Did You Know...
...that in 1800 ether was first used by partyers as a fun diversion? Sniffing the gas led to hilarious and raucous laughter as people watched each other become more and more intoxicated and silly. Several doctors independently realized the value ether would have to anesthetize surgery patients. Of those who claimed rights to the "discovery," none had a happy ending. One had a seizure and died defending his rights. Another spent his life in an asylum because he had been denied acclaim. A third became addicted to chloroform and, in a New York City jail, he soaked a cloth in the drug, severed an artery and bled to death.
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| Number | Title | Issue Date |
| 8118042 | Apparatus and method for cleaning a liquid handling probe The present invention concerns an improved apparatus for cleaning the interior of a liquid handling probe to reduce the amount time and the volume of wash fluid required to clean the probe and minimize carryover of material between different samples. In addition to ... | 02/21/2012 |
| 8047215 | Laparoscopic lens cleaner A laparoscopic lens cleaner which is suitable for maintaining the lens of a laparoscope in a clean, dry condition during a laparoscopic surgical procedure is disclosed. An illustrative embodiment of the laparoscopic lens cleaner includes an elongated cleaner sheath ... | 11/01/2011 |
| 8015984 | Substrate processing apparatus including a drying mechanism using a fluid mixture of purified water and a volatile organic solvent Disclosed is a substrate processing apparatus for cleaning and drying a substrate such as a semiconductor wafer. This substrate processing apparatus includes a liquid processing unit for processing a substrate by immersing the substrate in stored purified water, a d... | 09/13/2011 |
| 8001984 | Laparoscopic lens cleaner A laparoscopic lens cleaner which is suitable for maintaining the lens of a laparoscope in a clean, dry condition during a laparoscopic surgical procedure is disclosed. An illustrative embodiment of the laparoscopic lens cleaner includes an elongated cleaner sheath ... | 08/23/2011 |
| 7997288 | Single phase proximity head having a controlled meniscus for treating a substrate A system for processing a substrate is described. The system includes a proximity head, a mechanism, and a liquid supply. The proximity head is configured to generate a controlled meniscus. Specifically, the proximity head has a plurality of dispensing nozzles forme... | 08/16/2011 |
| 7934513 | Facility with multi-storied process chamber for cleaning substrates and method for cleaning substrates using the facility A facility for cleaning substrates such as semiconductor wafers includes a loading/unloading part, an aligning part where wafers are repositioned from a horizontal state to a vertical state, a cleaning part performing etchant-treating, rinsing, and drying processes ... | 05/03/2011 |
| 7905239 | Part washer An apparatus for cleaning an article comprises: a solution receptacle (12) for storing cleaning solution (100); a cleaning chamber (16) for receiving an article (P) to clean; a material transporting conduit including a solution conduit (14 | 03/15/2011 |
| 7861731 | Cleaning/drying apparatus and cleaning/drying method A cleaning/drying apparatus including a vapor area where vapor of an organic solvent inside the cleaning/drying apparatus is generated, an ejecting part configured to eject the organic solvent onto a cleaning/drying target, a first detecting part configured to deter... | 01/04/2011 |
| 7703462 | Reduction of entrance and exit marks left by a substrate-processing meniscus A proximity head for generating and maintaining a meniscus for processing a substrate is described. The proximity head includes a plurality of meniscus nozzles formed on a face of the proximity head, the nozzles being configured to supply liquid to the meniscus, a p... | 04/27/2010 |
| 7637272 | Method and apparatus for cleaning and drying substrates The present invention provides an apparatus and method for cleaning substrates such as semiconductor wafers by sinking the substrates into cleaning fluids such as cleaning chemicals or rinsing liquids and then drying the substrates. The substrate clean and dry appar... | 12/29/2009 |
| 7628162 | Dish washer and blower cover thereof A blower cover assembly of a dishwasher includes an attaching cap contacting a door liner, a guide sleeve extending frontward from the attaching cap, and a guide rib formed on an inner circumference to guide flow of washing water. ... | 12/08/2009 |
