U.S. patents available from 1976 to present.
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Class 134/902 - SEMICONDUCTOR WAFER


Subclass of Class 134 - Cleaning and liquid contact with solids
Definition: Apparatus including means to contact a semiconductor wafer
No. of patents: 1671
Last issue date: 10/28/2008


                    42  
NumberTitleIssue Date
4197000Positive developing method and apparatus
A positive developer and method spraying developer solution against rotating wafers stacked along rotation axis to remove photoresist and recycling the developer solution in successive cycles and batches of wafers being processed; adding small quantities ...
04/08/1980
4190481Apparatus for ion control of solutions
A system is provided for control of ion concentration (as for example in pH or redox control), for use for example in etching articles, wherein other features such as specific gravity control are also provided. The ion concentration control is provided wi...
02/26/1980
4186759Closed system quick coupling head assembly
A coupling head assembly for coupling a source container of chemical in a closed system, the assembly including a main passageway for flow of chemical from the container, an auxiliary passageway for rinsing the container when connected to a source of rins...
02/05/1980
4186032Method for cleaning and drying semiconductors
A semiconductor wafer is cleansed of loose foreign surface matter and chemical impurities near the surface in an apparatus which passes superheated steam over the wafer. Condensate is permitted to form and drip off the wafer. After rising above 100° C. t...
01/29/1980
4181222Kit for processing printed circuit boards
A method and apparatus for etching, developing, or plating circuit boards with a solution utilizing a transparent container in which the circuit board is contacted with the solution....
01/01/1980
4161356Apparatus for in-situ processing of photoplates
An apparatus for in-situ processing of photoplates which minimizes photoplate contamination. Frustro-conical sloping walls are provided in opposed bowl-shaped mating domes containing a centrally disposed photoplate mounted for rotation. Condensing vapor o...
07/17/1979
4132567Apparatus for and method of cleaning and removing static charges from substrates
Wafers are cleaned in the manufacture of integrated circuits by revolving the wafers successively through a spray of deionized water and drying nitrogen gas in a closed chamber, and introducing ionized nitrogen gas into the closed chamber to eliminate sta...
01/02/1979
4129457Post-polishing cleaning of semiconductor surfaces
Semiconductor materials are cleaned after silica polishing by treatment with an aqueous quarternary ammonium salt solution followed by rinsing in water. The treatment coagulates the silica sols and suspends them so that they do not form a film on the semi...
12/12/1978
4118649Transducer assembly for megasonic cleaning
A transducer assembly adapted to oscillate at an ultrasonic frequency comprises a metallic foil having a back surface, at least one transducer having one face thereof mounted adjacent to the back surface by conductive means disposed therebetween, and insu...
10/03/1978
4092176Apparatus for washing semiconductor wafers
An apparatus for washing semiconductor wafers is disclosed which comprises a washing tub, a basket holding semiconductor wafers to be washed and placed in the washing tub, nozzles provided above and below the basket respectively for constantly squirting a...
05/30/1978
4089339Solvent cleaning system
Apparatus adapted for cleaning or degreasing work pieces by contacting with an organic degreasing agent such as a halogenated hydrocarbon. The work pieces are moved in and out of contact with the degreasing agent and are supported on an array of substanti...
05/16/1978
4077416Apparatus for treating articles
To eliminate the manual handling of individual articles associated with loading and unloading conventional treating apparatus, a plurality of articles are simultaneously treated in the carriers which are used for batch handling prior to and subsequent to ...
03/07/1978
4077467Method and apparatus for soldering, fusing or brazing
An apparatus for soldering an article which is placed within a first confined region in hot saturated vapors of a primary high temperature liquid. The vapors condense on the article to heat the article for such purpose. A second body of hot saturated vapo...
03/07/1978
4064885Apparatus for cleaning workpieces by ultrasonic energy
A delicate workpiece, such as a semiconductor wafer is cleaned by supporting the workpiece on a shaft which is rotated. A film of liquid solvent is caused to continuously flow across the exposed workpiece surface while the workpiece is in rotation and ult...
12/27/1977
4027686Method and apparatus for cleaning the surface of a semiconductor slice with a liquid spray of de-ionized water
Method and apparatus for cleaning the surface of a slice of semiconductor material through the use of a liquid spray, wherein the liquid spray is delivered at an angle to the exposed surface of a rotating semiconductor slice at a controlled pressure and v...
