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...When G.G. Hubbard learned of his future son-in-law's invention, he called it "only a toy." His daughter was engaged to a young man named Alexander Graham Bell.
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| Number | Title | Issue Date |
| 7368017 | Method and apparatus for semiconductor wafer planarization Broadly speaking, the present invention provides a method and an apparatus for planarizing a semiconductor wafer (“wafer”). More specifically, the present invention provides for depositing a planarizing layer over the wafer, wherein the planarizing layer serves ... | 05/06/2008 |
| 7303462 | Edge bead removal by an electro polishing process A method and apparatus for the removal of a deposited conductive layer along an edge of a substrate using an electrode configured to electro polish a substrate edge are disclosed. The electro polishing of the substrate edge may occur simultaneously during electroche... | 12/04/2007 |
| 7161689 | Apparatus and method for processing a microelectronic workpiece using metrology A processing apparatus for processing a microelectronic workpiece includes a metrology unit and a control, signal-connected to the metrology unit. The control can modify a process recipe or a process sequence of the processing apparatus based on a feed forward or a ... | 01/09/2007 |
| 7144298 | Method for manufacturing semiconductor device and apparatus for manufacturing thereof The object of the invention is to provide a method of manufacturing a semiconductor device and a processing apparatus for planarization wherein to form copper wiring in multiple layers. The removal of a residue of polishing by local electro polishing, the enhancemen... | 12/05/2006 |
| 7136173 | Method and apparatus for end-point detection An apparatus for detecting the end-point of an electropolishing process of a metal layer formed on a wafer (1004) includes an end-point detector. The end-point detector is disposed adjacent the nozzle (1008) used to electropolish the wafer. In one embo... | 11/14/2006 |
| 7033466 | Electrochemical stripping using single loop control The present invention relates to a control loop to be used in a system for stripping a coating from a part. The control loop comprises an electrometer for measuring a potential between the part and a reference electrode and generating a voltage output signal, an ope... | 04/25/2006 |
| 6977036 | Method and apparatus for substrate polishing A method and apparatus are provided for polishing a substrate surface. In one aspect, an apparatus for polishing a substrate includes a conductive polishing pad and an electrode having a membrane disposed therebetween. The membrane is orientated relative the conduct... | 12/20/2005 |
| 6723223 | Electrochemical machining method with optimal machining pulse duration For an electromechanical machining of a work piece there is an optimal pulse duration for the machining pulses corresponding to the maximum copying accuracy. Such an optimal pulse duration corresponds to a certain value of the gap. By alternating the machining pulse... | 04/20/2004 |
| 6689269 | Method for electrochemically processing material The invention relates to a method for electrochemically processing a workpiece (61) in which a pulsating or alternating electrical voltage is applied between the workpiece and a workpiece electrode (62) which are arranged at a distance from one another in... | 02/10/2004 |
| 5685971 | Apparatus and method for forming a variable diameter hole in a conductive workpiece A method and apparatus for forming a passage with a variable diameter along its length in a conductive workpiece are disclosed. The workpiece is mounted in a fixture and an externally insulated hollow electrode is positioned proximate to a surface locatio... | 11/11/1997 |
| 5639343 | Method of characterizing group III-V epitaxial semiconductor wafers incorporating an etch stop layer The present invention comprises a method of characterizing a group III-V epitaxial semiconductor wafer in a characterization profiling apparatus having an electrolytic cell. The wafer contains at least a Group III-V compound first-layer and a thin etch st... | 06/17/1997 |
| 5225053 | Method for regulating the electrical current in an electrochemical working process While in electrochemical working of workpieces presently largely the constant current regulation at the working gap between workpiece and tool is being utilized, the new method includes increasingly raising the operating current at the working gap during ... | 07/06/1993 |
| 5096550 | Method and apparatus for spatially uniform electropolishing and electrolytic etching In an electropolishing or electrolytic etching apparatus the anode is separated from the cathode to prevent bubble transport to the anode and to produce a uniform current distribution at the anode by means of a solid nonconducting anode-cathode barrier. T... | 03/17/1992 |
| 5078839 | Method for centering in an electrolytic finishing system A workpiece is moved in a plus direction or in a minus direction or in a minus direction on an X-axis to be contacted with an electrode. The moved distance Lx is calculated. The workpiece is moved in the opposite direction by the Lx/2. Similarly, the work... | 01/07/1992 |
| 5034106 | Electrolytic drilling Method of electrolytic drilling of a fluid metering orifice through a metal substrate including the step of terminating electrolytic current flow when the volume of the electrolyte stream impinging on the substrate correlates to the desired flow of the fl... | 07/23/1991 |
| 4331524 | Process and apparatus for electrolytic metal processing A method and apparatus for electrolytic processing of a metallic workpiece in which short circuits in the operating gap which produce an arc are detected and extinguished by an auxiliary d.c. current of limited duration and counter to the direction of flo... | 05/25/1982 |
| 4264417 | Electrochemical method for processing work-pieces A method of electrochemical processing comprises the steps as follows: maintaining a variable gap between a processing electrode and a work-piece, having a value equal to a minimum permissible gap corresponding to processing conditions; with the gap value... | 04/28/1981 |
| 4257865 | Electrochemical working method and system for effecting same The electrochemical working method according to the invention comprises the use of two electrodes whereof one oscillates with respect to the other. Voltage pulses are applied to the electrodes in synchronization with the oscillation and are continued to b... | 03/24/1981 |
| 4213834 | Electrochemical working method and system for effecting same The electrochemical working method according to the invention comprises the use of two electrodes whereof one oscillates with respect to the other. Voltage pulses are applied to the electrodes in synchronization with the oscillation and are continued to b... | 07/22/1980 |
| 4167462 | Electrode drive and controls for electrochemical machining An improved apparatus for electrolytically removing material from a workpiece includes a plurality of electrodes which are movable relative to each other through working strokes. In order to coordinate the movement of the electrodes, they are stopped at o... | 09/11/1979 |
| 4134807 | Process and apparatus for electrical machining of an electrode workpiece by an electrode tool, using EDM and ECM A process and apparatus for electrically machining an electrode workpiece by means of an electrode tool, in which the electrode workpiece is first machined by EDM by way of electrical discharges occuring across a dielectric fluid. The electrode workpiece ... | 01/16/1979 |
