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Class 204/192.29 - Transparent conductor


Subclass of Class 204 - Chemistry: electrical and wave energy
Definition: Processes wherein the material is electrically conductive
No. of patents: 181
Last issue date: 12/20/2011


1          
NumberTitleIssue Date
8080141ITO-coated article and/or method of making the same via heat treating
Certain example embodiments of this invention relate to techniques for making a coated article including a transparent conductive indium-tin-oxide (ITO) film supported by a heat treated glass substrate. A substantially sub-oxidized ITO or metallic indium-tin (InSn) ...
12/20/2011
7763151Process for producing transparent conductive laminate
A process for producing a transparent conductive laminate having a completely crystallized, transparent conductive layer on a substrate comprising an organic polymer molding is provided. The transparent conductive layer is excellent in transparency and wet heat conf...
07/27/2010
7744731Sputtering apparatus of forming thin film
A sputtering deposit apparatus capable of depositing a thin film having uniform sheet resistance value is provided. The sputtering deposit apparatus is arranged with at least two magnetron sputtering units within a film deposit chamber. On the upstream side in the s...
06/29/2010
7674357Transparent electroconductive film and process for producing same
There are provided: (1) a process for producing an InSbO4-containing transparent electroconductive film, which comprises the step of sputtering simultaneously: (i) a target (A) for sputtering...
03/09/2010
7628896Coated article with transparent conductive oxide film doped to adjust Fermi level, and method of making same
A transparent conductive oxide (TCO) based film is formed on a substrate. The film may be formed by sputter-depositing, so as to include both a primary dopant (e.g., Al) and a co-dopant (e.g., Ag). The benefit of using the co-dopant in depositing the TCO inclusive f...
12/08/2009
7365327Electromagnetic radiation sensor and method for fabricating the same
An SiO2 layer (3), a Ti layer (4), a Pt layer (5), a PLZT layer (6) and an IrO2 layer (7) are formed sequentially on an Si substrate (2). The IrO2 layer (7) functioning as a top electr...
04/29/2008
7347958Oxide sintered body and sputtering target, and manufacturing method for transparent conductive oxide film as electrode
An oxide sintered body for sputtering target is provided wherein the main component is indium oxide, and it contains titanium such that the atomic ratio of Ti/In is 0.003 to 0.120, and the specific resistance is 1 kΩm or less. ...
03/25/2008
7338820Laser patterning of encapsulated organic light emitting diodes
Patterning an organic light emitting diode (OLED) after it has been encapsulated by permanently changing the light emissivity of the diodes. The OLED includes an intervening layer providing a pressure sensitive touch panel or touch screen panel. Depending on the com...
03/04/2008
7309405Method of forming ITO film
Disclosed is a method of forming an ITO film by optimized sequential sputter deposition of seed and bulk layers having different sputter process conditions, which is applicable to various display devices, and more particularly, to an organic light-emitting device ne...
12/18/2007
7303809Process for forming electrodes
Substantially transparent electrodes are formed upon a substrate by forming on the substrate, in order, a high index layer, a metallic conductive layer, and a conductive or semi-conductive top layer; and patterning the top layer and the conductive layer, preferably ...
12/04/2007
7294517Light emitting device and method of fabricating the same
It is characteristic of an organic material suited to an interlayer insulating film to transmit vapor therethrough and to be liable to absorb moisture, and the material has a disadvantage that it is extremely susceptible to oxygen and moisture to be readily deterior...
11/13/2007
7282240Elastomeric mask and use in fabrication of devices
An elastomeric mask is provided that allows deposition of a variety of materials through mask openings. The mask seals effectively against substrate surfaces, allowing simple deposition from fluid phase, gas phase, and the like or removal of material using gaseous o...
10/16/2007
7282123Composite sputter target and phosphor deposition method
The invention is a novel sputter target and deposition method for multi-element thin film phosphors for thick film dielectric electroluminescent displays in which the deposited phosphors provide a high luminance and colors required for TV applications. The method co...
