Bizarre Patents
Combination Beverage Container and Spittoon
A combination beverage container and spittoon includes a bottom portion including outer wall and a first inner wall defining a spittoon space.
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| Number | Title | Issue Date |
| 8037891 | Two-fluid nozzle for cleaning substrate and substrate cleaning apparatus An object of the present is to uniform particle diameters and speeds of liquid droplets in a two-fluid nozzle for cleaning substrates which mixes gas and liquid internally and injects liquid droplets with gas so as to clean a substrate. The two-fluid nozzle for clea... | 10/18/2011 |
| 7832418 | Dish washing machine In the dishwasher, a washing water distribution pipe on which washing nozzles are installed is arranged within a washing chamber, and is connected removably to a first connecting pipe that communicates with the outlet side of a washing pump. In the same way, a rinsi... | 11/16/2010 |
| 7669608 | Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle There is disclosed a substrate treating method comprising supplying a treating solution onto a substrate, and continuously discharging a first cleaning solution to the substrate from a first discharge region disposed in a nozzle, while moving the nozzle and substrat... | 03/02/2010 |
| 7426931 | Dishwasher A dishwasher includes a washer tub for accommodating therein items to be cleaned, and a mist generating unit for generating a mist of wash water in the washer tub, the mist generating unit including a mist generating vibrator and a vibration transmitting medium. The... | 09/23/2008 |
| 7426932 | Spray fill device and method for using the same A spray fill device for delivering water to a washing machine is provided. The spray fill device includes a body defining an inlet, an outlet port, a mounting port, and a plurality of outlet apertures in flow communication with the inlet. The spray fill device also ... | 09/23/2008 |
| 7427335 | Cleaning device of band-like apparatus Described is a cleaning device for a band-like apparatus. It comprises a hollow rotatable roll supported to turn in the traveling direction of the band-like apparatus. The roll has a plurality of apertures formed in it, and cleaning fluid jet nozzles arranged at the... | 09/23/2008 |
| 7422641 | Substrate cleaning apparatus and substrate cleaning method A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During clea... | 09/09/2008 |
| 7377053 | Method and device for drying substrate A device for drying substrate comprising a processing vessel housing a specified number of substrates such as semiconductor wafers installed erectedly in parallel to one another, a first substrate supporting member supporting substrates within the processing vessel,... | 05/27/2008 |
| 7371289 | Cleaning and doping of tubulars Apparatus for cleaning and doping a pin 2 of a tubular 3 during the making or breaking of a string on a well platform. The apparatus comprises a housing 4 having first and second conosed ends 6,7 and arranged in used to be secured at its ... | 05/13/2008 |
| 7364626 | Substrate processing apparatus and substrate processing method Substrate cleaning apparatus and method capable of preventing adhesion of particles to a substrate irrespective of being hydrophilic or hydrophobic are provided. Although a cleaning liquid ejected from a two-fluid nozzle 36 rebounds from a cup CP and scatters... | 04/29/2008 |
| 7337790 | Dishwasher Disclosed is a dishwasher, in which upper and lower pipes are opened/closed using a water pressure to simplify a configuration of the dishwasher and to reduce product costs. The present invention includes a washing chamber, top and bottom nozzles injecting water in ... | 03/04/2008 |
| 7338565 | Housingless washer An industrial parts washer includes a stand adapted to support a part, a chamber selectively moveable from a first position clear of the part to a second position engaging the stand where the chamber forms a closed volume encapsulating the part. A nozzle is position... | 03/04/2008 |
| 7329616 | Substrate processing apparatus and substrate processing method A substrate processing apparatus and a substrate processing method are provided wherein an oxide film which is thinner than the conventional films can be formed with uniform thickness when forming an oxide film on the front-side surface of a substrate. A subs... | 02/12/2008 |
| 7322065 | Washing machine and method of controlling the same A disinfecting washing machine includes a disinfecting liquid dispenser, a drive unit and a control unit. The disinfecting liquid dispenser supplies a disinfecting liquid to disinfect laundry. The drive unit outputs first and second voltages to determine a concentra... | 01/29/2008 |
| 7314529 | Substrate cleaning apparatus and substrate cleaning method A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During clea... | 01/01/2008 |
| 7291565 | Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry comprises fl... | 11/06/2007 |
| 7287535 | Work washing apparatus A work washing apparatus including a transfer unit for controlling forward and rearward movements of a work, a table moved by the transfer unit, carrying out the washing of the work from upper and lower surfaces thereof and provided with water/air pipes, an upper su... | 10/30/2007 |
| 7281903 | Device for varying the pressure of the fluid delivered by a jet washer Device for varying the delivery pressure of a jet washer comprising a positive-displacement pump operated by a single-phase electric motor powered by alternating current and having a delivery nozzle of predetermined cross-section, and electronic means for controllin... | 10/16/2007 |
| 7282454 | Switched uniformity control A component delivery mechanism for distributing a component inside a process chamber is disclosed. The component is used to process a work piece within the process chamber. The component delivery mechanism includes a plurality of component outputs for outputting the... | 10/16/2007 |
| 7275553 | Liquid processing apparatus and liquid processing method A cleaning processing apparatus comprises a spin chuck for holding a wafer W, an under plate being positioned to face the back surface of the wafer W with a prescribed gap provided therebetween, a support member for supporting the under plate, and a nozzle hole form... | 10/02/2007 |
