A simulation environment for the sport of boxing utilizing a robotic machine interface system which carries a person
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 8177993 | Apparatus and methods for cleaning and drying of wafers An first example method and apparatus for etching and cleaning a substrate comprises device with a first manifold and a second manifold. The first manifold has a plurality of nozzles for dispensing chemicals onto the substrate. The second manifold is attached to a v... | 05/15/2012 |
| 8137576 | Substrate developing method and developing apparatus A method for developing a substrate includes a developing step for supplying a developer to the substrate, and a neutralizing and removing step for supplying a treating solution containing a neutralizing material to the substrate to neutralize the developer, and neu... | 03/20/2012 |
| 8133403 | System and method for controlling the application of acid etchers or cleaners by means of color-changing dye An acidic etcher solution for etching a substrate's surface. The acidic etcher solution includes an acid and a pH indicator, the pH indicator having at least one color transition at a pH below 7. The acidic etcher solution having an initial color at an initial pH wh... | 03/13/2012 |
| 8075791 | Chemical treatment method A chemical treatment apparatus and a method for performing a chemical treatment of a wafer, etc., by supplying a chemical via a cell. The apparatus includes a cylindrical inner cell and a cylindrical outer cell with open ends disposed at an outer circumference of th... | 12/13/2011 |
| 8066896 | Apparatus for etching wafer by single-wafer process and single wafer type method for etching wafer An apparatus for etching a wafer by a single-wafer process comprises a fluid supplying device which feeds an etching fluid on a wafer, and a wafer-chuck for horizontally holding the wafer. The wafer-chuck is equipped with a gas injection device for injecting a gas t... | 11/29/2011 |
| 8062539 | Method for manufacturing multilayer printed wiring board and multilayer printed wiring board obtained by the same A method for manufacturing a multilayer printed wiring board which enables the dielectric layers to have excellent thickness uniformity, the capacitor circuits to have high registration accuracy and the unnecessary dielectric layer is removed as large as possible; a... | 11/22/2011 |
| 8021566 | Method for pre-conditioning CMP polishing pad An apparatus and method suitable for the pre-conditioning of a polishing pad on a CMP apparatus prior to the polishing of production wafers on the apparatus. The apparatus includes a pre-conditioning arm on which is mounted an ingot of suitable material. In use, the... | 09/20/2011 |
| 7967998 | Method of polishing implantable medical devices to lower thrombogenecity and increase mechanical stability The present invention relates to a method of polishing an implantable medical device. The method may include positioning an implantable medical device on a support. At least a portion of a surface of the implantable medical device may include a polymer. A fluid may ... | 06/28/2011 |
| 7938978 | Method of manufacturing stamper According to one embodiment, a method of manufacturing a stamper includes forming a first stamper from a master plate having lands and grooves through electroforming, forming a second stamper, a width of which is GW, from the first stamper through electro... | 05/10/2011 |
| 7883634 | Elevator load bearing member having a jacket with at least one traction-enhancing exterior surface An elevator load bearing member assembly includes at least one traction enhancing surface (46) on a jacket (44). In one example, a mechanical removal process is used to strip away at least some of an amide-rich layer from the surface (46) after ... | 02/08/2011 |
| 7879251 | Thin film removing device and thin film removing method A thin film removing device and a thin film removing method are capable of removing straight parts of a thin film formed on a square substrate from corners of the substrate, and of suppressing the formation of mists. An approach stage 20 having flat stage pla... | 02/01/2011 |
| 7875200 | Method for a repair process A method for a repair process includes the steps of subjecting a substrate coated with at least one protective metallic coating to a nitric acid solution and then subjecting the substrate with the at least one protective metallic coating to a hydrochloric acid solut... | 01/25/2011 |
| 7824563 | Etching media for oxidic, transparent, conductive layers The present invention relates to a novel etching medium for the structuring of transparent, conductive layers, as are used, for example, in the production of liquid-crystal displays (LCDS) using flat-panel screens or of organic light-emitting displays (OLEDs) or in ... | 11/02/2010 |
