrode assembly in a plasma reaction chamber used in semiconductor substrate processing. The method includes positioning the outer ring around an outer surface of a backing member of the electr... | 01/25/2011 |
| 7804040 | Physical vapor deposition plasma reactor with arcing suppression A physical vapor deposition reactor includes a vacuum chamber with a sidewall, a ceiling and a retractable wafer support pedestal near a floor of the chamber, and a vacuum pump coupled to the chamber, the retractable wafer support pedestal having an internal electro... | 09/28/2010 |
| 7767926 | Method and system for dry development of a multi-layer mask using sidewall passivation and mask passivation A method and system for the dry development of a multi-layer mask is described. A first passivation gas comprises as an incipient ingredient a hydrocarbon gas, while a second passivation gas comprises as an incipient ingredient an oxygen-containing gas. ... | 08/03/2010 |
| 7728252 | Etching method and system An etching method and an etching system are adapted to produce a high etch selectivity for a mask, an excellent anisotropic profile and a large etching depth. An etching system according to the invention comprises a floating electrode arranged vis-à-vis a substrate... | 06/01/2010 |
| 7728250 | RF sensor clamp assembly A clamp assembly for bringing an RF sensor into electrical contact with an RF current carrier is provided herein. The clamp assembly (101) comprises a first wedge-shaped element (103), and a second wedge-shaped element (105) which is slidingly e... | 06/01/2010 |
| 7728251 | Plasma processing apparatus with dielectric plates and fixing member wavelength dependent spacing In a plasma processing apparatus, electromagnetic waves are radiated from slots of waveguides into a processing chamber via dielectric windows that are supported on beams, thereby generating a plasma. A substrate, which is an object of processing, is processed by th... | 06/01/2010 |
| 7723637 | Plasma processing apparatus The purpose of the present invention is to provide homogeneous plasma in longitudinal direction of a plasma processing apparatus applicable to multiple processes. A microwave waveguide 10 with a plurality of variable couplers 12 is placed in a vacuum c... | 05/25/2010 |
| 7718919 | Industrial plasma reactor for plasma assisted thermal debinding of powder injection-molded parts Industrial plasma reactor for plasma assisted thermal debinding of power injection-molded parts is a reactor used for the plasma assisted debinding and sintering of metallic or ceramic parts produced by the powder injection molding process, comprising a vacuum chamb... | 05/18/2010 |
| 7683289 | Apparatus and method for controlling plasma density profile A number of RF power transmission paths are defined to extend from an RF power source through a matching network, through a transmit electrode, through a plasma to a number of return electrodes. A number of tuning elements are respectively disposed within the number... | 03/23/2010 |
| 7679024 | Highly efficient gas distribution arrangement for plasma tube of a plasma processing chamber A gas distribution arrangement configured to provide a process gas downstream to a plasma tube of a plasma processing chamber. The plasma tube has a top end. The arrangement includes a body having a first end. The first end has a width larger than the plasma tube an... | 03/16/2010 |
| 7622693 | Plasma whirl reactor apparatus and methods of use Apparatus for synergistically combining a plasma with a comminution means such as a fluid kinetic energy mill (jet mill), preferably in a single reactor and/or in a single process step is provided by the present invention. Within the apparatus of the invention poten... | 11/24/2009 |
| 7592564 | Plasma generation and processing with multiple radiation sources Plasma-assisted methods and apparatus that use multiple radiation sources are provided. In one embodiment, a plasma is ignited by subjecting a gas in a radiation cavity to electromagnetic radiation having a frequency less than about 333 GHz in the presence of a plas... | 09/22/2009 |
| 7582845 | Microwave plasma processing device and plasma processing gas supply member A microwave plasma processing device can form a uniform thin film on a substrate to be processed. The microwave plasma processing device includes a fixing device for fixing a substrate to be processed onto the center axis in a plasma processing chamber, an exhaust d... | 09/01/2009 |
| 7554054 | High-frequency heating device, semiconductor manufacturing device, and light source device A high-frequency heating device including: a solid-state oscillator that generates a microwave; an amplifier that amplifies the microwave generated by the solid-state oscillator; an isolator that is connected to a stage subsequent to the amplifier and blocks a refle... | 06/30/2009 |
| 7547860 | Microwave plasma processing apparatus for semiconductor element production A plasma processing apparatus 100 used to execute a specific type of processing such as plasma processing on a workpiece by supplying a processing gas into a chamber 110 while applying high-frequency power to generate plasma includes a stage 108... | 06/16/2009 |
| 7491908 | Plasma processing device and ashing method A plasma processing device comprises a chamber capable of maintaining an atmosphere depressurized less than atmospheric pressure, a transfer pipe connected to the chamber, a gas introduction mechanism for introducing a gas into the transfer pipe, and a microwave sup... | 02/17/2009 |
| 7485827 | Plasma generator A plasma generator comprising a propagation chamber propagating an electromagnetic radiation, and a plasma-generating chamber associated with the propagation chamber; said propagation chamber has a passage region of increasing width on moving away from the entrance ... | 02/03/2009 |
