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| Number | Title | Issue Date |
| 7431808 | Sputter target based on titanium dioxide An electrically conductive titanium dioxide sputter target with an electrical resistivity of less than 5 Ω-cm, which contains as an additive at least one doping agent or a mixture of doping agents in an amount of less than 5 mole %. The doping agent or agents are s... | 10/07/2008 |
| 7323088 | Glazing panels A method of manufacturing a glazing panel comprises the steps of: a) taking a glazing panel having on one of its surfaces (i) a substantially transparent coating layer having a transformable portion, and (ii) an enamel material associated with the transformable port... | 01/29/2008 |
| 7314688 | Method of producing a reflection mask blank, method of producing a reflection mask, and method of producing a semiconductor device A reflection mask blank and a method of producing a reflection mask blank by forming, on a substrate, at least a multilayer reflection film for reflecting exposure light and an absorber layer formed on the multilayer reflection film for absorbing the exposure light.... | 01/01/2008 |
| 7303658 | Glass coated with heat reflecting colored film and process for its production A glass coated with a heat reflecting colored film, which is excellent in the uniformity of the film thickness and composition, which is free from a unfavorable whitish coloration in ceramic color printing and which is excellent in a silver print coloration, is pres... | 12/04/2007 |
| 7291251 | Method of making coated article with IR reflecting layer(s) using krypton gas A method of making a coated article is provided, where the coated article may be used in a window or the like and may have at least one infrared (IR) reflecting layer in a low-E coating. The IR reflecting layer may be of silver or the like. In certain example embodi... | 11/06/2007 |
| 7276442 | Method for forming a metallization layer A method for depositing metal on a semiconductor device having a substrate, an exposed first surface, and an exposed second surface is provided. Metal ions are deposited on the exposed first surface and on the exposed second layer by applying a first voltage between... | 10/02/2007 |
| 7267748 | Method of making coated article having IR reflecting layer with predetermined target-substrate distance A coated article is provided, where a coating is supported by a substrate. The coating may include at least one infrared (IR) reflecting layer of or including Ag, Au or the like. The IR reflecting layer(s) may be sandwiched between first and second dielectric layers... | 09/11/2007 |
| 7238262 | System and method of coating substrates and assembling devices having coated elements A system and method of coating curved substrates and assembling devices having coated elements. The system and method are of particular utility in the manufacture of lamps having a coating formed on the hermetically sealed light emitting chamber of the lamp. The sys... | 07/03/2007 |
| 7229533 | Method of making coated article having low-E coating with ion beam treated and/or formed IR reflecting layer A coated article is provided that may be used as a vehicle windshield, insulating glass (IG) window unit, or the like. An ion beam is used during at least part of forming an infrared (IR) reflecting layer(s) of such a coated article. Advantageously, this has been fo... | 06/12/2007 |
| 7198699 | Sputter coating apparatus including ion beam source(s), and corresponding method A coating apparatus deposits a first coating (single or multi-layered) onto a first side of a substrate (e.g., glass substrate) passing through the apparatus, and a second coating (single or multi-layered) onto the other or second side of the substrate. In certain e... | 04/03/2007 |
| 7192647 | Concentration-modulated coatings The invention provides a substrate bearing a low-emissivity coating. The low-emissivity coating comprises at least one graded film region. In certain embodiments, at least one graded film region is provided between the two infrared-reflective layers of a double-type... | 03/20/2007 |
| 7189317 | Semiconductor manufacturing system for forming metallization layer A method for forming a metallization layer. A first layer is formed outwardly from a semiconductor substrate. Contact vias are formed through the first layer to the semiconductor substrate. A second layer is formed outwardly from the first layer. Portions of the sec... | 03/13/2007 |
| 7126195 | Method for forming a metallization layer A method for forming a metallization layer (30). A first layer (14) is formed outwardly from a semiconductor substrate (10). Contact vias (16) are formed through the first layer (14) to the semiconductor substrate (10). A se... | 10/24/2006 |
