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| Number | Title | Issue Date |
| 7268076 | Apparatus and method for metal plasma vapor deposition and re-sputter with source and bias power frequencies applied through the workpiece Physical vapor deposition and re-sputtering of a barrier layer in an integrated circuit is performed by providing a metal target near a ceiling of the chamber and a wafer support pedestal facing the target near a floor of the chamber. A process gas is introduced int... | 09/11/2007 |
| 7250196 | System and method for plasma plating An exemplary system and method for plasma plating are provided to generate a deposition layer on a substrate. The method for plasma plating includes positioning a substrate within a vacuum chamber, positioning a depositant in a filament within the vacuum chamber, re... | 07/31/2007 |
| 7244344 | Physical vapor deposition plasma reactor with VHF source power applied through the workpiece A physical vapor deposition plasma reactor includes a vacuum chamber including a sidewall, a ceiling and a wafer support pedestal near a floor of the chamber, and a vacuum pump coupled to the chamber, a process gas inlet coupled to the chamber and a process gas sour... | 07/17/2007 |
| 7214619 | Method for forming a barrier layer in an integrated circuit in a plasma with source and bias power frequencies applied through the workpiece A barrier layer is formed in an integrated circuit by providing a metal target near a ceiling of the chamber and a wafer support pedestal facing the target near a floor of the chamber. A process gas is introduced into the vacuum chamber. A target-sputtering plasma i... | 05/08/2007 |
| 7211152 | Heating element CVD system and connection structure between heating element and electric power supply mechanism in the heating element CVD system A heating element CVD system wherein one or a plurality of connection terminal holders is placed in the processing container, and each of the connection terminal holders holds a plurality of connection terminals. Each of the connection terminals connects the heating... | 05/01/2007 |
| 7189437 | Mobile plating system and method An exemplary method for using a mobile plating system is provided that includes locating the mobile plating system at a desired location for plating, positioning an external vacuum pump from an interior position of a mobile storage volume of the mobile plasma platin... | 03/13/2007 |
| 7115832 | Microplasma spray coating apparatus A portable, hand-held microplasma spray coating apparatus comprises an anode, a cathode and an arc gas emitter disposed in a housing, and a powder feeding system, a cooling system and a power source connected to the apparatus. The powder feeding system, cooling syst... | 10/03/2006 |
| 7038389 | Magnetron plasma source A point projection type flood plasma source implements a magnetron sputter cold cathode electron source in a discharge cavity separated from a process chamber by a narrow conduit and a solenoid magnetic field. The solenoid magnetic field impedes radial electron flow... | 05/02/2006 |
| 7011733 | Method and apparatus for depositing films In a sputtering apparatus, target particles to be deposited onto a substrate are selectively ionized relative to other particles in the deposition chamber. For example, titanium or titanium-containing target particles are selectively ionized, while inert particles, ... | 03/14/2006 |
| 6923692 | Electrical connectors incorporating low friction coatings and methods for making them Electrical connectors incorporate a composite coating of molybdenum disulfide and a metal, preferably tin, for one or both of the contact surfaces of the electrical connector. The coating provides for a low coefficient of friction, low contact resistance, and good e... | 08/02/2005 |
| 6905582 | Configurable vacuum system and method An exemplary configurable vacuum system is provided for use in coating or plating that provides the capability and versatility to handle substrates of significantly different shapes and sizes. The configurable vacuum system includes a vacuum table assembly, a mechan... | 06/14/2005 |
| 6878248 | Method of manufacturing an object in a vacuum recipient A method of manufacturing an object in a vacuum treatment apparatus having a vacuum recipient for containing an atmosphere, includes the steps of supporting a substrate on a work piece carrier arrangement in the recipient and treating the substrate to manufacture th... | 04/12/2005 |
| 6858119 | Mobile plating system and method An exemplary mobile plating system is provided for performing a plating process using virtually any known or available deposition technology for coating or plating as substrate. The mobile plating system may include a vacuum chamber positioned in a mobile storage vo... | 02/22/2005 |