| 7270132 | Washer A washer includes a plurality of washing devices for spraying washing water to an object to be washed from various directions of a washing tub, and a washing water feeding device for feeding the washing water. The washing water is sequentially sprayed from respectiv... | 09/18/2007 |
| 7267130 | Substrate processing apparatus The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, interm... | 09/11/2007 |
| 7267728 | System and method for cleaning and/or treating vehicles and the surfaces of other objects The present invention relates to a system and method for cleaning and/or treating a surface, preferably surfaces such as ceramic, steel, plastic, glass and/or painted surfaces such as the exterior surface of a vehicle. The system and method utilize a cleaning compos... | 09/11/2007 |
| 7264008 | Apparatus for cleaning a wafer An apparatus for cleaning a wafer includes a plurality of holders for contacting and securing peripheral portions of a wafer, and for rotating the wafer, a first plate disposed to face a first surface of the wafer, the first plate having a plurality of first nozzles... | 09/04/2007 |
| 7258124 | Apparatus and method for treating surfaces of semiconductor wafers using ozone An apparatus and method for treating surfaces of semiconductor wafers with a reactive gas, such as ozone, utilizes streams of gaseous material ejected from a gas nozzle structure to create depressions on or holes through a boundary layer of processing fluid formed o... | 08/21/2007 |
| 7255772 | High pressure processing chamber for semiconductor substrate A high pressure chamber comprises a chamber housing, a platen, and a mechanical drive mechanism. The chamber housing comprises a first sealing surface. The platen comprises a region for holding the semiconductor substrate and a second sealing surface. The mechanical... | 08/14/2007 |
| 7255115 | Apparatus for cleaning semiconductor wafers An apparatus for cleaning semiconductor wafers includes a chamber, a bubbler having a vapor generating part for generating alcohol vapor and a spray pipe for spraying the alcohol vapor into the chamber, a gas supply nozzle for spraying gas into the chamber to dry th... | 08/14/2007 |
| 7255114 | Ion sampling system for wafer An ion sampling method for wafer provides a wafer in a sampling chamber, wherein the wafer surface that is going to be sampled faces upward; spraying an extraction liquid continuously on the wafer surface to form a liquid film thereon; keeping the thickness of the f... | 08/14/2007 |
| 7252099 | Wafer cleaning apparatus with multiple wash-heads A wafer cleaning apparatus with multiple wash-heads is applied in chemical and mechanical polishing process after wafer cleaning. The wafer cleaning apparatus device includes a supporting base, which supporting base comprises a driving device and at least one fluid ... | 08/07/2007 |
| 7250374 | System and method for processing a substrate using supercritical carbon dioxide processing A method and system for processing a substrate in a film removal system. The method includes providing the substrate in a substrate chamber of a film removal system, where the substrate has a micro-feature containing a dielectric film on a sidewall of the micro-feat... | 07/31/2007 |
| 7240680 | Substrate processing apparatus A substrate processing apparatus includes a rotor 45 for rotating a plurality of wafers W paralleled each other at appropriate intervals. While rotating the wafers W by the rotor 45, a chemical liquid is supplied to the wafers W for their processing. T... | 07/10/2007 |
| 7232494 | Stop start wash cycle for dishwashers A method of washing dishes in a dishwasher that includes a Start Stop sequence in a wash segment of one or more of the dishwashing cycles. The Stop Start sequence includes the steps of pausing the operation of the wash pump, operating the wash pump to circulate wash... | 06/19/2007 |
| 7229521 | Etching system using a deionized water adding device An etching system (3) includes an etching chamber (31), an etchant solution tank (32) connected with the etching chamber, a heater (34) set in the tank, and a deionized water (DIW) adding device. The DIW adding device includes a DIW feedi... | 06/12/2007 |
| 7216655 | Wafer container washing apparatus A semi-conductor handling equipment cleaning method and apparatus are configured for use with wafer carriers. The cleaning apparatus comprises a base portion having first and second apertures and configured to support the wafer carrier in sealing contact about the f... | 05/15/2007 |
| 7213605 | Jewelry cleaning basket An improved tool for cleaning a jewelry article (e.g., ring) accurately grips and positions the article yet captures any device affixed thereto (e.g., gemstone, jewel) while exposing the tool to a jewelry cleaning liquid (e.g., pressurized steam, ultrasonic liquid, ... | 05/08/2007 |
| 7191787 | Method and apparatus for semiconductor wafer cleaning using high-frequency acoustic energy with supercritical fluid An apparatus and a method is provided for using high-frequency acoustic energy with a supercritical fluid to perform a semiconductor wafer (“wafer”) cleaning process. High-frequency acoustic energy is applied to the supercritical fluid to impart energy to partic... | 03/20/2007 |
| 7188632 | Cleaning and sanitizing system A high pressure water stream (14) is discharged onto a surface to be cleaned. An ozone/water stream (16) is discharged on the same surface for sanitizing the surface. The high pressure water and ozone/water streams (14, 16) are discharged simult... | 03/13/2007 |
| 7185664 | Fill control system for an in sink dishwasher A dish-cleaning appliance comprising a sink having a bowl defining a wash chamber with an open top for providing access to the wash chamber. A liquid recirculation system is provided for spraying liquid throughout the wash chamber. A drain conduit can be provided, a... | 03/06/2007 |
| 7182145 | Water bucket system A water bucket system having a water bucket is provided. The water bucket system comprises computer controlled loading of the water bucket from a water source, partial drop control means for controlling the drop of water from the water bucket onto a desired location... | 02/27/2007 |
| 7177081 | High contrast grating light valve type device A grating light valve has with a plurality of spaced reflective ribbons are spatially arranged over a substrate with reflective surfaces. The grating light valve is configured to optimized the conditions for constructive and destructive interference with an incident... | 02/13/2007 |
