Did You Know...
...that a workman who left the soap mixing machine on too long was responsible for making Ivory Soap? He was so embarrassed by his mistake that he threw the mess in a stream. Imagine his dismay when the evidence of his error floated to the surface! Result: Ivory soap, the soap that floats.
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| Number | Title | Issue Date |
| 8163128 | Plasma processing apparatus A plasma processing apparatus includes a chamber for containing a substrate to be processed, a gas supply unit for supplying a processing gas into the chamber, and a microwave introducing unit for introducing plasma generating microwaves into the chamber. The microw... | 04/24/2012 |
| 8128783 | Plasma generator and work processing apparatus provided with the same A plasma generator is provided which includes: a microwave generation portion which generates a microwave; a wave guide for propagating the microwave; a plurality of plasma generation nozzles which are attached to the wave guide so as to be apart from each other in ... | 03/06/2012 |
| 8092642 | Plasma processing apparatus Provided is a plasma processing apparatus capable of generating a uniform plasma by preventing a nonuniformity of a current flow in a slot antenna. A dielectric plate is disposed to close a top opening of a plate cover and a slot antenna for generating plasma is dis... | 01/10/2012 |
| 8075733 | Plasma processing apparatus A plasma processing apparatus includes: a decompression chamber of which the inside is depressed; a gas supply unit that supplies process gas into said chamber; a microwave supply unit that supplies a microwave into the chamber to generate plasma; an object-placing ... | 12/13/2011 |
| 7998307 | Electron beam enhanced surface wave plasma source A plasma processing system is described for generating plasma with a ballistic electron beam using a surface wave plasma (SWP) source, such as a radial line slot antenna (RLSA) during semiconductor device fabrication. The antenna comprises a resonator plate having a... | 08/16/2011 |
| 7993488 | Microwave plasma processing device and gate valve for microwave plasma processing device A gate valve includes a plate-shaped valve element which is rectangular-shaped to suit the shape of an opening of a processing chamber and has a size larger than the opening. A hermetically sealing member to perform hermetic sealing by abutting on and being pressed ... | 08/09/2011 |
| 7976672 | Plasma generation apparatus and work processing apparatus A plasma generation apparatus is provided which includes: a microwave generation portion which generates a microwave; a gas supply portion which supplies a gas to be turned into plasma; a plasma generation nozzle which includes a reception member receiving the micro... | 07/12/2011 |
| 7897009 | Plasma processing apparatus A plasma processing apparatus (100) includes a plasma generation mechanism; a process container defining a process chamber configured to perform a plasma process on a target substrate; a substrate worktable configured to place the target substrate thereon ins... | 03/01/2011 |
| 7828927 | Plasma processing device A plasma processing device comprising a chamber (1) for accommodating therein a substrate (11), a high-frequency power supply (5) for generating microwave, and an antenna unit (3) for radiating microwave into the chamber (1). Micro... | 11/09/2010 |
| 7807019 | Radial antenna and plasma processing apparatus comprising the same Guide members (37) extending from the microwave entrance to a ring member (34) are arranged in the direction of propagation of microwave in a radial waveguide. The guide members (37) contribute to prevention of complex electromagnetic mode due t... | 10/05/2010 |
| 7789992 | Neutral beam etching device for separating and accelerating plasma A neutral beam etching device for separating and accelerating a plasma is provided. The device includes a first chamber having a first opening formed at one side thereof; a second chamber having a second opening formed at one side thereof and being disposed inside t... | 09/07/2010 |
| 7682482 | Plasma generation apparatus and work processing apparatus A plasma generation apparatus is provided which includes: an apparatus main body which has a microwave generation section which generates a microwave and a plasma generation nozzle which generates and emits a plasma gas based on the energy of the microwave; a microw... | 03/23/2010 |
| 7670453 | Device for treating a container with microwave plasma A device for treating with microwave plasma a container. The container is placed in a chamber (12) made of a conductive material and is rotationally symmetrical, and the device includes a wave guide tunnel (15) substantially perpendicular to the axis (... | 03/02/2010 |
