Quotables
"I watched his countenance closely, to see if he was not deranged ... and I was assured by other senators after he left the room that they had no confidence in it."
U.S. Senator Smith of Indiana ; After seeing Samuel Morse demonstrate the telegraph.
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 7749364 | Coater having interrupted conveyor system Methods and coaters for applying films onto a substrate (e.g., a large-area glass substrate) are disclosed. Certain embodiments involve a coater for applying thin films onto a sheet-like substrate. The coater in some embodiments has a transport system adapted for co... | 07/06/2010 |
| 7410542 | Variable environment, scale-able, roll to roll system and method for manufacturing thin film electronics on flexible substrates A roll to roll, film forming system overcoming the shortcomings of current roll to roll processing is presented; The roll to roll enabled cartridge is loaded with a bolt of fresh flexible substrate. A skate couples with a cartridge, forms a seal with the cartridge's... | 08/12/2008 |
| 7402228 | Manufacturing method and apparatus of phase shift mask blank There is disclosed a manufacturing method of a phase shift mask blank in which dispersions of phase angle and transmittance among blanks can be reduced as much as possible and yield is satisfactory. In the manufacturing method of the phase shift mask blank, a proces... | 07/22/2008 |
| 7361256 | Electrolytic reactor An electrolytic reactor including a conical recess of removable slices through which the electrolyte circulates towards a part to be coated under the action of a pump setting up forced circulation. The part is polarized to act as a cathode, facing a coaxial anode in... | 04/22/2008 |
| 7347919 | Sputter source, sputtering device, and sputtering method According to the invention, when targets are sputtered, each of them moves with respect to a substrate; and therefore, the entire area of the substrate is opposed to the targets during sputtering, so that a film of homogeneous quality can be formed on the surface of... | 03/25/2008 |
| 7300557 | Device for targeted application of deposition material to a substrate The invention relates to a device for the targeted application of deposition material onto a substrate, especially for focusing the sputter flux onto a narrow angular range in a PVD-system. The invention is characterized in that the deposition material is directed t... | 11/27/2007 |
| 7294404 | Graded photocatalytic coatings The invention provides graded photocatalytic coatings. In one aspect, the invention provides a substrate carrying a photocatalytic coating that includes a first graded film region and a second graded film region. The first graded film region has a substantially cont... | 11/13/2007 |
| 7294283 | Penning discharge plasma source The preferred embodiments described herein provide a Penning discharge plasma source. The magnetic and electric field arrangement, similar to a Penning discharge, effectively traps the electron Hall current in a region between two surfaces. When a substrate (10 | 11/13/2007 |
| 7267725 | Thin-film deposition apparatus A thin-film deposition apparatus includes a reaction chamber, a substrate transfer chamber, a susceptor having a radially-extending step portion, a ring-shaped separation wall for separating the reaction chamber and the substrate transfer chamber at a processing pos... | 09/11/2007 |
| 7229532 | Sputtering apparatus A sputtering apparatus for forming a film by a physical gas-phase growth on a substrate having a irregular or flat shape is provided including three or more axes for independently varying a relative positional relationship between a substrate and a cathode in the co... | 06/12/2007 |
| 7214274 | Method and apparatus for thermally insulating adjacent temperature controlled processing chambers A dual chamber apparatus including a first chamber and a second chamber which is configured to be coupled to the first chamber at an interface. Each of the first chamber and the second chamber has a transfer opening located at the interface. An insulating plate is l... | 05/08/2007 |
| 7198699 | Sputter coating apparatus including ion beam source(s), and corresponding method A coating apparatus deposits a first coating (single or multi-layered) onto a first side of a substrate (e.g., glass substrate) passing through the apparatus, and a second coating (single or multi-layered) onto the other or second side of the substrate. In certain e... | 04/03/2007 |
| 7179352 | Vacuum treatment system and process for manufacturing workpieces A process is disclosed for manufacturing coated substantially plane workpieces, in which the workpieces are guided to a vacuum treatment area guided by a control. The treatment atmosphere is modulated in the treatment area as a function of workpiece position with th... | 02/20/2007 |
