Did You Know...
...that it was melting ice cream that inspired the invention of the outboard motor? It was a lovely August day and Ole Evinrude was rowing his boat to his favorite island picnic spot. As he rowed, he watched his ice cream melt and wished he had a faster way to get to the island. At that moment the idea for the outboard motor was born!
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| Number | Title | Issue Date |
| 8181302 | Brush alignment control mechanism A method and apparatus for providing uniform pressure, friction and/or contact between a substrate and a cylindrical roller in a brush-type cleaning system is described. The apparatus includes an alignment member adapted to allow pivotal movement of the cylindrical ... | 05/22/2012 |
| 8127391 | Subtrate treatment apparatus An inventive substrate treatment apparatus includes a substrate rotation unit which rotates a substrate, a brush to be brought into contact with at least a peripheral edge portion of a front surface of the substrate rotated by the substrate rotation unit, and a peri... | 03/06/2012 |
| 8099817 | Wafer edge cleaning In a first aspect, an apparatus for cleaning a thin disk is provided. The apparatus includes a support roller for supporting a rotating wafer within a wafer cleaner. The support roller comprises a guide portion, for receiving an edge of a wafer, having an inclined s... | 01/24/2012 |
| 8051522 | Substrate treatment apparatus The present invention provides a substrate treatment apparatus for performing a substrate periphery cleaning process. The substrate treatment apparatus includes substrate holding mechanism which holds a substrate, a brush having a cleaning surface inclined with resp... | 11/08/2011 |
| 8020240 | Substrate treatment apparatus A substrate treatment apparatus includes a substrate holding mechanism for holding a substrate, a brush made of an elastically deformable material and having a cleaning surface formed in a shape tapered toward one side in a perpendicular direction perpendicular to o... | 09/20/2011 |
| 7984526 | Methods and materials for making a monolithic porous pad cast onto a rotatable base The present invention includes methods and materials for making a brush or pad for removing materials, particles, or chemicals from a substrate. The brush or pad includes a rotatable base for supporting a porous pad material. The base include an inner surface and an... | 07/26/2011 |
| 7979942 | Substrate treatment apparatus and substrate treatment method A substrate treatment apparatus including a substrate holding mechanism for holding a substrate; a first brush made of an elastically deformable material and having a cleaning surface inclined with respect to a perpendicular direction perpendicular to one surface of... | 07/19/2011 |
| 7962989 | Apparatus for cleaning flat panel display and roll brush used therein An apparatus for cleaning a flat panel display and a roll brush used therein are provided. The apparatus includes an internal wall, hollow cylindrical joint parts, each of which is joined with the internal wall and having an opening therein, and roll brushes, each o... | 06/21/2011 |
| 7913346 | Substrate treatment apparatus and substrate treatment method A substrate treatment apparatus includes a substrate holding mechanism which holds a substrate, a scrub brush for scrubbing a surface of the substrate held by the substrate holding mechanism to remove foreign matter from the substrate surface, a treatment liquid sup... | 03/29/2011 |
| 7908698 | Cleaning apparatus and cleaning method for wafer A wafer on which a CMP processing is completed is rotated. A front surface cleaning brush and a rear surface cleaning brush are made contact both surfaces of the wafer while being rotated. After the front surface cleaning brush and the rear surface cleaning brush ar... | 03/22/2011 |
| 7900311 | Wafer edge cleaning In a first aspect, an apparatus for cleaning a thin disk is provided. The apparatus includes a support roller for supporting a rotating wafer within a wafer cleaner. The support roller comprises a guide portion, for receiving an edge of a wafer, having an inclined s... | 03/08/2011 |
| 7841035 | Disc cleaning machinery, disc cleaning device thereof and rotary brush thereof A disc cleaning mechanism or device has a rotary brush having a rotary shaft on which a plurality of brushes are mounted and, between adjacent brushes of which a plurality of discs is inserted, and a disc revolution stopper for preventing the discs inserted between ... | 11/30/2010 |