| 7780867 | Edge bevel removal of copper from silicon wafers Chemical etching methods and associated modules for performing the removal of metal from the edge bevel region of a semiconductor wafer are described. The methods and systems apply liquid etchant in a precise manner at the edge bevel region of the wafer, so that the... | 08/24/2010 |
| 7776228 | Catalyst-aided chemical processing method A catalyst-aided chemical processing method is a novel processing method having a high processing efficiency and suited for processing in a space wavelength range of not less than several tens of μm. The catalyst-aided chemical processing method comprises: immersin... | 08/17/2010 |
| 7754091 | Custom lamp from finished EL panel A two step etch is used to provide access to the front electrode of an EL panel cut from a larger EL panel. The two step etch produces a set back that electrically isolates the front electrode and enables a conductive layer to be easily deposited on the front electr... | 07/13/2010 |
| 7699998 | Method of substantially uniformly etching non-homogeneous substrates A method of substantially uniformly etching oxides from non-homogeneous substrates is provided. The method utilizes a substantially non-aqueous etchant including an organic solvent and a fluorine-containing compound. The fluorine containing compound may include HF, ... | 04/20/2010 |
| 7651625 | Catalyst-aided chemical processing method and apparatus A catalyst-aided chemical processing method can process hard-to-process materials, especially SiC, GaN, etc. whose importance as electronic device materials is increasing these days, with high processing efficiency and high precision even for a space wavelength rang... | 01/26/2010 |
| 7578947 | Method for etching non-conductive substrate surfaces An etching composition for non-conductive substrates such as polyester, polyether, polyimide, polyurethane, epoxy resin, polysulfone, polyethersulfone, polyetherimide, and polyamide, comprising a halogenide and/or nitrate of a metal selected from the group consistin... | 08/25/2009 |
| 7547398 | Self-aligned process for fabricating imprint templates containing variously etched features A process that enables coplanarization of the structures that have been created in multiple independent etch steps. The various etches are performed independently by selectively exposing only certain patterns to particular etching conditions. After these structures ... | 06/16/2009 |
| 7527742 | Etchant, method of etching, laminate formed thereby, and device An etchant including a halogenated salt, such as Cryolite (Na3AlF6) or potassium tetrafluoro borate (KBF4), is provided. The salt may be present in the etchant in an amount sufficient to etch a substrate and may have a melt temperatu... | 05/05/2009 |
| 7524432 | Metal pattern forming method A method of forming a metal pattern comprising forming a metal film having a lower layer made of a metal and an upper layer made of a metal different from the metal of the lower layer, forming a resist film having a predetermined pattern on the upper layer, and patt... | 04/28/2009 |
| 7442319 | Poly etch without separate oxide decap The use of an ammonium hydroxide spike to a hot tetra methyl ammonium hydroxide (TMAH) solution to form an insitu poly oxide decapping step in a polysilicon (poly) etch process, results in a single step rapid poly etch process having uniform etch initiation and a hi... | 10/28/2008 |
| 7442323 | Potassium monopersulfate solutions A composition comprising a solution of potassium monopersulfate having an active oxygen content of from about 3.4% to about 6.8% and a process for its preparation including neutralization with an alkaline material is disclosed. ... | 10/28/2008 |
| 7442317 | Method of forming a nozzle rim A method of forming a nozzle rim for a nozzle aperture is provided. The method is suitable for forming part of a printhead fabrication process. The method comprises the steps of: (a) depositing a roof material layer over a sacrificial layer; and (b) removing a first... | 10/28/2008 |
| 7435355 | Liquid-based gravity-driven etching-stop technique for controlling structure dimension A liquid-based gravity-driven etching-stop technique for controlling structure dimension is provided, where opposite etching trenches in cooperation with an etching-stop solution are used for controlling the dimension of a microstructure on the wafer level. In an em... | 10/14/2008 |
| 7431860 | Etching process A method for etching a pattern in a material in precise target areas comprising depositing selectively onto the material droplets of a substance for dissolving or reacting chemically with the material. Droplets may be deposited from a print head of the type having a... | 10/07/2008 |