| 7163608 | Apparatus for synthesis of layers, coatings or films Systems and methods are described for the synthesis of films, coatings or layers. An apparatus includes a first holder; a second holder coupled to the first holder; a linkage coupled to the first holder and the second holder to move the first holder relative to the ... | 01/16/2007 |
| 7156961 | Sputtering apparatus and film forming method The present invention is to provide a sputtering apparatus and a thin film formation method which make it possible to form respective layers of a multilayer film having a clean interface at a optimum temperature, or which make it possible to continuously carry out t... | 01/02/2007 |
| 7153399 | Method and apparatus for producing uniform isotropic stresses in a sputtered film The invention provides a method and apparatus for producing uniform, isotropic stresses in a sputtered film. In the presently preferred embodiment, a new sputtering geometry and a new domain of transport speed are presented, which together allow the achievement of t... | 12/26/2006 |
| 7153367 | Drive mechanism for a vacuum treatment apparatus The invention relates to a drive mechanism for a vacuum treatment apparatus by which substrate holders can be transported around an axis (A—A) from an entrance airlock to an exit airlock. A stationary supporting column (1) is disposed in the center and on i... | 12/26/2006 |
| 7090754 | Sputtering device An object of the invention is to provide a method of sputtering and a device for sputtering which can improve distribution of a film's thickness and coverage distribution improve. The device for sputtering includes at least a substrate, a substrate holder which hold... | 08/15/2006 |
| 7041202 | Timing apparatus and method to selectively bias during sputtering A system and method for sputtering using a plurality of different bias voltages, a plurality of target-cathodes that can be powered at different voltages disposed along said path of travel, and a controller configured to selectively vary the target-cathode voltage a... | 05/09/2006 |
| 7033471 | Sputter chamber as well as vacuum transport chamber and vacuum handling apparatus with such chambers A Vacuum transport chamber for disk-shaped substrates, has a base plate structure has an interior surface which borders an interior of the chamber on one side thereof. A covering structure is situated parallel and opposite an interior surface of the base plate struc... | 04/25/2006 |
| 7008518 | Method and apparatus for monitoring optical characteristics of thin films in a deposition process The present invention is directed at least in part to methods and apparatus for optically monitoring selected optical characteristics of coatings formed on substrates during the deposition process and controlling the deposition process responsive thereto. In one asp... | 03/07/2006 |
| 7001482 | Method and apparatus for improved focus ring A focus ring assembly, configured to be coupled to a substrate holder in a plasma processing system, comprises a focus ring having one or more wear indicators for determining the lifetime of the focus ring, wherein the coupling of the focus ring to the substrate hol... | 02/21/2006 |
| 6962648 | Back-biased face target sputtering A facing targets sputtering device for semiconductor fabrication includes an air-tight chamber in which an inert gas is admittable and exhaustible; a pair of target plates placed at opposite ends of said air-tight chamber respectively so as to face each other and fo... | 11/08/2005 |
| 6949170 | Deposition methods and apparatus A method and apparatus for processing a thin film on a substrate. The method involves locating the substrate in a first rotational position a location opposed to a process station. The process station has a first axis and is arranged for processing the substrate abo... | 09/27/2005 |
| 6905578 | Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure An apparatus and method for depositing plural layers of materials on a substrate within a single vacuum chamber allows high-throughput deposition of structures such as these for GMR and MRAM application. An indexing mechanism aligns a substrate with each of plural t... | 06/14/2005 |
| 6905582 | Configurable vacuum system and method An exemplary configurable vacuum system is provided for use in coating or plating that provides the capability and versatility to handle substrates of significantly different shapes and sizes. The configurable vacuum system includes a vacuum table assembly, a mechan... | 06/14/2005 |
| 6899795 | Sputter chamber as well as vacuum transport chamber and vacuum handling apparatus with such chambers A sputtering chamber system and method uses at least one sputtering source with a new sputter surface at least approximately symmetrical with respect to a central axis. A substrate carrier is arranged to be drivingly rotatable about a substrate carrier axis. The cen... | 05/31/2005 |