| 7823241 | System for cleaning a wafer A system for cleaning a wafer. At least one first chuck roller is connected to a first roller base and includes a first annular groove. A second roller base opposes the first roller base. At least one second chuck roller is connected to the second roller base and in... | 11/02/2010 |
| 7774887 | Scrubber box and methods for using the same A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the sc... | 08/17/2010 |
| 7743449 | System and method for a combined contact and non-contact wafer cleaning module A system and a method for cleaning and rinsing a wafer includes at least three rollers that are capable of supporting a wafer by an edge of the wafer. At least one of the rollers is driven and thereby capable of rotating the wafer. At least one of the rollers is a m... | 06/29/2010 |
| 7725975 | Device for cleaning LCD panel A device for cleaning a liquid crystal display panel including at least one pad part cleaning brush removing foreign matters from a pad part of the liquid crystal display panel, a holder holding the pad part cleaning brush, a driving shaft rotating the holder, and a... | 06/01/2010 |
| 7685667 | Post-CMP cleaning system A method and system for cleaning the wafer after CMP is disclosed. A brush module having at least two brushes placed adjacent to each other and having the wafer placed in between. A dummy roller is in contact with an edge of the wafer and follows a rotation of the w... | 03/30/2010 |
| 7516507 | Integrated megasonic cascade scrubber module and process Substrate preparation systems comprising multi-zone cascade brush scrubbers having sonic assemblies disposed between one or more of the scrubber zones for cleaning of disk-shaped substrates, including silicon wafers and disks for data storage devices, such as hard d... | 04/14/2009 |
| 7503090 | Glass washing machine with conveyor and brush speed control A glass sheet washing machine comprising a conveyor for moving a glass sheet along a path of travel at a controlled linear speed and a brush rotatable at a controlled rotational speed positioned along said path of travel such that said brush contacts the glass sheet... | 03/17/2009 |
| 7451515 | Cleaning processing system and cleaning processing apparatus Disclosed herein is a processing system for applying a cleaning processing to a substrate such as a semiconductor wafer which includes a cleaning processing section including a plurality of process units each serving to apply a predetermined treatment to a wafer and... | 11/18/2008 |
| 7441299 | Apparatuses and methods for cleaning a substrate An apparatus for use in processing a substrate includes a brush enclosure extending over a length. The brush enclosure is configured to be disposed over a surface of the substrate and has an open region that is configured to be disposed in proximity to the substrate... | 10/28/2008 |
| 7435302 | Surface treatment apparatus and method for manufacturing liquid crystal display device A cleaning apparatus according to the present invention is provided with a brush drive mechanism which brings a brush being rotating closer to a substrate, measures electrical potentials generated on a plurality of conductor patterns formed on the substrate, by a co... | 10/14/2008 |
| 7395573 | Dust remover and dust removal method A dust remover includes: a rotary brush for removing dust from a workpiece; a workpiece carrying unit for carrying the workpiece in a first direction; a brush rotation unit for rotating the rotary brush around its axis in synchronization with the movement of the wor... | 07/08/2008 |
| 7392563 | Probe pin cleaning system An improved device for cleaning probe pins of a probe head assembly is presented. The device includes a first holding plate, a second holding plate and a cleaning cartridge. The first holding plate secures the probe head assembly. The second holding plate secures th... | 07/01/2008 |
| 7383601 | Substrate brush scrubbing and proximity cleaning-drying sequence using compatible chemistries, and method, apparatus, and system for implementing the same In one embodiment, a substrate preparation system is provided. The system includes a brush, a front head, and a back head. The brush is configured to brush scrub a back surface of a substrate using a brush scrubbing chemistry. The front head is defined in close prox... | 06/10/2008 |
| 7377002 | Scrubber box A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the sc... | 05/27/2008 |
