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| Number | Title | Issue Date |
| 7520285 | Apparatus and method for processing a substrate A method for processing a substrate is provided which includes applying fluid onto a surface of the substrate from a portion of a plurality of inlets and removing at least the fluid from the surface of the substrate where the removing being processed as the fluid is... | 04/21/2009 |
| 7426932 | Spray fill device and method for using the same A spray fill device for delivering water to a washing machine is provided. The spray fill device includes a body defining an inlet, an outlet port, a mounting port, and a plurality of outlet apertures in flow communication with the inlet. The spray fill device also ... | 09/23/2008 |
| 7422641 | Substrate cleaning apparatus and substrate cleaning method A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During clea... | 09/09/2008 |
| 7335268 | Inorganic compound for removing polymers in semiconductor processes An inorganic compound for removing polymers after a semiconductor etching process and related methods and apparatus are disclosed. An example compound includes DIW, H2SO4, H2O2 and HF. An example method for removing polyme... | 02/26/2008 |
| 7328716 | Pressure-based gas delivery system and method for reducing risks associated with storage and delivery of high pressure gases Apparatus and method for dispensing a gas using a gas source coupled in selective flow relationship with a gas manifold. The gas manifold includes flow circuitry for discharging gas to a gas-using zone, and the gas source includes a pressure-regulated gas source ves... | 02/12/2008 |
| 7314529 | Substrate cleaning apparatus and substrate cleaning method A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During clea... | 01/01/2008 |
| 7291565 | Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry comprises fl... | 11/06/2007 |
| 7284558 | Enhanced megasonic based clean using an alternative cleaning chemistry The present invention relates to the use of a C1 to C5 alcohol during the cleaning step. With the use of said alcohol, the surface tension of the solution is reduced which allows the application of reduced megasonic power with increased cleanin... | 10/23/2007 |
| 7267473 | Transfer system for coloring agents A system for transferring coloring agents for concrete to a ready mix truck or the like, includes a tank for receiving coloring agents. The tank includes lines for supplying it with water and a pump for transferring the coloring agents to the ready mix truck through... | 09/11/2007 |
| 7255772 | High pressure processing chamber for semiconductor substrate A high pressure chamber comprises a chamber housing, a platen, and a mechanical drive mechanism. The chamber housing comprises a first sealing surface. The platen comprises a region for holding the semiconductor substrate and a second sealing surface. The mechanical... | 08/14/2007 |
| 7252100 | Systems and methods for processing a set of circuit boards A circuit board processing system includes a wash tank configured to contain cleaning fluid, and a positioning subsystem configured to immerse a set of circuit boards into the wash tank. The system further includes a flow control subsystem having (i) a first set of ... | 08/07/2007 |
| 7250374 | System and method for processing a substrate using supercritical carbon dioxide processing A method and system for processing a substrate in a film removal system. The method includes providing the substrate in a substrate chamber of a film removal system, where the substrate has a micro-feature containing a dielectric film on a sidewall of the micro-feat... | 07/31/2007 |
| 7235516 | Semiconductor cleaning composition comprising an ethoxylated surfactant A substrate surface cleaning liquid medium and a cleaning method using the cleaning liquid medium are capable of removing finely particulate contaminants more efficiently than conventional techniques from substrates for devices in the production of semiconductor dev... | 06/26/2007 |
| 7229522 | Substrate processing apparatus and substrate processing method A substrate processing apparatus removes resist films formed on wafers by holding the wafers in a processing vessel and exposing the wafers to a mixed gaseous fluid of steam and an ozone-containing gas into the processing vessel. The inner surfaces, to be exposed to... | 06/12/2007 |
| 7198052 | Mobile flushing unit and process In one embodiment of the invention, a method of cleaning a workpiece is disclosed. The method comprises providing a mobile flushing unit and servicing the workpiece as follows: a) connecting a flexible hose of the mobile flushing unit to one end of the workpiece and... | 04/03/2007 |
| 7171973 | Substrate processing apparatus The substrate processing apparatus has an enclosure structure enclosing a substrate support member to define a processing space. The enclosure structure has an opening closed by a shutter. A processing fluid supply unit, which supplies processing fluid, such as chem... | 02/06/2007 |
| 7165563 | Method and apparatus to decouple power and cavitation for megasonic cleaning applications An apparatus and a method is provided for decoupling a cavitation in a liquid from an acoustic energy used to induce the cavitation. Broadly speaking, a pressure adjustment is used to control an acoustically induced cavitation in a liquid contained within a wafer cl... | 01/23/2007 |
| 7146993 | Bracket for dishwasher tub A bracket is provided for mounting an object to a tub of a dishwasher. The bracket is mounted on the annulus edge of the pump opening in the bottom of the tub adjacent the pump seal ring. No other fasteners are used to secure the bracket to the tub. The bracket is m... | 12/12/2006 |
| 7140393 | Non-contact shuttle valve for flow diversion in high pressure systems A valve for redirecting flow in a supercritical fluid or other high pressure processing system is disclosed. In high pressure supercritical carbon dioxide (SCCO2) equipment for semiconductor wafer processing, a major hurtle in providing clean equipment and clean waf... | 11/28/2006 |
| 7111630 | High pressure processing apparatus and method When the hatch of a substrate washing chamber 5 is opened to receive a substrate, certain valves are closed, and a valve is opened, supply CO2 to purge the substrate washing chamber 5 to and exclude air. When the hatch is closed, another val... | 09/26/2006 |
| 7108000 | Washer pressure equalization system A system for equalizing pressure in a washing chamber in response to changes in pressure inside washing chamber. Gate elements are operable between open and closed positions to regulate pressure conditions inside the washing chamber. ... | 09/19/2006 |