| 6893544 | Apparatus and method for depositing thin films on a glass substrate An in-line sputtering system for depositing a thin film on a substrate includes a buffer heating module, an entry transfer module adjacent to the buffer heating module and having an expedited conveyor device for moving the substrate therein and a first sputtering mo... | 05/17/2005 |
| 6875280 | Substrate processing apparatus and substrate processing method A substrate processing apparatus includes a chamber, a gas introducing portion, a gas discharge port, a substrate transfer gate, and a substrate moving member which moves the substrate between a substrate processing position where the substrate is processed in the c... | 04/05/2005 |
| 6858119 | Mobile plating system and method An exemplary mobile plating system is provided for performing a plating process using virtually any known or available deposition technology for coating or plating as substrate. The mobile plating system may include a vacuum chamber positioned in a mobile storage vo... | 02/22/2005 |
| 6835289 | Particle implantation apparatus and particle implantation method The particle implantation apparatus comprises a target, an ion beam source, a target scanning mechanism, a slit plate, a holder, and a holder scanning mechanism. The target is used for sputtering. The ion beam source applies an ion beam apparently like a sheet wider... | 12/28/2004 |
| 6822158 | Thin-film solar cell and manufacture method therefor A thin-film solar cell including a transparent electrode layer, a semiconductor photovoltaic conversion layer, a rear transparent electrode layer and a rear reflective metal layer, said layers being formed in this order on a transparent substrate, wherein the rear t... | 11/23/2004 |
| 6818108 | Chamber for the transport of workpieces in a vacuum atmosphere, a chamber combination and a method for transporting a workpiece A vacuum chamber for transporting at least one workpiece has two or more openings defining respective opening areas for treating or handling the at least one workpiece. A transport device is arranged relative to the openings and includes a drive shaft rotatable arou... | 11/16/2004 |
| 6808592 | High throughput plasma treatment system A system for the plasma treatment of parts. The system includes a chamber base sealingly engageable with a reaction chamber to form a treatment chamber and a lifting device operable to lift the reaction chamber from the chamber base. A transfer mechanism is operable... | 10/26/2004 |
| 6787012 | Apparatus for the synthesis of layers, coatings or films Systems and methods are described for synthesis of films, coatings or layers. An apparatus includes a first holder; a second holder coupled to the first holder; a linkage coupled to the first holder and the second holder to move the first holder relative to the seco... | 09/07/2004 |
| 6783641 | Vacuum treatment system and process for manufacturing workpieces A vacuum treatment system has a vacuum treatment chamber, has an ACTUAL value sensor to establish a treatment atmosphere in the form of a regulating element of a control circuit. The treatment atmosphere in the treatment area is modulated according to a defined prof... | 08/31/2004 |
| 6780290 | Method and device for forming film The prevent invention improves the film thickness distribution in the direction of revolution of substrates by a simple manner in a method for forming coating films, wherein a evaporating source 3 is disposed at a predetermined distance from substrates 2, ... | 08/24/2004 |
| 6767439 | High throughput thin film deposition and substrate handling method and apparatus for optical disk processing The disclosure herein relates to a high throughput system for thin film deposition on substrates which can be used in applications such as optical disks, and in particular DVD disks, chip-scale packaging, and plastic based display, for example. An apparatus useful i... | 07/27/2004 |
| 6749729 | Method and apparatus for workpiece biassing utilizing non-arcing bias rail A non-arcing bias rail assembly for supplying an electrical bias potential to a moving workpiece/substrate holder, comprising an elongated metal strip adapted for mounting along a wall of a workpiece/substrate treatment apparatus and having a surface bounded by firs... | 06/15/2004 |
| 6740209 | Multilayer film deposition apparatus, and method and apparatus for manufacturing perpendicular-magnetic-recording media This application discloses a multi-layer film deposition apparatus comprising; plural cathodes comprising targets respectively, a main rotation mechanism for rotating each cathode together, and a substrate holder to hold a substrate onto which a multi-layer film is ... | 05/25/2004 |