| 7604013 | Substrate cleaning method and developing apparatus A cleaning method highly effectively cleans a surface of a semiconductor wafer by removing a dissolution product, produced when a surface of a semiconductor wafer is processed by a developing process that develops an exposed film formed on the semiconductor wafer by... | 10/20/2009 |
| 7578304 | Cleaning and drying apparatus for substrate holder chuck and method thereof A cleaning and drying apparatus is provided for a substrate holder chuck equipped with a holding members 31 (32, 33) having a plurality of holding grooves 31a (32a, 33a) for holding a plurality of wafers W resp... | 08/25/2009 |
| 7464719 | Multi-menisci processing apparatus A substrate preparation apparatus is provided. The apparatus includes a housing configured to be installed in a substrate fabrication facility. The housing includes a manifold for use in preparing a wafer surface. The manifold is configured to include a first proces... | 12/16/2008 |
| 7434588 | Spin cleaning and drying apparatus and method of spin cleaning and drying The present invention provides a spin cleaning and drying apparatus of single-wafer processing type which cleans a substrate with a cleaning liquid from a rinse nozzle while rotating the substrate and dries the substrate after cleaning while rotating the substrate, ... | 10/14/2008 |
| 7422641 | Substrate cleaning apparatus and substrate cleaning method A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During clea... | 09/09/2008 |
| 7406972 | Substrate proximity processing structures An apparatus for generating a fluid meniscus to process a substrate is provided. The apparatus includes a manifold head with a manifold surface having a plurality of conduits configured to generate a fluid meniscus on a substrate surface when positioned proximate th... | 08/05/2008 |
| 7386944 | Method and apparatus for drying a wafer, and an apparatus for cleaning and drying a wafer A method an apparatus for drying a wafer, and an apparatus for cleaning and drying a wafer are provided. In the apparatus for cleaning and drying a wafer, the wafer is dipped into a cleaning solution in a cleaning tank. The wafer is then dried using a drying gas in ... | 06/17/2008 |
| 7383844 | Meniscus, vacuum, IPA vapor, drying manifold A head is provided which includes a first surface of the head capable of being in close proximity to the wafer surface, and includes a first conduit region on the head where the first conduit region is defined for delivery of a first fluid to wafer of the surface an... | 06/10/2008 |
| 7383843 | Method and apparatus for processing wafer surfaces using thin, high velocity fluid layer Among the many embodiment, in one embodiment, a method for processing a substrate is disclosed which includes generating a fluid layer on a surface of the substrate, the fluid layer defining a fluid meniscus. The generating includes moving a head in proximity to the... | 06/10/2008 |
| 7371694 | Semiconductor device fabrication method and fabrication apparatus The flatness of the surface of a Si substrate is requested as the present gate length is miniaturized. The present invention is a semiconductor device fabrication method for flattening a silicon surface by continuously supplying a high-temperature fluoride ammonium ... | 05/13/2008 |
| 7367345 | Apparatus and method for providing a confined liquid for immersion lithography A method for processing a substrate is provided which includes generating a meniscus on the surface of the substrate and applying photolithography light through the meniscus to enable photolithography processing of a surface of the substrate. ... | 05/06/2008 |
| 7367134 | Dishwasher vent assembly A mechanized vent for a dishwasher employs a vent plate moving about a hinge axis as driven by a cam mechanism at a surface of the vent plate removed from the hinge axis. ... | 05/06/2008 |
| 7368016 | Substrate processing unit and substrate processing apparatus A substrate processing unit includes: a vertically-movable substrate holder for holding a substrate; a pan surrounding a periphery of the substrate holder; a cell, located below the substrate holder and within the pan, having in its interior a chemical processing se... | 05/06/2008 |
| 7363829 | Drill cutting sampler A device for sampling drill cuttings includes a frame, an inclined perforated member mounted on the frame, a sprayer for washing cuttings down over the perforations, and a removable open-topped cuttings collector mounted under the perforated member, the perforated m... | 04/29/2008 |
| 7364626 | Substrate processing apparatus and substrate processing method Substrate cleaning apparatus and method capable of preventing adhesion of particles to a substrate irrespective of being hydrophilic or hydrophobic are provided. Although a cleaning liquid ejected from a two-fluid nozzle 36 rebounds from a cup CP and scatters... | 04/29/2008 |