06/07/1977
4021278Reduced meniscus-contained method of handling fluids in the manufacture of semiconductor wafers
The invention relates to a method for reducing the consumption of deleterious materials used in the manufacture of semiconductor devices comprising the steps of supporting a semiconductor wafer, supplying a predetermined volume of said materials onto the ...
05/03/1977
4015615Fluid application system
A fluid application system which is useful for the subjection of substantially planar objects to various fluids for cleaning, etching, photoresist developing and the like. The system includes a chamber which has at least one agitation mechanism. The agita...
04/05/1977
4008729Solvent article cleaner
Apparatus for cleaning articles in volatile solvent is provided wherein the article to be cleaned is situated in a solvent collector with siphon tube attached above a reservoir of solvent and below a water-cooled vapor condenser, the solvent being heated ...
02/22/1977
4003392Process and apparatus for cleaning MOS-LSI die
A process and apparatus for cleaning particles from the surfaces of MOS-LSI die is disclosed. The present invention involves cleaning apparatus that includes a process tank, a manifold fixture that secures a plurality of universal inserts having variable ...
01/18/1977
3996949Solvent cleaning system
Apparatus adapted for cleaning or degreasing work pieces by contacting with an organic degreasing agent such as a halogenated hydrocarbon. The work pieces are moved in and out of contact with the degreasing agent and are supported on an array of substanti...
12/14/1976
3995588Apparatus for positioning articles in a treating medium to form layers of fusible metal thereon
In fabricating sealed contacts, often their axially extending leads are solder coated to protect them from contamination and to enhance their solderability into circuits. An apparatus for solder coating the leads, which minimizes their bending, includes a...
12/07/1976
3990462Substrate stripping and cleaning apparatus
A substrate stripping and cleaning apparatus including a closed bowl with an exhaust vent and a liquid drain, a rotating turntable in the bowl carrying baskets of substrates, a spray post with multiple fluid passages, orifices and spray nozzles directing ...
11/09/1976
3983361Electric heating apparatus for heating corrosive solutions
A pyrex tank for heating corrosive solutions is formed with a main body portion having an open top and with a small annular cavity portion depending from the bottom of the main body portion. A heater unit comprising a heating element enclosed in a quartz ...
09/28/1976
3973572Self-purging apparatus for determining the quantitative presence of derived ions
An apparatus for determining the quantitative presence of ions derived from solids, liquids, gases or similar items in which a deionized liquid dissolves the ions from the items, the liquid then is evaluated for conductivity by virtue of the presence of t...
08/10/1976
3973987Water recycle treatment system for use in metal processing
A water recycle treatment system comprising two main treatment sub-systems for treatment of contaminated water from a plurality of concentrated solutions and rinse baths to separate out the impurities therein. A first sub-system treats less concentrated s...
08/10/1976
3970471Methods and apparatus for treating wafer-like articles
Wafer-like articles are inserted through an input port into one of a plurality of slots in a rotatable disc having a slotted periphery. The disc is disposed in a vertical plane between a pair of closely-spaced parallel plates which laterally retain the ar...
07/20/1976
3968013System for cleaning work pieces with solvent
Apparatus adapted for cleaning or degreasing work pieces by contacting with an organic degreasing agent such as a halogenated hydrocarbon. The work pieces are moved in and out of contact with the degreasing agent and are supported on an array of substanti...
07/06/1976
3964956System for maintaining uniform copper etching efficiency
System and apparatus for the controlled etching of copper work pieces with ferric chloride etchants. The working solution is constantly monitored with regard to its oxidation reduction potential (ORP) by comparison with a standard solution or voltage. To ...
06/22/1976
3964957Apparatus for processing semiconductor wafers
Circular wafers of semiconductor (silicon) are chemically treated, e.g., etched, by supporting the wafers vertically by contacting their edges with annularly grooved drive rollers, immersing the supported wafers in a body of chemical medium (e.g., etchant...
06/22/1976
3958585Apparatus for stripping residual solvent from polymer pellets
Apparatus for continuous stripping of residual volatiles from polymer pellets, having their surfaces wet with water, by the use of an upwardly moving flow of steam through a downwardly moving column of wetted polymer pellets, moving in plug-flow, which mi...
05/25/1976
3950184Multichannel drainage system
Disclosed is a multichannel drainage system for separately draining the centrifugally broadcast residue of different liquids sequentially dispensed on the top surface of a semiconductor wafer spun on a spindle at a work station. The multichannel drainage ...
04/13/1976
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