| 7080651 | High pressure processing apparatus and method When the hatch of a substrate washing chamber 5 is opened to receive a substrate, certain valves are closed, and one valve is opened, to supply CO2 to purge the substrate washing chamber 5 to and exclude air. When the hatch is closed, anothe... | 07/25/2006 |
| 7066186 | Method and apparatus mounted on a painting system to clean a paint feed line A method and apparatus are provided to clean a paint feed-line (1) of a painting system, line running from at least one paint tank (2, 9) to a paint deposition device (3) and feeding paint in this direction during the operational stages. During ... | 06/27/2006 |
| 7060422 | Method of supercritical processing of a workpiece An apparatus for supercritical processing and non-supercritical processing of a workpiece comprises a transfer module, a supercritical processing module, a non-supercritical processing module, and a robot. The transfer module includes an entrance. The supercritical ... | 06/13/2006 |
| 7004016 | Probe system for ultrasonic processing tank The invention provides systems, methods and apparatus for processing delicate parts within a process tank such as an ultrasonic tank. Typically, one or more transducers connect to the tank and respond to drive signals from a generator to produce ultrasound within pr... | 02/28/2006 |
| 6996479 | Method and apparatus for measuring and controlling the water content of a water-containing liquid mixture An apparatus for measuring the water content of a water-containing liquid mixture contained in a tight chemistry tank includes a heating device for controlling the temperature of the liquid mixture to a temperature near the boiling point of the liquid mixture, a coo... | 02/07/2006 |
| 6990988 | Substrate processing method and substrate processing system A liquid processing system of the present invention controls a temperature of a processing liquid being in a stand-by circulation line by control means for controlling the heaters to heat the processing liquid stored in the tank, while controlling the opening/closin... | 01/31/2006 |
| 6966348 | Purgeable container for low vapor pressure chemicals A container having two ports; first block valve having two diaphragm valves, each valve having a valve seat side and a diaphragm side, each valve seat side faces the other valve seat side, and connected to the first end of a dispense conduit, one diaphragm side conn... | 11/22/2005 |
| 6953047 | Cabinet for chemical delivery with solvent purging The present invention is an apparatus for storing and delivering a low vapor pressure process chemical to a process tool for semiconductor fabrication, comprising: a) a bulk container for storing the process chemical; b) a process container for delivering the proces... | 10/11/2005 |
| 6946773 | Apparatus and methods for cleaning and/or processing delicate parts The invention utilizes harmonics of certain clamped ultrasound transducers to generate ultrasound within the liquid of an ultrasonic tank and in a frequency range of between about 100 khz to 350 khz (i.e., “microsonic” frequencies). The application of microsonic... | 09/20/2005 |
| 6945259 | Substrate cleaning method and substrate cleaning apparatus A substrate cleaning apparatus is provided that includes a cleaning cup for receiving a to-be-cleaned substrate, a table in the cleaning cup, a first, second, and third nozzles, a pure water heating mechanism configured to supply hot pure water, a branch line, a con... | 09/20/2005 |
| 6926012 | Method for supercritical processing of multiple workpieces An apparatus for supercritical processing of multiple workpieces comprises a transfer module, first and second supercritical processing modules, and a robot. The transfer module includes an entrance. The first and second supercritical processing modules are coupled ... | 08/09/2005 |
| 6921456 | High pressure processing chamber for semiconductor substrate A high pressure chamber comprises a chamber housing, a platen, and a mechanical drive mechanism. The chamber housing comprises a first sealing surface. The platen comprises a region for holding the semiconductor substrate and a second sealing surface. The mechanical... | 07/26/2005 |
| 6914364 | Apparatus and methods for cleaning and/or processing delicate parts The invention utilizes harmonics of certain clamped ultrasound transducers to generate ultrasound within the liquid of an ultrasonic tank and in a frequency range of between about 100 khz to 350 khz (i.e., “microsonic” frequencies). The application of microsonic... | 07/05/2005 |
| 6913029 | Multiple contents container assembly for ultrapure solvent purging A process and apparatus to deliver both process chemical and solvent for cleaning the process chemical in a solvent purge refill system along with an integral solvent sorption module, in a single “assembly” that permits ease of shipping, minimal end-user interac... | 07/05/2005 |
| 6857447 | Pressure-based gas delivery system and method for reducing risks associated with storage and delivery of high pressure gases Apparatus and method for dispensing a gas using a gas source coupled in selective flow relationship with a gas manifold. The gas manifold includes flow circuitry for discharging gas to a gas-using zone, and the gas source includes a pressure-regulated gas source ves... | 02/22/2005 |
| 6848457 | Liquid treatment equipment, liquid treatment method, semiconductor device manufacturing method, and semiconductor device manufacturing equipment Providing liquid treatment equipment capable of largely reducing a frequency of discarding a treatment solution as a whole and capable of implementing smooth and high quality liquid treatment with less manufacturing burden. Equipment comprises a treatment solution b... | 02/01/2005 |
| 6840252 | Multiple contents container assembly for ultrapure solvent purging A process and apparatus to deliver both process chemical and solvent for cleaning the process chemical in a solvent purge refill system along with an integral solvent sorption module, in a single “assembly” that permits ease of shipping, minimal end-user interac... | 01/11/2005 |
| 6837251 | Multiple contents container assembly for ultrapure solvent purging A process and apparatus to deliver both process chemical and solvent for cleaning the process chemical in a solvent purge refill system along with an integral solvent sorption module, in a single “assembly” that permits ease of shipping, minimal end-user interac... | 01/04/2005 |
| 6832616 | Substrate treating apparatus The present invention is directed to a substrate treating apparatus of a multi-nozzle type comprising an outer tube nozzle through which a chemical fluid, a combination of a chemical fluid and a gas, pure water, or a combination of pure water and a gas is discharged... | 12/21/2004 |
