Did You Know...
...that Thomas Edison's patent application on his phonograph was approved by the Patent Office in just seven weeks? In contrast, it took Gordon Gould, the inventor of the laser, 30 years to obtain his patent -- finally awarded in 1988!
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| Number | Title | Issue Date |
| 8163129 | Method and apparatus for cleaning a substrate In a method and an apparatus for cleaning a substrate using a laser beam, an inner chamber is disposed in a process chamber to define a space in which a laser-induced shock wave is generated. The laser beam is focused on a laser focus positioned in the inner chamber... | 04/24/2012 |
| 7442274 | Plasma etching method and apparatus therefor A fluorine-containing compound gas, e.g., SF6 gas, is converted into a plasma and a silicon portion of an object to be processed is etched by the plasma. At the same time, using a light source having a peak intensity of light in a wavelength range of ligh... | 10/28/2008 |
| 7435983 | Device for injecting electromagnetic radiation into a reactor Device for injecting electromagnetic radiation into a reactor and a reactor comprising this device A device for injecting electromagnetic radiation into a reactor for carrying out free-radical gas-phase reactions and a reactor comprising such a device are des... | 10/14/2008 |
| 7332731 | Radiation system and lithographic apparatus A radiation system for providing a projection beam of radiation is disclosed. The radiation system includes an extreme ultraviolet source for providing extreme ultra violet radiation, and a contamination barrier that includes a plurality of closely packed foil plate... | 02/19/2008 |
| 7323060 | Substrate treating apparatus A forward direction-only path (first substrate transport path) is formed for transporting substrates in a forward direction to pass the substrates on to an exposing apparatus. A separate, substrate transport path (second substrate transport path) is formed exclusive... | 01/29/2008 |
| 7297895 | Apparatus for removal of minute particles from a surface using thermophoresis to prevent particle redeposition A method and apparatus for removing minute particles from a surface of a sample are provided that prevent redeposition of the particles onto the surface. By combining thermophoresis with laser assisted particle removal (LAPR), the methods and apparatus remove minute... | 11/20/2007 |
| 7270724 | Scanning plasma reactor A scanning plasma reactor for exciting reactant gases at a substrate surface including a beam forming module, a gas injection module, a reaction chamber with a window and a vacuum chuck, a gas exhaust module. Radiation from the beam forming module and the reactant g... | 09/18/2007 |
| 7251012 | Lithographic apparatus having a debris-mitigation system, a source for producing EUV radiation having a debris mitigation system and a method for mitigating debris A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a patter... | 07/31/2007 |
| 7250871 | Particulate detector An apparatus and method are provided for detecting presence in gas of transient particulate above its normal zero or acceptable level within a duct (4), said apparatus comprising at least one emitter (2) of illumination selected from infra-red, ultravi... | 07/31/2007 |
| 7230258 | Plasma-based debris mitigation for extreme ultraviolet (EUV) light source A light source chamber in an Extreme Ultraviolet (EUV) lithography system may include a secondary plasma to ionize debris particles created by the light source and a foil trap to trap the ionize particles to avoid contamination of the collector optics in the chamber... | 06/12/2007 |
| 7214413 | Method and device for generating an activated gas curtain for surface treatment The invention relates to a surface treatment device comprising: electrodes (24a, 24b) that are used to initiate an electric arc of stabilised plasma (14); a stabilising channel (12) which is disposed in a body (10) in... | 05/08/2007 |
| 7182819 | Methods for cleaning a chamber of semiconductor device manufacturing equipment Methods for cleaning a chamber of semiconductor device manufacturing equipment are disclosed. An illustrated method comprises supplying cleaning gas into a chamber to start a cleaning process; detecting the intensity of a wavelength for the cleaning gas; fixing a va... | 02/27/2007 |
| 7169234 | Apparatus and methods for preventing rotational slippage between a vertical shaft and a support structure for a semiconductor wafer holder A substrate support assembly positively secures a substrate holder support to a rotation shaft with respect to rotationally applied forces. A substrate holder support is configured to have an opening in a socket into which, when aligned with an indentation in the ro... | 01/30/2007 |