| 7482550 | Quartz guard ring An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper electrode, a backing member attachable to an upper surface of the upper electrode, and an outer ring. The outer ring surrounds an outer sur... | 01/27/2009 |
| 7435926 | Methods and array for creating a mathematical model of a plasma processing system A method of creating a simplified equivalent circuit model of a plasma processing system, including an electrical measuring device, a lower electrode, an upper electrode, and a signal generator device is described. The method includes creating a simplified equivalen... | 10/14/2008 |
| 7432468 | Plasma processing apparatus and plasma processing method A microwave plasma processing apparatus 100 allows microwaves, passed through a plurality of slots 37, to be transmitted through a plurality of dielectric parts 31 supported by beams 26, raises a gas to plasma with the transmitted microwa... | 10/07/2008 |
| 7432470 | Surface cleaning and sterilization Methods and apparatus are provided for igniting, modulating, and sustaining a plasma for various plasma processes and treatments. Such treatments include cleaning and sterilizing parts. In some embodiments, a plasma is ignited by subjecting a gas in a multi-mode pro... | 10/07/2008 |
| 7432467 | Plasma processing apparatus A plasma processing apparatus performs a desired plasma processing on a target substrate by using a plasma generated from a processing gas by forming a high frequency electric field in an evacuable processing chamber having an electrode. The plasma processing appara... | 10/07/2008 |
| 7411148 | Plasma generation apparatus A plasma generation apparatus includes: a chamber having a chamber lid and defining an airtight reaction region; a susceptor in the chamber; a gas supplier supplying a process gas to the chamber; and a toroidal core vertically disposed with respect to the susceptor ... | 08/12/2008 |
| 7404879 | Ionized physical vapor deposition apparatus using helical self-resonant coil Provided is an ionized physical vapor deposition (IPVD) apparatus having a helical self-resonant coil. The IPVD apparatus comprises a process chamber having a substrate holder that supports a substrate to be processed, a deposition material source that supplies a ma... | 07/29/2008 |
| 7399943 | Apparatus for metal plasma vapor deposition and re-sputter with source and bias power frequencies applied through the workpiece A plasma reactor includes a vacuum chamber including a sidewall, a ceiling and a wafer support pedestal near a floor of the chamber, and a vacuum pump coupled to the chamber. A process gas inlet is coupled to the chamber and a process gas source coupled to the proce... | 07/15/2008 |
| 7399944 | Method and arrangement for controlling a glow discharge plasma under atmospheric conditions The present invention is directed to a method and arrangement for controlling a glow discharge plasma in a gas or gas mixture under atmospheric conditions, in a plasma discharge space comprising at least two spaced electrodes in which at least one plasma pulse havin... | 07/15/2008 |
| 7371332 | Uniform etch system Etching a layer over a substrate is provided. The substrate is placed in a plasma processing chamber. A first gas is provided to an inner zone within the plasma processing chamber. A second gas is provided to the outer zone within the plasma processing chamber, wher... | 05/13/2008 |
| 7371991 | Iron beam irradiation device and insulating spacer for the device Disclosed is a structure aimed to reduce the frequency of replacement of an insulating spacer arranged between grids of an ion beam irradiation device. More specifically, disclosed is a so-called insulating spacer arranged in order to maintain insulation between the... | 05/13/2008 |
| 7361228 | Showerheads for providing a gas to a substrate and apparatus Showerheads including a plate having a plurality of gas outlet holes extending therethrough and a head cover coupled to the plate to form a space between the plate and the head cover. A gas supply inlet member is configured to provide gas to the space directed towar... | 04/22/2008 |
| 7358193 | Apparatus for forming nanoholes and method for forming nanoholes A vacuum chamber includes a plasma generating space in its interior. A magnetic field generating device applies a fluctuating magnetic field to the plasma generating space to cause plasma therein to fluctuate. A substrate is placed in the plasma generating space so ... | 04/15/2008 |
| 7359177 | Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply output A plasma reactor has a dual frequency plasma RF bias power supply furnishing RF bias power comprising first and second frequency components, f(1), f(2), respectively, and an RF power path having an input end coupled to the plasma RF bias power supply a... | 04/15/2008 |
| 7358621 | Using sound waves and photic energy for electric power An electric power generating and gaining device using sound waves and photic energy to generate magnetism together using a crystal microphone device providing a metallic film with metallic coil leading wires to sense and receive the frequency of external sound waves... | 04/15/2008 |
| 7353771 | Method and apparatus of providing power to ignite and sustain a plasma in a reactive gas generator According to a first aspect, a power supply and a method of providing power for igniting a plasma in a reactive gas generator is provided that includes (i) coupling a series resonant circuit that comprises a resonant inductor and a resonant capacitor between a switc... | 04/08/2008 |
