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Class 204/192.22 - Insulator or dielectric


Subclass of Class 204 - Chemistry: electrical and wave energy
Definition: Processes wherein the material is characterized by low electrical
No. of patents: 394
Last issue date: 04/03/2012


1                    
NumberTitleIssue Date
8147657Sputtering device and film forming method
A sputtering apparatus according to the present invention is provided with first to fourth targets. The first and the second targets are disposed so that their surfaces face each other. The third and the fourth targets are also disposed so that their surfaces face e...
04/03/2012
7837838Method of fabricating a high dielectric constant transistor gate using a low energy plasma apparatus
The present invention generally provides methods and apparatuses that are adapted to form a high quality dielectric gate layer on a substrate. Embodiments contemplate a method wherein a metal plasma treatment process is used in lieu of a standard nitridization proce...
11/23/2010
7431808Sputter target based on titanium dioxide
An electrically conductive titanium dioxide sputter target with an electrical resistivity of less than 5 Ω-cm, which contains as an additive at least one doping agent or a mixture of doping agents in an amount of less than 5 mole %. The doping agent or agents are s...
10/07/2008
7407565Method and apparatus for ionized plasma deposition
A system for performing PVD of metallic nitride(s) is disclosed. The improved performance is provided by a method of increasing the partial pressures of nitrogen or other active gases near the wafer surface through initial introduction of the argon or other neutral ...
08/05/2008
7404877Low temperature zirconia based thermal barrier layer by PVD
Formation of a zirconia based thermal barrier layer is described. In accordance with the present invention, a thermal barrier layer composed of zirconia or an allow of zirconia is presented. An advantageous layer might be composed of zirconia or an alloy of zirconia...
07/29/2008
7393600Sputtering target, sintered article, conductive film fabricated by utilizing the same, organic EL device, and substrate for use therein
A sintered article is fabricated which contains one or more of indium oxide, zinc oxide, and tin oxide as a component thereof and contains any one or more types of metal out of hafnium oxide, tantalum oxide, lanthanide oxide, and bismuth oxide. A backing plate is at...
07/01/2008
7357969Phase-change optical recording medium
A phase-change optical recording medium has a first information layer including a phase-change optical recording film arranged in a position close to the light incident side, a second information layer including another phase-change optical recording film arranged i...
04/15/2008
7338582Method for manufacturing manganese oxide nanostructure and oxygen reduction electrode using said manganese oxide nanostructure
It is an object of the present invention to provide an oxygen reduction electrode having excellent oxygen reduction catalysis ability. In a method of manufacturing a manganese oxide nanostructure having excellent oxygen reduction catalysis ability and composed of se...
03/04/2008
7338581Sputtering apparatus
A sputtering apparatus includes paired targets 31 disposed in a vacuum chamber 30, substrate holder 33 disposed at a position nearly perpendicular to the paired target 31 and apart from a space formed by the paired targets 31, a pl...
03/04/2008
7328497Incremental tuning process for electrical resonators based on mechanical motion
A method is provided for adjusting the resonant frequency of a mechanical resonator whose frequency is dependent on the overall resonator thickness. Alternating selective etching is used to remove distinct adjustment layers from a top electrode. One of the electrode...
02/12/2008
7316764System and method for performing sputter etching using independent ion and electron sources and a substrate biased with an a-symmetric bi-polar DC pulse signal
A system and method for performing sputter etching includes an ion source that generates an ion current that is directed at a substrate and an electron source that generates an electron current directed at the substrate. Biasing circuitry biases the substrate with a...
01/08/2008
7312120Method for obtaining extreme selectivity of metal nitrides and metal oxides
Methods for etching metal nitrides and metal oxides include using ultradilute HF solutions and buffered, low-pH HF solutions containing a minimal amount of the hydrofluoric acid species H2F2. The etchant can be used to selectively remove metal ...