10/16/2007
7256923Switchable window based on electrochromic polymers
Syntheses of a new blue EC monomer (ProDOT-MePro), and a new red EC monomer (ProDOP-Et2) are described. Two additional new types of EC monomers based on 3,4-alkylenedioxythiophene include fluorinated EC monomers and an EC monomer including silicon. EC polymer device...
08/14/2007
7175880Surface treatment system and method
A surface treatment system in which gas for a deposition reaction is injected into a deposition chamber and power is applied to form a deposition reaction to form a deposition layer at a surface of an object or surface treatment, wherein the deposition chamber has a...
02/13/2007
7158206Sputter for deposition of metal layer and fabricating method of liquid crystal display device using the same
A fabricating method of a liquid crystal display device includes forming a gate line on a first substrate, forming a data line crossing the gate line, forming a switching element connected to the gate line and the data line, forming a pixel electrode connected to th...
01/02/2007
7153453Oxide sintered body, sputtering target, transparent conductive thin film and manufacturing method therefor
There is provided an amorphous transparent conductive thin film with a low resistivity, a low absolute value for the internal stress of the film, and a high transmittance in the visible light range, an oxide sintered body for manufacturing the amorphous transparent ...
12/26/2006
7153708Seed layer processes for MOCVD of ferroelectric thin films on high-k gate oxides
A method of forming a ferroelectric thin film on a high-k layer includes preparing a silicon substrate; forming a high-k layer on the substrate; depositing a seed layer of ferroelectric material at a relatively high temperature on the high-k layer; depositing a top ...
12/26/2006
7141186Oxide sintered body and sputtering target, and manufacturing method for transparent conductive oxide film as electrode
An oxide sintered body for sputtering target is provided wherein the main component is indium oxide, and it contains titanium such that the atomic ratio of Ti/In is 0.003 to 0.120, and the specific resistance is 1 k.cm or less. ...
11/28/2006
7135097Box-shaped facing-targets sputtering apparatus and method for producing compound thin film
Disclosed is a box-shaped facing-targets sputtering apparatus capable of forming, at low temperature, a compound thin film of high quality while causing minimal damage to an underlying layer. The box-shaped facing-targets sputtering apparatus includes a box-shaped f...
11/14/2006
7133032OLED display and touch screen
An OLED display and touch screen system includes a substrate; an OLED display including an array of individually addressable OLEDs formed on the substrate; and a touch screen including an OLED laser light emitter formed on the substrate, a light sensor formed on the...
11/07/2006
7125503Transparent conductive thin film, process for producing the same, sintered target for producing the same, and transparent, electroconductive substrate for display panel, and organic electroluminescence device
A transparent conductive thin film which can be produced easily by sputtering or the like with a sintered target, needs no post-treatment such as etching or grinding, is low in resistance and excellent in surface smoothness, and has a high transmittance in the low-w...
10/24/2006
7090356Projection type image display apparatus and display device
A projection type image display apparatus includes an electroluminescence element which has a plurality of pixels that can each emit modulated light, a projection optical system which projects the light emitted from each of the pixels in the electroluminescence elem...
08/15/2006
7041391Method for forming thin films
The present invention provides a method for forming a film of aluminum oxide in which a target containing aluminum is sputtered in a gas containing fluorine atoms. The thin film of aluminum oxide according to the present invention has little optical absorptio...
05/09/2006
7041430Information recording media, manufacturing technique and information recording method
Problem to be solved is that when an information recording medium is repeatedly subjected to recording of information several hundreds times, the atoms in a protective layer are diffused and dissolved into a recording layer to lower a reflectivity greatly and make t...
05/09/2006
7038828Electrochromic organic polymer synthesis and devices utilizing electrochromic organic polymers
Large contrast ratio and rapid switching laminated electrochromic (EC) polymer device includes transparent electrode, cathodic EC polymer, gel electrolyte, and counter-electrode. Preferably the cathodic EC polymer is a poly(3,4-propylenedioxythiophene) derivative, P...