| 7670454 | Plasma processing apparatus In a microwave plasma processing apparatus, the reflection of microwave by the joint unit between the microwave supplying waveguide and the microwave antenna is reduced by providing a taper surface or a member having a medium permittivity between the microwave suppl... | 03/02/2010 |
| 7655111 | Plasma processing apparatus and plasma processing method At a frame 26 in a microwave plasma processing apparatus 100, numerous horizontal spray gas nozzles 27 formed therein injection holes A and numerous vertical gas nozzles 28 formed therein injection holes B are fixed. A first gas supply me... | 02/02/2010 |
| 7527706 | Plasma processing apparatus, process vessel for plasma processing apparatus and dielectric plate for plasma processing apparatus According to the present invention, with an object of minimizing damage to a dielectric plate and a metal vessel and improving efficiency of plasma processing, a resin layer is disposed in an area where the dielectric plate and the process vessel face each other. Th... | 05/05/2009 |
| 7497922 | Plasma-assisted gas production Methods and apparatus are provided for plasma-assisted gas production. In one embodiment, a gas, which includes at least one atomic or molecular species, can flow into a cavity (305). The gas can be subjected to electromagnetic radiation having a frequency le... | 03/03/2009 |
| 7485204 | ECR plasma source and ECR plasma device An ECR plasma source of the invention is constructed of: a plasma generating chamber (10) having a generally rectangular section in a plane normal to a plasma flow; magnetic coils (20, 21) wound in generally rectangular shapes in a plane normal to the ... | 02/03/2009 |
| 7445690 | Plasma processing apparatus A plasma processing apparatus includes a chamber for containing a substrate to be processed, a gas supply unit for supplying a processing gas into the chamber, and a microwave introducing unit for introducing plasma generating microwaves into the chamber. The microw... | 11/04/2008 |
| 7442271 | Miniature microwave plasma torch application and method of use thereof A miniature microwave plasma torch apparatus (10) is described. The microwave plasma torch apparatus (10) is used for a variety of applications where rapid heating of a small amount of material is needed. The miniature microwave plasma torch apparatus ... | 10/28/2008 |
| 7442272 | Apparatus for manufacturing semiconductor device An apparatus for improving the density and uniformity of plasma in the manufacture of a semiconductor device features a plasma chamber having a complex geometry that causes plasma density to be increased at the periphery or edge of a semiconductor wafer being proces... | 10/28/2008 |
| 7434537 | Device for the coating of objects An apparatus for coating objects having a single microwave source, two or more coating chambers, and an impedance structure or a waveguide structure. The coating chambers are connected to the single microwave source. The impedance structure or waveguide structure di... | 10/14/2008 |
| 7430985 | Plasma processing equipment Plasma processing equipment capable of increasing the heat resistance of a wave guide by using a high dielectric material, comprising a processing container 44 formed to allow vacuuming, a loading table 46 installed in the processing container for plac... | 10/07/2008 |
| 7410552 | Electron cyclotron resonance equipment with variable flare angle of horn antenna An electron cyclotron resonance equipment generates plasma by application of a processing gas and microwave energy into a vacuum chamber having a wafer therein in an environment of reduced pressure. The equipment includes a horn antenna assembly mounted onto an uppe... | 08/12/2008 |
| 7395779 | Plasma processing apparatus A first conductive plate (31A) constituting the radiation surface of a slot antenna (30A) inclines with respect to a first dielectric member (13) opposed to the radiation surface of the slot antenna (30A). Consequently, a plasma generated... | 07/08/2008 |
| 7396431 | Plasma processing system for treating a substrate A plasma processing system for treating a substrate includes a processing chamber including a first chamber portion configured to receive a first gas for providing a plasma space, and a second chamber portion configured to receive a second gas for providing a proces... | 07/08/2008 |
| 7392760 | Microwave-excited plasma processing apparatus A microwave-excited plasma processing apparatus shows a wide pressure range and a wide applicable electric power range for normal electric discharges as a result of using slits cut through a rectangular waveguide and having a profile that allows the electric field a... | 07/01/2008 |