12/25/2007
7309616Laser annealing of complex metal oxides (CMO) memory materials for non-volatile memory integrated circuits
A method is disclosed to effectively achieve a low deposition temperature of CMO memory materials by depositing the CMO memory material at relatively low temperatures that give an amorphous film, then to later melt and re-crystallize the CMO memory material with a l...
12/18/2007
7303788Method for manufacturing solar cell module having a sealing resin layer formed on a metal oxide layer
The present invention provides a method for manufacturing a solar cell module having photovoltaic elements in each of which a metal oxide layer made of a metal oxide forms an outermost surface part thereof at a light incident side, and a sealing resin layer formed o...
12/04/2007
7294404Graded photocatalytic coatings
The invention provides graded photocatalytic coatings. In one aspect, the invention provides a substrate carrying a photocatalytic coating that includes a first graded film region and a second graded film region. The first graded film region has a substantially cont...
11/13/2007
7285312Atomic layer deposition for turbine components
A method and superalloy component for depositing a layer of material onto gas turbine engine components by atomic layer deposition. A superalloy component may have a ceramic thermal barrier coating on at least a portion of its surface, comprising a superalloy substr...
10/23/2007
7272094Methods and devices for recording marks in an information layer of an optical record carrier, and record carriers for use therein
Methods and devices are described for writing an optical record carrier, in which a mark representing recorded data is written in a phase-change layer of a record carrier by a sequence of radiation pulses. A rear heating pulse 24 is introduced after a last wr...
09/18/2007
7247227Buffer layer in flat panel display
In devices such as flat panel displays, an aluminum oxide layer is provided between an aluminum layer and an ITO layer when such materials would otherwise be in contact to protect the ITO from optical and electrical defects sustained, for instance, during anodic bon...
07/24/2007
7235160Hollow cathode sputtering apparatus and related method
The present invention provides an improved hollow cathode method for sputter coating a substrate. The method of the invention comprises providing a channel for gas to flow through, the channel defined by a channel defining surface wherein one or more portions of the...
06/26/2007
7226528Methods of making coated articles by sputtering silver in oxygen inclusive atmosphere
A sputter coated article is provided with improved mechanical durability (e.g., pre-HT scratch resistance) and/or thermal stability by sputtering at least one Ag inclusive layer in an atmosphere including at least O2 gas. For instance, in certain example ...
06/05/2007
7220517Solid electrolyte and battery employing the same
A solid electrolyte, a method of manufacturing the same, and a lithium battery and a thin-film battery that employ the solid electrolyte are provided. The solid electrolyte contains nitrogen to enhance the ionic conductivity and electrochemical stability of batterie...
05/22/2007
7217669Method of forming a metal oxide film
A method of forming a dielectric film composed of metal oxide under an atmosphere of activated vapor containing oxygen. In the method of forming the dielectric film, a metal oxide film is formed on a semiconductor substrate using a metal organic precursor and O...
05/15/2007
7214295Method for tantalum pentoxide moisture barrier in film resistors
The present invention discloses a method of manufacturing a thin film resistor with a moisture barrier by depositing a metal film layer on a substrate and depositing a layer of tantalum pentoxide film overlaying the metal film layer. The present invention also inclu...
05/08/2007
7211497Method for fabricating semiconductor devices
According to the present invention, an oxide film with the film quality almost equivalent to that of the thermal oxide can be formed by the low-temperature treatment. After removing an insulator on the active region of the substrate which constitutes a semiconductor...
05/01/2007
7198699Sputter coating apparatus including ion beam source(s), and corresponding method
A coating apparatus deposits a first coating (single or multi-layered) onto a first side of a substrate (e.g., glass substrate) passing through the apparatus, and a second coating (single or multi-layered) onto the other or second side of the substrate. In certain e...
04/03/2007
7194801Thin-film battery having ultra-thin electrolyte and associated method
A method and system for fabricating solid-state energy-storage devices including fabrication films for devices without an anneal step. A film of an energy-storage device is fabricated by depositing a first material layer to a location on a substrate. Energy is suppl...
