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| Number | Title | Issue Date |
| 8048259 | Vacuum processing apparatus A plasma processing apparatus which contributes to reducing required time for maintenance and thereby to enhancing the efficiency of processing and that of apparatus operation is to be provided. A vacuum processing apparatus comprises a vacuum vessel in which a subs... | 11/01/2011 |
| 8016974 | Plasma treatment apparatus In a plasma treatment apparatus for performing plasma treatment by accommodating a substrate in a treatment chamber, a fixed guide 12 and a movable guide 13 made of a ceramic are arrayed in an X direction (in a substrate transporting direction) for gui... | 09/13/2011 |
| 7943006 | Method and apparatus for preventing arcing at ports exposed to a plasma in plasma processing chambers A method and apparatus for preventing arcing at a port exposed to a plasma in a plasma chamber use circuit components causing a door sealing the port to provide a short circuit path at excitation frequency of the plasma. In one embodiment, the door is a slit valve d... | 05/17/2011 |
| 7879181 | Apparatus for manufacturing flat-panel display Disclosed herein is a flat panel display (FPD) manufacturing apparatus for performing a desired process for a substrate positioned in a chamber after establishing a vacuum atmosphere in the chamber. The vacuum chamber is divided into a chamber body and an upper cove... | 02/01/2011 |
| 7699957 | Plasma processing apparatus Disclosed is a plasma processing apparatus, in which parasitic plasma is not generated in a transfer chamber. The plasma processing apparatus has a load lock chamber, a transfer chamber, a processing chamber, and gate valves installed between the chambers for transf... | 04/20/2010 |
| 7682481 | Vacuum processing apparatus The present invention provides a vacuum processing apparatus that allows easy exchange of processing chambers. A vacuum processing apparatus of the present invention has a processing chamber and a carrying-in-and-out chamber. The carrying-in-and-out chamber is fixed... | 03/23/2010 |
| 7651583 | Processing system and method for treating a substrate A processing system and method for chemical oxide removal, wherein the processing system includes a process chamber having a lower chamber portion configured to chemically treat a substrate and an upper chamber portion configured to thermally treat the substrate, an... | 01/26/2010 |
| 7632378 | Polishing apparatus A polishing apparatus is used for polishing a workpiece such as a semiconductor wafer to a flat mirror finish. The polishing apparatus comprises a turntable having a polishing surface, a top ring for holding a workpiece and pressing the workpiece against the polishi... | 12/15/2009 |
| 7431795 | Cluster tool and method for process integration in manufacture of a gate structure of a field effect transistor A method and apparatus for process integration in manufacture of a gate structure of a field effect transistor are disclosed. The method includes assembling an integrated substrate processing system having a metrology module and a vacuumed processing platform to per... | 10/07/2008 |
| 7431773 | Atomic layer deposition apparatus and method An atomic layer deposition method includes positioning a semiconductor substrate within an atomic layer deposition chamber. A first deposition precursor is fed to the chamber under first vacuum conditions effective to form a first monolayer on the substrate. The fir... | 10/07/2008 |
| 7422653 | Single-sided inflatable vertical slit valve A vacuum chamber having a gate valve including a chamber housing defining an internal vacuum region and first and second openings through the chamber housing and a gate valve secured to the chamber housing. The gate valve includes a sealing door located in the proce... | 09/09/2008 |
| 7413639 | Energy and media connection for a coating installation comprising several chambers The invention relates to an energy and media connection module for coating installations. Said module serves for supplying with cooling water, compressed air, process gases, signal, control and cathode power. It can be moved from one coating chamber to another coati... | 08/19/2008 |
| 7371306 | Integrated tool with interchangeable wet processing components for processing microfeature workpieces An integrated tool that enables wet chemical processing chambers, lift-rotate units and other hardware to be quickly interchanged without having to recalibrate the transport system or other components to the replacement items. These tools are expected to reduce the ... | 05/13/2008 |