| 7350315 | Edge wheel dry manifold A apparatus for drying a substrate includes a vacuum manifold positioned adjacent to an edge wheel. The edge wheel includes an edge wheel groove for receiving a peripheral edge of a substrate, and the edge wheel is capable of rotating the substrate at a desired set ... | 04/01/2008 |
| 7347005 | Ventilation system for household appliances in particular for washing machines Ventilation system for household appliances, in particular for washing machines, including a device having at least a chamber for housing an impeller, a suction duct, through which a first fluid, in particular damp air, is sucked into the chamber by the impeller, an... | 03/25/2008 |
| 7343922 | Wafer drying apparatus A wafer drying method includes submerging a wafer in a cleaning solution in a dry chamber. An organic liquid vapor from an organic liquid is supplied into the dry chamber at a first volumetric supply rate to form an organic liquid layer on a surface of the cleaning ... | 03/18/2008 |
| 7329321 | Enhanced wafer cleaning method A method for removing post-processing residues in a single wafer cleaning system is provided. The method initiates with providing a first heated fluid to a proximity head disposed over a substrate. Then, a meniscus of the first fluid is generated between a surface o... | 02/12/2008 |
| 7314054 | Liquid processing apparatus with nozzle having planar ejecting orifices A liquid processing apparatus includes containers 26, 27, 26a, 26b surrounding processing chambers 51, 52 for accommodating a plurality of wafers W and nozzles 54, 56 for supplying a processing liquid to the substrates W in ... | 01/01/2008 |
| 7314529 | Substrate cleaning apparatus and substrate cleaning method A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During clea... | 01/01/2008 |
| 7299810 | Substrate treating apparatus with circulating and heating mechanism for removal liquid A substrate treating apparatus includes a spin chuck for supporting a substrate to be rotatable in a plane including a principal surface of the substrate, a motor for rotating the spin chuck, a circulating pump for circulating a removal liquid and transmitting the r... | 11/27/2007 |
| 7293571 | Substrate proximity processing housing and insert for generating a fluid meniscus An apparatus for generating a fluid meniscus to be formed on a surface of a substrate is provided including a housing where the housing includes a housing surface to be placed proximate to a substrate surface of the substrate. The housing further includes a process ... | 11/13/2007 |
| 7291565 | Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry comprises fl... | 11/06/2007 |
| 7282098 | Processing-subject cleaning method and apparatus, and device manufacturing method and device A method for reducing energy consumption, and amounts of cleaning liquids and rinse liquids used. A cleaning head has a plurality of cleaning units and a drying unit. The organic, and inorganic, substance cleaning portions of each cleaning head, blows a first, and a... | 10/16/2007 |
| 7278434 | Cleaning device with toggle for increasing ozone dissolution in water for cleaning vegetables and fruits A cleaning device with a toggle serves for increasing ozone dissolution in water for cleaning vegetables and fruits. The cleaning device is placed in a washing barrel. The cleaning device comprises a toggle being a circular body which is installed with at least one ... | 10/09/2007 |
| 7275553 | Liquid processing apparatus and liquid processing method A cleaning processing apparatus comprises a spin chuck for holding a wafer W, an under plate being positioned to face the back surface of the wafer W with a prescribed gap provided therebetween, a support member for supporting the under plate, and a nozzle hole form... | 10/02/2007 |
| 7264008 | Apparatus for cleaning a wafer An apparatus for cleaning a wafer includes a plurality of holders for contacting and securing peripheral portions of a wafer, and for rotating the wafer, a first plate disposed to face a first surface of the wafer, the first plate having a plurality of first nozzles... | 09/04/2007 |
| 7264007 | Method and apparatus for cleaning a substrate using megasonic power A method for processing a substrate is provided that includes generating a fluid meniscus on a surface of the substrate and applying acoustic energy to the fluid meniscus. The method also includes moving the fluid meniscus over the surface the substrate to process t... | 09/04/2007 |