| 7070657 | Method and apparatus for depositing antireflective coating This invention provides a stable process for depositing an antireflective layer. Helium gas is used to lower the deposition rate of plasma-enhanced silane oxide, silane oxynitride, and silane nitride processes. Helium is also used to stabilize the process, so that d... | 07/04/2006 |
| 7067414 | Low k interlevel dielectric layer fabrication methods A low k inter-level dielectric layer fabrication method includes providing a substrate having integrated circuitry at least partially formed thereon. An oxide-comprising inter-level dielectric layer including carbon and having a dielectric constant no greater than 3... | 06/27/2006 |
| 7052585 | Coated article including titanium oxycarbide and method of making same A coated article is provided which includes a layer including titanium oxycarbide. In order to form the coated article, a layer of titanium oxide is deposited on a substrate by sputtering or the like. After sputtering of the layer including titanium oxide, an ion be... | 05/30/2006 |
| 7008066 | Antiglare film process for producing the same, and display device using antiglare film Disclosed is an antiglare film having excellent durability. The antiglare film is disposed on the front of a display device and comprises a transparent plastic film and, formed on the transparent plastic film, at least an antiglare layer having fine concaves and con... | 03/07/2006 |
| 6940172 | Chemical vapor deposition of titanium A titanium layer is formed on a substrate with chemical vapor deposition (CVD). First, a seed layer is formed on the substrate by combining a first precursor with a reducing agent by CVD. Then, the titanium layer is formed on the substrate by combining a second prec... | 09/06/2005 |
| 6936405 | Organic polymeric antireflective coatings deposited by chemical vapor deposition An improved method for applying organic antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise chemical vapor depositing (CVD) an antireflective compound on the substrate surface. In one embod... | 08/30/2005 |
| 6911125 | Thin film producing method and light bulb having such thin film When forming an optical thin film on a surface of a bulb of a light source such as an electric lamp or a discharge lamp, a thin film whose interface/surface is less rough is formed on a base having a spheroid shape. When forming a thin film on a base 2 with a... | 06/28/2005 |
| 6903462 | Chemical vapor deposition of titanium A titanium layer is formed on a substrate with chemical vapor deposition (CVD). First, a seed layer is formed on the substrate by combining a first precursor with a reducing agent by CVD. Then, the titanium layer is formed on the substrate by combining a second prec... | 06/07/2005 |
| 6860974 | Long-Term sputtering method There are provided techniques of forming a back reflecting layer with constant characteristics throughout long-term film formation and forming a metal oxide film so as to be able to maintain a current of a bottom cell and thereby keep a short-circuit current Jsc of ... | 03/01/2005 |
| 6855369 | Transparent laminate, method for producing the same, and plasma display panel In a transparent laminate, n thin-film units (n=3 or 4) are laminated unit by unit successively on a surface of a substrate, and a high-refractive-index transparent thin film is deposited on a surface of the laminate of the n thin-film units, each of the n thin-film... | 02/15/2005 |
| 6808606 | Method of manufacturing window using ion beam milling of glass substrate(s) This invention relates to a method of making a window (e.g., vehicle windshield, architectural window, etc.), and the resulting window product. At least one glass substrate of the window is ion beam treated and/or milled prior to application of a coating (e.g., sput... | 10/26/2004 |
| 6800179 | Heat treatable coated article with anti-migration barrier between dielectric and solar control layer portion, and methods of making same A heat treatable coated article includes an oxidation graded layer designed so as to include an at least partially oxided anti-migration or barrier layer(s) portion provided between a solar management layer portion (e.g., NiCr layer portion) and a dielectric layer (... | 10/05/2004 |
| 6740211 | Method of manufacturing windshield using ion beam milling of glass substrate(s) This invention relates to a method of making a laminated window such as a vehicle windshield. At least one of the two glass substrates of the window is ion beam milled prior to heat treatment and lamination. As a result, defects in the resulting window and/or haze m... | 05/25/2004 |