| 7364922 | Automated semiconductor wafer salvage during processing The present invention provides a recovery processing method to restore the substrate processing apparatus to an operating state after correcting an abnormality having occurred in the substrate processing apparatus in operation and having resulted in a stop in the op... | 04/29/2008 |
| 7361600 | Semiconductor manufacturing apparatus having a built-in inspection apparatus and a device manufacturing method using said manufacturing apparatus According to the present invention, a chemical and mechanical polishing apparatus (100) for a sample such as a wafer includes a built-in inspection apparatus (25) incorporated therein. The polishing apparatus (100) further comprises a load unit ... | 04/22/2008 |
| 7357846 | Substrate processing apparatus and substrate processing method In a resist-removing process system 1 for removing a resist film formed on a wafer W, the resist film is denatured so as to make the resist film soluble in water and, then, the resist film is removed from the wafer by applying a water-wash processing to the d... | 04/15/2008 |
| 7358192 | Method and apparatus for in-situ film stack processing Embodiments of a cluster tool, processing chamber and method for processing a film stack are provided. In one embodiment, a method for in-situ etching of silicon and metal layers of a film stack is provided that includes the steps of etching an upper metal layer of ... | 04/15/2008 |
| 7351292 | Assembly for processing substrates An assembly for processing substrates, which processing comprises a vacuum deposition process, such as, for instance, sputtering, CVD or PECVD, which vacuum deposition process is carried out in at least one process chamber, the assembly being provided with a conveyi... | 04/01/2008 |
| 7351291 | Semiconductor processing system A semiconductor processing system includes a load lock chamber and first to third process chambers connected to an airtight transfer chamber. The second process chamber is disposed below the first process chamber and overlaps with the first process chamber. The thir... | 04/01/2008 |
| 7347656 | Vacuum processing apparatus and semiconductor manufacturing line using the same A vacuum processing apparatus is composed of a cassette block and a vacuum processing block. The cassette block has a cassette table for mounting a plurality of cassettes containing a sample and an atmospheric transfer means. The vacuum processing block has a plural... | 03/25/2008 |
| 7338899 | Method of forming contact plug in semiconductor device A method of forming a contact plug of a semiconductor device wherein, after a contact plug is formed in an interlayer insulation film, the interlayer insulation film is selectively etched so that the top surface of the contact plug is higher than the top surface of ... | 03/04/2008 |
| 7339273 | Semiconductor device with a via hole having a diameter at the surface larger than a width of a pad electrode The invention is directed to a semiconductor device having a penetrating electrode and a manufacturing method thereof in which reliability and a yield of the semiconductor device are enhanced. A semiconductor substrate is etched to form a via hole from a back surfac... | 03/04/2008 |
| 7335277 | Vacuum processing apparatus A vacuum processing apparatus comprising a transfer unit disposed at a center thereof, plural processing chambers, each processing chamber having a processing table for supporting an object to be processed and carrying out processing using a gas; and a mass flow con... | 02/26/2008 |
| 7331751 | Vacuum processing method A vacuum processing method includes an atmospheric transfer step of transferring a wafer in atmospheric air to a vacuum transfer chamber using atmospheric transfer equipment disposed in atmospheric air, a vacuum transfer step of transferring the wafer received from ... | 02/19/2008 |
| 7309395 | System for forming composite polymer dielectric film A system for depositing a composite polymer dielectric film on a substrate is disclosed, wherein the composite polymer dielectric film includes a low dielectric constant polymer layer disposed between a first silane-containing layer and a second silane-containing la... | 12/18/2007 |
| 7309269 | Method of fabricating light-emitting device and apparatus for manufacturing light-emitting device In this embodiment, an interval distance between a desposition source holder 17 and an object on which deposition is performed (substrate 13) is reduced to 30 cm or less, preferably 20 cm or less, more preferably 5 to 15 cm, and a deposition source hol... | 12/18/2007 |