05/02/2006
7008519Sputtering target for forming high-resistance transparent conductive film, and method for producing the film
The present invention provides an ITO sputtering target for forming a high-resistance transparent conductive film which target can be used virtually in a DC magnetron sputtering apparatus and can form a high-resistance, transparent film, and a method for producing a...
03/07/2006
7002722Electrochromic organic polymer synthesis and devices utilizing electrochromic organic polymers
Large contrast ratio and rapid switching laminated electrochromic (EC) polymer device includes transparent electrode, cathodic EC polymer, gel electrolyte, and counter-electrode. Preferably the cathodic EC polymer is a poly(3,4-propylenedioxythiophene) derivative, P...
02/21/2006
6995891Electrochromic safety glazing
An electrochromic device is achieved that exhibits the characteristics of impact-resistant safety glass by starting with a solid electrolyte sheet material and a peripheral sealant material sandwiched between substrates to heat and pressure such that the electrolyte...
02/07/2006
6951786Method of forming a stack of refractory metal nitride over refractory metal silicide over silicon
The invention encompasses methods of forming silicide interconnects over silicon comprising substrates. In one implementation, a first layer comprising a metal and a non-metal impurity is formed over a region of a silicon comprising substrate where a silicide interc...
10/04/2005
6936481Method of depositing dielectric
This invention relates to a method of depositing dielectric on a semiconductor substrate to form part of a capacitor. The method includes reactive sputtering a metal oxide layer from a target of metal onto the substrate wherein the support is biased to induce a DC v...
08/30/2005
6860974Long-Term sputtering method
There are provided techniques of forming a back reflecting layer with constant characteristics throughout long-term film formation and forming a metal oxide film so as to be able to maintain a current of a bottom cell and thereby keep a short-circuit current Jsc of ...
03/01/2005
6822158Thin-film solar cell and manufacture method therefor
A thin-film solar cell including a transparent electrode layer, a semiconductor photovoltaic conversion layer, a rear transparent electrode layer and a rear reflective metal layer, said layers being formed in this order on a transparent substrate, wherein the rear t...
11/23/2004
6793782Sputter deposition process for electroluminescent phosphors
The invention is a novel sputter deposition process for thin film phosphors that provide high luminance and colors required for TV applications. ...
09/21/2004
6685805Method of manufacturing substrate having transparent conductive film, substrate having transparent conductive film manufactured using the method, and touch panel using the substrate
In a method of manufacturing a substrate having a transparent conductive film in which sputtering is carried out on a transparent insulating substrate using an indium oxide/tin oxide target under an atmosphere of a mixed gas containing argon and oxygen, w...
02/03/2004
6679977Method of producing flat panels
A method for producing flat panels for TFT or plasma display applications includes forming a sputter source within a sputter coating chamber, the source having at least two electrically mutually isolated stationery bar-shaped target arrangements. A contro...
01/20/2004
6660931Substrate for solar cell, solar cell having the same, and production process of solar cell
A substrate for a solar cell is provided which comprises a support having a metal surface and a zinc oxide film formed on the metal surface and having a water content of 7.5×10-3 mol/cm3 or less, preferably 4.0×10-4 mol/...
12/09/2003
6596135Sputtering target, transparent conductive film, and method for producing the same
A sputtering target which comprises an oxide containing Zn, Al and Y, which can be used for a DC sputtering method, and with which a transparent conductive film having a resistivity of from 10-2 to 1010 Ω.multidot.cm can be produced...
07/22/2003
6596134Method of fabricating transparent contacts for organic devices
A multicolor organic light emitting device employs vertically stacked layers of double heterostructure devices which are fabricated from organic compounds. The vertical stacked structure is formed on a glass base having a transparent coating of ITO or sim...
07/22/2003
6572940Coatings with a silver layer
A glass sheet includes a coating comprising at least one silver layer and inner and outer antireflection layers. The glass sheet is formed by a magnetron sputtering process. The inner antireflection layer is a multiple layer comprising a layer of a titani...
06/03/2003
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