03/27/2007
7192494Method and apparatus for annealing copper films
A method and apparatus for annealing copper. The method comprises forming a copper layer by electroplating on a substrate in an integrated processing system and annealing the copper layer in a chamber inside the integrated processing system. ...
03/20/2007
7192625Manufacturing method of barrier-forming film
In manufacturing a barrier-forming film, a vapor-deposited inorganic oxide film is provided on a face of a substrate film. An annealing treatment is applied to the substrate film having said vapor-deposited inorganic film. The substrate film is a resinous film which...
03/20/2007
7189313Substrate support with fluid retention band
An apparatus and method for supporting a substrate is provided. In one embodiment, an apparatus for supporting a substrate includes a body having a band extending therefrom. The band is adapted to retain a fluid on the body thereby forming a shallow processing bath ...
03/13/2007
7182816Particulate reduction using temperature-controlled chamber shield
Particle flaking is reduced in a semiconductor wafer processing apparatus by installing a chamber shield assembly in the chamber of the apparatus. The shield assembly includes a plurality of nested shields that are supported out of contact with each other and suspen...
02/27/2007
7172947High dielectric constant transition metal oxide materials
A transition metal oxide dielectric material is doped with a non-metal in order to enhance the electrical properties of the metal oxide. In a preferred embodiment, a transition metal oxide is deposited over a bottom electrode and implanted with a dopant. In a prefer...
02/06/2007
7138039Liquid isolation of contact rings
Embodiments of the invention may further provide a contact ring for an electrochemical plating system. The contact generally includes a substrate receiving member having a substrate support surface formed thereon, a plurality of electrical contact pins extending fro...
11/21/2006
7132147Phase-change optical recording medium
A phase-change optical recording medium has a phase-change recording film to which recording and erasure can be reversibly performed by irradiation with light, and at least one dielectric film formed of a SiOC film containing Si, O and C, and having a carbon concent...
11/07/2006
7116516Magnetic head having write head with helical coil and method for fabrication thereof
The present invention is a magnetic head having a helical induction coil and includes hard disk drive devices that utilize the magnetic head. The helical coil is fabricated around a magnetic pole yoke in a series of process steps that include a reactive ion etch (RI...
10/03/2006
7087144Contact ring with embedded flexible contacts
A contact assembly for supporting a substrate in an electrochemical plating system, wherein that contact assembly includes a contact ring and a thrust plate assembly. The contact ring includes an annular ring member having an upper surface and a lower surface, an an...
08/08/2006
7081268In-situ post-deposition oxidation treatment for improved magnetic recording media
A method of manufacturing a magnetic recording medium comprises sequential steps of: (a) providing an apparatus for manufacturing the medium; (b) supplying the apparatus with a substrate for the medium; ...
07/25/2006
7078785Semiconductor device and making thereof
By forming a conductive smoothing layer over the bottom electrode and/or a capacitor dielectric, a MIM capacitor with improved reliability due to reduction of geometrically enhanced electric fields and electrode smoothing is formed. In one embodiment, layer includin...
07/18/2006
7063984Low temperature deposition of complex metal oxides (CMO) memory materials for non-volatile memory integrated circuits
A memory fabrication apparatus includes a pair of targets arranged so as to be spaced apart from one another within a closed vacuum vessel, each target of said pair of targets having a sputtering surface facing the sputtering surface of the other target of said pair...
06/20/2006
7060338Phase-change optical recording medium
A phase-change optical recording medium capable of performing recording and reproduction at a high speed is provided, in which a reproduced signal output is not only sufficiently large but the phase-change optical recording medium also has excellent repeated rewriti...
06/13/2006
7052584Method of forming a capacitor
A method of forming a capacitor having a capacitor dielectric layer comprising ABO3, where “A” is selected from the group consisting of Sn and Group IIA metal elements and mixtures thereof, where “B” is selected from the group consisting of Group ...
05/30/2006
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