| 7303112 | Repair of braze joint and article repaired A method of repairing a braze joint and the resulting joint includes removing an unsuitable portion of a first joining material in a joint between a first member and a second member of an aerospace assembly and cleaning the joint. A stripping solution is used to rem... | 12/04/2007 |
| 7291565 | Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry comprises fl... | 11/06/2007 |
| 7282460 | Transfer chamber for cluster system A transfer chamber for a cluster system includes a first body, a second body attached at one side of the first body, and a cover combined with an upper portion of the first body. The transfer chamber further includes a third body at another side of the first body, w... | 10/16/2007 |
| 7282097 | Slit valve door seal Embodiments of the invention generally provide a slit valve door seal. In one embodiment, a slit valve door seal includes a ring-shaped base having a center axis and at least one finger extending from the base. The finger is oriented substantially parallel to the ce... | 10/16/2007 |
| 7279349 | Semiconductor optical device and manufacturing method thereof In a dry etching step for an organic material film, a fluorine-containing member is disposed to the periphery of a semiconductor substrate disposed on a lower electrode or a tray for wafer transportation to form fluorine (fluoro-radicals) from the member per se in a... | 10/09/2007 |
| 7276122 | Multi-workpiece processing chamber A multi-workpiece chamber includes at least two processing stations, for exposing workpieces to a treatment process. A partition cooperates with the chamber such that the partition is disengagably removable from the chamber and re-engagable with the chamber for sele... | 10/02/2007 |
| 7276124 | Reactor having a movable shutter A shutter assembly for a reactor includes a cylindrical shutter for selectively closing a passthrough opening of the reactor, the shutter forming a closed loop and including an internal cavity adapted to receive a cooling fluid, tubing connected with the cylindrical... | 10/02/2007 |
| 7276097 | Load-lock system, exposure processing system, and device manufacturing method A load-lock system includes a load-lock chamber arranged between a storage port which stores a substrate and a process chamber which processes the substrate in a process space maintained at a pressure lower than that in the storage port, and a dehumidifying unit whi... | 10/02/2007 |
| 7276123 | Semiconductor-processing apparatus provided with susceptor and placing block A semiconductor-processing apparatus comprises a susceptor and removable placing blocks detachably placed at a periphery of the susceptor for transferring a substrate. Retractable supporting members are provided for detaching/attaching the placing blocks from/to the... | 10/02/2007 |
| 7270715 | Chemical vapor deposition apparatus A chemical vapor deposition apparatus includes a subatmospheric substrate transfer chamber. A subatmospheric deposition chamber is defined at least in part by a chamber sidewall. A passageway in the chamber sidewall extends from the transfer chamber to the depositio... | 09/18/2007 |
| 7267725 | Thin-film deposition apparatus A thin-film deposition apparatus includes a reaction chamber, a substrate transfer chamber, a susceptor having a radially-extending step portion, a ring-shaped separation wall for separating the reaction chamber and the substrate transfer chamber at a processing pos... | 09/11/2007 |
| 7264741 | Coater having substrate cleaning device and coating deposition methods employing such coater A coater having a substrate cleaning device is disclosed. Also disclosed are methods of processing substrates in a coater equipped with a substrate cleaning device. The substrate cleaning device comprises an ion gun (i.e., an ion source) that is positioned beneath a... | 09/04/2007 |
| 7258768 | Method of fabricating an EL display device, and apparatus for forming a thin film A plurality of processing chambers are connected to a common chamber (103 in FIG. 1), and they comprehend a processing chamber for oxidation (107), a processing chamber for solution application (108), a processing chamber for baking (1... | 08/21/2007 |
| 7258520 | Methods and apparatus for using substrate carrier movement to actuate substrate carrier door opening/closing A system for opening a substrate carrier includes a substrate carrier having an openable portion. The substrate carrier also has an opening mechanism coupled to the openable portion. A substrate transfer location has a support adapted to support a substrate carrier.... | 08/21/2007 |
