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Class 216/83 - NONGASEOUS PHASE ETCHING OF SUBSTRATE


Subclass of Class 216 - Etching a substrate: processes
Definition: Process the ... wherein the etchant used is employed in
No. of patents: 576
Last issue date: 05/15/2012


1                      
NumberTitleIssue Date
8177993Apparatus and methods for cleaning and drying of wafers
An first example method and apparatus for etching and cleaning a substrate comprises device with a first manifold and a second manifold. The first manifold has a plurality of nozzles for dispensing chemicals onto the substrate. The second manifold is attached to a v...
05/15/2012
8137576Substrate developing method and developing apparatus
A method for developing a substrate includes a developing step for supplying a developer to the substrate, and a neutralizing and removing step for supplying a treating solution containing a neutralizing material to the substrate to neutralize the developer, and neu...
03/20/2012
8133403System and method for controlling the application of acid etchers or cleaners by means of color-changing dye
An acidic etcher solution for etching a substrate's surface. The acidic etcher solution includes an acid and a pH indicator, the pH indicator having at least one color transition at a pH below 7. The acidic etcher solution having an initial color at an initial pH wh...
03/13/2012
8075791Chemical treatment method
A chemical treatment apparatus and a method for performing a chemical treatment of a wafer, etc., by supplying a chemical via a cell. The apparatus includes a cylindrical inner cell and a cylindrical outer cell with open ends disposed at an outer circumference of th...
12/13/2011
8066896Apparatus for etching wafer by single-wafer process and single wafer type method for etching wafer
An apparatus for etching a wafer by a single-wafer process comprises a fluid supplying device which feeds an etching fluid on a wafer, and a wafer-chuck for horizontally holding the wafer. The wafer-chuck is equipped with a gas injection device for injecting a gas t...
11/29/2011
8062539Method for manufacturing multilayer printed wiring board and multilayer printed wiring board obtained by the same
A method for manufacturing a multilayer printed wiring board which enables the dielectric layers to have excellent thickness uniformity, the capacitor circuits to have high registration accuracy and the unnecessary dielectric layer is removed as large as possible; a...
11/22/2011
8021566Method for pre-conditioning CMP polishing pad
An apparatus and method suitable for the pre-conditioning of a polishing pad on a CMP apparatus prior to the polishing of production wafers on the apparatus. The apparatus includes a pre-conditioning arm on which is mounted an ingot of suitable material. In use, the...
09/20/2011
7967998Method of polishing implantable medical devices to lower thrombogenecity and increase mechanical stability
The present invention relates to a method of polishing an implantable medical device. The method may include positioning an implantable medical device on a support. At least a portion of a surface of the implantable medical device may include a polymer. A fluid may ...
06/28/2011
7938978Method of manufacturing stamper
According to one embodiment, a method of manufacturing a stamper includes forming a first stamper from a master plate having lands and grooves through electroforming, forming a second stamper, a width of which is GW, from the first stamper through electro...
05/10/2011
7883634Elevator load bearing member having a jacket with at least one traction-enhancing exterior surface
An elevator load bearing member assembly includes at least one traction enhancing surface (46) on a jacket (44). In one example, a mechanical removal process is used to strip away at least some of an amide-rich layer from the surface (46) after ...
02/08/2011
7879251Thin film removing device and thin film removing method
A thin film removing device and a thin film removing method are capable of removing straight parts of a thin film formed on a square substrate from corners of the substrate, and of suppressing the formation of mists. An approach stage 20 having flat stage pla...
02/01/2011
7875200Method for a repair process
A method for a repair process includes the steps of subjecting a substrate coated with at least one protective metallic coating to a nitric acid solution and then subjecting the substrate with the at least one protective metallic coating to a hydrochloric acid solut...
01/25/2011
7824563Etching media for oxidic, transparent, conductive layers
The present invention relates to a novel etching medium for the structuring of transparent, conductive layers, as are used, for example, in the production of liquid-crystal displays (LCDS) using flat-panel screens or of organic light-emitting displays (OLEDs) or in ...