| 6758947 | Damage-free sculptured coating deposition We disclose a method of applying a sculptured layer of material on a semiconductor feature surface using ion deposition sputtering, wherein a surface onto which the sculptured layer is applied is protected to resist erosion and contamination by impacting ions of a d... | 07/06/2004 |
| 6651582 | Method and device for irradiating an ion beam, and related method and device thereof When ion beam 14 is irradiated onto a substrate 2 to conduct processing such as ion injection, plasma 30 emitted from a plasma generating device 20 is supplied to a portion close to the substrate 2 to suppress electric charging on a substrate surface caus... | 11/25/2003 |
| 6524431 | Apparatus for automatically cleaning mask An apparatus for automatically cleaning a mask applied to a mask cleaning step after an evaporation process. An RF plasma is used to clean the mask. By isolating the RF plasma generator, the wafer table and the mask table from the grounded reaction chambe... | 02/25/2003 |
| 6521104 | Configurable vacuum system and method An exemplary configurable vacuum system and method are provided for use in coating or plating that provides the capability to handle substrates of significantly different shapes and sizes. The configurable vacuum system includes a vacuum table assembly an... | 02/18/2003 |
| 6516233 | Pulse plating rectifiers and methods, systems and computer program products for controlling pulse plating rectifiers in master/slave mode Methods, systems and computer program products for controlling plating pulse rectifiers are provided by identifying one of the plurality of plating pulse rectifiers as a master plating pulse rectifier and identifying at least one of the plurality of plati... | 02/04/2003 |
| 6503379 | Mobile plating system and method An exemplary mobile plating system and method are provided for performing a plating process using virtually any known or available deposition technology for coating or plating. The mobile plating system may include a vacuum chamber positioned in a mobile ... | 01/07/2003 |
| 6447652 | Thin-film forming method and thin-film forming apparatus A Raman spectrum of a thin film which must be formed is measured in a thin-film forming step for forming the thin film on a member to be processed in an atmosphere, the pressure of which has been reduced. Moreover, the conditions under which the thin film... | 09/10/2002 |
| 6435130 | Plasma CVD apparatus and plasma processing method A plasma CVD apparatus comprising a substantially enclosed reaction chamber containing substrate holding means and a cathode electrode arranged therein, wherein a high frequency power from a high frequency power source is supplied to said cathode electrod... | 08/20/2002 |
| 6394025 | Vacuum film growth apparatus A correction mechanism including a magnetic body (51) is placed at a position between a vacuum chamber (21) and a steering coil (23) and where line of magnetic force generated from the steering coil is present, to correct torsion and/or bias of a plasma b... | 05/28/2002 |
| 6294479 | Film forming method and apparatus A method and apparatus for radiation of ions from an ion source 4 onto a surface of an objective substrate T and vacuum evaporation of a predetermined material from an evaporation source 5 onto the surface of the substrate, simultaneously while the substr... | 09/25/2001 |
| 6261634 | Apparatus and method for forming film When a thin film is formed on a flexible and filmy substrate by a vapor phase method, the substrate is prevented from warping to be caused by the internal stress remaining in the thin film. When the thin film is formed by the vapor phase method, the subst... | 07/17/2001 |
| 6238532 | Radio-frequency coil for use in an ionized physical vapor deposition apparatus A cooling structure and a reinforcing structure are described for use with a radio-frequency coil in an ionized physical vapor deposition apparatus. The cooling structure includes a portion for carrying coolant and is proximate to the RF coil along the ou... | 05/29/2001 |
| 6217951 | Impurity introduction method and apparatus thereof and method of manufacturing semiconductor device An impurity solid including boron as impurity and a solid sample to which boron is introduced are held in a vacuum chamber. Ar gas is introduced into the vacuum chamber to generate plasma composed of the Ar gas. A voltage allowing the impurity solid to se... | 04/17/2001 |