| 7166186 | Laser decapsulation apparatus and method A decapsulation apparatus 100 has a laser 8 that removes plastic encapsulant from a device 24. Chamber 20 is sealed. Exhaust port 9 removes debris and fumes. The device 24 is positioned and scanned using an X,Y table 2. A hi... | 01/23/2007 |
| 7157666 | Systems for producing semiconductors and members therefor A member provided around a susceptor for mounting a semiconductor in a chamber of a semiconductor production system. The member has a face opposing the susceptor and a center line average surface roughness of the face opposing the susceptor is 0.5 μm or less. Alter... | 01/02/2007 |
| 7138640 | Method and apparatus for protecting surfaces of optical components The invention pertains to mechanisms for protecting surfaces of optical components of an optical inspection system. One aspect of the invention relates to a gas purge system that produces a gas stream that blocks contaminants from reaching the optical surfaces of th... | 11/21/2006 |
| 7106412 | Lithographic apparatus comprising a gas flushing system A lithographic projection apparatus includes a radiation system constructed and arranged to supply a projection beam of radiation, a support structure constructed and arranged to support a patterning structure, the patterning structure constructed and arranged to pa... | 09/12/2006 |
| 7094193 | High speed laser perforation of cigarette tipping paper A system and method for controlling a cigarette tipping paper perforation process includes supplying the paper in the form of a flexible web from a supply spindle that is mounted for powered angular rotation to a take-up spindle that receives a portion of the flexib... | 08/22/2006 |
| 7087119 | Atomic layer deposition with point of use generated reactive gas species An apparatus for atomic layer deposition preventing mixing of a precursor gas and an input gas. From the apparatus a flow of the input gas is provided over a surface of the workpiece wherein a beam of the electromagnetic radiation is directed into the input gas in c... | 08/08/2006 |
| 7083702 | RF current return path for a large area substrate plasma reactor An apparatus for providing a return current path for RF current between a chamber wall and a substrate support is provided comprising a low impedance flexible curtain having a first end and a second end, the first end adapted to be electrically connected to the cham... | 08/01/2006 |
| 7068370 | Optical inspection equipment for semiconductor wafers with precleaning A method for improving the measurement of semiconductor wafers is disclosed. In the past, the repeatability of measurements was adversely affected due to the unpredictable growth of a layer of contamination over the intentionally deposited dielectric layers. Repeata... | 06/27/2006 |
| 7064363 | Symmetric inducting device for an integrated circuit having a ground shield The present invention relates to integrated circuits having symmetric inducting devices with a ground shield. In one embodiment, a symmetric inducting device for an integrated circuit comprises a substrate, a main metal layer and a shield. The substrate has a workin... | 06/20/2006 |
| 7061574 | Lithographic apparatus with contamination suppression, device manufacturing method, and device manufactured thereby A lithographic projection apparatus is provided. The apparatus includes a radiation system for providing a beam of radiation, and a support for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired patte... | 06/13/2006 |
| 7057701 | Exposure apparatus An exposure apparatus for exposing a substrate to light via a mask. The apparatus includes a projection optical system configured to project a pattern of the mask onto the substrate, a cover configured to surround a path of light from the projection optical system t... | 06/06/2006 |
| 7037560 | Film forming method, and film modifying method A film forming and film modifying method utilizing a film forming apparatus which has an alcohol supply unit to form a metal oxide film on a semiconductor wafer in a vacuum atmosphere in which a vaporized metal oxide film material and a vaporized alcohol exist. The ... | 05/02/2006 |
| 7025831 | Apparatus for surface conditioning Apparatus and process for conditioning a generally planar substrate, contained in a chamber isolatable from the ambient environment and fed with a conditioning gas which includes reactive gas. The apparatus includes a support for supporting the substrate in the cham... | 04/11/2006 |