11/02/2010
7780867Edge bevel removal of copper from silicon wafers
Chemical etching methods and associated modules for performing the removal of metal from the edge bevel region of a semiconductor wafer are described. The methods and systems apply liquid etchant in a precise manner at the edge bevel region of the wafer, so that the...
08/24/2010
7776228Catalyst-aided chemical processing method
A catalyst-aided chemical processing method is a novel processing method having a high processing efficiency and suited for processing in a space wavelength range of not less than several tens of μm. The catalyst-aided chemical processing method comprises: immersin...
08/17/2010
7754091Custom lamp from finished EL panel
A two step etch is used to provide access to the front electrode of an EL panel cut from a larger EL panel. The two step etch produces a set back that electrically isolates the front electrode and enables a conductive layer to be easily deposited on the front electr...
07/13/2010
7699998Method of substantially uniformly etching non-homogeneous substrates
A method of substantially uniformly etching oxides from non-homogeneous substrates is provided. The method utilizes a substantially non-aqueous etchant including an organic solvent and a fluorine-containing compound. The fluorine containing compound may include HF, ...
04/20/2010
7651625Catalyst-aided chemical processing method and apparatus
A catalyst-aided chemical processing method can process hard-to-process materials, especially SiC, GaN, etc. whose importance as electronic device materials is increasing these days, with high processing efficiency and high precision even for a space wavelength rang...
01/26/2010
7578947Method for etching non-conductive substrate surfaces
An etching composition for non-conductive substrates such as polyester, polyether, polyimide, polyurethane, epoxy resin, polysulfone, polyethersulfone, polyetherimide, and polyamide, comprising a halogenide and/or nitrate of a metal selected from the group consistin...
08/25/2009
7547398Self-aligned process for fabricating imprint templates containing variously etched features
A process that enables coplanarization of the structures that have been created in multiple independent etch steps. The various etches are performed independently by selectively exposing only certain patterns to particular etching conditions. After these structures ...
06/16/2009
7527742Etchant, method of etching, laminate formed thereby, and device
An etchant including a halogenated salt, such as Cryolite (Na3AlF6) or potassium tetrafluoro borate (KBF4), is provided. The salt may be present in the etchant in an amount sufficient to etch a substrate and may have a melt temperatu...
05/05/2009
7524432Metal pattern forming method
A method of forming a metal pattern comprising forming a metal film having a lower layer made of a metal and an upper layer made of a metal different from the metal of the lower layer, forming a resist film having a predetermined pattern on the upper layer, and patt...
04/28/2009
7442319Poly etch without separate oxide decap
The use of an ammonium hydroxide spike to a hot tetra methyl ammonium hydroxide (TMAH) solution to form an insitu poly oxide decapping step in a polysilicon (poly) etch process, results in a single step rapid poly etch process having uniform etch initiation and a hi...
10/28/2008
7442323Potassium monopersulfate solutions
A composition comprising a solution of potassium monopersulfate having an active oxygen content of from about 3.4% to about 6.8% and a process for its preparation including neutralization with an alkaline material is disclosed. ...
10/28/2008
7442317Method of forming a nozzle rim
A method of forming a nozzle rim for a nozzle aperture is provided. The method is suitable for forming part of a printhead fabrication process. The method comprises the steps of: (a) depositing a roof material layer over a sacrificial layer; and (b) removing a first...
10/28/2008
7435355Liquid-based gravity-driven etching-stop technique for controlling structure dimension
A liquid-based gravity-driven etching-stop technique for controlling structure dimension is provided, where opposite etching trenches in cooperation with an etching-stop solution are used for controlling the dimension of a microstructure on the wafer level. In an em...