| 6182604 | Hollow cathode for plasma doping system A plasma doping apparatus includes a hollow cathode to increase throughput and uniformity of ion implantations in a target. The hollow cathode is located adjacent an anode and a target cathode on which a target is placed. An ionizable gas is provided in a... | 02/06/2001 |
| 6149783 | Vacuum treatment apparatus A vacuum treatment apparatus (FIG. 13) includes a vacuum recipient or chamber (3) for containing an atmosphere. A mechanism (50,52) for generating electrical charge carriers in the atmosphere is provided in the recipient, the electrical charge carriers be... | 11/21/2000 |
| 6120660 | Removable liner design for plasma immersion ion implantation A plasma treatment system (200) for implantation with a novel susceptor with a silicon coating (203). The system (200) has a variety of elements such as a chamber, which can have a silicon coating formed thereon, in which a plasma is generated in the cham... | 09/19/2000 |
| 6089186 | Vacuum coating forming device The invention provides a vacuum coating forming device for forming a thin-film coating by a plasma beam on a substrate arranged in a vacuum chamber, the vacuum coating forming device being provided with a pressure gradient type plasma gun for generating t... | 07/18/2000 |
| 6086959 | Boron and nitrogen containing coating and method for making A coating scheme comprising a boron and nitrogen containing layer that satisfactorily adheres to a substrate is disclosed. The satisfactorily adherent coating scheme comprises a base layer, a first intermediate layer, a second intermediate layer and the b... | 07/11/2000 |
| 6054185 | Substrate with superhard coating containing boron and nitrogen and method of making the same A cutting tool includes a substrate and a coating on the substrate. The coating includes a base adhesion layer that is on at least a portion of the substrate. A first intermediate adhesion layer, which includes boron and a first element, that is on the ba... | 04/25/2000 |
| 6035805 | Method and apparatus for vacuum deposition of highly ionized media in an electromagnetic controlled environment A method and apparatus for vacuum depositing a coating onto a substrate are provided. The method includes the steps of: introducing an evaporant into a magnetically defined deposition region of a vacuum process chamber, ionizing the evaporant to form a pl... | 03/14/2000 |
| 5970908 | Apparatus and improved polymerization gun for coating objects by vacuum deposit An apparatus for initial ion cleaning, vapor metal deposition and protective coating of objects by vacuum deposition. The apparatus includes a vacuum chamber for receiving the objects which are held on a movable rack or support. A metal such as aluminum i... | 10/26/1999 |
| 5964989 | Ionized PVD device and method of manufacturing semiconductor device Provided are an ionized PVD device capable of performing film formation having excellent vertical growth, and more particularly an ionized PVD device having a comparatively simple structure in which a rate of a metal film formed by neutral metal atoms can... | 10/12/1999 |
| 5948224 | Method of controlling a treatment process and vacuum treatment apparatus A vacuum treatment apparatus eliminate arcing in a vacuum recipient for containing an atmosphere and having a mechanism for generating electrical charge carriers in the atmosphere. A workpiece carrier arrangement and at least two electro-conductive surfac... | 09/07/1999 |
| 5919342 | Method for depositing golden titanium nitride Golden TiN films having uniform sheet resistance are deposited from a plasma sputtering chamber by initially saturating the chamber with nitrogen using high nitrogen gas flow rates and then reducing the nitrogen gas flow rates and reducing the pressure in... | 07/06/1999 |
| 5910220 | Apparatus and method for selective area deposition of thin films on electrically biased substrates An ion beam deposition process for selective area deposition on a polarized substrate uses a potential applied to the substrate which allows the ionized particles to reach into selected areas for film deposition. Areas of the substrate to be left uncoated... | 06/08/1999 |
| 5895531 | Apparatus and polymerization gun for coating objects by vacuum deposit An apparatus for initial ion cleaning, vapor metal deposition and protective coating of objects by vacuum deposition. The apparatus includes a vacuum chamber for receiving the objects which are held on a movable rack or support. A metal such as aluminum i... | 04/20/1999 |
| 5891312 | Enhanced vacuum arc vapor deposition electrode A process for forming a thin metal coating on a substrate wherein a gas stream heated by an electrical current impinges on a metallic target in a vacuum chamber to form a molten pool of the metal and then vaporize a portion of the pool, with the source of... | 04/06/1999 |