| 7367773 | Apparatus for combining or separating disk pairs simultaneously Various methods and apparatus are provided for merging and demerging pairs of disks. In one embodiment, pairs of merged disks are first separated and then transferred to separate cassettes such that all of the disks in the separate cassettes are oriented in the same... | 05/06/2008 |
| 7364626 | Substrate processing apparatus and substrate processing method Substrate cleaning apparatus and method capable of preventing adhesion of particles to a substrate irrespective of being hydrophilic or hydrophobic are provided. Although a cleaning liquid ejected from a two-fluid nozzle 36 rebounds from a cup CP and scatters... | 04/29/2008 |
| 7353560 | Proximity brush unit apparatus and method An apparatus is provided for producing a wet region and corresponding dry region on a wafer. A proximity brush unit delivers fluids with a rotatable brush to produce the wet region on the wafer. As the proximity brush unit moves in a selected scan method across the ... | 04/08/2008 |
| 7351269 | Self cleaning filter and vacuum incorporating same A brush configured to move repeatedly over a vacuum filter. The brush will remove dust particles to prevent them from clogging the filter. In the preferred embodiment, the brush is mounted on a revolving shaft. As the shaft turns it moves the bristles of the brush o... | 04/01/2008 |
| 7350315 | Edge wheel dry manifold A apparatus for drying a substrate includes a vacuum manifold positioned adjacent to an edge wheel. The edge wheel includes an edge wheel groove for receiving a peripheral edge of a substrate, and the edge wheel is capable of rotating the substrate at a desired set ... | 04/01/2008 |
| 7346954 | Arrangement for cleaning surfaces with cleaning equipment having a cleaning belt An arrangement (1) for cleaning surfaces (2), particularly curved or arched or wavy surfaces and/or surfaces (2) with varying direction of curvature, for example on vehicle chassis, metal strip or unflat plates. The arrangement has a cleaning de... | 03/25/2008 |
| 7341024 | Apparatus, method and business methods for processing animal waste in a farm building A mobile apparatus is used to process animal waste in a farm building and to spread the processed animal waste back on the floor of the farm building as the apparatus moves through the farm building. The apparatus includes a processing mechanism that heats the anima... | 03/11/2008 |
| 7329321 | Enhanced wafer cleaning method A method for removing post-processing residues in a single wafer cleaning system is provided. The method initiates with providing a first heated fluid to a proximity head disposed over a substrate. Then, a meniscus of the first fluid is generated between a surface o... | 02/12/2008 |
| 7328712 | Cleaning bench for removing contaminants from semiconductor process equipment Described are cleaning benches and methods for removing contaminant layers from semiconductor process components using small volumes of hazardous liquids and minimizing cross-contamination between components from different deposition chambers. Components to be clean... | 02/12/2008 |
| 7322098 | Method of simultaneous two-disk processing of single-sided magnetic recording disks Various methods and apparatus for simultaneously processing two single-sided hard memory disks is provided. Disks are positioned in pairs, with one surface of one disk positioned adjacent one surface of the second disk, with the disk surfaces touching or with a slig... | 01/29/2008 |
| 7314529 | Substrate cleaning apparatus and substrate cleaning method A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During clea... | 01/01/2008 |
| 7314344 | Substrate-transporting device The present invention relates to a substrate-transporting device, including a base, a substrate carrier unit and a shaft unit mounted between the base and the substrate carrier unit. The shaft unit has a supporting shaft and a shaft base to support and control rotat... | 01/01/2008 |
| 7302727 | Pressed powder pan cleaning machine An apparatus is provided for cleaning residual powder and other contaminants from external surfaces of pressed powder cosmetic pans before the pans are adhered into the compact. A feed chute feeds pans into a feed path in the apparatus one after another in an uprigh... | 12/04/2007 |
| 7299810 | Substrate treating apparatus with circulating and heating mechanism for removal liquid A substrate treating apparatus includes a spin chuck for supporting a substrate to be rotatable in a plane including a principal surface of the substrate, a motor for rotating the spin chuck, a circulating pump for circulating a removal liquid and transmitting the r... | 11/27/2007 |