| 7001481 | Method and system providing high flux of point of use activated reactive species for semiconductor processing A method and system providing a high flux of point of use activated reactive species for semiconductor processing wherein a workpiece is exposed to a gaseous atmosphere containing a transmission gas that is substantially nonattenuating to preselected wavelengths of ... | 02/21/2006 |
| 6968850 | In-situ cleaning of light source collector optics A method and system for cleaning collector optics in a light source chamber. In producing, for example, extreme ultraviolet light for lithography, debris such as tungsten can accumulate on optical components near a light source in the light source chamber. An... | 11/29/2005 |
| 6949147 | In situ module for particle removal from solid-state surfaces Apparatus and a method for removing particles from the surface of a substrate include determining respective position coordinates of the particles on the surface. A beam of electromagnetic energy is directed via an optical cleaning arm at the coordinates of each of ... | 09/27/2005 |
| 6926801 | Laser machining method and apparatus In a laser machining method for removing remaining defects on a photomask, there has been problems to be resolved that damage is formed at the portion of the substrate where the defect has been removed, thus resulting in degraded quality of machining. In a laser mac... | 08/09/2005 |
| 6890387 | Method and device for correcting pattern film on a semiconductor substrate In order to correct a white defect on a surface of a substrate, the substrate is held with the surface facing downward, laser light is upward irradiated at the defect on the surface in material gas, and as a result, the white defect is covered with film. ... | 05/10/2005 |
| 6878303 | Substrate processing apparatus and substrate processing method A substrate processing apparatus for supplying a treatment liquid onto the surface of a substrate to treat the same. This apparatus is provided with: a spin chuck for holding and rotating a substrate; a nozzle for supplying a treatment liquid to the substrate held b... | 04/12/2005 |
| 6866721 | Apparatus and method for photo-induced process Apparatus for a photo-induced process are provided, which implement a transparent film (instead of an optical window), to reduce light absorption loss that would result from use of an optical window. A photo-induced process apparatus eliminates problems of conventio... | 03/15/2005 |
| 6858695 | Curable hot melt adhesive for casemaking A curable casemaking adhesive, books and related articles bound thereby. In one embodiment, a UV curable hot melt adhesive is used to form the case, which is preferably also embossed. In another embodiment, a moisture curable hot melt adhesive is used to form the ca... | 02/22/2005 |
| 6833047 | Alarm apparatus for exchanging lamps of wafer etching equipment There is provided an alarm apparatus for checking an amount of electric current supplied to each of the lamps of a wafer etching equipment and timely exchanging defective lamps if the amount of the current is less than a predetermined level, thereby minimizing proce... | 12/21/2004 |
| 6821906 | Method and apparatus for treating surface of substrate plate Method and apparatus for treating a surface of a substrate plate under irradiation of ultraviolet ray emitted from a dielectric barrier discharge lamp. Upon admission into a treating chamber, oxygen is removed from a treating surface and surrounding atmosphere of a ... | 11/23/2004 |
| 6805751 | Method and apparatus for removal of minute particles from a surface using thermophoresis to prevent particle redeposition A method and apparatus for removing minute particles from a surface of a sample are provided that prevent redeposition of the particles onto the surface. By combining thermophoresis with laser assisted particle removal (LAPR), the methods and apparatus remove minute... | 10/19/2004 |
| 6752900 | Vacuum loadlock ultraviolet bake for plasma etch An improved vacuum plasma etching device for plasma etching semiconductor wafers that have a photo-resist pattern. The improved plasma etching device has a reaction chamber in which the plasma etching is performed during a process cycle, an entrance vacuum loadlock ... | 06/22/2004 |
| 6726805 | Pedestal with integral shield Generally, a substrate support member for supporting a substrate is provided. In one embodiment, a substrate support member for supporting a substrate includes a body coupled to a lower shield. The body has an upper surface adapted to support the substrate and a low... | 04/27/2004 |
| 6648973 | Process for the treatment of a fiber A process using ultraviolet light having a wavelength of 160 to 500 nanometers without higher wavelengths and a high intensity between about 1 and 40 watts/cm2 to surface treat a carbon containing fiber is described. The treated fiber contains ... | 11/18/2003 |