| 7431855 | Apparatus and method for removing photoresist from a substrate An apparatus and method for removing photoresist from a substrate, which includes treating the photoresist with a first reactant to cause swelling, cracking or delamination of the photoresist, treating the photoresist with a second reactant to chemically alter the p... | 10/07/2008 |
| 7427360 | Process and ink for making electronic devices A process for making an electronic device comprising a dielectric substrate laminated with an electrically conductive metal or alloy which comprises applying a non-aqueous etch-resistant ink by ink jet printing to selected areas of the metal or alloy, exposing the e... | 09/23/2008 |
| 7425357 | Surface modification of expanded ultra high molecular weight polyethylene(eUHMWPE) for improved bondability A balloon catheter and a method of making the balloon catheter, having a balloon which is bonded to an elongated shaft, and which has a first layer and a second layer and an improved bond between the balloon and the shaft. One aspect of the invention is directed to ... | 09/16/2008 |
| 7422982 | Method and apparatus for electroprocessing a substrate with edge profile control A method and apparatus for electroprocessing a substrate is provided. In one embodiment, a method for electroprocessing a substrate includes the steps of biasing a first electrode to establish a first electroprocessing zone between the electrode and the substrate, a... | 09/09/2008 |
| 7422696 | Multicomponent nanorods Multicomponent nanorods having segments with differing electronic and/or chemical properties are disclosed. The nanorods can be tailored with high precision to create controlled gaps within the nanorods or to produce diodes or resistors, based upon the identities of... | 09/09/2008 |
| 7419614 | Method of etching and cleaning objects A method of etching and cleaning objects contained in a vessel, includes etching the objects by providing etching solution into the vessel, forcing out the etching solution from the vessel by providing pressurized gas into the vessel; cleaning the objects by providi... | 09/02/2008 |
| 7419613 | Method and device for plasma-etching organic material film A support electrode (2) and a counter electrode (16) constituting parallel plate electrodes are disposed in a process vessel (1). A substrate (W) with an organic material film formed thereon is supported by the support electrode (2). A hi... | 09/02/2008 |
| 7419615 | Renewable superhydrophobic coating A method of forming a superhydrophobic material (66) includes mixing a hydrophobic material (24) with soluble particles (26) to form a mixture (32). The mixture (32) is cured. A portion of the soluble particles (26) is etche... | 09/02/2008 |
| 7410592 | Stamp for use in a lithographic process, method of manufacturing a stamp, and method of manufacturing a patterned layer on a substrate The stamp (10) for a lithographic process, such as patterning a surface layer, of the invention has a stamp body (5) with at least a first recess (11) formed therein, which recess defines a first aperture (15) in the printing face (3 | 08/12/2008 |
| 7402258 | Methods of removing metal contaminants from a component for a plasma processing apparatus Methods of removing metal contaminants from a component for a plasma processing apparatus are provided. The method includes cleaning a surface of the component with a cleaning liquid that includes at least one acid selected from oxalic acid, formic acid, acetic acid... | 07/22/2008 |
| 7390422 | Method for manufacturing printing plate A method for manufacturing a printing plate is realizes a precise and fine pattern by minimizing a variation of etching critical dimension. The method includes forming a hard mask having an opening on an insulating substrate; forming a first trench having a first de... | 06/24/2008 |
| 7387739 | Mask and method of manufacturing the same, electroluminescent device and method of manufacturing the same, and electronic instrument A plurality of penetrating holes are formed in a substrate, each of the penetrating holes connecting a first opening and a second opening larger than the first opening. An etching resistant film is formed on a first surface of the substrate avoiding areas in which t... | 06/17/2008 |
| 7381342 | Method for manufacturing an inkjet nozzle that incorporates heater actuator arms A method is provided for manufacturing an inkjet nozzle. The method includes the step of depositing a plastics material layer on a substrate incorporating heater actuator circuitry. The plastics material layer is etched to form a nozzle rim defining an ink port thro... | 06/03/2008 |