Did You Know...
...that after Parker Brothers executives turned down the game of Monopoly because it had "52 fundamental errors" (including taking too long to play), a copy of the game wound up in the home of the company president who stayed up until 1 a.m. to finish playing it? He was so impressed by the game that the next day he wrote to inventor Charles Darrow and offered to buy it!
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| Number | Title | Issue Date |
| 8015985 | Substrate processing apparatus and substrate processing method using the same A fluid supply pipe is inserted through a motor supporting member, a spin motor, a rotating shaft, and a plate supporting member. A first flange is integrally formed in the vicinity of a curved portion of a straight portion, extending in the vertical direction, of t... | 09/13/2011 |
| 7726323 | Device and process for liquid treatment of wafer-shaped articles A device for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, near the edge, in which the liquid is applied to a first surface, flows essentially radially to the outside to the peripheral-side edge of the wafer-shaped article and ... | 06/01/2010 |
| 7584761 | Wafer edge surface treatment with liquid meniscus A method for cleaning an edge surface of a semiconductor substrate is disclosed. The proximity head unit is positioned so that the flow head portion and the collection head portion of the proximity head unit are proximate to the edge surface of the semiconductor sub... | 09/08/2009 |
| 7426932 | Spray fill device and method for using the same A spray fill device for delivering water to a washing machine is provided. The spray fill device includes a body defining an inlet, an outlet port, a mounting port, and a plurality of outlet apertures in flow communication with the inlet. The spray fill device also ... | 09/23/2008 |
| 7422024 | Ultrasonic shower cleaning apparatus of double-side cleaning type An ultrasonic shower cleaning apparatus is disclosed which is capable of efficiently cleaning both surfaces of an article and configured to have a reduced size enabling an installation space thereof to be decreased. A pair of ultrasonic shower cleaning mechanisms ea... | 09/09/2008 |
| 7422641 | Substrate cleaning apparatus and substrate cleaning method A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During clea... | 09/09/2008 |
| 7406972 | Substrate proximity processing structures An apparatus for generating a fluid meniscus to process a substrate is provided. The apparatus includes a manifold head with a manifold surface having a plurality of conduits configured to generate a fluid meniscus on a substrate surface when positioned proximate th... | 08/05/2008 |
| 7383843 | Method and apparatus for processing wafer surfaces using thin, high velocity fluid layer Among the many embodiment, in one embodiment, a method for processing a substrate is disclosed which includes generating a fluid layer on a surface of the substrate, the fluid layer defining a fluid meniscus. The generating includes moving a head in proximity to the... | 06/10/2008 |
| 7383601 | Substrate brush scrubbing and proximity cleaning-drying sequence using compatible chemistries, and method, apparatus, and system for implementing the same In one embodiment, a substrate preparation system is provided. The system includes a brush, a front head, and a back head. The brush is configured to brush scrub a back surface of a substrate using a brush scrubbing chemistry. The front head is defined in close prox... | 06/10/2008 |
| 7372645 | Observation device An observation device includes a housing and an optical lens having a field of view. The housing includes an outer dome having at least one transparent portion and an inner dome. The optical lens is accommodated within the housing. The outer dome is transparent in t... | 05/13/2008 |
| 7367345 | Apparatus and method for providing a confined liquid for immersion lithography A method for processing a substrate is provided which includes generating a meniscus on the surface of the substrate and applying photolithography light through the meniscus to enable photolithography processing of a surface of the substrate. ... | 05/06/2008 |
| 7350528 | Warewash machine with moveable table and multi-position rack support track A warewash machine includes a housing at least in part defining a washing chamber having an access opening and a door mounted for movement between a closed position for washing and an open position for inlet/outlet of wares through the access opening. At least one n... | 04/01/2008 |
| 7350316 | Meniscus proximity system for cleaning semiconductor substrate surfaces A system and apparatus for cleaning a substrate is provided. The system includes a first head configured as a bar shape that extends approximately a diameter of the substrate. The first head is configured for placement on a first side of the substrate. A second head... | 04/01/2008 |
| 7314344 | Substrate-transporting device The present invention relates to a substrate-transporting device, including a base, a substrate carrier unit and a shaft unit mounted between the base and the substrate carrier unit. The shaft unit has a supporting shaft and a shaft base to support and control rotat... | 01/01/2008 |
| 7314529 | Substrate cleaning apparatus and substrate cleaning method A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During clea... | 01/01/2008 |
| 7284560 | Liquid processing apparatus A liquid processing apparatus has a substrate rotating device including a holder for holding a substrate and a motor, a chamber for applying the liquid processing to the substrate, a posture changing mechanism for changing the posture of the substrate rotating devic... | 10/23/2007 |
| 7278434 | Cleaning device with toggle for increasing ozone dissolution in water for cleaning vegetables and fruits A cleaning device with a toggle serves for increasing ozone dissolution in water for cleaning vegetables and fruits. The cleaning device is placed in a washing barrel. The cleaning device comprises a toggle being a circular body which is installed with at least one ... | 10/09/2007 |
| 7275553 | Liquid processing apparatus and liquid processing method A cleaning processing apparatus comprises a spin chuck for holding a wafer W, an under plate being positioned to face the back surface of the wafer W with a prescribed gap provided therebetween, a support member for supporting the under plate, and a nozzle hole form... | 10/02/2007 |
| 7270136 | Apparatus for cleaning the edges of wafers The invention concerns an apparatus for cleaning the edge of a wafer that may be relatively simply constructed with low cost, and prevent the wafer from being re-contaminated by the edge cleaning, thus resulting in increase of the yield rate of wafers. The apparatus... | 09/18/2007 |