10/14/2008
7431860Etching process
A method for etching a pattern in a material in precise target areas comprising depositing selectively onto the material droplets of a substance for dissolving or reacting chemically with the material. Droplets may be deposited from a print head of the type having a...
10/07/2008
7431855Apparatus and method for removing photoresist from a substrate
An apparatus and method for removing photoresist from a substrate, which includes treating the photoresist with a first reactant to cause swelling, cracking or delamination of the photoresist, treating the photoresist with a second reactant to chemically alter the p...
10/07/2008
7427360Process and ink for making electronic devices
A process for making an electronic device comprising a dielectric substrate laminated with an electrically conductive metal or alloy which comprises applying a non-aqueous etch-resistant ink by ink jet printing to selected areas of the metal or alloy, exposing the e...
09/23/2008
7425357Surface modification of expanded ultra high molecular weight polyethylene(eUHMWPE) for improved bondability
A balloon catheter and a method of making the balloon catheter, having a balloon which is bonded to an elongated shaft, and which has a first layer and a second layer and an improved bond between the balloon and the shaft. One aspect of the invention is directed to ...
09/16/2008
7422982Method and apparatus for electroprocessing a substrate with edge profile control
A method and apparatus for electroprocessing a substrate is provided. In one embodiment, a method for electroprocessing a substrate includes the steps of biasing a first electrode to establish a first electroprocessing zone between the electrode and the substrate, a...
09/09/2008
7422696Multicomponent nanorods
Multicomponent nanorods having segments with differing electronic and/or chemical properties are disclosed. The nanorods can be tailored with high precision to create controlled gaps within the nanorods or to produce diodes or resistors, based upon the identities of...
09/09/2008
7419614Method of etching and cleaning objects
A method of etching and cleaning objects contained in a vessel, includes etching the objects by providing etching solution into the vessel, forcing out the etching solution from the vessel by providing pressurized gas into the vessel; cleaning the objects by providi...
09/02/2008
7419613Method and device for plasma-etching organic material film
A support electrode (2) and a counter electrode (16) constituting parallel plate electrodes are disposed in a process vessel (1). A substrate (W) with an organic material film formed thereon is supported by the support electrode (2). A hi...
09/02/2008
7419615Renewable superhydrophobic coating
A method of forming a superhydrophobic material (66) includes mixing a hydrophobic material (24) with soluble particles (26) to form a mixture (32). The mixture (32) is cured. A portion of the soluble particles (26) is etche...
09/02/2008
7410592Stamp for use in a lithographic process, method of manufacturing a stamp, and method of manufacturing a patterned layer on a substrate
The stamp (10) for a lithographic process, such as patterning a surface layer, of the invention has a stamp body (5) with at least a first recess (11) formed therein, which recess defines a first aperture (15) in the printing face (3
08/12/2008
7402258Methods of removing metal contaminants from a component for a plasma processing apparatus
Methods of removing metal contaminants from a component for a plasma processing apparatus are provided. The method includes cleaning a surface of the component with a cleaning liquid that includes at least one acid selected from oxalic acid, formic acid, acetic acid...
07/22/2008
7390422Method for manufacturing printing plate
A method for manufacturing a printing plate is realizes a precise and fine pattern by minimizing a variation of etching critical dimension. The method includes forming a hard mask having an opening on an insulating substrate; forming a first trench having a first de...
06/24/2008
7387739Mask and method of manufacturing the same, electroluminescent device and method of manufacturing the same, and electronic instrument
A plurality of penetrating holes are formed in a substrate, each of the penetrating holes connecting a first opening and a second opening larger than the first opening. An etching resistant film is formed on a first surface of the substrate avoiding areas in which t...
06/17/2008
7381342Method for manufacturing an inkjet nozzle that incorporates heater actuator arms
A method is provided for manufacturing an inkjet nozzle. The method includes the step of depositing a plastics material layer on a substrate incorporating heater actuator circuitry. The plastics material layer is etched to form a nozzle rim defining an ink port thro...
06/03/2008
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