| 7381290 | Microwave plasma generator A microwave plasma generator including field-enhancing electrodes consisting of opposed laminae (108,109) with a gap (110) between them orthogonal to the direction of propagation through the plasma generator of microwave radiation. Gas inlet (106 | 06/03/2008 |
| 7371467 | Process chamber component having electroplated yttrium containing coating A component capable of being exposed to a plasma in a process chamber has a structure having an electroplated coating comprising yttrium-containing species. The electroplated coating is resistant to corrosion in the plasma, and can have a compositional gradient of y... | 05/13/2008 |
| 7368398 | Substrate processing apparatus and substrate processing method A substrate processing apparatus includes a reaction chamber with a structure allowing pressure reduction, a shower head for supplying a processing gas into the reaction chamber including a gas diffusion plate in which through holes are formed, and a substrate suppo... | 05/06/2008 |
| 7364798 | Internal member for plasma-treating vessel and method of producing the same It is to propose an internal member for a plasma treating vessel having excellent resistances to chemical corrosion and plasma erosion under an environment containing a halogen gas and an advantageous method of producing the same, which is a member formed by coverin... | 04/29/2008 |
| 7338575 | Hydrocarbon dielectric heat transfer fluids for microwave plasma generators A process and apparatus for cooling a plasma tube generally includes flowing a hydrocarbon dielectric heat transfer fluid into a space defined by the plasma tube and a concentric tube surrounding the plasma tube. In one embodiment, the hydrocarbon fluid is selected ... | 03/04/2008 |
| 7325511 | Microwave plasma processing apparatus, microwave processing method and microwave feeding apparatus A microwave plasma processing apparatus includes a processing vessel, a microwave generator, a waveguide guiding a microwave formed by the microwave generator, and a microwave emitting member emitting the microwave with wavelength compression by a retardation plate,... | 02/05/2008 |
| 7311796 | Plasma processing apparatus A plasma processing apparatus comprises: a chamber 12 having at least one opening and for generating plasma; a dielectric member 14 provided to cover the opening air-tightly; at least one wave guide 16 provided in the exterior of the chamber suc... | 12/25/2007 |
| 7311851 | Apparatus and method for reactive atom plasma processing for material deposition Reactive atom plasma processing can be used to shape, polish, planarize, and clean surfaces of difficult materials with minimal subsurface damage. The apparatus and methods use a plasma torch, such as a conventional ICP torch. The workpiece and plasma torch are move... | 12/25/2007 |
| 7311797 | Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor Components of semiconductor processing apparatus comprise thermal sprayed yttria-containing coatings that provide erosion, corrosion and/or corrosion-erosion resistance in plasma atmospheres. The coatings can protect substrates from physical and/or chemical attack. | 12/25/2007 |
| 7305935 | Slotted antenna waveguide plasma source A high density plasma generated by microwave injection using a windowless electrodeless rectangular slotted antenna waveguide plasma source has been demonstrated. Plasma probe measurements indicate that the source could be applicable for low power ion thruster appli... | 12/11/2007 |
| 7305934 | Plasma treatment apparatus and plasma generation method A plasma processing apparatus includes a table (22) on which a processing target (W) is to be placed, a processing vessel (11) where the table is to be accommodated, and a power feed unit (40) for supplying a high-frequency electromagnetic field... | 12/11/2007 |
| 7302910 | Plasma apparatus and production method thereof A plasma apparatus includes a container (11) having an opening, a dielectric member (13) supported by an end surface of an outer periphery of the opening of the container (11), an electromagnetic field supplying means for supplying an electromag... | 12/04/2007 |
| 7303789 | Methods for producing thin films on substrates by plasma CVD Methods are provided to form a thin film reproducibly in a process for forming the thin film on the inner wall surface facing a space formed in a substrate by plasma CVD. A thin film is produced on an inner wall surface of a substrate facing a space formed in the su... | 12/04/2007 |