| 7267129 | Device and process for liquid treatment of wafer-shaped articles A device for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, near the edge, in which the liquid is applied to a first surface, flows essentially radially to the outside to the peripheral-side edge of the wafer-shaped article and ... | 09/11/2007 |
| 7267726 | Method and apparatus for removing polymer residue from semiconductor wafer edge and back side A method for cleaning a semiconductor device has the steps of securing a wafer (16) with a modified chuck (11) and applying a cleaning solution (18) to the backside (20) of the wafer (16). The cleaning solution (18) is formu... | 09/11/2007 |
| 7264007 | Method and apparatus for cleaning a substrate using megasonic power A method for processing a substrate is provided that includes generating a fluid meniscus on a surface of the substrate and applying acoustic energy to the fluid meniscus. The method also includes moving the fluid meniscus over the surface the substrate to process t... | 09/04/2007 |
| 7254900 | Wafer edge wheel with drying function An edge wheel for supporting and rotating a disk-shaped substrate includes a wheel body having a peripheral groove configured to support an edge of a substrate and at least one radial channel extending into said wheel body from said peripheral groove. An edge wheel ... | 08/14/2007 |
| 7252097 | System and method for integrating in-situ metrology within a wafer process A system and method for processing a wafer includes applying a process to the wafer. The process being supported by a surface tension gradient device. A result of the process is monitored. The monitored result is output. ... | 08/07/2007 |
| 7243911 | Substrate treating apparatus A substrate treating apparatus for performing a predetermined treatment of substrates includes a treating tank for storing a treating solution, a holder for holding a plurality of substrates arranged in one direction inside the treating tank, and a bubble generating... | 07/17/2007 |
| 7240679 | System for substrate processing with meniscus, vacuum, IPA vapor, drying manifold One of many embodiments of a substrate preparation system is provided which includes a drying system, the drying system including at least one proximity head for drying a substrate. The system also includes a cleaning system for cleaning the substrate. ... | 07/10/2007 |
| 7234477 | Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces One of many embodiments of a substrate preparation system is provided which includes a head having a head surface where the head surface is proximate to a surface of the substrate. The system also includes a first conduit for delivering a first fluid to the surface ... | 06/26/2007 |
| 7211555 | Process for preparing fine zeolite particles A process for efficiently preparing fine zeolite particles comprising synthesizing zeolite in the presence of an alkaline earth metal-containing compound and/or with controlling the preparation process of zeolite, thereby giving fine zeolite particles being composed... | 05/01/2007 |
| 7195679 | Versatile system for wafer edge remediation The present invention provides a system (200, 300) for remediating aberrations along the perimeter of a semiconductor wafer (202). The system includes a cleaning apparatus (204) within which the wafer is spun within a confined area. A chuck (... | 03/27/2007 |
| 7188632 | Cleaning and sanitizing system A high pressure water stream (14) is discharged onto a surface to be cleaned. An ozone/water stream (16) is discharged on the same surface for sanitizing the surface. The high pressure water and ozone/water streams (14, 16) are discharged simult... | 03/13/2007 |
| 7172674 | Device for liquid treatment of wafer-shaped articles A device for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, in which a mask is kept at a defined short distance to the wafer-shaped article such that liquid can be retained between the mask and the defined area of the wafer-shap... | 02/06/2007 |
| 7168126 | Central vacuum cleaner having an energy recovery ventilator system A central vacuum assembly including a vacuum cleaning apparatus, a ventilation apparatus, a heat exchanger for transferring heat energy between air in the vacuum cleaning apparatus and air in the ventilation apparatus. Optionally, a fan for circulating air within th... | 01/30/2007 |
| 7165563 | Method and apparatus to decouple power and cavitation for megasonic cleaning applications An apparatus and a method is provided for decoupling a cavitation in a liquid from an acoustic energy used to induce the cavitation. Broadly speaking, a pressure adjustment is used to control an acoustically induced cavitation in a liquid contained within a wafer cl... | 01/23/2007 |
| 7163019 | Method of reducing water spotting and oxide growth on a semiconductor structure The present invention relates to a method of cleaning and drying a semiconductor structure in a modified conventional gas etch/rinse or dryer vessel. In an embodiment of the present invention, a semiconductor structure is placed into a first treatment vessel and che... | 01/16/2007 |
| 7147553 | Portable smoking room A portable smoking room having a flexible enclosure defining a room detachably mounted on a frame is provided. A duct is detachably mounted to the frame for transporting smoke laden air within the flexible enclosure outside of the flexible enclosure. A fan detachabl... | 12/12/2006 |
| 7147720 | Non-contact cool-down station for wafers A stationary cooling station for cooling wafers after the wafers have been subjected to semiconductor processing supports the wafer by flowing gas in accordance with the Bernoulli principle. An upper wall of the cooling station contains a plurality of gas outlets th... | 12/12/2006 |
| 7144551 | Mold remediation system and method Provided herein are systems and methods associated therewith for killing molds and reducing other contaminating bioburden that may include bacteria and their spores, yeast, and viruses within various dwellings including homes, office buildings, institutions, and any... | 12/05/2006 |
| 7143771 | Salt truck wash system A vehicle wash system having a series of spray assemblies for use in cleaning vehicles such as a highway salt truck. As the vehicle is driven through the vehicle wash system, sensors alert the control system as to the location of the vehicle. While using a single pu... | 12/05/2006 |
| 7103992 | Industrial dishwasher An industrial dishwashing machine with at least one essentially closed water circuit in which washing water is circulated, and with at least one water inflow which makes rinsing water available which is received into the water circuit after a rinsing operation follo... | 09/12/2006 |
| 7093604 | Dishwasher with heater and method of controlling the same A method of controlling a dishwasher, which heats air in a washing chamber while supplying water into the washing chamber to generate hot water through a heat exchange between the heated air and the supplied water. Further, a second method of controlling a dishwashe... | 08/22/2006 |