| 6726814 | Process for producing optical article A process for producing an optical article includes laminating a first optically transparent thin layer and a second optically transparent thin layer having a higher refractive index than that of the first optically transparent thin layer on a surface of a substrate... | 04/27/2004 |
| 6635155 | Method for preparing an optical thin film A method for forming an optical thin film having multiple optical layers on the surface of a substrate using a magnetron sputtering apparatus with a sputtering chamber having cathodes, the substrate, and at least two kinds of targets disposed therein. An ... | 10/21/2003 |
| 6630058 | Method and apparatus for manufacturing film with conductive sheet, for touch-panel, and film manufactured thereby A tensile force is applied to at least a surface of a film to which a conductive material is applied within an elastic limit by a tensile force applying means, the conductive material is applied to a first surface of the film by a coating means in a tensi... | 10/07/2003 |
| 6579427 | Coated articles Multilayer high transmittance, low emissivity coatings on transparent substrates feature a special antireflective base film of at least two parts on the substrate-near side of a metallic, reflective film. A first of the two parts is in contact with the me... | 06/17/2003 |
| 6569293 | Magnetron sputtered boron films for increasing hardness of a metal surface A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor ... | 05/27/2003 |
| 6559593 | Sputter deposition A method of sputter deposition onto an organic material, wherein the discharge gas of the sputtering operation is a gas having a spectrum of light emission of a lower energy than that of argon.... | 05/06/2003 |
| 6478932 | Combination process of vacuum sputtering and wet coating for high conductivity and light attenuation anti-reflection coating on CRT surface A combination process of vacuum sputtering and wet coating produces a high conductivity and light attenuation anti-reflection coating on a substrate of a CRT surface. The coating includes five layers by vacuum sputtering and one layer on top of the coatin... | 11/12/2002 |
| 6447963 | Method of making a light quantity correction filter and method of manufacturing a color cathode ray tube using the light quantity correction filter made by the method A light quantity correction filter that can implement the desired transmittance distribution precisely and easily without complicating an exposure system, a method of making the light quantity correction filter, and a method of manufacturing a color catho... | 09/10/2002 |
| 6412307 | Heat treatable coated glass A heat-treatable coated glass article comprises a substantially transparent substrate with a substantially transparent dual-function coating on a surface of the substrate. The coating provides low emissivity and high anti-solar performance properties. It ... | 07/02/2002 |
| 6383346 | Method for forming thin films The present invention provides a method for forming a film of aluminum oxide in which a target containing aluminum is sputtered in a gas containing fluorine atoms. The thin film of aluminum oxide according to the present invention has little optical absor... | 05/07/2002 |
| 6325901 | Method of producing a cathode-ray tube and apparatus therefor At least an effective region of the face of a panel of a cathode ray tube is held within a vacuum chamber. After the vacuum chamber is hermetically sealed from the outside of the vacuum chamber, a thin film is formed on the face of the panel by using a fi... | 12/04/2001 |
| 6264805 | Method of fabricating transparent contacts for organic devices A multicolor organic light emitting device employs vertically stacked layers of double heterostructure devices which are fabricated from organic compounds. The vertical stacked structure is formed on a glass base having a transparent coating of ITO or sim... | 07/24/2001 |
| 6210542 | Process for producing thin film, thin film and optical instrument including the same A substrate 2 is autorotatably installed in a vacuum chamber 1 at an upper part thereof. MgF2 granules 3 as a film source material are put in a quartz boat 4 and mounted on a magnetron cathode 5. The magnetron cathode 5 is connected through a m... | 04/03/2001 |
| 6171458 | Method for manufacturing an absorbent layer for solar collectors, a device for performing the method and an absorbent layer for solar collectors A spectral selective absorbing surface on solar collector elements has a very high solar absorbing ability, in the range of 96% to 97% and a low thermal emittance, in the order of 10%, and can be produced with high capacity in industrial scale. A reactive... | 01/09/2001 |
